Patents by Inventor Masaki Ohashi

Masaki Ohashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition and patterning process
    Patent number: 10162262
    Abstract: A resist composition comprising a base resin comprising recurring units having an acid labile group and recurring units containing a rubidium or cesium salt of ?-fluorinated sulfonic acid exhibits a high sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
    Type: Grant
    Filed: October 13, 2016
    Date of Patent: December 25, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180364574
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of brominated benzene-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 16, 2018
    Publication date: December 20, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180364570
    Abstract: A resist composition comprising a base polymer and a sulfonium and/or iodonium salt of brominated benzene-containing carboxylic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: June 6, 2018
    Publication date: December 20, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180335696
    Abstract: A resist composition contains a polymer-bound acid generator, specifically a polymer comprising recurring units derived from a sulfonium or iodonium salt having a polymerizable unsaturated bond and containing iodine in the linker between the polymerizable unsaturated bond and a fluorosulfonic acid. The resist composition offers a high sensitivity and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 14, 2018
    Publication date: November 22, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Resist composition and patterning process
    Patent number: 10126647
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: November 13, 2018
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Polymer compound for a conductive polymer and method for producing same
    Patent number: 10125202
    Abstract: The present invention provides a polymer compound for a conductive polymer comprising one or more repeating units “a” shown by the formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: November 13, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Takayuki Nagasawa, Koji Hasegawa
  • Negative resist composition and resist pattern forming process
    Patent number: 10120279
    Abstract: A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: November 6, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Kenji Yamada, Masaki Ohashi
  • Resist composition and patterning process
    Patent number: 10101654
    Abstract: A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
    Type: Grant
    Filed: August 31, 2017
    Date of Patent: October 16, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Resist composition and patterning process
    Patent number: 10101653
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of iodinated phenoxy or iodinated phenylalkoxy-containing fluorinated sulfonic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: October 16, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180275512
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: March 14, 2018
    Publication date: September 27, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180267403
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: March 14, 2018
    Publication date: September 20, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Resist composition, patterning process, and barium, cesium and cerium salts
    Patent number: 10078264
    Abstract: A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of ?-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: September 18, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takeshi Sasami, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20180239249
    Abstract: A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: February 8, 2018
    Publication date: August 23, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Sulfonium compound, resist composition, and patterning process
    Patent number: 10025180
    Abstract: A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: July 17, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryo Mitsui, Takayuki Fujiwara, Ryosuke Taniguchi, Koji Hasegawa, Masaki Ohashi
  • Positive resist composition and pattern forming process
    Patent number: 10012902
    Abstract: A non-chemically-amplified positive resist composition comprising a polymer comprising both recurring units derived from a sulfonium salt capable of generating a fluorinated acid and recurring units containing an amino group as a base resin exhibits a high resolution and a low edge roughness and forms a pattern of good profile after exposure and organic solvent development.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: July 3, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Teppei Adachi, Masaki Ohashi
  • Chemically Amplified Positive Resist Composition and Resist Pattern Forming Process
    Publication number: 20180180992
    Abstract: A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of formula (A) has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.
    Type: Application
    Filed: December 26, 2017
    Publication date: June 28, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaaki Kotake, Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi
  • CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
    Publication number: 20180180998
    Abstract: A negative resist composition comprising a sulfonium compound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
    Type: Application
    Filed: December 27, 2017
    Publication date: June 28, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaaki Kotake, Satoshi Watanabe, Keiichi Masunaga, Kenji Yamada, Masaki Ohashi
  • Positive resist composition and patterning process
    Patent number: 10007178
    Abstract: A positive resist composition is provided comprising a polymer having an acid labile group and an acid generator bound to its backbone, in admixture with an onium salt having a specific cation structure capable of generating sulfonic acid having a molecular weight of at least 540. The composition is effective for suppressing acid diffusion, has high resolution, and forms a pattern of satisfactory profile and minimal edge roughness after exposure and development.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: June 26, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masahiro Fukushima
  • Onium salt compound, resist composition, and pattern forming process
    Patent number: 9989847
    Abstract: Sulfonium and iodonium salts of nitrogen-containing carboxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: June 5, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Jun Hatakeyama, Masahiro Fukushima
  • Resist composition and patterning process
    Patent number: 9958777
    Abstract: A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: May 1, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi