Abstract: A silicone-based encapsulating material composition contains a bifunctional the silicone resin (A), a multifunctional thermosetting silicone resin having a hydroxyl group (B), and a curing catalyst (C). In the composition, a weight-average molecular weight of the component (A) is 300 to 4,500, a mass ratio of the component (B) relative to a total mass of the component (A) and the component (B) is 0.5% by mass or more and less than 100% by mass, an average functional number of the component (B) is 2.5 to 3.5, and the repeating units constituting the component (B) which are trifunctional account for 50% by mass or more relative to a total mass of the component (B). A visible light transmittance measured at an optical path length of 1 cm and a wavelength of 600 nm is 70% or higher.

Abstract: A walking training system includes a detection unit that detects whether a leg portion of a walking trainee on which a walking assistance apparatus has been mounted has performed a walking operation or a stepping operation on a belt of a treadmill on which the walking trainee performs walking training, and a controller maintains an operation prohibition state in which a rotational operation of the belt is not started until the time that the detection unit detects the walking operation or the stepping operation a predetermined number of times and cancels the operation prohibition state after the detection unit detects the walking operation or the stepping operation the predetermined number of times.

Abstract: A method for producing a semiconductor light-emitting device containing a substrate, an element and an encapsulating material as constituent members is provided. The method involves providing the substrate with the element; potting at least one encapsulating material (i) before curing selected from addition polymerization-type encapsulating materials and polycondensation-type encapsulating materials onto the substrate to cover the element; curing the potted encapsulating material (i); potting a polycondensation-type encapsulating material (ii) before curing onto the encapsulating material (i) after curing which covers the element, and then curing the potted polycondensation-type encapsulating material (ii), thereby laminating the encapsulating material. A semiconductor light-emitting device produced by the method is also provided, in which two or more layers each containing the encapsulating material are laminated.

Abstract: A silicone resin liquid composition containing a silicone resin is provided. The 29Si-NMR measurement of the resin exhibits a ratio of the area of signals assigned to A3 silicon atoms to the area of all signals derived from silicon atoms of 51% to 69%. An A3 silicon atom represents a silicon atom to which are bonded three oxygen atoms bonded to another silicon atom.

Abstract: A phosphoric acid-based catalyst is used as a cure accelerator for a polysilsesquioxane-based UV-LED-encapsulating material, a cured product of which has a light transmittance of 65% or more at 260 nm. A polysilsesquioxane-based UV-LED-encapsulating material composition contains a polysilsesquioxane-based UV-LED-encapsulating material and a phosphoric acid-based catalyst.

Abstract: A method for producing a semiconductor light-emitting device having a substrate, an element and an encapsulating material as constituent members, includes: a first step of providing the substrate with the element; a second step of potting un uncured encapsulating material onto the substrate to cover the element; and a third step of curing the potted encapsulating material in such a manner that all of the following formulae (1), (2) and (3) are satisfied when the absorbances which a cured encapsulating material having a thickness of t [nm] has at wavelengths of 380 nm, 316 nm and 260 nm are represented by AbsA(t), AbsB(t) and AbsC(t), respectively, and the light transmittance thereof at 380 nm is represented by T(t): (1) T(1.7)?90%; (2) AbsB(t)?AbsA(t)<0.011t; and (3) AbsC(t)?AbsA(t)<0.125t.

Abstract: A liquid crystal panel (display panel) 11 includes a display area AA configured to display images, a non-display area NAA outside the display area AA, a light blocking layer (a light blocking portion) 11i disposed at least in the non-display area NAA and configured to block light, a signal line connection line (a narrow line portion) 29 where lines are arranged at intervals in the non-display area NAA, and a common electrode connection line portion (a wide line portion) 30 disposed in the non-display area and having a line width greater than that of the signal line connection line 29 and including empty portions 34.

Abstract: A gait training apparatus includes: a walking assistance device that is attached to a leg portion of a user and assists walking of the user; a peripheral device used for gait training of the user; a control unit that controls the walking assistance device and the peripheral device; and a switching unit that switches the control unit between a cooperative control mode for performing a cooperative control of the walking assistance device and the peripheral device based on information output from the walking assistance device, and an operation mode for controlling the peripheral device based on set operation information. When the control unit is switched to the operation mode by the switching unit, the control unit executes the control of the peripheral device even when the control unit is in a non-connected state with the walking assistance device.

Abstract: The present invention provides a liquid crystal display device having a sufficiently improved reflectance. The liquid crystal display device of the present invention is a liquid crystal display device including a pair of substrates and a liquid crystal layer sandwiched between the pair of substrates, at least one of the pair of the substrates including an insulating layer and a reflective pixel electrode for reflective display, the insulating layer including a flat part surrounding the reflective pixel electrode, convex portions under the reflective pixel electrode, and a bevel part inclining downward from the flat part between the flat part and the convex portions, the convex portions having an average diameter of 1 to 50 ?m, and vertex points of the reflective pixel electrode layer on the convex portions being not lower than the flat part.

Abstract: The present invention provides a liquid crystal display device that uniformly stabilizes the alignment direction of liquid crystal molecules, prevents display roughness and what is called an afterimage phenomenon in which a previous display state remains unchanged in switching display, has excellent display performance, and responds to finer pixels. A liquid crystal display device of the present invention comprises: a pair of substrates; and a liquid crystal layer sealed between the pair of substrates, wherein the liquid crystal layer contains liquid crystal molecules that are aligned vertically to a substrate surface when no voltage is applied, at least one of the pair of substrates includes a pixel electrode, a gate bus line, and a source bus line, the pixel electrode is provided with a slit, the slit bends, and a part of the slit is along the gate bus line.

Abstract: Disclosed is a cleaning method which can remove, particularly, all of an organic contaminant, a particle contaminant, and a metal contaminant adhered to a semiconductor substrate at a high cleaning level, and which can realize the reduction in environmental load caused by the cleaning. The method of cleaning the semiconductor substrate includes a first cleaning process of cleaning the semiconductor substrate with a cleaning composition including a transition-metal-containing water-soluble salt (A), a chelating agent (B1), and a peroxide (C), a ratio of the chelating agent (B1) to the transition-metal-containing water-soluble salt (A) being 0.5 molar equivalent or more; and a second cleaning process of cleaning the semiconductor substrate, which is cleaned through the first cleaning process, with an acidic solution containing a chelating agent (B2).

Abstract: The mold assembly for magnesium alloys comprises a mold and/or a core, each formed of an air permeable material. The air permeable material is any one or any combination of a network, a sheet having multiple holes, and cloth. The network, the sheet or the cloth is any one or any combination of a metal, a chemical fiber, and a ceramic material. The invention also provides a casting method for magnesium alloys, which uses that mold assembly.

Abstract: A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.

Abstract: A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.

Abstract: A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.

Abstract: (Object) To provide a new electronic parts cleaning solution that inhibits the corrosion of silicon or metals other than the silicon, and that efficiently cleans off fine dust or organic matters adhered on the surface of electronic parts, and that does not have white turbidity easily. (Solution) An electronic parts clearing solution which is characterized in containing an anionic surfactant, hydroxide, metal corrosion inhibitor, water, and a nonionic surfactant represented by formula (I) and/or a nonionic surfactant represented by formula (II): HO-((EO)x—(PO)y)z—H??(I) R-[((EO)a—(PO)b)c—H]m??(II) (EO is an oxyethylene group, and PO is an oxypropylene group. x and y, and a and b are positive number, which x(x+y) and a(a+b) are 0.05 to 0.5 respectively, and z and c are positive integers. R is a residue group wherein hydrogen atoms are removed from hydroxyl group of alcohol or amine represented by a group having valency of 1˜4).

Abstract: A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator: CH3—(CH2)l—O—(CmH2mO)n—X ??(1) wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group; CH3—(CH2)a—O—(CbH2bO)d—(CxH2xO)y—X ??(2) wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.

Abstract: A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.

Abstract: Recently, use is made of copper wiring as the wiring material for semiconductor devices, and of low dielectric constant films as the insulating film between the lines of wiring. In this connection, a photoresist stripper is in need which can inhibit corrosion or damage on the copper wiring or the Low-k film, and which has excellent property of removing ashed photoresist residues. The invention provides a photoresist stripper (hereinafter, referred to as the stripper of the invention) characterized in containing a tertiary amine compound, an alkaline compound, a fluoro compound, and an anionic surfactant; and a process for preparation of semiconductor devices using the stripper of the invention.

Abstract: According to the present invention, there is provided an anticorrosive treating concentrate usable for an exposed surface of a metal (e.g. copper or a copper alloy), containing an anticorrosive agent and a precipitation inhibitor and having a pH of 4 to 12 when used in the form of an aqueous solution, in which concentrate the anticorrosive agent is a triazole type compound and/or a derivative thereof and is contained in a concentration of 0.05 to 20% by weight and the precipitation inhibitor is a compound having at least one nitrogen atom but no metal atom in the molecule.