Patents by Inventor Masaki Takeuchi

Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RECTANGULAR SUBSTRATE FOR IMPRINT LITHOGRAPHY AND MAKING METHOD
    Publication number: 20180079130
    Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
    Type: Application
    Filed: September 26, 2017
    Publication date: March 22, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
  • Polishing agent for synthetic quartz glass substrate
    Patent number: 9919962
    Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: March 20, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Masaki Takeuchi, Yukio Shibano, Shuhei Ueda, Atsushi Watabe
  • RECTANGULAR GLASS SUBSTRATE AND METHOD FOR PREPARING THE SAME
    Publication number: 20180057399
    Abstract: A rectangular glass substrate has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 ?m below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface along the edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one side surface to a position of 50 ?m below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.
    Type: Application
    Filed: August 24, 2017
    Publication date: March 1, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daijitsu HARADA, Masaki TAKEUCHI
  • METHOD FOR PRODUCING SUBSTRATE
    Publication number: 20180056475
    Abstract: There is furnished a working tool comprising a rotating shaft (6), a polishing plate (3) mounted on the shaft, an expandable elastomer sheet (4) attached to the polishing plate (3), an abrasive cloth (5) attached to the elastomer sheet (4), and means for pressing the elastomer sheet (4) at a plurality of positions under respective predetermined different pressures such that a lower surface of the abrasive cloth (5) is deformed to the desired inverted convex shape in accordance with differences of pressing force applied to the elastomer sheet (4) at the plurality of positions. A substrate is produced by bringing the inverted convexly deformed surface of the abrasive cloth (5) in contact with a substrate stock, and rotating and moving the working tool for polishing the substrate over a selected area.
    Type: Application
    Filed: August 22, 2017
    Publication date: March 1, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoko ISHITSUKA, Atsushi WATABE, Masaki TAKEUCHI
  • Electronic grade glass substrate and making method
    Patent number: 9902037
    Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: February 27, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
  • WINDOW MEMBER FOR OPTICAL DEVICE PACKAGE, OPTICAL DEVICE PACKAGE, MAKING METHODS, AND OPTICAL DEVICE-MOUNTABLE PACKAGE
    Publication number: 20180040778
    Abstract: An optical device package comprising a receptacle, an optical device received therein, and a window member disposed forward of the receptacle in a light emitting direction of the optical device. The window member is a member of synthetic quartz glass having front and back surfaces, at least one of the front and back surfaces being a rough surface.
    Type: Application
    Filed: August 2, 2017
    Publication date: February 8, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shuhei UEDA, Masaki TAKEUCHI, Harunobu MATSUI
  • SYNTHETIC QUARTZ GLASS LID AND OPTICAL DEVICE PACKAGE
    Publication number: 20180040777
    Abstract: A synthetic quartz glass lid is provided comprising a synthetic quartz glass and an adhesive formed on a periphery of a main surface of the window member. Further, an optical device package is provided comprising a box-shaped receptacle having an open upper end, an optical device received in the receptacle, and a window member of synthetic quartz glass bonded to the upper end of the receptacle with an adhesive. The adhesive is a low-melting metallic glass consisting of Te, Ag and at least one element selected from W, V, P, Ba, and Zr.
    Type: Application
    Filed: August 2, 2017
    Publication date: February 8, 2018
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Harunobu MATSUI, Daijitsu HARADA, Masaki TAKEUCHI
  • Rectangular substrate for imprint lithography and making method
    Patent number: 9884448
    Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: February 6, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
  • RESIN FILM FOR FLEXIBLE PRINTED CIRCUIT BOARD, METAL FOIL PROVIDED WITH RESIN, COVERLAY FILM, BONDING SHEET, AND FLEXIBLE PRINTED CIRCUIT BOARD
    Publication number: 20180009195
    Abstract: The present invention relates to a resin film for a flexible printed circuit board consisting of a resin composition containing: a long-chain alkyl bismaleimide resin having a main chain containing an alkylene chain having 10 or more carbon atoms and a side chain containing an alkyl group bonded to the alkylene chain; and a curing agent having two or more functional groups reacting with the long-chain alkyl bismaleimide resin.
    Type: Application
    Filed: January 13, 2016
    Publication date: January 11, 2018
    Inventors: Masaki TAKEUCHI, Yoshitsugu MATSUURA, Yuta NAKANO, Kazuhito OBATA, Katsuhiko YASU
  • METHOD FOR PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20170260081
    Abstract: Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.
