Patents by Inventor Mario Johannes Meissl

Mario Johannes Meissl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190232533
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20190196324
    Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.
    Type: Application
    Filed: December 26, 2017
    Publication date: June 27, 2019
    Inventors: Seth J. Bamesberger, Jeremy Sevier, Byung-Jin Choi, Philip D. Schumaker, Mario Johannes Meissl
  • Publication number: 20190061228
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: October 30, 2018
    Publication date: February 28, 2019
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20190033708
    Abstract: Reducing an alignment error of an imprint lithography template with respect to a substrate includes locating central alignment marks of the template with respect to corresponding central alignment marks of the substrate and locating peripheral alignment marks of the template with respect to corresponding peripheral alignment marks of the substrate. In-plane alignment error of the template is assessed based on relative positions of central alignment marks of the template and corresponding central alignment marks of the substrate. A combined alignment error of the template is assessed based on relative positions of peripheral alignment marks of the template and corresponding peripheral alignment marks of the substrate. Out-of-plane alignment error of the template is assessed based on a difference between the-combined and the in-plane alignment error of the template, and a relative position of the template and the substrate is adjusted to reduce the out-of-plane alignment error of the template.
    Type: Application
    Filed: July 31, 2017
    Publication date: January 31, 2019
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Publication number: 20190033709
    Abstract: Reducing an overlay error in nanoimprint lithography includes forming an imprinted substrate having pairs of corresponding peripheral overlay marks and corresponding central overlay marks on the imprinted substrate. An in-plane overlay error is assessed based on relative positions of corresponding central overlay marks, and a combined overlay error is assessed based on relative positions of corresponding peripheral overlay marks. A difference between the combined overlay error and the in-plane overlay error is assessed to yield an adjusted overlay error for each pair of corresponding peripheral overlay marks.
    Type: Application
    Filed: June 22, 2018
    Publication date: January 31, 2019
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Publication number: 20180284604
    Abstract: Methods, systems, and apparatus for applying an imprinting force to an imprint lithography template, including providing, by a controller using a first control loop, a first control signal to a first actuator associated with the first control loop; providing, by the controller using a second control loop, a second control signal to a second actuator associated with the second control loop, wherein the second control loop and the first control loop are different; and applying, to the imprint lithography template, at least one of: a first force by the first actuator in response to the first control signal, and a second force by the second actuator in response to the second control signal.
    Type: Application
    Filed: March 28, 2017
    Publication date: October 4, 2018
    Inventors: Byung-Jin Choi, Mario Johannes Meissl
  • Publication number: 20180173119
    Abstract: Methods, systems, and apparatus for of adjusting a shape of an imprint lithography template, including identifying a shape of an active area positioned on a first side of the template, the active area including patterning features; determining a correspondence between a shape of an adaptive chuck and the shape of the active area positioned on the first side of the template, the adaptive chuck coupled to a second side of the template, the second side opposite the first side of the template; and adjusting, by an actuation system coupled to the adaptive chuck, the shape of the adaptive chuck based on the correspondence to obtain a target shape of the active area positioned on the first side of the template.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 21, 2018
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi
  • Publication number: 20180136556
    Abstract: Methods, systems, and apparatus for identifying dimensional attributes of a first active area of a template; based at least in part on the dimensional attributes of the first active area, determining a desired magnification correction of a second active area of a substrate; determining an out-of-plane distortion of the template, the substrate, or both; applying a back pressure to the template, the substrate, or both, to compensate for the out-of-plane distortion of the template, the substrate, or both; after compensating for the out-of-plane distortion of the template, the substrate, or both: i) contacting an imprint resist positioned on the substrate with the template such that pattern features in the first active area are filled by the imprint resist, and ii) applying an additional back pressure to the template, the substrate, or both, wherein the additional back pressure is selected such that the second active area exhibits the desired magnification correction.
    Type: Application
    Filed: November 14, 2016
    Publication date: May 17, 2018
    Inventors: Byung-Jin Choi, Anshuman Cherala, Mario Johannes Meissl
  • Patent number: 9778578
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Publication number: 20170165898
    Abstract: In an embodiment, an imprint apparatus can include a substrate holder having a chucking region and a recessed support section; and a template holder, wherein the chucking region has more area as compared to a template region. In another embodiment, an imprint apparatus can include gas zones; and a gas controller that can be configured to adjust pressures within the gas zones to induce a convex curvature of a partial field of a workpiece used with the imprint apparatus. A method can include providing a workpiece within an imprint apparatus, wherein the workpiece includes a substrate and a formable material; and initially contacting a template with the formable material at a location spaced apart from the periphery of a partial field. In a particular embodiment, the method can further include modulating the substrate to form a convex shape contacting the template with the formable material.
    Type: Application
    Filed: January 29, 2016
    Publication date: June 15, 2017
    Inventors: Mario Johannes Meissl, Wei Zhang, Byung-Jin Choi, Zhengmao Ye
  • Patent number: 9529274
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: December 27, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Publication number: 20150165671
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Application
    Filed: February 26, 2015
    Publication date: June 18, 2015
    Inventors: Se-Hyuk Im, Mahadevan Ganapathisubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20150131072
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Applicants: TOSHIBA CORPORATION, CANON NANOTECHNOLOGIES, INC.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Publication number: 20150091230
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Application
    Filed: December 15, 2014
    Publication date: April 2, 2015
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Patent number: 8968620
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: 8913230
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: December 16, 2014
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Publication number: 20140117574
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 8, 2014
    Publication date: May 1, 2014
    Applicant: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung- Jin Choi
  • Patent number: 8652393
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: February 18, 2014
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 8556616
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: October 15, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Patent number: RE47483
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: July 2, 2019
    Assignees: Molecular Imprints, Inc., Canon Nanotechnologies, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan