Patents by Inventor Masaki Mizuochi
Masaki Mizuochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230369011Abstract: A stage device includes: a sample installation unit in which a positioning target is installed; a scale plate used to measure displacement of the sample installation unit in a vertical direction; and a lower axis table configured to support the scale plate. A free support unit is provided between the scale plate and the lower axis table.Type: ApplicationFiled: April 5, 2023Publication date: November 16, 2023Applicant: Hitachi High-Tech CorporationInventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Takanori KATO, Akira NISHIOKA
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Publication number: 20230343622Abstract: Provided is a stage apparatus including: a first table that is movable on a base; a second table that is movable in a state of floating above the first table and includes a first portion and a second portion below the first portion; a first position measuring device that measures a position of the first portion of the second table; a second position measuring device that measures a position of the second portion of the second table; and a computer that controls a motor that drives the second table. The computer drives the second table based on information on the position of the first portion measured by the first position measuring device and information on the position of the second portion measured by the second position measuring device.Type: ApplicationFiled: March 28, 2023Publication date: October 26, 2023Inventors: Takanori KATO, Masaki MIZUOCHI, Motohiro TAKAHASHI, Hironori OGAWA
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Publication number: 20230260740Abstract: A stage device is disposed in a vacuum environment and moves a target placed on the stage device, the stage device including: a guide rail that is laid on a base; a carriage that moves along the guide rail; rolling elements that come into contact with the guide rail and the carriage and rotate along with the movement of the carriage; a table that is connected to a part of the carriage and moves along with the carriage; and a blocking cover that is provided to cover a normal direction of a guide surface of the guide rail and blocks foreign matter scattered from the guide rail, the carriage, or the rolling elements.Type: ApplicationFiled: December 14, 2022Publication date: August 17, 2023Applicant: Hitachi High-Tech CorporationInventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Raifu YAMAMOTO, Yasuhiro ANDO
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Publication number: 20230215684Abstract: The present invention provides: a stage device that can suppress bending deformation of a mirror, and that can reduce the positioning error of a stage by reducing the measurement error of the position of the stage; and a charged particle beam device comprising this stage device.Type: ApplicationFiled: February 22, 2021Publication date: July 6, 2023Applicant: Hitachi High-Tech CorporationInventors: Motohiro TAKAHASHI, Masaki MIZUOCHI, Shuichi NAKAGAWA, Tomotaka SHIBAZAKI, Hironori OGAWA, Takanori KATO
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Publication number: 20230143197Abstract: A stage apparatus includes a lower stage that moves in a Y-axis direction, an upper stage that floats from the lower stage and moves at least in an X-axis direction orthogonal to the Y-axis direction, a heat exchanger that cools a Y table of the lower stage with a refrigerant, and a control device that controls an inclination of the lower stage with reference to the Y table cooled by the heat exchanger.Type: ApplicationFiled: October 11, 2022Publication date: May 11, 2023Applicant: Hitachi High-Tech CorporationInventors: Akira NISHIOKA, Motohiro TAKAHASHI, Masaki MIZUOCHI, Yasuhiro ANDO, Raifu YAMAMOTO
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Publication number: 20230137117Abstract: A charged particle beam device according to the present invention includes a first movement table and a second movement table disposed above the first movement table, measures a first relative position between a sample chamber and the first movement table, a second relative position between the sample chamber and the second movement table, and a third relative position between a lens barrel and a sample, and corrects a relative position between the first movement table and the second movement table according to the first relative position and the second relative position.Type: ApplicationFiled: October 12, 2022Publication date: May 4, 2023Inventors: Hironori OGAWA, Masaki MIZUOCHI, Motohiro TAKAHASHI, Takanori KATO
