Patents by Inventor Masayoshi Sagehashi

Masayoshi Sagehashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11009793
    Abstract: A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: May 18, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama
  • Publication number: 20210096465
    Abstract: A polymer comprising recurring units having a multiple bond-containing acid labile group, recurring units having a phenolic hydroxyl group, and recurring units adapted to generate an acid upon exposure is used to formulate a resist composition, which exhibits a high sensitivity, low LWR and improved CDU when processed by lithography using EUV of wavelength 13.5 nm.
    Type: Application
    Filed: September 16, 2020
    Publication date: April 1, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Emiko Ono
  • Publication number: 20200369605
    Abstract: An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
    Type: Application
    Filed: April 24, 2020
    Publication date: November 26, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Takayuki Fujiwara, Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama
  • Publication number: 20200283400
    Abstract: An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
    Type: Application
    Filed: February 25, 2020
    Publication date: September 10, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Ryosuke Taniguchi, Takeru Watanabe, Yoshinori Matsui
  • Publication number: 20200285152
    Abstract: A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.
    Type: Application
    Filed: February 25, 2020
    Publication date: September 10, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Matsui, Masayoshi Sagehashi, Tatsushi Kaneko, Akihiro Seki, Satoshi Watanabe
  • Publication number: 20200247926
    Abstract: Polymerization reaction is performed using a polymerizable monomer shown by the following general formula (1) and at least one monomer selected from monomers each having a structure of a salt among a lithium salt, a sodium salt, a potassium salt, and a nitrogen compound salt of a fluorosulfonic acid or the like; then, the structure of the salt of the repeating unit of a polymer obtained by the polymerization reaction is changed to the fluorosulfonic acid or the like by ion exchange. Thus, the present invention provides a polymer compound for a conductive polymer and a method for producing the polymer compound which is suitably used as a dopant for a fuel cell and a conductive material, and which is a copolymer containing a repeating unit of styrene having a 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylisobutyl ether group, and a repeating unit having any of a fluorosulfonic acid, a fluorosulfonimide group, and a n-carbonyl-fluoro-sulfonamide group.
    Type: Application
    Filed: January 16, 2020
    Publication date: August 6, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Takayuki NAGASAWA, Koji HASEGAWA, Masayoshi SAGEHASHI, Masahiro FUKUSHIMA
  • Publication number: 20200159115
    Abstract: A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.
    Type: Application
    Filed: October 31, 2019
    Publication date: May 21, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Emiko Ono, Masayoshi Sagehashi, Masahiro Fukushima, Yuki Kera
  • Publication number: 20200140592
    Abstract: A polymer comprising recurring units derived from a monomer (A) adapted to be decomposed to generate an acid upon light exposure, recurring units derived from a monomer (B) having an acid labile group, and recurring units derived from a monomer (C) having a phenolic hydroxyl group, an amount of residual monomer (A) in the polymer being up to 1.0 wt %, is prepared by feeding a monomer solution containing monomers (A), (B), and (C) in a solvent (S) to a reactor and effecting polymerization reaction in the reactor. The monomer solution has a monomer concentration of at least 35 wt %. The solvent (S) contains a compound having formula (S-1) or (S-2).
    Type: Application
    Filed: October 17, 2019
    Publication date: May 7, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Teppei Adachi, Masayoshi Sagehashi, Emiko Ono, Hideyuki Onozuka
  • Publication number: 20200133123
    Abstract: A composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having a cyclic ester, cyclic carbonate or cyclic sulfonate structure, (B) a thermal acid generator, and (C) an organic solvent is suited to form a protective film between a substrate and a resist film. Even when a metal-containing resist film is used, the protective film is effective for preventing the substrate from metal contamination.
    Type: Application
    Filed: October 8, 2019
    Publication date: April 30, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomohiro Kobayashi, Kenichi Oikawa, Masayoshi Sagehashi, Teppei Adachi
  • Patent number: 10591819
    Abstract: A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: March 17, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama
  • Patent number: 10527939
    Abstract: A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: January 7, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama
  • Publication number: 20190361347
    Abstract: A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
    Type: Application
    Filed: May 21, 2019
    Publication date: November 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daisuke Domon, Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe
  • Patent number: 10457779
    Abstract: The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; “k” represents 1 or 2; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition and usable as a base resin of a photosensitive resin composition.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: October 29, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa
  • Publication number: 20190235381
    Abstract: A monomer of formula (1a) or (1b) is provided wherein A is a polymerizabie group, R1-R6 are monovalent hydrocarbon groups, X1 is a divalent hydrocarbon, group, Z1 is an aliphatic group, Z2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.
    Type: Application
    Filed: April 10, 2019
    Publication date: August 1, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama
  • Patent number: 10363555
    Abstract: The present invention provides a polymer compound for a conductive polymer, having one or more kinds of repeating units “a” represented by the following general formula (1), the polymer compound for a conductive polymer being synthesized by ion exchange of a lithium salt, a sodium salt, a potassium salt, a sulfonium compound salt, or a nitrogen compound salt of sulfonic acid residue with a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group, R2 represents a fluorine atom or a trifluoromethyl group, “m” represents an integer of 1 to 4, and “a” satisfies 0<a?1.0. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group that is soluble in an organic solvent and suitably used for fuel cells or a dopant for conductive materials.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: July 30, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masaki Ohashi, Masayoshi Sagehashi, Takayuki Nagasawa
  • Patent number: 10303056
    Abstract: A positive resist composition based on a polymer comprising recurring units (a) of (meth)acrylate having an iodized lactone ring, and recurring units (b1) having a carboxyl group substituted with an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group has a high sensitivity and resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Grant
    Filed: May 3, 2017
    Date of Patent: May 28, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
  • Publication number: 20190129304
    Abstract: An object of the invention is to provide a simple, mechanized analytical approach for resist quality control and early source investigation when a defect occurs. A resist quality control method includes the steps of: (1) pretreating a resist to obtain an analysis sample; (2) subjecting the analysis sample to an instrumental analysis to obtain an analysis result; (3) converting the analysis result into numerical data, followed by a multivariate analysis; and (4) performing a quality control based on an analytical result thus obtained.
    Type: Application
    Filed: October 1, 2018
    Publication date: May 2, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki ARAI, Masayoshi SAGEHASHI, Kazuhiro KATAYAMA
  • Publication number: 20190064664
    Abstract: A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.
    Type: Application
    Filed: August 22, 2018
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama
  • Patent number: 10216085
    Abstract: The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X1 represents a tetravalent organic group; and R1 represents a group shown by the following general formula (2), Y1nRf)k??(2) wherein the dotted line represents a bond; Y1 represents an organic group with a valency of k+1; Rf represents a linear, branched, or cyclic alkyl group having 1 to 20 carbon atoms or an aromatic group in which a part or all of hydrogen atoms is/are substituted with a fluorine atom(s); “k” represents 1, 2, or 3; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition, and usable as a base resin of a negative photosensitive resin composition.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: February 26, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa
  • Patent number: 10131730
    Abstract: A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: November 20, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masayoshi Sagehashi, Koji Hasegawa, Kenichi Oikawa