Patents by Inventor Masami Yamashita
Masami Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20050227399Abstract: The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.Type: ApplicationFiled: May 20, 2005Publication date: October 13, 2005Applicant: NEC LCD TECHNOLOGIES, LTD.Inventors: Takasuke Hayase, Keiko Yamada, Masami Yamashita, Shinichi Nakata, Akitoshi Maeda
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Publication number: 20050150451Abstract: According to the present invention, in a coating treatment apparatus comprising a rotary holding member and a coating solution discharge member, positional adjustment of the holding position of the substrate with respect to the rotary holding member and a discharge position of a coating solution discharge member is quickly and accurately performed, so that the time required for the positional adjustment can be shortened. Further, variations in accuracy of the positional adjustment depending on the degree of proficiency of operator can be eliminated, realizing positional adjustment with a high precision at all times.Type: ApplicationFiled: January 6, 2005Publication date: July 14, 2005Inventors: Michio Tanaka, Masami Yamashita
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Publication number: 20050141891Abstract: In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the resist film are measured. Based on the measured values, calculation is performed to obtain calculated light intensity distributions of reflected light reflected from a plurality of virtual patterns. The calculated light intensity distributions are stored, and their library is created. The substrate for which the refractive index and so on are measured is irradiated with light, and the light intensity distribution of its reflected light is measured.Type: ApplicationFiled: December 17, 2004Publication date: June 30, 2005Inventors: Michio Tanaka, Masami Yamashita
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Publication number: 20050137985Abstract: A media information distribution and recording system for distributing media information from a central apparatus to terminal apparatus through a network and for recording the media information on a detachable recording medium in the terminal apparatus, wherein the terminal apparatus serves not only as a transmitting terminal apparatus, but also as a receiving terminal apparatus, is proposed, together with the terminal apparatus, a media information recording apparatus for use in this system, and a recording medium which stores a program that controls the operation of a computer for use in this system as well as in the media information recording apparatus.Type: ApplicationFiled: December 22, 2004Publication date: June 23, 2005Inventors: Masami Yamashita, Kenji Katsuhara
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Patent number: 6872512Abstract: A method of forming a resist pattern effectively controls the manner/style and the amount of modification of a resist pattern in its reflowing process, realizing a desired resist pattern with a desired accuracy even if the deformation amount of the resist pattern is increased in the reflowing process. A second layer is formed on a first layer and then, a first resist pattern is formed on the second layer. The second layer is selectively etched using the first resist pattern as a mask. Thereafter, wettability of at least part of an exposed area of the second or first layer from the first resist pattern is adjusted, thereby forming a wettability-adjusted part. The first resist pattern is modified in such a way as to extend to the wettability-adjusted area by reflowing the first resist pattern using an organic solvent, thereby forming a second resist pattern for selectively etching the first layer or the second layer.Type: GrantFiled: March 27, 2003Date of Patent: March 29, 2005Assignee: NEC LCD Technologies, Ltd.Inventor: Masami Yamashita
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Patent number: 6872670Abstract: A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.Type: GrantFiled: January 8, 2004Date of Patent: March 29, 2005Assignee: Tokyo Electron LimitedInventors: Takayuki Toshima, Tsutae Omori, Masami Yamashita
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Patent number: 6864971Abstract: A system and method for performing optical inspection of structures on the surface of a semiconductor wafer. The wafer surface is illuminated with a polychromatic light source. A multiple-charged couple-device (CCD) camera is positioned to capture light diffracted by the structures on the wafer surface at the first order of diffraction. The captured light is then separated into a plurality of component wavelengths which are directed onto the CCDs. A digital filter creates a plurality of digitized diffractive images of the wafer surface at different component wavelengths. The diffractive images may be integrated and analyzed to detect defects in the structures, or may be, analyzed individually. An image at a particular wavelength may be selected and analyzed by using the known grating pitch of the structures to calculate the wavelength.Type: GrantFiled: March 8, 2002Date of Patent: March 8, 2005Assignee: ISOA, Inc.Inventors: YouLing Lin, A. Kathleen Hennessey, Yongqiang Liu, Yonghang Fu, Masami Yamashita, Ichiro Shimomura
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Publication number: 20050030450Abstract: A semi-transmissive-type liquid crystal display device is provided which is capable of preventing an electric erosion reaction between a reflective film made of Al (aluminum) or an Al alloy and a transparent electrode film made of ITO or a like (Indium Tin Oxide) and of inhibiting occurrence of a flicker caused by a residual DC (Direct Current) voltage in the reflective film. In the semi-transmissive-type of a liquid crystal display device, a transmissive region to provide light from a backlight source and a reflective region to receive ambient light are placed in a pixel region and a transparent electrode film is formed above a reflective film formed in the reflective region on an active matrix substrate with a second passivation film being interposed between the reflective film and the transparent electrode film.Type: ApplicationFiled: July 8, 2003Publication date: February 10, 2005Inventors: Mamoru Okamoto, Michiaki Sakamoto, Osamu Sukegawa, Ken-Ichirou Naka, Shin-Ichi Nakata, Masami Yamashita
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Patent number: 6853985Abstract: A media information distribution and recording system for distributing media information from a central apparatus to terminal apparatus through a network and for recording the media information on a detachable recording medium in the terminal apparatus, wherein the terminal apparatus serves not only as a transmitting terminal apparatus, but also as a receiving terminal apparatus, is proposed, together with the terminal apparatus, a media information recording apparatus for use in this system, and a recording medium which stores a program that controls the operation of a computer for use in this system as well as in the media information recording apparatus.Type: GrantFiled: February 16, 2000Date of Patent: February 8, 2005Assignee: Ricoh Microelectronics, Company, Ltd.Inventors: Masami Yamashita, Kenji Katsuhara
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Publication number: 20040142580Abstract: A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.Type: ApplicationFiled: January 8, 2004Publication date: July 22, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Takayuki Toshima, Tsutae Omori, Masami Yamashita
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Publication number: 20040100605Abstract: There is provided a liquid crystal display device including a display screen comprised of a plurality of areas in each of which a pixel pattern is formed, wherein any two areas located adjacent to each other, among the areas, have at least two stitches therebetween.Type: ApplicationFiled: November 19, 2003Publication date: May 27, 2004Applicant: NEC LCD TECHNOLOGIES, LTD.Inventors: Takayuki Ishino, Yuji Yamamoto, Shinichi Nakata, Masami Yamashita
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Publication number: 20040085489Abstract: The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.Type: ApplicationFiled: October 27, 2003Publication date: May 6, 2004Applicant: NEC LCD TECHNOLOGIES, LTD.Inventors: Takasuke Hayase, Keiko Yamada, Masami Yamashita, Shinichi Nakata, Akitoshi Maeda
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Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
Publication number: 20040069757Abstract: Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.Type: ApplicationFiled: October 2, 2003Publication date: April 15, 2004Applicant: NEC LCD TECHNOLOGIES, LTD.Inventors: Shinichi Nakata, Takayuki Ishino, Masami Yamashita -
Patent number: 6709523Abstract: A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.Type: GrantFiled: November 16, 2000Date of Patent: March 23, 2004Assignee: Tokyo Electron LimitedInventors: Takayuki Toshima, Tsutae Omori, Masami Yamashita
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Publication number: 20040050321Abstract: On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.Type: ApplicationFiled: August 28, 2003Publication date: March 18, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Junichi Kitano, Yuji Matsuyama, Takahiro Kitano, Takayuki Katano, Hidefumi Matsui, Yo Suzuki, Masami Yamashita, Toru Aoyama, Hiroyuki Iwaki, Satoru Shimura, Masatoshi Deguchi, Kousuke Yoshihara, Naruaki Iida