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Publication number: 20220352804Abstract: A vacuum processing apparatus includes a linear motor. The linear motor includes a mover having a permanent magnet, a stator having a coil covered by a resin member, and a wire for supplying a current to the coil provided in a vacuum sample chamber. The wire is led out to an outside of the vacuum sample chamber through a through hole portion provided in the wall surface of the vacuum sample chamber. The through hole portion is filled with the resin member integrally or with a filler that binds to the resin member, so that the through hole portion is sealed.Type: ApplicationFiled: July 5, 2022Publication date: November 3, 2022Inventors: Tomotaka SHIBAZAKI, Masaki MIZUOCHI
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Patent number: 11418101Abstract: Since wires connected to a linear motor are routed in a vacuum sample chamber, outgassing is generated from wire coating and efficiency of assembly operations is reduced. Further, there is a problem that thrust generation efficiency of the linear motor is reduced when a gap between a coil and a permanent magnet of the linear motor cannot be small. In order to solve the above problems, a linear motor for vacuum is provided, the linear motor for vacuum including: a mover having a permanent magnet; and a stator having a support member to which a coil is fixed, in which the support member includes a vacuum sealing portion that vacuum seals with a wall surface of a vacuum sample chamber, and a feed-through for supplying a current to the coil provided in the vacuum sample chamber.Type: GrantFiled: October 11, 2019Date of Patent: August 16, 2022Assignee: Hitachi High-Technologies CorporationInventors: Tomotaka Shibazaki, Masaki Mizuochi
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Patent number: 11380515Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.Type: GrantFiled: July 7, 2020Date of Patent: July 5, 2022Assignee: Hitachi High-Tech CorporationInventors: Keiichiro Hosobuchi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Takaaki Kikuchi
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Patent number: 11342156Abstract: A charged particle beam apparatus includes a sample stage on which a sample is mounted, a control device that controls to drive the sample stage, a linear scale that detects a position of the sample stage, laser position detection means for detecting the position of the sample stage, an optical microscope that observes the sample mounted on the sample stage, and a barrel that irradiates the sample mounted on the sample stage with an electron beam, and generates a secondary electron. Image data of a first correction sample mounted on the sample stage is acquired by the optical microscope, and position data of the sample stage is detected by the laser position detection means. The sample stage is positioned with respect to the barrel based on the image data acquired by the optical microscope and the position data of the sample stage detected by the laser position detection means.Type: GrantFiled: January 19, 2021Date of Patent: May 24, 2022Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Hironori Ogawa, Masaki Mizuochi, Shuichi Nakagawa, Motohiro Takahashi
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Publication number: 20220148845Abstract: In order to improve the accuracy of stage movement in a charged particle beam apparatus, this stage movement control apparatus is characterized by comprising: a storage device in which overshoot amount data in which the movement distance of a stage and the overshoot amount of the stage are associated is stored; a movement target position setting unit which sets the movement target position of the stage; a stage movement amount calculation unit which calculates a stage movement amount that is an amount by which the stage moves to the movement target position in future; an overshoot estimation unit which, on the basis of the calculated stage movement amount and the overshoot amount data, estimates an overshoot amount corresponding to the stage movement amount; a movement target position correction unit which sets a corrected movement target position obtained by correcting the movement target position closer than the movement target position by the calculated overshoot amount; and a stage movement control unit wType: ApplicationFiled: March 19, 2019Publication date: May 12, 2022Inventors: Hironori OGAWA, Shuichi NAKAGAWA, Masaki MIZUOCHI, Takanori KATO, Naruo WATANABE, Motohiro TAKAHASHI
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Publication number: 20220076918Abstract: A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.Type: ApplicationFiled: July 13, 2021Publication date: March 10, 2022Inventors: Akira NISHIOKA, Shuichi NAKAGAWA, Masaki MIZUOCHI, Takaaki KIKUCHI, Masashi FUJITA, Kenta NOMURA, Naoya ISHIGAKI
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Publication number: 20210265129Abstract: A charged particle beam apparatus includes a sample stage on which a sample is mounted, a control device that controls to drive the sample stage, a linear scale that detects a position of the sample stage, laser position detection means for detecting the position of the sample stage, an optical microscope that observes the sample mounted on the sample stage, and a barrel that irradiates the sample mounted on the sample stage with an electron beam, and generates a secondary electron. Image data of a first correction sample mounted on the sample stage is acquired by the optical microscope, and position data of the sample stage is detected by the laser position detection means. The sample stage is positioned with respect to the barrel based on the image data acquired by the optical microscope and the position data of the sample stage detected by the laser position detection means.Type: ApplicationFiled: January 19, 2021Publication date: August 26, 2021Inventors: Hironori OGAWA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Motohiro TAKAHASHI
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Patent number: 11049687Abstract: A stage includes a sample table on which a sample is placed, a first drive mechanism moving the sample table in a first direction; a position measurement element measuring a position in the first direction that is a driving direction of the sample table. The stage also has a scale element having a scale measurement axis that is parallel to a first measurement axis in the first direction based on the position measurement element and is different from the first measurement axis in height, and measuring the position of the sample table in the first direction. A controller calculates the orientation of the sample table by using a measurement value by the position measurement element and a measurement value by the scale element and correcting the Abbe error of the sample table.Type: GrantFiled: November 14, 2019Date of Patent: June 29, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Naruo Watanabe, Hironori Ogawa, Takanori Kato, Akira Nishioka
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Publication number: 20210066025Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.Type: ApplicationFiled: July 7, 2020Publication date: March 4, 2021Inventors: Keiichiro HOSOBUCHI, Masaki MIZUOCHI, Shuichi NAKAGAWA, Tomotaka SHIBAZAKI, Takaaki KIKUCHI
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Patent number: 10879033Abstract: Provided is a stage apparatus that reduces thermal deformation and temperature rise in an upper table on which a sample is mounted and a charged particle beam apparatus including the stage apparatus. The stage apparatus includes: an upper stage that moves an upper table on which a sample is mounted in a first direction; a middle stage that moves a middle table on which the upper stage is mounted in a second direction orthogonal to the first direction; and a lower stage that moves a lower table on which the middle stage is mounted in a third direction orthogonal to the first direction and the second direction. The upper table and the middle table use a material having a smaller thermal expansion coefficient than in a material of the lower table, and the lower table uses a material having higher thermal conductivity than in the material of the upper table and the middle table.Type: GrantFiled: June 6, 2019Date of Patent: December 29, 2020Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Akira Nishioka, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Hironori Ogawa, Naruo Watanabe, Motohiro Takahashi, Takanori Kato
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Patent number: 10840059Abstract: The purpose of the present invention is to provide a charged particle radiation device capable of performing appropriate vibration suppression control in accordance with a device condition. To achieve the purpose, proposed is a charged particle radiation device provided with: a sample stage for supporting a sample irradiated with a charged particle beam emitted from a charged particle source; and a vacuum chamber for placing the atmosphere in which the sample is disposed in a vacuum state.Type: GrantFiled: July 28, 2016Date of Patent: November 17, 2020Assignee: Hitachi High-Tech CorporationInventors: Kentaro Shigeoka, Takanori Kato, Kazuhiro Morita, Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Masao Saida
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Patent number: D989144Type: GrantFiled: October 13, 2021Date of Patent: June 13, 2023Assignee: Hitachi High-Tech CorporationInventors: Masayuki Arakawa, Junpei Hokari, Akira Kojima, Masaki Mizuochi, Tomokazu Kobayashi, Takaaki Kikuchi
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Patent number: D989830Type: GrantFiled: October 13, 2021Date of Patent: June 20, 2023Assignee: Hitachi High-Tech CorporationInventors: Masayuki Arakawa, Junpei Hokari, Akira Kojima, Masaki Mizuochi, Tomokazu Kobayashi, Takaaki Kikuchi
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Patent number: D989831Type: GrantFiled: October 13, 2021Date of Patent: June 20, 2023Assignee: Hitachi High-Tech CorporationInventors: Masayuki Arakawa, Junpei Hokari, Akira Kojima, Masaki Mizuochi, Tomokazu Kobayashi, Takaaki Kikuchi