Patents by Inventor Martin Riker

Martin Riker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EM source for enhanced plasma control
    Patent number: 11692262
    Abstract: Apparatus and methods for controlling plasma profiles during PVD deposition processes are disclosed. Some embodiments utilize EM coils placed above the target to control the plasma profile during deposition.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: July 4, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Alexander Jansen, Keith A. Miller, Prashanth Kothnur, Martin Riker, David Gunther, Emily Schooley
  • EM SOURCE FOR ENHANCED PLASMA CONTROL
    Publication number: 20220341029
    Abstract: Apparatus and methods for controlling plasma profiles during PVD deposition processes are disclosed. Some embodiments utilize EM coils placed above the target to control the plasma profile during deposition.
    Type: Application
    Filed: July 11, 2022
    Publication date: October 27, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Alexander Jansen, Keith A. Miller, Prashanth Kothnur, Martin Riker, David Gunther, Emily Schooley
  • EM SOURCE FOR ENHANCED PLASMA CONTROL
    Publication number: 20210017639
    Abstract: Apparatus and methods for controlling plasma profiles during PVD deposition processes are disclosed. Some embodiments utilize EM coils placed above the target to control the plasma profile during deposition.
    Type: Application
    Filed: July 16, 2020
    Publication date: January 21, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Alexander Jansen, Keith A. Miller, Prashanth Kothnur, Martin Riker, David Gunther, Emily Schooley
  • SUBSTRATE HEATING PEDESTAL HAVING CERAMIC BALLS
    Publication number: 20150144263
    Abstract: A substrate heating pedestal for a process chamber for processing substrates is described. The pedestal comprises an annular plate comprising a surface having an array of recesses. A plurality of ceramic balls are each positioned in a recess on the surface of the annular plate to define a substrate receiving surface. A heating element is embedded in the annular plate.
    Type: Application
    Filed: February 3, 2015
    Publication date: May 28, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Martin RIKER, Wei W. WANG
  • Substrate cleaning chamber and components
    Patent number: 8980045
    Abstract: A consumable ceramic liner can be used for connecting a gas outlet channel of a remote chamber to a gas inlet channel of a substrate cleaning chamber. The ceramic liner comprises an inlet cylinder having an outer diameter sized to fit in the gas outlet channel of the remote chamber, and an outlet cylinder connected to the gas inlet channel of the substrate cleaning chamber. A conical flare joins the inlet cylinder to the outlet cylinder.
    Type: Grant
    Filed: May 17, 2011
    Date of Patent: March 17, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Martin Riker, Wei W. Wang
  • SUBSTRATE CLEANING CHAMBER AND COMPONENTS
    Publication number: 20110232845
    Abstract: A consumable ceramic liner can be used for connecting a gas outlet channel of a remote chamber to a gas inlet channel of a substrate cleaning chamber. The ceramic liner comprises an inlet cylinder having an outer diameter sized to fit in the gas outlet channel of the remote chamber, and an outlet cylinder connected to the gas inlet channel of the substrate cleaning chamber. A conical flare joins the inlet cylinder to the outlet cylinder.
    Type: Application
    Filed: May 17, 2011
    Publication date: September 29, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Martin RIKER, Wei W. WANG
  • Substrate cleaning chamber and components
    Patent number: 7942969
    Abstract: A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas inlet channel of a substrate cleaning chamber. The substrate heating pedestal comprises an annular plate having a substrate receiving surface with a plurality of ceramic balls positioned in an array of recesses. A process kit comprises a top plate, top liner, gas distributor plate, bottom liner, and focus ring.
    Type: Grant
    Filed: September 19, 2007
    Date of Patent: May 17, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Martin Riker, Wei W. Wang
  • SUBSTRATE CLEANING CHAMBER AND COMPONENTS
    Publication number: 20080295872
    Abstract: A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas inlet channel of a substrate cleaning chamber. The substrate heating pedestal comprises an annular plate having a substrate receiving surface with a plurality of ceramic balls positioned in an array of recesses. A process kit comprises a top plate, top liner, gas distributor plate, bottom liner, and focus ring.
    Type: Application
    Filed: September 19, 2007
    Publication date: December 4, 2008
    Inventors: Martin Riker, Wei W. Wang
  • Sputter target for a physical vapor deposition chamber
    Patent number: D937329
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: November 30, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Martin Riker, William Fruchterman, Ilya Lavitsky, Srinivasa Rao Yedla, Kirankumar Neelasandra Savandaiah
  • Sputter target for a physical vapor deposition chamber
    Patent number: D970566
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: November 22, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Martin Riker, William Fruchterman, Ilya Lavitsky, Srinivasa Rao Yedla, Kirankumar Neelasandra Savandaiah