Patents by Inventor Masahiko Minemura

Masahiko Minemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050166112
    Abstract: A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.
    Type: Application
    Filed: March 9, 2005
    Publication date: July 28, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Tomoyuki Okada, Masahiko Minemura, Mitsuo Sakurai, Ryo Tsujimura
  • Patent number: 6878200
    Abstract: In a cold-curing mortar or concrete composition comprising calcareous and siliceous materials as predominant components, 0.3-2.5 wt % based on the calcareous material of a silicone oil having formula (1) is added. R is C3-12 alkyl, R? is C1-4 alkyl, y is such an integer that the number of R is 5-50 mol % of the total number of substituent groups directly attached to silicon atoms in a molecule, z is an integer of 0-5, and 3?x+y+z?30. The set composition is improved in water repellency without incurring a drop of strength.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: April 12, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masafumi Kikuchi, Akio Koyama, Usaburo Yano, Masahiko Minemura, Akira Yamamoto
  • Publication number: 20050000392
    Abstract: In a cold-curing mortar or concrete composition comprising calcareous and siliceous materials as predominant components, 0.3-2.5 wt % based on the calcareous material of a silicone oil having formula (1) is added. R is C3-12 alkyl, R? is C1-4 alkyl, y is such an integer that the number of R is 5-50 mol % of the total number of substituent groups directly attached to silicon atoms in a molecule, z is an integer of 0-5, and 3?x+y+z?30. The set composition is improved in water repellency without incurring a drop of strength.
    Type: Application
    Filed: March 3, 2004
    Publication date: January 6, 2005
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masafumi Kikuchi, Akio Koyama, Usaburo Yano, Masahiko Minemura, Akira Yamamoto
  • Publication number: 20040214931
    Abstract: A dimethylpolysiloxane composition comprising at least two dimethylpolysiloxanes selected from dimethylpolysiloxanes represented by formula (1) or formula (2), 1
    Type: Application
    Filed: April 27, 2004
    Publication date: October 28, 2004
    Inventors: Toshiaki Ihara, Sinobu Sato, Ichiro Ono, Hiroshi Nakayama, Masahiko Minemura
  • Publication number: 20040186224
    Abstract: A novel dilatant fluid which keeps fluid state within a broad temperature range, is excellent in storage stability, has large mechanical strength and shows large changing quantity of viscosity resistance accompanied by the increase of shear stress. It was found that excellent dilatancy is expressed markedly specifically in a composition comprising (B) from 0.5 to 100 parts by weight of a particle dispersing agent and (C) from 5 to 1,000 parts by weight of a silicone medium, based on (A) 100 parts by weight an inorganic fine particle having a primary particle size of from 2 nm to 30 &mgr;m.
    Type: Application
    Filed: January 29, 2004
    Publication date: September 23, 2004
    Inventors: Masahiko Minemura, Masanao Kamei
  • Publication number: 20030200523
    Abstract: An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.
