Patents by Inventor Mathias B. Steiner

Mathias B. Steiner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9417387
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: August 16, 2016
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Vasili Perebeinos, Mathias B. Steiner, Alberto Valdes Garcia
  • Patent number: 9412815
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: August 9, 2016
    Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, KARLSRUHE INSTITUTE OF TECHNOLOGY, TAIWAN BLUESTONE TECHNOLOGY LTD.
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin
  • Publication number: 20160216447
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. A plasmonic conductive layer is formed over the gap to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Application
    Filed: March 31, 2016
    Publication date: July 28, 2016
    Inventors: PHAEDON AVOURIS, VASILI PEREBEINOS, MATHIAS B. STEINER, ALBERTO VALDES GARCIA
  • Patent number: 9335471
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: May 10, 2016
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Vasili Perebeinos, Mathias B. Steiner, Alberto Valdes Garcia
  • Publication number: 20160080092
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Application
    Filed: November 30, 2015
    Publication date: March 17, 2016
    Inventors: PHAEDON AVOURIS, VASILI PEREBEINOS, MATHIAS B. STEINER, ALBERTO VALDES GARCIA
  • Patent number: 9250389
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: February 2, 2016
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Vasili Perebeinos, Mathias B. Steiner, Alberto Valdes Garcia
  • Publication number: 20150346428
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Application
    Filed: August 7, 2015
    Publication date: December 3, 2015
    Inventors: PHAEDON AVOURIS, VASILI PEREBEINOS, MATHIAS B. STEINER, ALBERTO VALDES GARCIA
  • Publication number: 20150294246
    Abstract: A selection parameter is applied to a set of risk assessment data and corresponding performance measure data for a completed, or active, project that is similar to a proposed project. Certain combinations of the risk assessment data and corresponding performance measure data are selected for training an optimal predictive model. The predictive model is applied to available data of a proposed project for predicting associated risks, or outcomes, of the proposed project.
    Type: Application
    Filed: August 29, 2014
    Publication date: October 15, 2015
    Inventors: Sinem Guven Kaya, Tsuyoshi Ide, Sergey Makogon, Amitkumar M. Paradkar, Mathias B. Steiner, Alejandro Venegas Middleton
  • Publication number: 20150294249
    Abstract: A method for predicting risks for information technology service contracts includes calculating a probability of occurrence of each target risk in a target contract; constructing clusters of root causes observed in historical contracts similar to the target contract, for each of the clusters, identifying root causes that co-occur with target contract risks by searching each cluster for root causes of similar historical contract risks such that the identified root causes represent additional new contract risks, and calculating the probability of occurrence of each new target risk identified for the target contract based on root causes identified in the similar historical contract risks. Two root causes are in the same cluster if both root causes occur in one or more contracts in the set of historical contracts, where two root causes co-occur if both root causes are in the same cluster.
    Type: Application
    Filed: April 11, 2014
    Publication date: October 15, 2015
    Inventors: SINEM GUVEN KAYA, VUGRANAM C. SREEDHAR, MATHIAS B. STEINER, SHERIF A. GOMA
  • Patent number: 9134481
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: September 15, 2015
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Vasili Perebeinos, Mathias B. Steiner, Alberto Valdes Garcia
  • Patent number: 8987705
    Abstract: Carbon nanotubes can be aligned with compatibility with semiconductor manufacturing processes, with scalability for forming smaller devices, and without performance degradation related to structural damages. A planar structure including a buried gate electrode and two embedded electrodes are formed. After forming a gate dielectric, carbon nanotubes are assembled in a solution on a surface of the gate dielectric along the direction of an alternating current (AC) electrical field generated by applying a voltage between the two embedded electrodes. A source contact electrode and a drain contact electrode are formed by depositing a conductive material on both ends of the carbon nanotubes. Each of the source and drain contact electrodes can be electrically shorted to an underlying embedded electrode to reduce parasitic capacitance.
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: March 24, 2015
    Assignees: International Business Machines Corporation, Karlsruher Institut fuer Technologie (KIT)
    Inventors: Phaedon Avouris, Yu-ming Lin, Mathias B. Steiner, Michael W. Engel, Ralph Krupke
  • Publication number: 20150058080
    Abstract: A method for predicting contract renewal ahead of contract expiration includes receiving comments and interview transcripts by a sentiment analysis program to generate sentiments, where the comments and interview transcripts are received from a plurality of clients who are contractees to one or more service contracts, combining the sentiments with contract assessment survey scores and historical renewal and growth data for the service contracts to generate a contract renewal and growth prediction model, providing a contract that is up for expiration to the predictive model, and providing the comments, interview transcripts, and risk assessment survey scores to the predictive model, where the predictive model outputs a prediction of renewal and growth for the contract up for expiration, and an analysis of root causes for the predictions.
    Type: Application
    Filed: April 8, 2014
    Publication date: February 26, 2015
    Inventors: SINEM GUVEN KAYA, MATHIAS B. STEINER, NIYU GE, AMITKUMAR M. PARADKAR
  • Publication number: 20150048312
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Application
    Filed: September 25, 2014
    Publication date: February 19, 2015
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin
  • Patent number: 8859439
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: October 14, 2014
    Assignees: International Business Machines Corporation, Karlsruhe Institute of Technology, Taiwan Bluestone Technology Ltd.
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin
  • Publication number: 20140291606
    Abstract: A semiconductor device includes a substrate having at least one electrically insulating portion. A first graphene electrode is formed on a surface of the substrate such that the electrically insulating portion is interposed between a bulk portion of the substrate and the first graphene electrode. A second graphene electrode formed on the surface of the substrate. The electrically insulating portion of the substrate is interposed between the bulk portion of the substrate and the second graphene electrode. The second graphene electrode is disposed opposite the first graphene electrode to define an exposed substrate area therebetween.
    Type: Application
    Filed: March 28, 2013
    Publication date: October 2, 2014
    Inventors: Phaedon Avouris, Christos Dimitrakopoulos, Damon B. Farmer, Mathias B. Steiner, Michael Engel, Ralph Krupke, Yu-Ming Lin
  • Publication number: 20140255044
    Abstract: A signal transfer link includes a first plasmonic coupler, and a second plasmonic coupler spaced apart from the first plasmonic coupler to form a gap. An insulator layer is formed over end portions of the first and second plasmonic couplers and in and over the gap. A plasmonic conductive layer is formed over the gap on the insulator layer to excite plasmons to provide signal transmission between the first and second plasmonic couplers.
    Type: Application
    Filed: August 16, 2013
    Publication date: September 11, 2014
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Vasili Parebeinos, Mathias B. Steiner, Alberto Valdes Garcia
  • Publication number: 20140124736
    Abstract: Carbon nanotubes can be aligned with compatibility with semiconductor manufacturing processes, with scalability for forming smaller devices, and without performance degradation related to structural damages. A planar structure including a buried gate electrode and two embedded electrodes are formed. After forming a gate dielectric, carbon nanotubes are assembled in a solution on a surface of the gate dielectric along the direction of an alternating current (AC) electrical field generated by applying a voltage between the two embedded electrodes. A source contact electrode and a drain contact electrode are formed by depositing a conductive material on both ends of the carbon nanotubes. Each of the source and drain contact electrodes can be electrically shorted to an underlying embedded electrode to reduce parasitic capacitance.
    Type: Application
    Filed: January 9, 2014
    Publication date: May 8, 2014
    Applicants: KARLSRUHER INSTITUT FUER TECHNOLOGIE, INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Phaedon Avouris, Yu-ming Lin, Mathias B. Steiner, Michael W. Engel, Ralph Krupke
  • Patent number: 8629010
    Abstract: Carbon nanotubes can be aligned with compatibility with semiconductor manufacturing processes, with scalability for forming smaller devices, and without performance degradation related to structural damages. A planar structure including a buried gate electrode and two embedded electrodes are formed. After forming a gate dielectric, carbon nanotubes are assembled in a solution on a surface of the gate dielectric along the direction of an alternating current (AC) electrical field generated by applying a voltage between the two embedded electrodes. A source contact electrode and a drain contact electrode are formed by depositing a conductive material on both ends of the carbon nanotubes. Each of the source and drain contact electrodes can be electrically shorted to an underlying embedded electrode to reduce parasitic capacitance.
    Type: Grant
    Filed: October 21, 2011
    Date of Patent: January 14, 2014
    Assignees: International Business Machines Corporation, Karlsruher Institut Fuer Technologie (KIT)
    Inventors: Phaedon Avouris, Yu-Ming Lin, Mathias B. Steiner, Michael W. Engel, Ralph Krupke
  • Patent number: 8610989
    Abstract: A microcavity-controlled two-dimensional carbon lattice structure device selectively modifies to reflect or to transmit, or emits, or absorbs, electromagnetic radiation depending on the wavelength of the electromagnetic radiation. The microcavity-controlled two-dimensional carbon lattice structure device employs a graphene layer or at least one carbon nanotube located within an optical center of a microcavity defined by a pair of partial mirrors that partially reflect electromagnetic radiation. The spacing between the mirror determines the efficiency of elastic and inelastic scattering of electromagnetic radiation inside the microcavity, and hence, determines a resonance wavelength of electronic radiation that is coupled to the microcavity. The resonance wavelength is tunable by selecting the dimensional and material parameters of the microcavity. The process for manufacturing this device is compatible with standard complementary metal oxide semiconductor (CMOS) manufacturing processes.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: December 17, 2013
    Assignees: International Business Machines Corporation, Karlsruher Institut Fuer Technologie (KIT), Cambridge Enterprise Limited
    Inventors: Phaedon Avouris, Mathias B. Steiner, Michael Engel, Ralph Krupke, Andrea C. Ferrari, Antonio Lombardo
  • Publication number: 20130107344
    Abstract: A microcavity-controlled two-dimensional carbon lattice structure device selectively modifies to reflect or to transmit, or emits, or absorbs, electromagnetic radiation depending on the wavelength of the electromagnetic radiation. The microcavity-controlled two-dimensional carbon lattice structure device employs a graphene layer or at least one carbon nanotube located within an optical center of a microcavity defined by a pair of partial mirrors that partially reflect electromagnetic radiation. The spacing between the mirror determines the efficiency of elastic and inelastic scattering of electromagnetic radiation inside the microcavity, and hence, determines a resonance wavelength of electronic radiation that is coupled to the microcavity. The resonance wavelength is tunable by selecting the dimensional and material parameters of the microcavity. The process for manufacturing this device is compatible with standard complementary metal oxide semiconductor (CMOS) manufacturing processes.
    Type: Application
    Filed: October 31, 2011
    Publication date: May 2, 2013
    Applicants: International Business Machines Corporation, Karlsruher Institut fuer Technologie
    Inventors: Phaedon Avouris, Mathias B. Steiner, Michael Engel, Ralph Krupke, Andrea C. Ferrari, Antonio Lombardo