Patents by Inventor Masatoshi Yasutake

Masatoshi Yasutake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080314131
    Abstract: There is provided a sample manipulating apparatus 1 which is an apparatus of manipulating a sample S mounted on a substrate surface 2a, in which at least a position data and a shape data are acquired by observing the sample S, thereafter, a tweezers 4 is positioned by moving means 5 such that the sample S is positioned between an observing probe 15 and a grasping probe 16 based on the two data, after the positioning, a height of the tweezers 4 is set to a position of being remote from the substrate surface 2a by a constant distance by moving means 5 while monitoring a result of measurement by displacement measuring means 7, thereafter, the grasping probe 16 is moved to a side of the observing probe 15 while monitoring the result of measurement by the displacement measuring means 7 at the set height and the sample S is grasped while detecting a grasping start point.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 25, 2008
    Applicant: SII Nano Technology, Inc.
    Inventors: Masatoshi Yasutake, Takeshi Umemoto, Masafumi Watanabe
  • Publication number: 20080295585
    Abstract: A tweezer-equipped scanning probe microscope comprises a first arm with a probing portion, a second arm that moves along an opening direction or a closing direction relative to the first arm, an electrostatic actuator that drives the second arm along the opening direction or the closing direction based upon an opening/closing drive voltage applied thereto, an amplifier that induces self-oscillation in the electrostatic actuator by using an electrically equivalent circuit accompanying the electrostatic actuator as a feedback circuit and causes the second arm to vibrate through the self-oscillation, and a vibration state detection unit that detects a change of vibration state of the second arm as the second arm contacts an object.
    Type: Application
    Filed: May 30, 2008
    Publication date: December 4, 2008
    Applicants: AOI Electronics Co., Ltd., SII Nano Technology Inc.
    Inventors: Takashi Konno, Masatoshi Yasutake
  • Patent number: 7442925
    Abstract: The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.
    Type: Grant
    Filed: March 4, 2006
    Date of Patent: October 28, 2008
    Assignee: SII Nanotechnology Inc.
    Inventors: Masatoshi Yasutake, Takuya Nakaue, Kazutoshi Watanabe, Osamu Takaoka, Atsushi Uemoto, Naoya Watanabe, Yoshiteru Shikakura
  • Patent number: 7398678
    Abstract: A scanning microscope probe in which a palladium covering film is formed on the surface of the protruding portion of a cantilever, and the base end portion of a nanotube is disposed in contact with the palladium covering film with the tip end portion of the nanotube protruding to the outside, thus allowing the tip end to be used as a probe needle end for detecting signals. A coating film is formed to cover all or part of the surface of this base end portion, and the nanotube is thus firmly fastened to the cantilever. Since the base end portion adheres tightly to the palladium covering film, both of them are electrically continuous. This palladium covering film allows, as an electrode film, the application of a voltage to the nanotube or the passage of an electric current through the nanotube, showing also good adhesion to the nanotube and cantilever.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: July 15, 2008
    Assignees: Daiken Chemical Co., Ltd., SII Nanotechnology, Inc.
    Inventors: Yoshikazu Nakayama, Takashi Okawa, Shigenobu Yamanaka, Akio Harada, Masatoshi Yasutake, Yoshiharu Shirakawabe
  • Publication number: 20080166560
    Abstract: The present invention provides a probe for a scanning magnetic force microscope having a resolution sufficient to allow observation of a magnetic storage medium with 1200 kFCI or higher recording densities, a method for producing the probe, and a method for forming a ferromagnetic alloy film on a carbon nanotube. In the context of the present invention, the probe for a scanning magnetic force microscope comprises a carbon nanotube whose surface is at least in part coated with a ferromagnetic alloy film consisting of any one of a Co—Fe alloy and a Co—Ni alloy, wherein the arithmetic mean roughness (Ra 10 ?m) of the surface of the ferromagnetic alloy film is controlled to 1.15 nm or less. A method for producing such probes for a scanning magnetic force microscope and a method for forming such a ferromagnetic alloy film on a carbon nanotube, so as to achieve such mean surface roughness by controlling the growth rate of the ferromagnetic alloy film within the range of 1.0 to 2.5 nm/min, is also disclosed.
    Type: Application
    Filed: December 28, 2005
    Publication date: July 10, 2008
    Applicants: National Institute of Advanced Industrial Science and Technology, SII NanoTechnology Inc.
    Inventors: Hiroyuki Akinaga, Yasuyuki Semba, Hiroshi Yokoyama, Masatoshi Yasutake, Hiromi Kuramochi
  • Publication number: 20080132151
    Abstract: There is a micro-machining apparatus for removing the micro-machining dust generated at the time of machining while a workpiece M is machined within a liquid W using a probe tip. The apparatus includes a stage on which the workpiece is to be placed; a probe having the probe tip, a machining device having a moving means that moves the stage and the probe relative to each other to machine the workpiece by the probe tip, and a micro-machining dust removing device having a first electrode and a second electrode that are arranged in the liquid so as to sandwich the probe tip therebetween, and a voltage application means that applies a voltage to between both the electrodes to move the micro-machining dust in the liquid.