    Type: Application
    Filed: March 6, 2003
    Publication date: October 23, 2003
    Applicant: Fujitsu Limited
    Inventors: Kazuhiko Takahashi, Masahiko Minemura, Mitsuo Sakurai, Kazuya Sugawa
  • Patent number: 6635392
    Abstract: Provided is a computer 15 for producing corrected pattern data which includes corrected features each obtained by adding auxiliary features (serifs) to the right-angle corners of an original feature to compensate for the photo proximity effect. The computer performs the step of: (S1) inputting an original pattern data; (S2) adding triangle or rectangle serifs to right-angle corners of original features, each serif having a side which is an extension of a first side of a corresponding original feature and another side which is a portion of the side adjacent to the first side; (S3) performing a geometric OR operation on the original feature and the serifs to obtain a synthesized feature; and (S4) decomposing the synthesized feature into basic figures which can be processed in an electron beam exposure apparatus.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: October 21, 2003
    Assignee: Fujitsu Limited
    Inventors: Tomoyuki Okada, Yoshimasa Iiduka, Kazuhiko Takahashi, Masahiko Minemura
  • Patent number: 6507944
    Abstract: A data processing apparatus comprises a grid pattern area calculation section (24) for calculating the minimum grid and the present area of a circuit element for each layer of circuit patterns given by CAD data (1); an overlap area calculation section (25) for calculating an overlap area of present areas; and a composition/division optimization judgment section (26) for judging by a criterion whether the layers including the overlap area should be processed according to a single common grid or different grids. Each layer can be assigned the grid with the minimum accuracy required for the layer. A grid with more minute accuracy than it requires may not be used. Operation load in making reticle mask data and processing load in actually performing exposure or the like are thereby considerably relieved.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: January 14, 2003
    Assignee: Fujitsu Limited
    Inventors: Kenji Kikuchi, Yoshimasa Ilduka, Tomoyuki Okada, Masahiko Minemura
  • Patent number: 6444596
    Abstract: A base cloth for an air bag is obtained by forming a film of a silicone modified thermoplastic polyurethane resin having a polysiloxane segment on a surface of a woven fabric, and the air bag is formed of the base cloth. Since an organic solvent is not used when the resin is prepared, its workability is superior, the resin is safe for the human body. Also, the air bag can be quickly developed in a wide range from an extremely low temperature to a high temperature, and there is no problem of adhesion or sticking. Thus, the air bag having a stable performance and the base cloth for the air bag are provided.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: September 3, 2002
    Assignees: Takata Corporation, Shin-Etsu Chemical Co., Ltd., Dainichiseika Color & Chemicals Mfg. Co., Ltd.
    Inventors: Kinji Hirai, Masahiko Minemura, Yoshitaka Koshiro, Susumu Nakamura, Kazuyuki Hanada
  • Patent number: 6444483
    Abstract: A full area of a semiconductor integrated circuit is divided into unit areas, a mask data file for use in a beam exposure system or an inspection apparatus is produced based on CAD data of the full area, full-area header information in which a starting address of a mask data of each unit area relates to positional information on said unit area, partial-area header information corresponding to each of partial areas obtained by division of the full area is produced based on the full-area header information and mask data of the partial areas are extracted from a mask data of the full area based on the partial area header information to produce the mask data files corresponding to the partial area header information.
    Type: Grant
    Filed: July 14, 2000
    Date of Patent: September 3, 2002
    Assignee: Fujitsu Limited
    Inventors: Masahiko Minemura, Tomoyuki Okada, Ryo Tsujimura, Kenji Kikuchi, Yoshimasa Iiduka
  • Publication number: 20010028981
    Abstract: Provided is a computer 15 for producing corrected pattern data which includes corrected features each obtained by adding auxiliary features (serifs) to the right-angle corners of an original feature to compensate for the photo proximity effect. The computer performs the step of: (S1) inputting an original pattern data; (S2) adding triangle or rectangle serifs to right-angle corners of original features, each serif having a side which is an extension of a first side of a corresponding original feature and another side which is a portion of the side adjacent to the first side; (S3) performing a geometric OR operation on the original feature and the serifs to obtain a synthesized feature; and (S4) decomposing the synthesized feature into basic figures which can be processed in an electron beam exposure apparatus.
    Type: Application
    Filed: January 19, 2001
    Publication date: October 11, 2001
    Inventors: Tomoyuki Okada, Yoshimasa Iiduka, Kazuhiko Takahashi, Masahiko Minemura
  • Patent number: 5981641
    Abstract: Provided are a thermally conductive silicone composition, a thermally conductive material and a thermally conductive silicone grease, wherein a liquid silicone, an aluminum nitride powder and a zinc oxide powder are comprised, and wherein the total amount of those powders are from 500 to 1,000 parts by weight per 100 parts by weight of the liquid silicone and the ratio of the zinc oxide powder to the sum total of the aluminum nitride powder and the zinc oxide powder is from 0.05 to 0.5 by weight.
    Type: Grant
    Filed: August 8, 1997
    Date of Patent: November 9, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Takahashi, Masahiko Minemura, Takashi Ohkawara
  • Patent number: 5945185
    Abstract: An air bag made of thermoplastic polyurethane resin which can be deployed quickly enough over a wide range of temperature from very low to high and which can exhibit stable performance without danger of blocking is made of silicone modified thermoplastic polyurethane resin in which the content of siloxane is 5-40% by weight. An occupant can be protected by the air bag over a wide range of temperature such as from -40.degree. C. to +100.degree. C.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: August 31, 1999
    Assignees: Takata Corporation, Shin-Etsu Chemical Co., Ltd., Dainichiseika Color & Chemicals Mfg. Co., Ltd.
    Inventors: Kinji Hirai, Masahiko Minemura, Yoshitaka Koshiro, Susumu Nakamura, Kazuyuki Hanada
  • Patent number: 5557000
    Abstract: The goal of this invention is to offer a silicone oil for low temperature use which possesses a superior fluidity even at low temperature, along with a small viscosity change with temperature. Disclosed is a silicone oil for low temperature mechanical use which contains siloxanes having siloxy alkyl groups of formulae (1) and (2) below, as main components: ##STR1## wherein R is at least one organic group selected from the group consisting of: alkyl groups, aryl groups, aralkyl groups, and halogenated alkyl groups, the sum of subscripts l+m+n is at least 2 and m+n is at least 1 and R.sub.1 is a monovalent siloxy alkyl group expressed by formula (3): ##STR2## wherein a is an integer of at least 2 and b is also an integer of at least 0.
    Type: Grant
    Filed: November 25, 1994
    Date of Patent: September 17, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Masahiko Minemura
  • Patent number: 5489482
    Abstract: A film forming composition, comprising an amine-modified highly polymerized polysiloxane represented by the general formula (1): ##STR1## wherein R, which are the same or different, each represent a monovalent hydrocarbon group having 1 to 6 carbon atoms, a hydroxyl group, or a hydrogen atom, R' each represent an amino-group-containing organic group, a is an integer of 0 to 3, m is an integer of 1 or more, and n is an integer of 5 or more, provided that m+n is an integer of 2,000 or more, and dissolved in an organic solvent, which film forming composition can give a smooth soft film that is excellent in water repellency, water resistance, touch, and durability in comparison with the conventional film forming compositions.
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: February 6, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiko Minemura, Osamu Uchida
  • Patent number: 5391314
    Abstract: An electroviscous fluid composition comprising a dispersion medium of two nonmiscible components (A) and (B) as below, the volum ratio of (A)/(B) being in the ratio 99/1-1/99, and a dispersoid (C) as below; wherein the true specific gravity of the dispersoid (C) is greater than the specific gravity of said component (A) and less than the specific gravity of said component (B);Component (A):A silicone oil of general formula (I):R.sub.a SiO.sub.(4-a)/2(wherein R, which may be similar or dissimilar, are monovalent hydrocarbon groups with 1-18 carbon atoms and "a" lies in the range 1.8<a<3.0.) having a viscosity of 1-1,000 centistokes at 25.degree. C. and a specific gravity of 0.8-1.5,Component (B):A synthetic fluorinated oil having a viscosity of 1-1,000 centistokes at 25.degree. C. and a specific gravity greater than 1.
    Type: Grant
    Filed: September 3, 1993
    Date of Patent: February 21, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiko Minemura, Satoshi Kuwata
  • Patent number: 5192458
    Abstract: A silicone grease composition comprising an organosiloxane containing long-chain alkyl groups, a thickener, and an organomolybdenum compound is disclosed.The silicone grease composition is excellent not only in heat and cold resistance, oxidation resistance, chemical stability and low-load lubricity but also in high-load (extreme-pressure) lubricity.
    Type: Grant
    Filed: October 12, 1990
    Date of Patent: March 9, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiko Minemura, Takayuki Takahashi, Satoshi Kuwata