Abstract: Provided is a solid catalyst component for olefin polymerization capable of suitably producing polymer particles with a suppressed content ratio of fine powder and reduced surface stickiness at high activity when subjected to polymerization of an olefin. The solid catalyst component for olefin polymerization contains magnesium, titanium, halogen and an internal electron-donating compound, in which a cross-sectional pore area ratio is 10 to 50%, and a ratio MXi/MXs of a cross-sectional pore area ratio (MXi) in a region of less than 50% in a radial direction to a cross-sectional pore area ratio (MXs) in a region of 50% or more in the radial direction from a particle center is 0.50 to 2.00.

Abstract: Provided is a high-frequency treatment tool including: a sheath having an inner hole that passes therethrough in a longitudinal direction; a first electrode portion that is formed in a rod shape, that passes through the inner hole of the sheath to protrude from a distal end of the sheath, and that is configured to apply a high-frequency current; a second electrode portion that is disposed at a position at which the second electrode portion is electrically connected with the first electrode portion; and a power source that uses the first electrode portion as a negative electrode, that uses the second electrode portion as a positive electrode, and that supply a current between the first electrode portion and the second electrode portion so that a state in which attached matter attached to the first electrode portion is lifted from the first electrode portion due to osmosis is created.

Abstract: A light source device includes a first light source, a second light source, and a processor. The processor controls, based on spectrum setting information, an emitted light amount of the first light source and an emitted light amount of the second light source so that the emitted light amount of the first light source becomes larger than the emitted light amount of the second light source. The observation object includes a region of interest, a merkmal, and a peripheral portion. The spectrum setting information is set based on a merkmal observed ratio that is a ratio between a spectral reflectance in the merkmal and a spectral reflectance in the peripheral portion. A degree of disassociation of the merkmal observed ratio in the first wavelength region from 1 is greater than a degree of disassociation of the merkmal observed ratio in the second wavelength region from 1.

Abstract: A method for producing a vapor generation unit, which is for generating a vapor by heating a liquid and is to be used in a non-combustible flavor inhaler, includes: a support feeding step of feeding a wick support to a production line for the vapor generation unit; a wick feeding step of, after the support feeding step, feeding a wick toward the wick support and disposing the same on the wick support; a holder feeding step of, after the wick feeding step, feeding a wick holder toward the wick support and assembling the same on the wick support; and a heater feeding step of, after the holder feeding step, feeding a heater toward the wick holder and assembling the same on the wick support.

Abstract: A method for producing a vapor generation unit, which is for generating a vapor by heating a liquid and is to be used in a non-combustible flavor inhaler, includes: a support feeding step of feeding a wick support to a production line for the vapor generation unit; a wick feeding step of, after the support feeding step, feeding a wick toward the wick support and disposing the same on the wick support; a holder feeding step of, after the wick feeding step, feeding a wick holder toward the wick support and assembling the same on the wick support; and a heater feeding step of, after the holder feeding step, feeding a heater toward the wick holder and assembling the same on the wick support.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: A photomask reticle for use in projection exposure to form a resist pattern on a workable film formed over a semiconductor substrate, includes a first area in which a light shield is formed, a second area formed around said first area, a third area formed around said second area; and a fourth area formed around said third area, the areas being formed over a substrate, a relationship between transmissivities of said areas being second area transmissivity>fourth area transmissivity>third area transmissivity>first area transmissivity.

Abstract: There is provided a semiconductor device including a capacitorless RAM. The semiconductor device includes a field effect transistor (FET) having a floating body structure. FET includes a channel body region arranged in a first region comprising a first semiconductor (e.g., p-SiGe) having a given band gap and a second region comprising a second semiconductor (e.g., n-Si) having a larger band gap than the first semiconductor.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: There is provided a semiconductor device including a capacitorless RAM. The semiconductor device includes a field effect transistor (FET) having a floating body structure. FET includes a channel body region arranged in a first region comprising a first semiconductor (e.g., p-SiGe) having a given band gap and a second region comprising a second semiconductor (e.g., n-Si) having a larger band gap than the first semiconductor.

Abstract: An immersion microscope objective formed of thirteen or fewer lens elements includes, in order from the object side, first and second lens groups of positive refractive power, a third lens group, a fourth lens group having negative refractive power with its image-side surface being concave, and a fifth lens group having positive refractive power with its object-side surface being concave. The first lens group includes, in order from the object side, a lens component that consists of a lens element of positive refractive power (when computed as being in air) and a meniscus lens element having its concave surface on the object side. Various conditions are satisfied to ensure that images of fluorescence, obtained when the immersion microscope objective is used in a laser scanning microscope that employs multiphoton excitation to observe a specimen, are bright and of high resolution. Various laser scanning microscopes are also disclosed.

Abstract: A pattern forming method includes forming a resist film on a target film to be processed, which is formed on a substrate; and forming a basic pattern part in the resist film by multiple exposure using photomasks, wherein each exposure process is performed at an amount of exposure smaller than a threshold assigned to the resist film; and the resist film is developed after the total sum of the amounts of exposure through a plurality of exposure processes exceeds the threshold, so that the basic pattern part including a hole shape, which corresponds to each area where the total amount of exposure through the exposure processes via the photomasks exceeds the threshold, is formed in the resist film. The method also includes performing etching via the basic pattern part so as to form a desired pattern in the target film.

Abstract: A photomask reticle is provided for use in projection exposure which forms a resist pattern on a workable film formed over a semiconductor substrate, comprising area 1 in which a main pattern is formed, area 2 formed around area 1, area 3 formed around area 2, and area 4 formed around area 3, the areas being formed over substrate 5. The relationship among the areas in terms of transmissivity is area 2>area 2>area 3>area 1.

Abstract: A method of forming a pattern according to the present invention comprising preparing a reduced projection exposure apparatus having a reduced projection ratio 1/m and a wavelength ? (nm) of exposing light and patterning a light shielding element pattern of a reticle mask on a resist film having a thickness tr (nm). The light shielding element pattern has a pattern opening portion having a minimum opening dimension D (nm). A thickness t0 of the light shielding element pattern is set so as to meet a relational equation of m*tr?t0+5*D*D/?. Preferably, the thickness t0 of the light shielding element pattern is set so as to meet a relational equation of m*tr?t0+D*D/?.

Abstract: An AlCu film is formed by simultaneously depositing AlCu within a via hole and on top of an interlayer dielectric film. The surface of the AlCu film is polished using a CMP process, and a TiN antireflection layer is formed thereon. The TiN antireflection layer having a flat surface prevents halation during pattering the interconnections including the AlCu film, thereby preventing ingress of etching solution during a subsequent wet etching process.

Abstract: A contact plug is formed in a contact hole which is formed in an interlayer insulation film and then a barrier metal layer and a main wiring layer, which form a wiring layer in all, are formed on both of the interlayer insulation film and the contact plug. After a surface of the main wiring layer is flattened by means of CMP, an antireflection film is formed on the main wiring layer. After that, a resist pattern is formed on the antireflection film to pattern the wiring layer. Thus, it is possible to pattern the wiring layer finely without influence of unevenness caused by the contact plug located under the wiring layer.