Abstract: A method and a device for maintenance of an elevator or escalator installation includes an interface for connection of a controller of the installation with a display and control unit for display of operating parameters or for input of control commands and data, and connection equipment for creating a data connection with a maintenance center. Data and parameters stored in the maintenance center can be transferred to the display and control unit by the data connection after an identification check. A fault log with component designations, which is transferred by the data connection from the display and control unit to the maintenance center, can be produced in dependence on a comparison between operating parameters and transferred data and parameters.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.

Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Abstract: The invention relates to a covering body for masts of construction cranes, electricity lines, or the like with an outer covering which is designed to partially or totally encase a mast in the direction of extension and/or peripheral direction and which furthermore has at least one rigid inner support, with which the outer covering can be arranged to be spaced at least partially at a distance from the mast. Finally, a fastening device for fastening the inner support to the mast is provided. Such a covering body according to the invention is further developed in that the inner support, by means of the fastening device, can be connected to the mast rotatably adjustable in the peripheral direction and/or adjustable in the direction of extension and that a device for active and/or passive variation of position and/or geometry of the outer covering is provided.

Abstract: An optical system, for example a projection exposure apparatus for microlithography, has at least one optical element with an optical surface. A correction radiation device is provided that includes at least one correction radiation source for emitting correction radiation. A scanning device has at least one scanning mirror that is irradiated by the correction radiation and driven in such a way that a defined portion of the optical surface of the optical element is scanned with the correction radiation. This results in a correction of imaging characteristics of the optical element by means of heat which is supplied to the optical element by the correction radiation.

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract: There is provided a collector unit for illumination systems with a wavelength of ?193 nm, preferably ?126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.

Abstract: Facet mirror having a number of mirror facets A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

Abstract: An optical system, for example a projection exposure apparatus for microlithography, has at least one optical element with an optical surface. A correction radiation device is provided that includes at least one correction radiation source for emitting correction radiation. A scanning device has at least one scanning mirror that is irradiated by the correction radiation and driven in such a way that a defined portion of the optical surface of the optical element is scanned with the correction radiation. This results in a correction of imaging characteristics of the optical element by means of heat which is supplied to the optical element by the correction radiation.

Abstract: The invention relates to a medical pump device comprising a rotary valve (13) having preferably only one rectilinear channel (20) which respectively connects the inlet (4) and the outlet (7) of the pump device, or connects the inlet to a pump chamber (15), or said pump chamber to the outlet, upon rotation of the rotary element (19) of the valve. The invention enables a medical pump device to be especially easily produced, said pump device being preferably inserted between an infusion syringe driver or an infusion container and a catheter, and being used to supply small quantities of liquid in an accurately dosed manner.

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

Abstract: There is provided a collector for illumination systems for light having a wavelength ≦193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

Abstract: An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.