Patents by Inventor Masahiko Nakamura

Masahiko Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10399916
    Abstract: There is provided a method of producing HFO with which diluent gas is easily separated even at a low boiling point and which has excellent productivity. A method of producing HFO includes: converting HFC of the formula (1) into the HFO of the formula (2) to obtain a first gas composition containing the HFO and the fluorine-containing solvent, CR1R2X1CR3R4X2 (1), CR1R2?CR3R4 (2), where in the formulae, R1 to R3 are H or F, R4 is H, F, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more. One of X1 and X2 is H, and the other of X1 and X2 is F; and separating the fluorine-containing solvent from the first gas composition to obtain a second gas composition containing the HFO.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: September 3, 2019
    Assignee: AGC Inc.
    Inventors: Yusuke Tomiyori, Masahiko Nakamura
  • Patent number: 10384992
    Abstract: A method for manufacturing hydrofluoroolefin, includes: converting hydrofluorocarbon represented by a formula (1) into hydrofluoroolefin (HFO) represented by formula (2) in the presence of carbon dioxide to obtain a first gas composition containing hydrofluoroolefin and carbon dioxide; and separating carbon dioxide contained in the first gas composition to obtain a second gas composition containing HFO, CR1R2X1CR3R4X2 . . . (1), CR1R2?CR3R4 . . . (2), wherein R1 to R3 are each independently hydrogen atom or fluorine atom, R4 is hydrogen atom, fluorine atom, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more, X1 and X2 are each hydrogen atom or fluorine atom where X2 is the fluorine atom when X1 is the hydrogen atom, and X2 is the hydrogen atom when X1 is the fluorine atom.
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: August 20, 2019
    Assignee: AGC Inc.
    Inventors: Yusuke Tomiyori, Masahiko Nakamura
  • Patent number: 10138025
    Abstract: A medical bag handling system (10) includes a plurality of cassettes (16) capable of holding bags for blood (14), and connecting means (32) capable of connecting one cassette (16) and another cassette (16). Accordingly, the cassettes (16) can be easily connected, and the plurality of bags for blood (14) supported by the respective cassettes (16) can be collectively handled.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: November 27, 2018
    Assignee: Terumo Kabushiki Kaisha
    Inventor: Masahiko Nakamura
  • Publication number: 20180319726
    Abstract: The present invention is a solvent composition including: a solvent including 1-chloro-2,3,3-trifluoro-1-propene; and at least one type of stabilizer selected from a group consisting of phenols, ethers, epoxides, amines, alcohols, and hydrocarbons, and is a solvent composition which is excellent in solubility of various organic substances and has no adverse effect on a global environment, and is excellent in stability, and this solvent composition can be used for a wide range of industrial uses such as cleaning, coating uses, and a heat transfer fluid.
    Type: Application
    Filed: July 13, 2018
    Publication date: November 8, 2018
    Applicant: AGC Inc
    Inventors: Hiroaki MITSUOKA, Toshio Miki, Masahiko Nakamura, Mari Ichinokawa, Hidekazu Okamoto, Atsushi Fujimori
  • Publication number: 20180290951
    Abstract: There is provided a method of producing HFO with which diluent gas is easily separated even at a low boiling point and which has excellent productivity. A method of producing HFO includes: converting HFC of the formula (1) into the HFO of the formula (2) to obtain a first gas composition containing the HFO and the fluorine-containing solvent, CR1R2X1CR3R4X2 (1), CR1R2?CR3R4 (2), where in the formulae, R1 to R3 are H or F, R4 is H, F, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more. One of X1 and X2 is H, and the other of X1 and X2 is F; and separating the fluorine-containing solvent from the first gas composition to obtain a second gas composition containing the HFO.
    Type: Application
    Filed: June 13, 2018
    Publication date: October 11, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yusuke TOMIYORI, Masahiko NAKAMURA
  • Patent number: 10093600
    Abstract: A method to efficiently and stably produce trifluoroethylene from 1,1,1,2-tetrafluoroethane is provided. In the method, a material gas containing 1,1,1,2-tetrafluoroethane in a gaseous phase and calcium oxide in a solid phase are brought into contact with each other in a reactor. Clogging of the reactor is less likely to occur, the load of the moisture removal process is light, and problems such as a decrease in the yield of trifluoroethylene do not arise.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: October 9, 2018
    Assignee: AGC Inc.
    Inventors: Masahiko Nakamura, Hidekazu Okamoto
  • Patent number: 10049695
    Abstract: An optical pickup device includes a semiconductor laser that emits a laser beam, and an object lens that concentrates the laser beam emitted from the semiconductor laser on an optical disc. In this optical pickup device, an optical axis of the object lens is inclined with respect to an optical axis of the laser beam that is incident on the object lens so as to generate flares caused by coma aberration on an entrance side in a forward direction of pits of the optical disc.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: August 14, 2018
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Masatoshi Yajima, Kazuyoshi Kajita, Masahiko Nakamura
  • Publication number: 20180187134
    Abstract: There is provided a solvent composition which is a stable solvent composition which is excellent in solubility of various organic substances, has a sufficient drying property, and has no adverse effect on a global environment, is stabilized not to decompose, and moreover suppresses metal corrosion under coexistence with metal, and which can be used without having an adverse effect on articles of various materials such as metal, plastic, and elastomer in a wide range of industrial uses such as cleaning and dilution coating uses. A solvent composition including: a solvent (A) including (Z)-1-chloro-3,3,3-trifluoro-1-propene; and a stabilizer (B) consisting of HCFC whose boiling point at normal pressure is not lower than 30° C. nor higher than 60° C.
    Type: Application
    Filed: March 5, 2018
    Publication date: July 5, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Masahiko Nakamura, Hidekazu Okamoto, Masaaki Tsuzaki, Hiroaki Mitsuoka, Satoko Itoh
  • Publication number: 20180134640
    Abstract: There are provided a solvent composition which is excellent in solubility of various organic substances and excellent in detergency and a drying property, and has no adverse effect on a global environment and is excellent in stability; a cleaning method using the solvent composition; a method of forming a coating film; a heat transfer fluid including the solvent composition; and a heat cycle system using the heat transfer fluid. A solvent composition including 1-chloro-2,3,3-trifluoro-1-propene and 1-chloro-3,3-difluoro-1-propyne, a cleaning method of bringing the solvent composition and an article into contact with each other, a method of dissolving a nonvolatile organic compound in the solvent composition to produce a coating film-forming composition and evaporating the solvent composition after applying the coating film-forming composition on an article to be coated, to form a coating film, a heat transfer fluid including the solvent composition, and a heat cycle system using the heat transfer fluid.
    Type: Application
    Filed: January 9, 2018
    Publication date: May 17, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Masahiko NAKAMURA, Hiroaki MITSUOKA, Mari ICHINOKAWA, Atsushi FUJIMORI, Hidekazu OKAMOTO
  • Publication number: 20180127341
    Abstract: There are provided: a solvent composition which is excellent in solubility of various organic substances and excellent in detergency, and has no adverse effect on a global environment, is excellent in stability, and is capable of suppressing corrosion of metal; a cleaning method using the solvent composition; a method of forming a coating film; a heat transfer fluid including the solvent composition; and a heat cycle system using the heat transfer fluid. A solvent composition including HCFO-1233yd and HCFC-244ca, in which a content of HCFC-244ca to a total of HCFO-1233yd and HCFC-244ca is 0.0001 to 1 mass %, a cleaning method of contacting the solvent composition with an article, a method of forming a coating film consisting of the nonvolatile organic compound using the solvent composition and a nonvolatile organic compound, a heat transfer fluid including the solvent composition, and a heat cycle system using the heat transfer fluid.
    Type: Application
    Filed: January 9, 2018
    Publication date: May 10, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Masahiko NAKAMURA, Hiroaki MITSUOKA, Mari ICHINOKAWA, Atsushi FUJIMORI, Hidekazu OKAMOTO
  • Publication number: 20180037524
    Abstract: A method for manufacturing hydrofluoroolefin, includes: converting hydrofluorocarbon represented by a formula (1) into hydrofluoroolefin (HFO) represented by formula (2) in the presence of carbon dioxide to obtain a first gas composition containing hydrofluoroolefin and carbon dioxide; and separating carbon dioxide contained in the first gas composition to obtain a second gas composition containing HFO, CR1R2X1CR3R4X2 . . . (1), CR1R2?CR3R4 . . . (2), wherein R1 to R3 are each independently hydrogen atom or fluorine atom, R4 is hydrogen atom, fluorine atom, CH3, CH2F, CHF2 or CF3, the total number of fluorine atoms of R1 to R4 is one or more, and the total number of hydrogen atoms of R1 to R4 is one or more, X1 and X2 are each hydrogen atom or fluorine atom where X2 is the fluorine atom when X1 is the hydrogen atom, and X2 is the hydrogen atom when X1 is the fluorine atom.
    Type: Application
    Filed: October 5, 2017
    Publication date: February 8, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yusuke TOMIYORI, Masahiko NAKAMURA
  • Patent number: 9850189
    Abstract: To provide a production process with high degree of conversion of HFC-134a and selectivity for HFO-1123, with a high productivity of HFO-1123 and with a small load in process of purification and recovery. A process for producing HFO-1123, which comprises bringing a material gas having a proportion of HFC-134a based on the total amount of a diluent gas and HFC-134a of from 50 to 100 mol % into contact with a dehydrofluorination catalyst to convert part of HFC-134a into HFO-1123, then removing hydrogen fluoride in a reaction product gas, and then bringing the reaction product gas from which hydrogen fluoride has been removed into contact with a dehydrofluorination catalyst to convert at least part of unreacted HFC-134a into HFO-1123.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: December 26, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiko Nakamura, Hidekazu Okamoto
  • Patent number: 9802878
    Abstract: A method to stably produce trifluoroethylene with a high selectivity by reacting 1,1,1,2-tetrafluoroethane with a solid reactant and suppressing the formation of by-products such as polymer carbon is provided. In the method, a material gas containing 1,1,1,2-tetrafluoroethane passes through a layer consisting of a particulate solid reactant having an average particle size of from 1 ?m to 5,000 ?m to bring the solid reactant and 1,1,1,2-tetrafluoroethane into contact with each other in a state where the layer consisting of the solid reactant is fluidized.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: October 31, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiko Nakamura, Hidekazu Okamoto
  • Publication number: 20170301369
    Abstract: An optical pickup device includes a semiconductor laser that emits a laser beam, and an object lens that concentrates the laser beam emitted from the semiconductor laser on an optical disc. In this optical pickup device, an optical axis of the object lens is inclined with respect to an optical axis of the laser beam that is incident on the object lens so as to generate flares caused by coma aberration on an entrance side in a forward direction of pits of the optical disc.
    Type: Application
    Filed: December 21, 2015
    Publication date: October 19, 2017
    Inventors: MASATOSHI YAJIMA, KAZUYOSHI KAJITA, MASAHIKO NAKAMURA
  • Publication number: 20170090228
    Abstract: A display device includes a substrate and a seal. The seal is provided in a first frame region and a second frame region when seen in a plan view. A spacer is formed from a first end of the substrate to a second end of the substrate on the opposite side of the first end at a boundary between the first frame region and the second frame region. Further, the spacer is in contact with the seal on the first frame region side and on the second frame region side.
    Type: Application
    Filed: September 20, 2016
    Publication date: March 30, 2017
    Applicant: Japan Display Inc.
    Inventors: Tomokazu ISHIKAWA, Masahiko NAKAMURA, Masayuki MURAKAMI, Koji KITAMURA, Daisuke ITO
  • Publication number: 20170008823
    Abstract: To provide a production process with high degree of conversion of HFC-134a and selectivity for HFO-1123, with a high productivity of HFO-1123 and with a small load in process of purification and recovery. A process for producing HFO-1123, which comprises bringing a material gas having a proportion of HFC-134a based on the total amount of a diluent gas and HFC-134a of from 50 to 100 mol % into contact with a dehydrofluorination catalyst to convert part of HFC-134a into HFO-1123, then removing hydrogen fluoride in a reaction product gas, and then bringing the reaction product gas from which hydrogen fluoride has been removed into contact with a dehydrofluorination catalyst to convert at least part of unreacted HFC-134a into HFO-1123.
    Type: Application
    Filed: September 22, 2016
    Publication date: January 12, 2017
    Applicant: Asahi Glass Company, Limited
    Inventors: Masahiko NAKAMURA, Hidekazu OKAMOTO
  • Patent number: 9541795
    Abstract: A liquid crystal display device including an array of pixels each including first and second substrates, first and second electrodes formed on opposing surfaces of the first and second substrates, which surfaces are positioned opposite to the second and first substrates, first and second alignment restricting portions provided in the first and second electrodes, first and second alignment films covering respectively the first and second electrodes, the first and second alignment restricting portions, and the opposing surfaces of the first and second substrates, and a liquid crystal layer formed between the first and second alignment films and containing liquid crystal molecules, wherein, in each pixel, major axes of a group of liquid crystal molecules are positioned substantially in the same imaginary plane in a predetermined overlapped region between the first and second electrodes, and a pre-tilt is given to the liquid crystal molecules by at least the first alignment film.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: January 10, 2017
    Assignee: Sony Corporation
    Inventors: Shunichi Suwa, Masashi Miyakawa, Masahiko Nakamura, Tadaaki Isozaki
  • Patent number: 9523889
    Abstract: A method of manufacturing a liquid crystal display device with which response characteristics are able to be easily improved without using major equipment is provided. The method of manufacturing a liquid crystal display device includes steps of forming a first alignment film including a polymer compound having a crosslinkable functional group as a side chain on one substrate of a pair of substrates; forming a second alignment film on the other substrate of the pair of substrates; arranging the pair of substrates so that the first alignment film and the second alignment film are opposed to each other, and sealing a liquid crystal layer containing a liquid crystal molecule having negative dielectric constant anisotropy between the first alignment film and the second alignment film; and bridging the polymer compound to give pre-tilt to the liquid crystal molecule 41 after sealing the liquid crystal layer.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: December 20, 2016
    Assignee: SONY CORPORATION
    Inventors: Shunichi Suwa, Yuichi Inoue, Ryo Ogawa, Tsuyoshi Kamada, Masashi Miyakawa, Tadaaki Isozaki, Masahiko Nakamura
  • Patent number: D802515
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: November 14, 2017
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Lu Yi, Masayuki Sugiura, Masahiko Nakamura, Yoshikiyo Ichino
  • Patent number: D812543
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: March 13, 2018
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Lu Yi, Masayuki Sugiura, Masahiko Nakamura