Patents by Inventor Matthew Lipson
Matthew Lipson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230031443Abstract: Systems, apparatuses, and methods are provided for manufacturing a wafer clamp having hard burls. The method can include providing a first layer that includes a first surface. The method can further include forming a plurality of burls over the first surface of the first layer. The forming of the plurality of burls can include forming a subset of the plurality of burls to a hardness of greater than about 6.0 gigapascals (GPa).Type: ApplicationFiled: December 8, 2020Publication date: February 2, 2023Applicant: ASML Holding N.V.Inventors: Matthew LIPSON, Mehmet Ali AKBAS, Tammo UITTERDIJK, Fei ZHAO
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Publication number: 20230021360Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.Type: ApplicationFiled: December 4, 2020Publication date: January 26, 2023Applicant: ASML Holding N.V.Inventors: Matthew LIPSON, Mehmet Ali AKBAS
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Patent number: 11520241Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.Type: GrantFiled: November 29, 2018Date of Patent: December 6, 2022Assignee: ASML Holding N.V.Inventors: Matthew Lipson, David Allen Heald, Iliya Sigal
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Publication number: 20220236649Abstract: An electrostatic clamp and a method for fabricating the same. The electrostatic clamp includes a first stack and a second stack, wherein the first stack is joined with the second stack. Each of the first and second stacks includes a clamp body, one or more electrodes disposed on the clamp body, a dielectric plate disposed on the electrodes, and a plurality of channels inside the clamp body.Type: ApplicationFiled: May 11, 2020Publication date: July 28, 2022Applicant: ASML HOLDING N.V.Inventors: Matthew LIPSON, Eric Justin MONKMAN, Victor Antonio PEREZ-FALCON
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Publication number: 20220082953Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.Type: ApplicationFiled: May 5, 2020Publication date: March 17, 2022Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Satish ACHANTA, Benjamin David DAWSON, Matthew Anthony SORNA, IIiya SIGAL, Tammo UITTERDIJK
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Publication number: 20210405539Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.Type: ApplicationFiled: October 22, 2019Publication date: December 30, 2021Applicant: ASML Holding N.V.Inventors: Mehmet Ali AKBAS, Tammo UITTERDIJK, Christopher John MASON, Matthew LIPSON, David Hart PETERSON, Michael PERRY, Peter HELMUS, Jerry Jianguo DENG, Damoon SOHRABIBABAHEIDARY
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Publication number: 20210173312Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.Type: ApplicationFiled: November 29, 2018Publication date: June 10, 2021Applicant: ASML HOLDING N.V.Inventors: Matthew LIPSON, David Allen HEALD, Iliya SIGAL
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Patent number: 11016401Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: GrantFiled: May 1, 2018Date of Patent: May 25, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
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Patent number: 11009803Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: September 30, 2019Date of Patent: May 18, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
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Patent number: 10908518Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: GrantFiled: May 18, 2018Date of Patent: February 2, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. Delpuerto, Antonius Franciscus Johannes De Groot, Kenneth C. Henderson, Raymond Wilhelmus Louis Lafarre, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20200073262Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: ApplicationFiled: May 1, 2018Publication date: March 5, 2020Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
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Publication number: 20200057394Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: ApplicationFiled: September 30, 2019Publication date: February 20, 2020Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
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Patent number: 10558129Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: November 16, 2015Date of Patent: February 11, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
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Patent number: 10310391Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.Type: GrantFiled: July 9, 2015Date of Patent: June 4, 2019Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
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Patent number: 10274842Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.Type: GrantFiled: July 9, 2015Date of Patent: April 30, 2019Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
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Publication number: 20190086819Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: November 21, 2018Publication date: March 21, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 10146142Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: January 30, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Publication number: 20180329314Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: ApplicationFiled: November 16, 2015Publication date: November 15, 2018Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
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Publication number: 20180267414Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: ApplicationFiled: May 18, 2018Publication date: September 20, 2018Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. DELPUERTO, Antonius Franciscus Johannes De Groot, Kenneth C. HENDERSON, Raymond Wilhelmus Louis LAFARRE, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
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Patent number: 10001713Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: GrantFiled: February 5, 2014Date of Patent: June 19, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. Del Puerto, Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis LaFarre, Louis John Markoya, Tammo Uitterdijk, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Franciscus Johannes De Groot, Ronald Van Der Wilk