    Type: Application
    Filed: March 8, 2017
    Publication date: September 14, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoko ISHITSUKA, Atsushi WATABE, Daijitsu HARADA, Masaki TAKEUCHI
  • Method of preparing synthetic quartz glass substrate
    Patent number: 9731396
    Abstract: A synthetic quartz glass substrate is prepared by immersing a starting substrate in an aqueous solution of a nonionic surfactant and precision polishing the substrate with a colloidal silica water dispersion. A synthetic quartz glass substrate having a few defects and low surface roughness is obtained while the polishing rate is improved and the polishing time is reduced.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: August 15, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • HEATING AND COOLING DEVICE
    Publication number: 20170203377
    Abstract: A heating and cooling device including: an airtight processing chamber openable to load a member-to-be-processed in the airtight processing chamber; a transfer apparatus to adjust a distance between the member-to-be-processed and a cooling unit that cools the member-to-be-processed, by moving the member-to-be-processed and/or the cooling unit; an induction heating apparatus to heat the member-to-be-processed, including a induction heating coil; a cooling apparatus to cool the member-to-be-processed by cooling the cooling unit; a temperature sensor to determine a temperature of the member-to-be-processed; and a controller to control the induction heating apparatus and the cooling apparatus based on the temperature determined by the temperature sensor.
    Type: Application
    Filed: April 4, 2017
    Publication date: July 20, 2017
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Shoji YOKOYAMA, Takeshi Matsushita, Hiroaki Nakahara, Masaki Takeuchi, Takenori Wada, Masahiro Momose, Masahiro Kikuchi, Yoshio Igarashi, Mitsuhiro Naruse
  • METHODS FOR WORKING AND SENSING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20170123102
    Abstract: A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.
    Type: Application
    Filed: January 18, 2017
    Publication date: May 4, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shuhei Ueda, Masaki Takeuchi
  • Manufacture of synthetic quartz glass substrate
    Patent number: 9616542
    Abstract: A rough surface of a starting synthetic quartz glass substrate is polished to a mirror finish, using a polishing slurry containing tetragonal or cubic zirconia.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: April 11, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryouhei Hasegawa, Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • Synthetic quartz glass substrate and making method
    Patent number: 9598305
    Abstract: A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squares from the central surface area of 148 mm squares has a flatness of up to 150 nm.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: March 21, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • Methods for working and sensing synthetic quartz glass substrate
    Patent number: 9599746
    Abstract: A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: March 21, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shuhei Ueda, Masaki Takeuchi
  • METHOD FOR PRODUCING COMPOSITE MOLDED ARTICLE
    Publication number: 20170037202
    Abstract: The present invention relates to a method for producing a composite molded article having a flexural modulus at 150° C. of 25% or more of a flexural modulus at 23° C., including the steps of (1) placing glass fibers in a mold; (2) impregnating glass fibers with a polymerizable composition containing a cycloolefin monomer, a metathesis polymerization catalyst, a radical generator, and a compound represented by the general formula (I); (3) subjecting the above polymerizable composition with which the glass fibers are impregnated to a bulk polymerization to provide a composite molded article; and (4) demolding the composite molded article; and a composite molded article obtained by the above method. According to the method of the present invention, a composite molded article containing glass fibers, the composite molded article having excellent mechanical strength can be produced.
    Type: Application
    Filed: December 17, 2014
    Publication date: February 9, 2017
    Applicant: RIMTEC CORPORATION
    Inventor: Masaki TAKEUCHI
  • Method for manufacturing joint member and joint member
    Patent number: 9527230
    Abstract: There is provided a method for manufacturing a joint member obtained by joining a carbon fiber composite material containing a thermoplastic resin as a matrix and a metal. The method includes a step (i) of forming an uneven shape having a depth of 0.02 to 0.6 mm on a surface of the metal at a joining portion; a step (ii) of providing a thermoplastic resin layer having a thickness in the range of 5?m or more and 5 mm or less at a joining portion between the surface of the metal and a surface of the composite material; and a step (iii) of melting the thermoplastic resin layer by heating the joining portion to thereby combine the metal and the composite material into one.
    Type: Grant
    Filed: March 27, 2013
    Date of Patent: December 27, 2016
    Assignee: Teijin Limited
    Inventors: Masaki Takeuchi, Masumi Hirata, Takumi Kato, Hiroki Sano
  • METHOD FOR PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20160363856
    Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.
    Type: Application
    Filed: June 7, 2016
    Publication date: December 15, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hisashi Yagi, Daijitsu Harada, Masaki Takeuchi, Kazuo Shirota, Kazuhiko Aoki
  • Rectangular mold-forming substrate
    Patent number: 9505166
    Abstract: A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.
    Type: Grant
    Filed: October 31, 2013
    Date of Patent: November 29, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi