Patents by Inventor Markus Weiss
Markus Weiss has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7362414Abstract: There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.Type: GrantFiled: February 24, 2005Date of Patent: April 22, 2008Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Joachim Hainz, Joachim Wietzorrek, Markus Weiss
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Patent number: 7354168Abstract: A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).Type: GrantFiled: May 18, 2004Date of Patent: April 8, 2008Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Andreas Heisler, Wolfgang Singer, Markus Weiss, Andreas Seifert, Frank Melzer, Heinz Mann, Jurgen Faltus, Berndt Warm, Stefan Dornheim
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Publication number: 20080042079Abstract: There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.Type: ApplicationFiled: October 16, 2007Publication date: February 21, 2008Applicant: Carl Zeiss SMTInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Patent number: 7321126Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.Type: GrantFiled: May 2, 2006Date of Patent: January 22, 2008Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Publication number: 20070283591Abstract: There is provided, a system that includes (a) a source of light having a wavelength of less than or equal to about 193 nm, (b) an optical element having a region for directing the light, (c) an arrangement for cleaning the region, and (d) a chamber to accommodate the region during the cleaning.Type: ApplicationFiled: April 27, 2007Publication date: December 13, 2007Applicant: Carl-Zeiss SMT AGInventors: Wolfgang Singer, Joachim Hainz, Joachim Wietzorrek, Markus Weiss
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Publication number: 20070242799Abstract: There is provided an illumination system. The illumination system includes (a) a mirror, (b) a diaphragm in a light path downstream of the mirror, and (c) a field plane in the light path, downstream of the diaphragm.Type: ApplicationFiled: June 19, 2007Publication date: October 18, 2007Applicant: Carl Zeiss SMT AGInventors: Markus Weiss, Wolfgang Singer, Bernd Kleemann
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Publication number: 20070206301Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.Type: ApplicationFiled: April 3, 2007Publication date: September 6, 2007Inventors: Andreas Seifert, Markus Weiss, Andreas Heisler, Stefan Dornheim
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Patent number: 7248667Abstract: An illumination system, particularly for wavelengths ?100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.Type: GrantFiled: September 24, 2001Date of Patent: July 24, 2007Assignee: Carl Zeiss SMT AGInventors: Markus Weiss, Wolfgang Singer, Bernd Kleemann
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Patent number: 7246909Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12?, which have mirror surfaces 15 and are fitted into reception bores 22, 22? of a support plate 16, the mirror facets 12, 12? are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12? fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12? in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.Type: GrantFiled: September 8, 2004Date of Patent: July 24, 2007Assignee: Carl Zeiss SMT AGInventors: Andreas Seifert, Markus Weiss, Andreas Heisler, Stefan Dornheim
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Patent number: 7244954Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.Type: GrantFiled: October 4, 2005Date of Patent: July 17, 2007Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer, Johannes Wangler
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Publication number: 20070146660Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.Type: ApplicationFiled: December 28, 2005Publication date: June 28, 2007Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Marc Lorenz Van Der Velden, Vadim Banine, Bastiaan Mertens, Johannes Josephina Moors, Markus Weiss, Bastiaan Wolschrijn, Michiel Nijkerk
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Publication number: 20070113857Abstract: A medical ventilation device comprising a cannula having proximal and distal ends; an inflatable cuff adapted to be inflated to an inspiratory pressure, the cuff attached to and surrounding a portion of the cannula toward the distal end thereof; an inspiratory pressure inflation tube having first and second ends, the first end in communication with an interior of the inflatable cuff, the second end adapted to communicate with an inspiratory pressure source; and a pressure valve in communication with the inspiratory pressure inflation tube.Type: ApplicationFiled: November 23, 2005Publication date: May 24, 2007Inventors: Markus Weiss, William Denman
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Publication number: 20070114466Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: ApplicationFiled: May 24, 2006Publication date: May 24, 2007Inventors: Marco Wedowski, Markus Weiss, Stephan Mullender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel Nijkerk, Fokko Wieringa, Nadyeh Shariloo
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Publication number: 20070054497Abstract: The invention relates to a method for preventing contamination of the surfaces of reflective optical elements for the soft X-ray and EUV wavelength range during their irradiation at operating wavelength in an evacuated closed system having a residual gas atmosphere, said elements comprising a cover layer consisting of at least one transition metal. According to said method a residual gas atmosphere is adjusted. The aim of the invention is to prevent a degradation of the surfaces by deposition of carbon and by surface oxidation. For this purpose, both a reducing gas or gas mixture and a gas or gas mixture containing oxygen atoms are introduced.Type: ApplicationFiled: May 6, 2004Publication date: March 8, 2007Inventors: Markus Weiss, Marco Wedowski, Bas Mertens, Bas Wolschrijn, Bart Van Mierlo, Norbert Koster, Jan Van Elp, Anton Duiserwinkel, Annemieke Van De Runstraat
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Patent number: 7172055Abstract: A method and a device for maintenance of an elevator or escalator installation includes an interface for connection of a controller of the installation with a display and control unit for display of operating parameters or for input of control commands and data, and connection equipment for creating a data connection with a maintenance center. Data and parameters stored in the maintenance center can be transferred to the display and control unit by the data connection after an identification check. A fault log with a specification of operating faults and/or a specification of the replacement parts coming into question for rectification of the operating faults can be produced, which is transferred by the data connection from the display and control unit to the maintenance center, can be produced for example to cause ordering of missing replacement parts.Type: GrantFiled: November 28, 2005Date of Patent: February 6, 2007Assignee: Inventio AGInventors: Werner Engel, Markus Weiss
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Publication number: 20060291062Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength 193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.Type: ApplicationFiled: May 2, 2006Publication date: December 28, 2006Inventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Patent number: 7116394Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.Type: GrantFiled: December 19, 2003Date of Patent: October 3, 2006Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Levinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer
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Patent number: 7090362Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.Type: GrantFiled: May 7, 2004Date of Patent: August 15, 2006Assignee: Carl Zeiss SMT AGInventors: Hubert Holderer, Andreas Heisler, Wolfgang Singer, Markus Weiss, Andreas Seifert, Frank Melzer, Heinz Mann
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Patent number: 7091505Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.Type: GrantFiled: February 9, 2004Date of Patent: August 15, 2006Assignee: Carl Zeiss SMT AGInventors: Wolfgang Singer, Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler, Frank Melzer, Bernhard Gellrich, Bernhard Geuppert, Erich Schubert, Martin Antoni
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Patent number: 7084412Abstract: There is provided a collector unit for illumination systems with a wavelength of ?193 nm, preferably ?126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.Type: GrantFiled: September 28, 2004Date of Patent: August 1, 2006Assignee: Carl Zeiss SMT AGInventor: Markus Weiss