    Type: Application
    Filed: June 4, 2007
    Publication date: June 5, 2008
    Applicants: NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY, SII Nano Technology Inc.
    Inventors: Futoshi Iwata, Masatoshi Yasutake, Takuya Nakaue, Syuichi Kikuchi, Osamu Takaoka
  • Patent number: 7378654
    Abstract: A processing probe for repairing a defective portion in a sample has a cantilever and a probe separate and independent from the cantilever and integrally connected to an end portion of the cantilever for scratch-processing a defective portion of a sample. The cantilever and the probe are conductive for preventing the generation of electrostatic charges by friction of the probe against the sample during scratch-processing of the defective portion of the sample.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: May 27, 2008
    Assignee: SII NanoTechnology Inc.
    Inventors: Shigeru Wakiyama, Osamu Takaoka, Masatoshi Yasutake
  • Patent number: 7373806
    Abstract: A scanning probe microscope has a probe tip for undergoing a scanning operation to scan a sample surface in X- and Y-directions parallel to the sample surface and for undergoing movement in a Z-direction vertical to the sample surface. A vibration unit vibrates the probe tip at a vibration frequency that resonates with of forcedly vibrates the probe tip. An observation unit collects observational data from the sample surface when the probe tip is in proximity or contact with the sample surface. A detection unit detects a variation in the state of vibration of the probe tip when the probe tip is in proximity or contact with the sample surface during a scanning operation.
    Type: Grant
    Filed: August 24, 2004
    Date of Patent: May 20, 2008
    Assignee: SII NanoTechnology Inc.
    Inventors: Itaru Kitajima, Kazutoshi Watanabe, Shigeru Wakiyama, Masatoshi Yasutake, Akira Inoue
  • Publication number: 20080105044
    Abstract: There is provided a sample operation apparatus in which, by a static electricity force acting between a probe and a sample, an accurate position is gripped without the sample being moved, and the sample can be operated by the probe for an observation, a grip, a release, or the like. In a casing body capable of being sealed, there are installed a sample operation tweezers comprising an observation probe and a grip probe, and a sample base fixing a substrate on which the sample is mounted. By the facts that a surface of the substrate is treated such that its hydrophilic nature is higher than the sample operation tweezers, and that a humidity in the casing body is controlled by a humidity control device, there is made such that an actuation of a grip, a movement, a separation or the like of the sample is performed under a state in which water films are formed on the sample, the substrate and a surface of the sample operation tweezers.
    Type: Application
    Filed: October 31, 2007
    Publication date: May 8, 2008
    Inventors: Masatoshi Yasutake, Takeshi Umemoto
  • Publication number: 20080105043
    Abstract: There is provided a sample operation apparatus in which, by a static electricity force acting between a probe and a sample, an accurate position is gripped without the sample being moved, and the sample can be operated by the probe for an observation, a grip, a release, or the like.
    Type: Application
    Filed: October 30, 2007
    Publication date: May 8, 2008
    Inventors: Masatoshi Yasutake, Takeshi Umemoto
  • Publication number: 20070278177
    Abstract: Under the condition that the height is fixed at a target height by turning off a feedback control system of a Z piezoelectric actuator of a cantilever of an atomic force microscope having a probe, which is harder than a processed material, flexure and twisting of the cantilever when carrying out mechanical processing while selectively repeating scanning only on the processed area (in the case of detecting flexure, parallel with the cantilever and in the case of detecting twisting, vertical with the cantilever) is monitored by a quadrant photodiode position sensing detector and the processing is repeated till a flexure amount or a twisting amount, namely, till an elastic deformation amount of the cantilever becomes not more than a determined threshold. It is not necessary to carry out scanning of the observation in obtaining the height information for detection of an end point, so that it is possible to improve a throughput of processing.
    Type: Application
    Filed: June 1, 2007
    Publication date: December 6, 2007
    Inventors: Kazushige Kondo, Masatoshi Yasutake, Takuya Nakaue, Osamu Takaoka, Atsushi Uemoto, Kazutoshi Watanabe, Yoshiteru Shikakura
  • Patent number: 7278299
    Abstract: An indentation is formed by thrusting a probe of a scanning probe microscope for processing, which has a vertical surface or a vertical ridge and is harder than sample material, into sample for measuring the indentation. A high-fidelity AFM observation is performed on the shape of the formed indentation with a thin probe with high aspect ratio, the direction of the vertical surface or the vertical ridge is inspected, and the angle error ? is stored. By rotating a sample stage by an angle corresponding to the measured mounting angle error ? of the probe, the mounting angle error of the probe is corrected in advance.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: October 9, 2007
    Assignee: SII NanoTechnology Inc.
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe
  • Patent number: 7259372
    Abstract: A processing method uses a probe of a scanning probe microscope. A fine marker is formed in a processing material by thrusting the probe, which is made of a material harder than the processing material, into a portion of the processing material disposed in the vicinity of an area of the processing material to be processed by the probe during a processing operation. A position of the fine marker on the processing material is detected during the processing operation. A drift amount of the area of the processing material is calculated in accordance with the detected position of the fine marker. A position of the area of the processing material is corrected in accordance with the calculated drift amount.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: August 21, 2007
    Assignee: SII NanoTechnology Inc.
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe
  • Patent number: 7232995
    Abstract: The kind of a particle is determined by pressing a hard atomic force microscope stylus having a spring constant equal to or larger than 300 N/m onto a particle to be removed and detecting bending quantity relative to a press force and a kind of a stylus used for removing the particle is changed in accordance with the kind of the particle.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: June 19, 2007
    Assignee: SII NanoTechnology Inc.
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe
  • Publication number: 20060219901
    Abstract: The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.
    Type: Application
    Filed: March 4, 2006
    Publication date: October 5, 2006
    Inventors: Masatoshi Yasutake, Takuya Nakaue, Kazutoshi Watanabe, Osamu Takaoka, Atsushi Uemoto, Naoya Watanabe, Yoshiteru Shikakura
  • Publication number: 20060150720
    Abstract: A scanning microscope probe in which a palladium covering film is formed on the surface of the protruding portion of a cantilever, and the base end portion of a nanotube is disposed in contact with the palladium covering film with the tip end portion of the nanotube protruding to the outside, thus allowing the tip end to be used as a probe needle end for detecting signals. A coating film is formed to cover all or part of the surface of this base end portion, and the nanotube is thus firmly fastened to the cantilever. Since the base end portion adheres tightly to the palladium covering film, both of them are electrically continuous. This palladium covering film allows, as an electrode film, the application of a voltage to the nanotube or the passage of an electric current through the nanotube, showing also good adhesion to the nanotube and cantilever.
    Type: Application
    Filed: June 6, 2005
    Publication date: July 13, 2006
    Inventors: Yoshikazu Nakayama, Takashi Okawa, Shigenobu Yamanaka, Akio Harada, Masatoshi Yasutake, Yoshiharu Shirakawabe
  • Publication number: 20060060778
    Abstract: A problem to be resolved by the invention resides in providing a multifunction analyzing apparatus for detecting a shape with high resolution and physical property information capable of not only successively reading a base arrangement from end to end but also specifying a position hybridized by known RNA with regard to a single piece of DNA elongated in one direction on a board. A microscope system of the invention is provided with a fluorescence microscope, a scanning near field microscope and a scanning probe microscope as a detecting system, the microscopes are fixed to a switching mechanism and can be moved to a position at which the various microscopes can observe the same portion of a sample by switching operation of the mechanism. The microscope system of the invention is provided with a function capable of directly detecting a shape and physical property information of one piece of DNA by the scanning probe microscope by multifunction scanning.
    Type: Application
    Filed: August 31, 2005
    Publication date: March 23, 2006
    Inventors: Masamichi Fujihira, Masatoshi Yasutake, Tatsuaki Ataka
  • Publication number: 20060022134
    Abstract: The kind of a particle is determined by pressing a hard atomic force microscope stylus having a spring constant equal to or larger than 300 N/m onto a particle to be removed and detecting bending quantity relative to a press force and a kind of a stylus used for removing the particle is changed in accordance with the kind of the particle.
    Type: Application
    Filed: July 20, 2005
    Publication date: February 2, 2006
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe
  • Publication number: 20050262685
    Abstract: An indentation is formed by thrusting a probe of a scanning probe microscope for processing, which has a vertical surface or a vertical ridge and is harder than sample material, into sample for measuring the indentation. A high-fidelity AFM observation is performed on the shape of the formed indentation with a thin probe with high aspect ratio, the direction of the vertical surface or the vertical ridge is inspected, and the angle error ? is stored. By rotating a sample stage by an angle corresponding to the measured mounting angle error ? of the probe, the mounting angle error of the probe is corrected in advance.
    Type: Application
    Filed: May 23, 2005
    Publication date: December 1, 2005
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe
  • Publication number: 20050263700
    Abstract: Fine markers are formed by thrusting a probe, which is harder than material to be processed, the formed fine markers are observed in the course of processing, the drift amount is obtained from the change of the position of the center of gravity of the hole, and the processing is restarted in the processing area corrected by the obtained drift amount.
    Type: Application
    Filed: May 23, 2005
    Publication date: December 1, 2005
    Inventors: Osamu Takaoka, Masatoshi Yasutake, Shigeru Wakiyama, Maoya Watanabe