Abstract: A semiconductor device includes a first semiconductor layer of a first conductivity type, and a second semiconductor layer of a second conductivity type provided on part of the first semiconductor layer in each of a first region and a second region separated from each other. A first distance is a distance between both ends of the first insulating film in a direction connecting the fourth semiconductor layer and the sixth semiconductor layer. The first distance in the first region is longer than the first distance in the second region. A second distance is a distance between the third semiconductor layer and the seventh semiconductor layer. The second distance in the first region is longer than the second distance in the second region.

Abstract: According to one embodiment, a spin-torque oscillation element includes a lamination structure containing a spin injection layer, a non-magnetic interlayer formed on the spin injection layer and an oscillation layer formed on the non-magnetic interlayer, and a non-magnetic conductive layer provided on a sidewall of the lamination structure, and the thickness of the lamination structure in a longitudinal direction is 60 nm or less.

Abstract: According to one embodiment, a semiconductor device includes a first semiconductor layer of a first conductivity type, and a second semiconductor layer of a second conductivity type provided on part of the first semiconductor layer in each of a first region and a second region separated from each other. A first distance is a distance between both ends of the first insulating film in a direction connecting the fourth semiconductor layer and the sixth semiconductor layer. The first distance in the first region is longer than the first distance in the second region. A second distance is a distance between the third semiconductor layer and the seventh semiconductor layer. The second distance in the first region is longer than the second distance in the second region.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, the magnetic recording head comprises a cooling/heating material between a laminated oscillator and a main magnetic pole, the cooling/heating material including the following layers laminated from the laminated oscillator side in the following order, a first thermoelectric material layer having the same junction area as that of the laminated oscillator, a first metal material layer having the same junction area as that of the laminated oscillator, a second metal material layer having the same junction area as that of the main magnetic pole, and a second thermoelectric material layer having the same junction area as that of the main magnetic pole.

Abstract: According to one embodiment, a semiconductor device includes a first semiconductor layer of a first conductivity type, and a second semiconductor layer of a second conductivity type provided on part of the first semiconductor layer in each of a first region and a second region separated from each other. A first distance is a distance between both ends of the first insulating film in a direction connecting the fourth semiconductor layer and the sixth semiconductor layer. The first distance in the first region is longer than the first distance in the second region. A second distance is a distance between the third semiconductor layer and the seventh semiconductor layer. The second distance in the first region is longer than the second distance in the second region.

Abstract: According to one embodiment, a semiconductor device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a first conductivity type, a third semiconductor layer of a second conductivity type, an isolation layer, and a guard ring layer of the second conductivity type. The second semiconductor layer is provided on the first semiconductor layer. The third semiconductor layer is provided on the second semiconductor layer to be joined to the second semiconductor layer. The isolation layer surrounds a periphery of the third semiconductor layer and is deeper than the third semiconductor layer. The guard ring layer is provided between the third semiconductor layer and the isolation layer, adjacent to the third semiconductor layer, and deeper than the third semiconductor layer.

Abstract: According to one embodiment, a magnetic recording head includes a main magnetic pole, an auxiliary magnetic pole, and a spin torque oscillator formed between them. The spin torque oscillator includes a main oscillation layer and spin sink layer as an oscillation layer. The spin sink layer contains one of iron and cobalt, and at least one element selected from the group consisting of platinum, palladium, ruthenium, tantalum, chromium, terbium, gadolinium, europium, dysprosium, and samarium.

Abstract: According to one embodiment, a first distance is a distance between both ends of the first insulating film in a direction connecting the fourth semiconductor layer and the sixth semiconductor layer. The first distance in the first region is longer than the first distance in the second region. A second distance is a distance between an edge of the second insulating film on an inner peripheral side of the second semiconductor layer and an edge of the third semiconductor layer on an outer peripheral side of the second semiconductor layer. The second distance in the first region is shorter than the second distance in the second region.

Abstract: According to one embodiment, an oscillation layer of a spin torque oscillator for use in a magnetic head includes a stack of first and second metal films. The first metal film is formed by repetitively stacking a combination of first and second magnetic layers twice or more. The thickness of the first metal film is 0.4 to 5.0 nm. The first magnetic layer has a bcc structure and contains Fe. The second magnetic layer contains Co. The second metal film is made of Cu.

Abstract: According to one embodiment, a magnetic head includes a spin torque oscillator formed between a main magnetic pole and auxiliary magnetic pole. The spin torque oscillator includes a transmission-type spin transfer layer, first interlayer, oscillation layer, second interlayer, and reflection-type spin transfer layer. The transmission-type spin transfer layer includes a first perpendicular magnetization film and first interface magnetic layer. The first interface magnetic layer contains at least one element selected from Fe, Co, and Ni, and at least one element selected from Cr, V, Mn, Ti, and Sc. The reflection-type spin transfer layer includes a second perpendicular magnetization film.

Abstract: According to one embodiment, a first distance is a distance between both ends of the first insulating film in a direction connecting the fourth semiconductor layer and the sixth semiconductor layer. The first distance in the first region is longer than the first distance in the second region. A second distance is a distance between an edge of the second insulating film on an inner peripheral side of the second semiconductor layer and an edge of the third semiconductor layer on an outer peripheral side of the second semiconductor layer. The second distance in the first region is shorter than the second distance in the second region.

Abstract: An example magnetic head includes a recording pole to generate a recording magnetic field, a spin torque oscillator formed in the vicinity of the recording magnetic pole and a hard bias film provided at both end portions of a bias layer and an oscillation layer of spin torque oscillator. The hard bias film is configured to apply a magnetic field to the bias layer and the oscillation layer.

Abstract: An example magnetic writing head includes a main magnetic pole and a coil to generate an ampere magnetic field to magnetize the main magnetic pole to cause the magnetized main magnetic pole to generate a magnetic field. The laminated body includes a first magnetic layer, and a second magnetic layer.

Abstract: According to one embodiment, a magnetic recording head includes a main magnetic pole, an auxiliary magnetic pole, and a spin torque oscillator formed between them. The spin torque oscillator includes a main oscillation layer and spin sink layer as an oscillation layer. The spin sink layer contains one of iron and cobalt, and at least one element selected from the group consisting of platinum, palladium, ruthenium, tantalum, chromium, terbium, gadolinium, europium, dysprosium, and samarium.

Abstract: A first semiconductor layer extends from the element region to the element-termination region, and functions as a drain of the MOS transistor. A second semiconductor layer extends, below the first semiconductor layer, from the element region to the element-termination region. A third semiconductor layer extends from the element region to the element-termination region, and is in contact with the second semiconductor layer to function as a drift layer of the MOS transistor. A distance between a boundary between the first semiconductor layer and the field oxide film, and the end portion of the third semiconductor layer on the fifth semiconductor layer side in the element region is smaller than that between a boundary between the first semiconductor layer and the field oxide layer and an end portion of the third semiconductor layer on the fifth semiconductor layer side in the element-termination region.