Patents by Inventor Masaki Takeuchi

Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask-forming glass substrate and making method
    Patent number: 9316902
    Abstract: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 ?m.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: April 19, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Mamoru Morikawa, Masaki Takeuchi, Yukio Shibano
  • Method for recovery of cerium oxide
    Patent number: 9309447
    Abstract: A method for recovery of cerium oxide from the abrasive waste composed mainly of cerium oxide arising from the polishing of glass substrates, said method including the steps of (i) adding to the abrasive waste an aqueous solution of a basic substance; (ii) adding to the resulting solution a precipitant, thereby forming precipitates composed mainly of cerium oxide, and removing the supernatant liquid; (iii) adding to the resulting precipitates a solution of an acid substance, thereby making said precipitate slightly acid to neutral; (iv) washing the precipitates with an organic solvent; and (v) drying and crushing the precipitates. The method males it possible to recycle abrasive waste into a pure abrasive composed mainly of cerium oxide which can be reused to polish synthetic quartz glass substrates for state-of-the-art semiconductor technology relating to photomasks and reticles.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: April 12, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • ELECTRONIC GRADE GLASS SUBSTRATE AND MAKING METHOD
    Publication number: 20160067843
    Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.
    Type: Application
    Filed: November 3, 2015
    Publication date: March 10, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
  • RECTANGULAR SUBSTRATE FOR IMPRINT LITHOGRAPHY AND MAKING METHOD
    Publication number: 20160052193
    Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
    Type: Application
    Filed: August 18, 2015
    Publication date: February 25, 2016
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
  • Network system, communication method, communication device, and computer-readable recording medium having communication program recorded thereon
    Patent number: 9264251
    Abstract: A network system includes a first communication device, a second communication device and a server. The communication device includes a storage unit storing first device information indicating a function of the communication device, and a communication unit for receiving second device information indicating a function of another communication device from the other communication device, transmitting the first and second device information to the server, and receiving first control information used by the first device from the server.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: February 16, 2016
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Akihiro Azuma, Masaki Takeuchi
  • METHOD FOR PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20150360997
    Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating an arbitrary surface and an opposite surface of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring the birefringence of the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable or unacceptable group, based on the measured birefringence value.
    Type: Application
    Filed: June 11, 2015
    Publication date: December 17, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daijitsu Harada, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
  • Electronic grade glass substrate and making method
    Patent number: 9205528
    Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.
    Type: Grant
    Filed: October 24, 2012
    Date of Patent: December 8, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
  • Molded Transformer
    Publication number: 20150270048
    Abstract: As in a molded transformer installed in a seawater environment, it is necessary to improve corrosion resistance under environments in which air, a liquid, fine particles containing seawater attach to a stress buffer (silicone rubber or the like) in a connection part of a support structure and a coil. The connection part of the support structure and the coil of the molded transformer is coated with a material having higher corrosion resistance than a material in a gap of the connection part.
    Type: Application
    Filed: February 13, 2015
    Publication date: September 24, 2015
    Inventors: Kinya KOBAYASHI, Masaki TAKEUCHI, Atsushi SUZUKI
  • METHODS FOR WORKING AND SENSING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20150260877
    Abstract: A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.
    Type: Application
    Filed: March 12, 2015
    Publication date: September 17, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shuhei Ueda, Masaki Takeuchi
  • HEAT TREATMENT METHOD OF SYNTHETIC QUARTZ GLASS
    Publication number: 20150239766
    Abstract: A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (?OH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of ?7° C./hr to ?30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of ?25° C./hr to ?85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.
    Type: Application
    Filed: February 13, 2015
    Publication date: August 27, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hisashi Yagi, Masaki Takeuchi, Daijitsu Harada
  • Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold
    Patent number: 9090502
    Abstract: A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided wherein Rf and Rf? are each independently a fluoroalkyl group of 1 to 10 carbon atoms; R1 is a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms; R2 and R3 are each independently methyl group or ethyl group; X and Y are each independently an ether linkage or an ester linkage; a and b are each 0 or 1; m, n, and p are each an integer of 0 to 6; q is an integer of 1 to 6 and r is an integer of 0 to 2.
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: July 28, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Yamazaki, Daijitsu Harada, Masaki Takeuchi, Takayuki Honma, Ayumu Kiyomori, Tohru Kubota
  • METHOD OF PREPARING SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20150202731
    Abstract: A synthetic quartz glass substrate is prepared by immersing a starting substrate in an aqueous solution of a nonionic surfactant and precision polishing the substrate with a colloidal silica water dispersion. A synthetic quartz glass substrate having a few defects and low surface roughness is obtained while the polishing rate is improved and the polishing time is reduced.
    Type: Application
    Filed: January 15, 2015
    Publication date: July 23, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Harunobu Matsui, Daijitsu Harada, Masaki Takeuchi
  • Method for manufacturing electronic grade synthetic quartz glass substrate
    Patent number: 9017144
    Abstract: An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
  • Method for manufacturing electronic grade synthetic quartz glass substrate
    Patent number: 9017143
    Abstract: An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
  • Method for Manufacturing Joint Member and Joint Member
    Publication number: 20150064409
    Abstract: There is provided a method for manufacturing a joint member obtained by joining a carbon fiber composite material containing a thermoplastic resin as a matrix and a metal. The method includes a step (i) of forming an uneven shape having a depth of 0.02 to 0.6 mm on a surface of the metal at a joining portion; a step (ii) of providing a thermoplastic resin layer having a thickness in the range of 5?m or more and 5 mm or less at a joining portion between the surface of the metal and a surface of the composite material; and a step (iii) of melting the thermoplastic resin layer by heating the joining portion to thereby combine the metal and the composite material into one.
    Type: Application
    Filed: March 27, 2013
    Publication date: March 5, 2015
    Applicant: Teijin Limited
    Inventors: Masaki Takeuchi, Masumi Hirata, Takumi Kato, Hiroki Sano
  • Polyamideimide resin, adhesive agent, material for flexible substrate, flexible laminate, and flexible print wiring board
    Patent number: 8956732
    Abstract: A polyamide-imide resin obtained by a process comprising the step of reacting an aromatic diisocyanate with a diimide dicarboxylic acid containing 40 mol % or more of a compound represented by the following general formula (1) and 20 mol % or more of a compound represented by the following general formula (2).
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: February 17, 2015
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masaki Takeuchi, Katsuyuki Masuda, Kenichi Tomioka, Takako Ejiri
  • Treatment of synthetic quartz glass substrate
    Patent number: 8951386
    Abstract: A synthetic quartz glass substrate having a resist film coated thereon is treated by immersing it in a terpene-containing solvent until the resist film is released, and rinsing the substrate with water.
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: February 10, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Harunobu Matsui, Ryouhei Hasegawa, Masaki Takeuchi
  • Method for Manufacturing Joint Member and Joint Member
    Publication number: 20150030864
    Abstract: There is provided a method for manufacturing a joint member in which a carbon fiber composite material containing a thermoplastic resin as a matrix and a metal are joined, wherein the joint member is manufactured by (i) treating a surface of the metal with a solution containing a specific triazine thiol derivative, (ii) providing a thermoplastic resin layer having a thickness of 5?m to 5 mm between the carbon fiber composite material and the surface of the metal on which the treatment is performed, and (iii) heating and melting the thermoplastic resin layer to join (fuse) the carbon fiber composite material to the surface of the metal.
    Type: Application
    Filed: March 27, 2013
    Publication date: January 29, 2015
    Applicant: Teijin Limited
    Inventors: Masaki Takeuchi, Shuji Koike, Masumi Hirata, Takumi Kato, Hiroki Sano
  • POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE
    Publication number: 20150021292
    Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.
    Type: Application
    Filed: October 9, 2014
    Publication date: January 22, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daijitsu HARADA, Masaki TAKEUCHI, Yukio SHIBANO, Shuhei UEDA, Atsushi WATABE
  • Silazane compounds having fluoroalkyl group and method of preparing the same
    Patent number: 8927754
    Abstract: Disclosed are silazane compounds having two fluoroalkyl groups, represented by the following general formula (1): wherein Rf and Rf? are each a fluoroalkyl group, R1 is a hydrogen atoms or an aliphatic monovalent hydrocarbon group, R2 and R3 are each an aliphatic monovalent hydrocarbon group, R4 is a hydrogen atom or an aliphatic monovalent hydrocarbon group, a and b are each 0 or 1, m, n and p are each an integer of 0 to 6, q is an integer of 1 to 6, and r is 1 or 2. By treating an inorganic material with the silazane compound having two fluoroalkyl groups, high water and oil repellency and high sliding properties can be imparted to the inorganic material in good balance.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: January 6, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Honma, Ayumu Kiyomori, Tohru Kubota, Daijitsu Harada, Hiroyuki Yamazaki, Masaki Takeuchi