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Publication number: 20040047958Abstract: Disclosed are an inhibitory agent for protein denaturation, kneaded meat with suppressed freezing-denaturation and process thereof, method for freezer storage for fish and meat paste products, and process for producing fish and meat paste products, especially, kamabokos, and fish sausages. The inhibitory agent comprises (i) a member selected from sorbitol, trehalose, mixture thereof, and another saccharide(s) containing sorbitol and/or trehalose; and (ii) a pH-controlling agent which adjusts a kneaded meat to an alkaline pH. The agent effectively inhibits the protein denaturation of kneaded meat, and fish- and meat-paste products without using phosphate.Type: ApplicationFiled: August 25, 2003Publication date: March 11, 2004Inventors: Teruo Kowata, Mitsutake Sato, Takeo Shimorura, Masami Yamashita
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Patent number: 6641853Abstract: Disclosed is an inhibitory agent for kneaded meat and process for producing fish and meat paste products, especially, kamabokos, and fish sausages. The inhibitory agent comprises (i) a member selected from sorbitol, trehalose, mixture thereof, and another saccharide(s) containing sorbitol and/or trehalose; and (ii) a pH-controlling agent which adjusts a kneaded meat to an alkaline pH. The agent effectively inhibits the protein denaturation of kneaded meat, and fish- and meat-paste products without using a phosphate.Type: GrantFiled: January 10, 2000Date of Patent: November 4, 2003Assignees: Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenyuojo, Aoba Kasei Kabushiki KaishaInventors: Teruo Kowata, Mitsutake Sato, Takeo Shimomura, Masami Yamashita
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Publication number: 20030186170Abstract: A method of forming a resist pattern effectively controls the manner/style and the amount of modification of a resist pattern in its reflowing process, realizing a desired resist pattern with a desired accuracy even if the deformation amount of the resist pattern is increased in the reflowing process. A second layer is formed on a first layer and then, a first resist pattern is formed on the second layer. The second layer is selectively etched using the first resist pattern as a mask. Thereafter, wettability of at least part of an exposed area of the second or first layer from the first resist pattern is adjusted, thereby forming a wettability-adjusted part. The first resist pattern is modified in such a way as to extend to the wettability-adjusted area by reflowing the first resist pattern using an organic solvent, thereby forming a second resist pattern for selectively etching the first layer or the second layer.Type: ApplicationFiled: March 27, 2003Publication date: October 2, 2003Applicant: NEC CorporationInventor: Masami Yamashita
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Patent number: 6622303Abstract: A digital broadcast transmitting method and an apparatus for repeating and transmitting a digital broadcast program are disclosed. The method comprises transmitting individual information from a first to a second digital broadcast transmitter, wherein the second digital broadcast transmitter selects particular information from the individual information. The selected information is transmitted to a receiving terminal which stores contract data corresponding to the selected information. In addition, the first digital broadcast transmitter supplies common information necessary for descrambling the broadcast program. The scrambled broadcast program received at the receiving terminal may be descrambled utilizing a descramble key corresponding to the common information depending on the stored contract data. The apparatus comprises a first and second digital broadcast transmitter and a receiving terminal which are capable of repeating and transmitting digital broadcasts.Type: GrantFiled: February 16, 2000Date of Patent: September 16, 2003Assignee: Sony CorporationInventor: Masami Yamashita
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Patent number: 6485203Abstract: A developing unit, a coating unit and a plurality of cooling plates are arranged in a process station which performs a resist coating and so on and a wafer is transferred among them by a substrate transfer device. The temperature of an area to where the wafer is transferred is detected by a temperature/humidity detector and the temperature of the wafer which is cooled by the cooling plates is adjusted accordingly based on a detected value so that the temperature of the wafer when transferred to the coating unit becomes a coating temperature of a processing solution. Thereby, the wafer is transferred to the coating unit while maintaining its temperature with high accuracy to be coated with a resist solution, so that a formation of an uneven processing due to the temperature change can be prevented and a uniform processing can be performed.Type: GrantFiled: December 18, 2000Date of Patent: November 26, 2002Assignee: Tokyo Electron LimitedInventors: Takayuki Katano, Hidefumi Matsui, Junichi Kitano, Yo Suzuki, Masami Yamashita, Toru Aoyama, Hiroyuki Iwaki, Satoru Shimura