Patents by Inventor Matthew Lipson
Matthew Lipson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170242345Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.Type: ApplicationFiled: July 9, 2015Publication date: August 24, 2017Applicant: ASML Holding N.V.Inventors: Matthew LIPSON, Vincent DIMILIA, Ronald Peter TOTILLO, Tammo UITTERDIJK, Steven Michael ZIMMERMAN
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Publication number: 20170160650Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: January 30, 2017Publication date: June 8, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus BASELMANS, Marcel Mathijs Theodore Marie DIERICHS, Johannes Christiaan Maria JASPER, Matthew LIPSON, Hendricus Johannes Maria MEIJER, Uwe MICKAN, Johannes Catharinus Hubertus MULKENS, Tammo UITTERDIJK
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Patent number: 9606448Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: May 28, 2013Date of Patent: March 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 9442388Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: August 11, 2014Date of Patent: September 13, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 9348236Abstract: An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.Type: GrantFiled: September 21, 2011Date of Patent: May 24, 2016Assignee: ASML HOLDING N.V.Inventors: Peter Richard Helmus, Matthew Lipson, Ronald A. Wilklow, James Kennon, Kennard White, Wilbur Jordan Reichmann, II
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Patent number: 9330912Abstract: A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.Type: GrantFiled: September 21, 2011Date of Patent: May 3, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Harry Sewell, Louis John Markoya
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Publication number: 20150370180Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: ApplicationFiled: February 5, 2014Publication date: December 24, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. DEL PUERTO, Matthew LIPSON, Kenneth C. HENDERSON, Raymond Wilhelmus Louis LAFARRE, Louis John MARKOYA, Tammo UITTERDIJK, Johannes VERMEULEN, Antonius Franciscus Johannes DE GROOT, Ronald VAN DER WILK
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Patent number: 9195148Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.Type: GrantFiled: July 13, 2010Date of Patent: November 24, 2015Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Taras Shvets, Richard Bruls
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Publication number: 20140347642Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 8755027Abstract: A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.Type: GrantFiled: September 6, 2011Date of Patent: June 17, 2014Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
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Publication number: 20140071420Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: May 28, 2013Publication date: March 13, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 8597549Abstract: Disclosed are highly efficient multiphoton absorbing compounds and methods of their use. The compounds generally include a bridge of pi-conjugated bonds connecting electron donating groups or electron accepting groups. The bridge may be substituted with a variety of substituents as well. Solubility, lipophilicity, absorption maxima and other characteristics of the compounds may be tailored by changing the electron donating groups or electron accepting groups, the substituents attached to or the length of the pi-conjugated bridge. Numerous photophysical and photochemical methods are enabled by converting these compounds to electronically excited states upon simultaneous absorption of at least two photons of radiation. The compounds have large two-photon or higher-order absorptivities such that upon absorption, one or more Lewis acidic species, Lewis basic species, radical species or ionic species are formed.Type: GrantFiled: June 26, 2007Date of Patent: December 3, 2013Assignee: The California Institute of TechnologyInventors: Brian Cumpston, Matthew Lipson, Seth R. Marder, Joseph W. Perry
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Publication number: 20130308116Abstract: An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.Type: ApplicationFiled: September 21, 2011Publication date: November 21, 2013Applicant: ASML Holding N.V.Inventors: Peter Richard Helmus, Matthew Lipson, Ronald A. Wilklow, James Kennon, Kennard White, Wilbur Jordan Reichmann, II
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Patent number: 8208123Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: August 27, 2004Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Tammo Utterdijk
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Patent number: 8168017Abstract: A wafer chuck for use in a lithographic apparatus, which includes a low-thermal expansion glass ceramic substrate, a silicon silicon carbide layer, and a bonding layer comprising silicate having a strength of at least about 5 megapascals, the bonding layer attaching the silicon silicon carbide layer to the substrate is described. Also, a method of forming a wafer chuck for use in a lithographic apparatus, which includes coating a portion of one or both of a low-thermal expansion glass ceramic substrate and a silicon silicon carbide layer with a bonding solution, and contacting the substrate and the silicon silicon carbide layer to bond the substrate and the silicon silicon carbide layer together is described.Type: GrantFiled: February 4, 2010Date of Patent: May 1, 2012Assignee: ASML Holding N.V.Inventors: Matthew Lipson, Robert D. Harned, Geoffrey O'Connor, Timothy O'Neil
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Publication number: 20120013866Abstract: A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.Type: ApplicationFiled: September 21, 2011Publication date: January 19, 2012Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Johannes Catharinus Hubertus MULKENS, Matthew LIPSON, Harry SEWELL, Louis John MARKOYA
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Publication number: 20110317138Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.Type: ApplicationFiled: September 6, 2011Publication date: December 29, 2011Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
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Patent number: 8045135Abstract: A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.Type: GrantFiled: November 22, 2006Date of Patent: October 25, 2011Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Harry Sewell, Louis John Markoya
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Patent number: 8027026Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.Type: GrantFiled: January 28, 2011Date of Patent: September 27, 2011Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
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Publication number: 20110134402Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.Type: ApplicationFiled: January 28, 2011Publication date: June 9, 2011Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge