Patents by Inventor Masahiko Minemura

Masahiko Minemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220195136
    Abstract: In a heat-shielding film formed of addition-curing silicone resin containing organopolysiloxane, organopolysiloxane includes the combination of a plurality of units including at least a R1SiO3/2 unit (a T unit), a R2R3SiO2/2 unit (a D unit), and a R4R5R6SiO1/2 unit (a M unit) (in each unit, R1 to R6 is aliphatic hydrocarbon or hydrogen), and the molar ratio of the T unit, the D unit, and the M unit among all structural units is T:33.3 mol % to 71.4 mol %, D:11.1 mol % to 42.9 mol %, and M:7.0 mol % to 42.9 mol %.
    Type: Application
    Filed: December 16, 2021
    Publication date: June 23, 2022
    Applicants: MAZDA MOTOR CORPORATION, Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuaki YAMAMOTO, Shinji KADOSHIMA, Hiroyuki KOGA, Kazuyuki NEGISHI, Masahiko MINEMURA, Koichi HIGUCHI
  • Publication number: 20220169836
    Abstract: A rubber composition which contains (A) an organosilicon compound represented by formula (1) and gives a cured object satisfying desired fuel (or power)-saving tire properties. (R1 represents an alkyl or aryl group, R2 represents an alkyl or aryl group, e, f, and g each indicate a number larger than 0 and satisfy g/(e+f+g)<0.05, and m is an integer of 1-3.
    Type: Application
    Filed: January 23, 2020
    Publication date: June 2, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Munenao HIROKAMI, Tsuneo KIMURA, Masahiko MINEMURA, Tsutomu NAKAMURA, Masaki TANAKA, Satoru UNO, Masashi YANO
  • Publication number: 20210355284
    Abstract: An organopolysiloxane compound represented by average structural formula (1) is capable of imparting an electron beam curable resin with high antistatic properties, while having excellent antistatic performance durability.
    Type: Application
    Filed: July 11, 2019
    Publication date: November 18, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tetsuro YAMADA, Masahiko MINEMURA
  • Patent number: 9508559
    Abstract: A semiconductor wafer including patterns transferred to a plurality of shot regions of the semiconductor wafer respectively, a plurality of chip regions being formed in the plurality of shot regions respectively, a plurality of first dummy patterns being formed respectively in a first chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of first dummy patterns being arranged repeatedly in a first manner, a plurality of second dummy patterns being formed respectively in a second chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of second dummy patterns being arranged repeatedly in a second manner different from the first manner.
    Type: Grant
    Filed: September 18, 2013
    Date of Patent: November 29, 2016
    Assignee: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Shoko Saito, Tomoyuki Okada, Kanji Takeuchi, Mitsufumi Naoe, Masahiko Minemura, Yukihiro Sato, Yoshito Konno, Yasuhiko Inada, Tomoaki Inaoka, Naoya Sashida
  • Patent number: 9163121
    Abstract: There is disclosed a polycarbonate and polysiloxane block copolymer includes 1 to 50 percent by mass of a siloxane portion derived from a polysiloxane block represented by the following formula (I) and 50 to 99 percent by mass of a carbonate portion derived from a polycarbonate block represented by the following formula (II). There can be provided a novel polycarbonate and polysiloxane block copolymer capable of readily imparting excellent flame retardance, and a flame retardant resin composition.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: October 20, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiko Minemura, Mitsuhiro Takarada, Masaki Tanaka
  • Patent number: 9163157
    Abstract: The present invention relates to a multilayer laminated product which at least contains a layer formed of an acrylic resin composition containing an acrylic resin as a main component, and a specific terminally-modified polycarbonate resin. Moreover, the multilayer laminated product of the present invention has an excellent releasability and low frictional properties.
    Type: Grant
    Filed: May 7, 2013
    Date of Patent: October 20, 2015
    Assignees: MITSUBISHI GAS CHEMICAL COMPANY, INC., MGC FILSHEET CO., LTD.
    Inventors: Masahiko Minemura, Noriyoshi Ogawa, Tatsuya Kanagawa
  • Publication number: 20140328779
    Abstract: A cosmetic product comprising a polymer having recurring units of formula (1): wherein R1 is independently an alkyl group or a fluorinated alkyl group having 1 to 12 carbon atoms, R2 is methyl group or hydrogen atom, R3 is a divalent saturated hydrocarbon group having 1 to 6 carbon atoms, letter a is an integer of 1 to 3, and X is a monovalent group represented by formula (i): wherein R4 is independently an alkyl group or a fluorinated alkyl group having 1 to 12 carbon atoms and letter b is an integer of 1 to 5.
    Type: Application
    Filed: July 17, 2014
    Publication date: November 6, 2014
    Inventors: Mamoru HAGIWARA, Naoki OMURA, Masahiko MINEMURA
  • Patent number: 8710157
    Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility is provided. The present invention also relates to a contact lens gel material having excellent oxygen permeability and transparency. Particularly, the present invention relates to a contact lens material comprising a polycarbonate resin derived from a bisphenol compound (A), a polysiloxane-substituted bisphenol compound (B) and a compound forming a carbonic acid ester.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: April 29, 2014
    Assignees: Menicon Co., Ltd., Mitsubishi Gas Chemical Company, Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
  • Publication number: 20140110712
    Abstract: A semiconductor wafer including patterns transferred to a plurality of shot regions of the semiconductor wafer respectively, a plurality of chip regions being formed in the plurality of shot regions respectively, a plurality of first dummy patterns being formed respectively in a first chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of first dummy patterns being arranged repeatedly in a first manner, a plurality of second dummy patterns being formed respectively in a second chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of second dummy patterns being arranged repeatedly in a second manner different from the first manner.
    Type: Application
    Filed: September 18, 2013
    Publication date: April 24, 2014
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Shoko Saito, Tomoyuki Okada, Kanji Takeuchi, MITSUFUMI NAOE, Masahiko Minemura, Yukihiro Sato, Yoshito Konno, Yasuhiko Inada, Tomoaki Inaoka, Naoya SASHIDA
  • Publication number: 20130272995
    Abstract: A cosmetic product comprising a polymer having recurring units of formula (1): wherein R1 is independently an alkyl group or a fluorinated alkyl group having 1 to 12 carbon atoms, R2 is methyl group or hydrogen atom, R3 is a divalent saturated hydrocarbon group having 1 to 6 carbon atoms, letter a is an integer of 1 to 3, and X is a monovalent group represented by formula (i): wherein R4 is independently an alkyl group or a fluorinated alkyl group having 1 to 12 carbon atoms and letter b is an integer of 1 to 5.
    Type: Application
    Filed: April 12, 2012
    Publication date: October 17, 2013
    Inventors: Mamoru Hagiwara, Naoki Omura, Masahiko Minemura
  • Publication number: 20130261235
    Abstract: There is disclosed a polycarbonate and polysiloxane block copolymer includes 1 to 50 percent by mass of a siloxane portion derived from a polysiloxane block represented by the following formula (I) and 50 to 99 percent by mass of a carbonate portion derived from a polycarbonate block represented by the following formula (II). There can be provided a novel polycarbonate and polysiloxane block copolymer capable of readily imparting excellent flame retardance, and a flame retardant resin composition.
    Type: Application
    Filed: March 8, 2013
    Publication date: October 3, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiko MINEMURA, Mitsuhiro TAKARADA, Masaki TANAKA
  • Patent number: 8501878
    Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility, as well as a contact lens gel material having excellent oxygen permeability and transparency can be provided. The present invention relates to a contact lens material comprising a polycarbonate resin derived from at least two compounds among compounds represented by a general formula (A), a general formula (B) and a general formula (C), a highly polar molecular weight control modifier (chain terminator) and a compound forming a carbonic acid ester, wherein the compound of the general formula (A) is essentially comprised, and to a production method thereof.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: August 6, 2013
    Assignees: Menicon Co., Ltd., Mitsubishi Gas Chemical Company, Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
  • Patent number: 8394181
    Abstract: A permselective material has a polymer having an organosiloxane skeleton and containing a dispersed solid additive. When oxygen and nitrogen are passed through a membrane having the permselective material, the relation between the permeability coefficients [cm3·cm·sec?1·cm?2·cmHg?1] of oxygen and nitrogen at a temperature of 23±2° C. under a pressure difference of 1.05 atm to 1.20 atm through the membrane is expressed by Formula (1): 0.94 ? P ? ( O 2 ) P ? ( N 2 ) < 1 ( 1 ) where P(O2) denotes the permeability coefficient of oxygen, while P(N2) denotes the permeability coefficient of nitrogen.
    Type: Grant
    Filed: December 26, 2007
    Date of Patent: March 12, 2013
    Assignees: Shin-Etsu Polymer Co., Ltd., DENSO CORPORATION, Shin-Etsu Chemical Co., Ltd.
    Inventors: Junya Ishida, Katsunori Iwase, Akira Yamamoto, Masahiko Minemura
  • Patent number: 8394183
    Abstract: An asymmetric membrane contains a porous layer and a dense layer adjacent thereto. The porous layer and the dense layer are formed of a polymeric material. The porous layer and/or dense layer contains a filler. The amount of the filler is 11 parts by mass or more per 100 parts by mass of the polymeric material contained in the asymmetric membrane.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: March 12, 2013
    Assignees: Shin-Etsu Polymer Co., Ltd., Denso Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Junya Ishida, Mitsuaki Negishi, Yuzo Morioka, Mika Kawakita, Katsunori Iwase, Manabu Maeda, Masahiko Minemura, Mamoru Hagiwara
  • Patent number: 8365105
    Abstract: A method of performing an optical proximity effect correction to a first photomask pattern for a wiring of a semiconductor device for use in combination with a second photomask pattern for a via, the wiring including an end portion coupled to the via, the method being performed by a computer including a memory storing layout data of the first photomask pattern and the second photomask pattern, including extracting a pattern of layout data of the first photomask pattern for the wiring corresponding to the end portion of the wiring and layout data of the second photomask pattern for the via.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: January 29, 2013
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Norimasa Nagase, Koichi Suzuki, Masahiko Minemura
  • Patent number: 8298732
    Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: October 30, 2012
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Masahiko Minemura, Seiji Makino, Kanji Takeuchi, Noboru Sugiyama, Kozo Ogino
  • Patent number: 8288493
    Abstract: Provided is a siloxane compound having one end modified with at least one (meth)acrylic group via a spacer, the spacer being a straight chain having at least three ether bonds or a branched structure having at least one ether bond. The (meth)acrylic-modified siloxane compound is added to a heat or photo-curable composition, which cures into a product exhibiting water repellent, antifouling, lubricating and other properties inherent to siloxane.
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: October 16, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroyuki Kume, Masahiko Minemura, Mamoru Hagiwara
  • Publication number: 20120116028
    Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility, as well as a contact lens gel material having excellent oxygen permeability and transparency can be provided. The present invention relates to a contact lens material comprising a polycarbonate resin derived from at least two compounds among compounds represented by a general formula (A), a general formula (B) and a general formula (C), a highly polar molecular weight control modifier (chain terminator) and a compound forming a carbonic acid ester, wherein the compound of the general formula (A) is essentially comprised, and to a production method thereof.
    Type: Application
    Filed: July 15, 2009
    Publication date: May 10, 2012
    Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
  • Publication number: 20120116019
    Abstract: According to the present invention, a contact lens material being excellent in oxygen permeability and transparency, being capable of undergoing injection molding, having no water content and having flexibility is provided. The present invention also relates to a contact lens gel material having excellent oxygen permeability and transparency. Particularly, the present invention relates to a contact lens material comprising a polycarbonate resin derived from a compound represented by a general formula (A), a compound represented by a general formula (B) and a compound forming a carbonic acid ester.
    Type: Application
    Filed: July 15, 2009
    Publication date: May 10, 2012
    Inventors: Yasuhiko Suzuki, Kazuhiko Nakada, Tsuyoshi Watanabe, Takahiro Adachi, Mamoru Hagiwara, Masahiko Minemura
  • Patent number: 8173720
    Abstract: A transparent gel is disclosed which has an interpenetrating polymer network of a copolymer containing a polysiloxane structure and a polycarbonate structure and a hydrophilic polymer obtained by polymerizing a hydrophilic monomer. The transparent gel is useful as a cultivation substrate, a container for storage and an ophthalmic material, comprising an easily synthesizable and purifiable silicon-containing resin, wherein a gel strength, transparency, oxygen permeability, birefringence and other characteristics are excellent.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: May 8, 2012
    Assignees: Mitsubishi Gas Chemical Company, Inc., Menicon Co., Ltd.
    Inventors: Kazuhiko Nakada, Takahito Nakase, Takahiro Adachi, Akira Yamamoto, Masahiko Minemura