Abstract: A wireless network apparatus includes a wireless communication unit, a receiving unit, an acquisition unit, and a setting unit. The wireless communication unit performs wireless communication with a mobile terminal apparatus. The receiving unit receives user identification information regarding a user corresponding to the mobile terminal apparatus in which network connection information assigned in advance to the user is set. The network connection information includes an identification name and authentication information that are used for network connection. The acquisition unit acquires network connection information set in association with the user identification information received by the receiving unit. The setting unit sets, in the wireless communication unit, the network connection information acquired by the acquisition unit.

Abstract: An image processing apparatus includes an authenticating unit that performs authentication as to whether a user is an authenticated user who is permitted to use multiple functions, a determining unit that, by use of history information that records an operation made by the authenticated user authenticated by the authenticating unit, determines an expected function that is expected to be executed by the authenticated user among the multiple functions, and a setting attribute for each of setting items that specify how the expected function is to be executed, a setting unit that sets the setting attribute for the expected function determined by the determining unit, and a display that displays, on a display device, an execution screen that shows the setting attribute set by the setting unit and receives an instruction instructing that the expected function be executed.

Abstract: An information processing apparatus includes a sensing unit that senses occurrence of a predetermined fault through one of detection of the occurrence of the fault and prediction of the occurrence of the fault, and a notifying unit that, when the fault is sensed to have occurred by the sensing unit, identifies a user to be notified that the fault is sensed to have occurred from among multiple users registered in advance, and notifies an information processing terminal of the identified user that the fault has occurred.

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

Abstract: In an optical information reader controlled by this controller, a laser beam originating in light emitted by a laser diode is reflected by a scan mirror to scan optical information of a bar code or the like, reflected light therefrom is received by a photodiode to be converted to an electrical signal, and the optical information is read by processing the signal. In the controller, a main amp having a characteristic that a gain changes according to a frequency of an input signal amplifies the electrical signal, a detector detects an analog signal resulting from the amplification, and from a. detection output thereof, a MPU (on/off frequency control circuit) detects level of the analog signal and adjusts the gain of the main amp by changing an on/off frequency of the laser diode caused by an APC circuit (light emission on/off circuit), according to the detected level.

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract: In an optical information reader controlled by this controller, a laser beam originating in light emitted by a laser diode is reflected by a scan mirror to scan optical information of a bar code or the like, reflected light therefrom is received by a photodiode to be converted to an electrical signal, and the optical information is read by processing the signal. In the controller, a main amp having a characteristic that a gain changes according to a frequency of an input signal amplifies the electrical signal, a detector detects an analog signal resulting from the amplification, and from a. detection output thereof, a MPU (on/off frequency control circuit) detects level of the analog signal and adjusts the gain of the main amp by changing an on/off frequency of the laser diode caused by an APC circuit (light emission on/off circuit), according to the detected level.

Abstract: A method of forming a laminated film includes forming a silicon oxide film on a plurality of target objects loaded in a reaction chamber, and forming a silicon oxynitride film on the plurality of target objects by supplying a silicon source, an oxidizing agent and a nitride agent to the reaction chamber, wherein forming the silicon oxide film and forming the silicon oxynitride film are repeatedly performed for a predetermined number of times on the plurality of target objects to form a laminated film including the silicon oxynitride film and the silicon oxide film.

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: Provided is a method of manufacturing a stacked semiconductor device, which includes forming a stacked film on a semiconductor substrate, the stacked film including a plurality of silicon oxide films and a plurality of silicon nitride films, which are alternately arranged on top of each other, and the stacked film being obtained by repeatedly performing a series of operations of forming the silicon oxide film on the semiconductor substrate using one of triethoxysilane, octamethylcyclotetrasiloxane, hexamethyldisilazane and diethylsilane gases, and forming the silicon nitride film on the formed silicon oxide film; etching the silicon nitride films in the stacked film; removing carbons contained in the silicon oxide films, which are not removed in the etching, to reduce a concentration of the carbons; and forming electrodes in regions where the silicon nitride films are etched in the etching.

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract: In a barcode reader, a sensor controller sets time of one frame of a line image sensor based on output time necessary for data output of one frame from the line image sensor and lighting time of an LED. A light source controller performs first lighting control to turn on the LED only for the lighting time after termination of the data output within the time of one frame, and second lighting control to turn on the LED only for the lighting time so as to include the entire period of the data output within the time of one frame.

Abstract: An information processing apparatus includes: an information storage that stores information; a request accepting section that accepts a predetermined request for the information; a setting section that, for each of the information, sets whether the predetermined request is allowed; a setting storage that stores a setting by the setting section; a determining section that, with respect to the information corresponding to a request accepted by the request accepting section, reads out a corresponding setting from the setting storage, and that determines allowance/non-allowance of the predetermined request; and a process executing section that, in a case where the determining section determines allowance of the predetermined request, executes a process corresponding to the predetermined request on the information.

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.