Patents by Inventor Masaki Ohashi

Masaki Ohashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170351177
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: May 18, 2017
    Publication date: December 7, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • NOVEL SULFONIUM COMPOUND, MAKING METHOD, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
    Publication number: 20170329227
    Abstract: A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.
    Type: Application
    Filed: May 9, 2017
    Publication date: November 16, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Ryosuke Taniguchi
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
    Publication number: 20170242339
    Abstract: A non-chemically-amplified positive resist composition comprising a polymer comprising both recurring units derived from a sulfonium salt capable of generating a fluorinated acid and recurring units containing an amino group as a base resin exhibits a high resolution and a low edge roughness and forms a pattern of good profile after exposure and organic solvent development.
    Type: Application
    Filed: February 16, 2017
    Publication date: August 24, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Teppei Adachi, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170205709
    Abstract: A resist composition comprising a base polymer and a sulfonium salt capable of generating fluorinated aminobenzoic acid offers a satisfactory dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
    Type: Application
    Filed: January 18, 2017
    Publication date: July 20, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Onium salt, resist composition, and patterning process
    Patent number: 9703193
    Abstract: An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: July 11, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Ryosuke Taniguchi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170184962
    Abstract: A resist composition comprising a base polymer and a biguanide salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
    Type: Application
    Filed: December 12, 2016
    Publication date: June 29, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170184964
    Abstract: A resist composition comprising a base polymer and a phosphazene salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
    Type: Application
    Filed: December 27, 2016
    Publication date: June 29, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170184963
    Abstract: A resist composition comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 29, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Onium salt compound, resist composition, and pattern forming process
    Patent number: 9665002
    Abstract: Sulfonium and iodonium salts of a carboxylate having an aromatic ring to which a nitrogen-containing alkyl or cyclic structure is attached are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: May 30, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Jun Hatakeyama
  • Polymer compound for a conductive polymer and method for producing same
    Patent number: 9663593
    Abstract: The present invention provides a polymer compound for a conductive polymer, containing one or more repeating units (a) represented by the following general formula (1), the polymer compound for a conductive polymer being synthesized by ion-exchange of a lithium salt, a sodium salt, a potassium salt, or a nitrogen compound salt of a sulfonic acid residue, and having a weight average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: May 30, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masaki Ohashi, Masayoshi Sagehashi
  • Sulfonium salt, chemically amplified resist composition, and patterning process
    Patent number: 9645491
    Abstract: A sulfonium salt having both anion and cation moieties in the molecule functions as a photoacid generator and is compatible with other components. A resist composition comprising the sulfonium salt has the advantages of reduced acid diffusion and forms a pattern with a good balance of sensitivity, MEF and DOF, less outgassing, and minimal defects.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: May 9, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170115565
    Abstract: A resist composition comprising a base resin comprising recurring units having an acid labile group and recurring units containing a rubidium or cesium salt of ?-fluorinated sulfonic acid exhibits a high sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
    Type: Application
    Filed: October 13, 2016
    Publication date: April 27, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
    Publication number: 20170115566
    Abstract: A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of ?-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
    Type: Application
    Filed: October 21, 2016
    Publication date: April 27, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takashi Sasami, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170108774
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.
    Type: Application
    Filed: October 14, 2016
    Publication date: April 20, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170108775
    Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.
    Type: Application
    Filed: October 18, 2016
    Publication date: April 20, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170075218
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of carboxylic acid containing nitrogenous heterocycle offers dimensional stability on PPD and a satisfactory resolution.
    Type: Application
    Filed: September 1, 2016
    Publication date: March 16, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • RESIST COMPOSITION AND PATTERNING PROCESS
    Publication number: 20170075217
    Abstract: A resist composition comprising a base polymer and a sulfonium salt of amino-containing carboxylic acid offers dimensional stability on PPD and a satisfactory resolution.
    Type: Application
    Filed: August 30, 2016
    Publication date: March 16, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME
    Publication number: 20170058059
    Abstract: The present invention provides a polymer compound for a conductive polymer comprising one or more repeating units “a” shown by the formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0<a?1.0.
    Type: Application
    Filed: August 8, 2016
    Publication date: March 2, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Masaki OHASHI, Takayuki NAGASAWA, Koji HASEGAWA
  • COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
    Publication number: 20170038683
    Abstract: The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.
    Type: Application
    Filed: June 28, 2016
    Publication date: February 9, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki OHASHI, Jun HATAKEYAMA, Masahiro FUKUSHIMA, Takayuki FUJIWARA
  • Polymer compound for a conductive polymer and method for producing same
    Patent number: 9527937
    Abstract: The present invention provides a polymer compound for a conductive polymer, containing one or more repeating units (a) represented by the following general formula (1), the polymer compound for a conductive polymer being synthesized by ion-exchange of a lithium salt, a sodium salt, a potassium salt, or a nitrogen compound salt of a sulfonic acid residue, and having a weight average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: December 27, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masayoshi Sagehashi, Masaki Ohashi