Patents by Inventor Masaaki Nagase

Masaaki Nagase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180217053
    Abstract: A concentration measurement device including at least one light source; a measurement cell for containing a fluid to be measured; a splitter for dividing light from the light source into incident light being incident into the measurement cell and non-incident light not being incident into the measurement cell; a transmitted-light detector for detecting transmitted light that is the incident light having passed through the measurement cell; a non-incident light detector for detecting the non-incident light; and an arithmetic part for correcting a detection signal of the transmitted-light detector using a detection signal of the non-incident light detector.
    Type: Application
    Filed: August 9, 2016
    Publication date: August 2, 2018
    Applicants: TOKUSHIMA UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Yoshihiro DEGUCHI, Masaaki NAGASE, Michio YAMAJI, Nobukazu IKEDA, Kouji NISHINO, Masayoshi KAWASHIMA, Kazuteru TANAKA
  • Publication number: 20180217054
    Abstract: A concentration measurement device for measuring the concentration of a measured fluid within a measurement cell by detecting transmitted light that has passed through the measurement cell having a light incidence window and a light emission window disposed opposing to each other, comprising a reflected-light detector for detecting reflected light of the light incidence window.
    Type: Application
    Filed: August 9, 2016
    Publication date: August 2, 2018
    Applicants: TOKUSHIMA UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Yoshihiro DEGUCHI, Masaaki NAGASE, Michio YAMAJI, Nobukazu IKEDA, Kouji NISHINO, Masayoshi KAWASHIMA, Kazuteru TANAKA
  • Patent number: 9994955
    Abstract: The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: June 12, 2018
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 9983051
    Abstract: A fastening structure of a brittle-fracturable panel material includes a first fastening flange, a second fastening flange, and a light transmission window panel made of a brittle-fracturable panel material, wherein the light transmission window panel is nipped between the first fastening flange and the second fastening flange, and both fastening flanges are air-tightly fitted and fastened.
    Type: Grant
    Filed: April 25, 2014
    Date of Patent: May 29, 2018
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino, Michio Yamaji, Tadayuki Yakushijin
  • Patent number: 9921089
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1-P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Grant
    Filed: June 2, 2016
    Date of Patent: March 20, 2018
    Assignees: Fujikin Incorporated, National University Corporation Tohuku University, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Publication number: 20180071702
    Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.
    Type: Application
    Filed: April 11, 2016
    Publication date: March 15, 2018
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Masaaki NAGASE, Kaoru HIRATA, Katsuyuki SUGITA, Takatoshi NAKATANI, Satoru YAMASHITA, Kouji NISHINO, Nobukazu IKEDA, Keiji HIRAO
  • Publication number: 20170364099
    Abstract: To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.
    Type: Application
    Filed: June 26, 2017
    Publication date: December 21, 2017
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 9841770
    Abstract: The pressure-type flow control device includes: a main body provided with a fluid channel communicating between a fluid inlet and a fluid outlet and an exhaust channel communicating between the fluid channel and an exhaust outlet; a pressure control valve fixed to a fluid inlet side of the main body for opening or closing the upstream side of the fluid channel; a first pressure sensor for detecting the internal pressure of the fluid channel on the downstream side of the control valve; an orifice provided in the fluid channel on the downstream side of the point of branching of the exhaust channel; an on/off valve for opening or closing the fluid channel on the downstream side of the first pressure sensor; and an exhaust valve for opening or closing the exhaust channel.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: December 12, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Nobukazu Ikeda, Kouji Nishino, Ryousuke Dohi, Katsuyuki Sugita, Masaaki Nagase
  • Publication number: 20170327949
    Abstract: [Problem] To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. [Means for Resolution] The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.
    Type: Application
    Filed: November 2, 2015
    Publication date: November 16, 2017
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20170315051
    Abstract: To provide a concentration measurement method with which the concentrations of predetermined chemical components can be measured non-destructively, accurately, and rapidly by a simple means, up to the concentrations in trace amount ranges, as well as a concentration measurement method with which the concentrations of chemical components in a measurement target can be accurately and rapidly measured in real time up to the concentrations in nano-order trace amount ranges, and which is endowed with a versatility that can be realized in a variety of embodiments and modes. In the present invention, a measurement target is irradiated, in a time sharing manner, with light of a first wavelength and light of a second wavelength that have different optical absorption rates with respect to the measurement target. The light of each wavelength, arriving optically via the measurement target as a result of irradiation with the light of each wavelength, is received at a shared light-receiving sensor.
    Type: Application
    Filed: November 20, 2015
    Publication date: November 2, 2017
    Inventors: Masaaki Nagase, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Shigetoshi Sugawa, Rihito Kuroda
  • Patent number: 9791867
    Abstract: A flow control device equipped with flow monitor includes a build-down type flow monitor unit provided on an upstream side, a flow control unit provided on a downstream side of the build-down type flow monitor unit, a signal transmission circuit connecting the build-down type flow monitor unit and the flow control unit and transmitting a monitored flow rate of the build-down type flow monitor unit to the flow control unit, and a set flow rate value adjustment mechanism being provided in the flow control unit and adjusting a set flow rate of the flow control unit based on the monitored flow rate from the build-down type flow monitor unit.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: October 17, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 9746856
    Abstract: A multi-hole orifice plate for flow control includes an orifice plate for controlling the flow rate of a fluid, wherein the opening area of one orifice necessary for the passage of a predetermined flow rate of fluid is divided to provide a plurality of orifices having a total opening area equal to said opening area.
    Type: Grant
    Filed: April 9, 2014
    Date of Patent: August 29, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Atsushi Hidaka, Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino, Katsuyuki Sugita, Takashi Hirose
  • Patent number: 9733649
    Abstract: To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.
    Type: Grant
    Filed: April 15, 2013
    Date of Patent: August 15, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20170212531
    Abstract: The pressure-type flow controller includes a main body provided with a fluid passage, a control valve for pressure control fixed in a horizontal position to the main body, an on/off valve fixed in a vertical position to the main body on the downstream side of the control valve for pressure control, an orifice provided in the fluid passage on the upstream side of the on/off valve, and a pressure sensor fixed to the main body for detecting the internal pressure of the fluid passage between the control valve for pressure control and the orifice. The fluid passage includes a first passage portion in a horizontal position connected to the control valve for pressure control, a second passage portion in a vertical position connecting the first passage portion to the orifice, and a third passage portion in a horizontal position connecting the second passage portion to the pressure sensor.
    Type: Application
    Filed: July 9, 2015
    Publication date: July 27, 2017
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Kaoru HIRATA, Ryousuke DOHI, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20170199117
    Abstract: An inline concentration measurement device comprises: a measurement cell main body with a gas flow path formed; a light incident part with a window member connected to the main body; and a light receiving part with a window member connected to the main body, wherein the gas flow path includes a gas flow path for an optical path extending straight between the window members of the light incident part and the light receiving part, a first communication part making a gas inlet formed in the main body communicate with the gas flow path part for the optical path, and a second communication part making a gas outlet formed in the main body communicate with the gas flow path part for the optical path, and the first communication part obliquely extends from the gas inlet towards the window member of the light incident part.
    Type: Application
    Filed: July 23, 2015
    Publication date: July 13, 2017
    Applicants: TOKUSHIMA UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Yoshihiro DEGUCHI, Masaaki NAGASE, Nobukazu IKEDA, Michio YAMAJI, Tadayuki YAKUSHIJIN
  • Patent number: 9651467
    Abstract: This invention is related to an optical-analysis-type raw material fluid density detector including a detector main body and a light oscillation unit and a light detection unit that are provided on the upper surface or the under surface of the detector main body, in which the detector main body has at least one recess formed in the upper surface and the under surface, a fluid flow path connecting a fluid inlet of the detector main body to the recess, a fluid flow path connecting the recesses to each other, and a fluid flow path connecting the recess to a fluid outlet of the detector main body; the light oscillation unit is disposed in the recess that is closest to the inlet; and light detection units are disposed in the remaining recesses.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: May 16, 2017
    Assignees: TOKUSHIMA UNIVERSITY, FUJKIN INCORPORATED
    Inventors: Yoshihiro Deguchi, Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino, Michio Yamaji, Tadayuki Yakushijin
  • Patent number: 9638560
    Abstract: In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V2 of the tank, and a gas pressure detector and a gas temperature detector for gas inside the tank, joined in a branched form to a gas supply line, with the valve V2 connected to vacuum. The calibration unit is used to calibrate a flow rate controller based on performing a first measurement of gas temperature and pressure inside the tank, and then building-up gas into the tank, and then performing a second measurement of gas temperature and pressure, and from respective measured values, calculating gas flow rate Q and by comparing a set gas flow rate and calculated gas flow rate Q, performing flow rate calibration.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: May 2, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Nobukazu Ikeda, Yohei Sawada, Tooru Hirai, Kazuyuki Morisaki, Kouji Nishino, Ryousuke Dohi
  • Patent number: 9631777
    Abstract: An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mixed gas easily and highly accurately and displaying the concentration in real time without using an expensive concentration meter, etc.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: April 25, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Kaoru Hirata, Atushi Hidaka, Kouji Nishino, Nobukazu Ikeda, Takeshi Nakamura
  • Patent number: 9574917
    Abstract: A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: February 21, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino
  • Patent number: 9556518
    Abstract: A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: January 31, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kaoru Hirata, Ryousuke Dohi, Kouji Nishino, Nobukazu Ikeda