Patents by Inventor Megumi Nakamura

Megumi Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6635868
    Abstract: A mass spectrometry apparatus is provided with a mass spectrometry mechanism for analyzing the mass of ionized detected gas. The mass spectrometry apparatus is further provided with two ion sources, that is, a first ion source for attaching positive charge metal ions to cause ionization, and a second ion source for causing electrons to impact to cause ionization. Based on the configuration, it becomes possible to simultaneously or separately measure the molecular weight and analyze the molecular structure of the detected gas with a high sensitivity. The second ion source is positioned between the first ion source and the mass spectrometry mechanism and the detected gas is introduced into the first ion source. According to the above mass spectrometry apparatus, it is possible to measure the accurate molecular weight of the detected gas with a sufficient sensitivity and to simultaneously analyze the molecular structure with a sufficient sensitivity.
    Type: Grant
    Filed: March 23, 2001
    Date of Patent: October 21, 2003
    Assignee: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Patent number: 6590205
    Abstract: Metal ions are attached to a sample gas in an ionization chamber to produce ions of the sample gas. The ions of the sample gas pass through a mass spectrometer formed by an electromagnetic field for separation by mass. The mass separated ions of the sample gas are detected and measured by a detector as an ion current. Further, a metal ion emitter for emitting metal ions is arranged at the upstream side of a region controlled to a reduced pressure atmosphere where the flow of gas becomes viscous, a sample gas inflow part for introducing the sample gas to the downstream side where the metal ions are transported, and the sample gas ionized by attachment of the metal ions passes through the opening of the aperture plate and transported to the mass spectrometer. A second gas inflow part is arranged at the upstream side of the metal ion producing region. A second gas supplied by the second inflow part flows through the metal ion producing region and sample gas ionization region.
    Type: Grant
    Filed: August 8, 2001
    Date of Patent: July 8, 2003
    Assignee: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Patent number: 6559443
    Abstract: An ionization apparatus and ionization method, wherein an ion trap type structural unit is used as the ion source and an ion emitter for emitting metal ions is provided inside or outside the ion source, metal ions are attached to ingredients of a sample gas to ionize the sample gas, a separation parameter is changed to separate ions relating to a target substance for analysis and the metal ions, the metal ions are trapped and accumulated inside the ion source, and the ions relating to a target substance are ejected to a mass spectrometry unit. Due to this configuration, in ion mass spectrometry, it is possible to accurately separate the ions desired to be analyzed and the ions desired to be trapped by a simple configuration and relatively low resolution and possible to improve the sensitivity of analysis.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: May 6, 2003
    Assignee: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Yoshiki Hirano, Toshihiro Fujii
  • Patent number: 6479814
    Abstract: An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion.
    Type: Grant
    Filed: March 23, 2001
    Date of Patent: November 12, 2002
    Assignee: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Publication number: 20020139930
    Abstract: An ionization apparatus according to the present invention has a mechanism for causing metal ions emitted from an ion emitter to attach to an introduced target gas so as to generate ions of the sample gas and emits the ions of the sample gas to a mass spectrometer. The mass spectrometer has a zone in which one or both of an electric field and magnetic field are formed. As the electrode for causing the generation of cleaning plasma in the ionization zone generating the ions of the sample gas, the ion emitter is used. The ion emitter causes the generation of plasma in connection with a hollow vessel and removes deposits on components facing the ionization zone by the plasma. The plasma cleaning process is performed consecutively at a suitable timing after the ionization process. Due to the above configuration, deteriorated performance in ionization can be restored in a short time, a memory effect can be prevented, and accurate mass spectrometry becomes possible.
    Type: Application
    Filed: March 22, 2002
    Publication date: October 3, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20020084408
    Abstract: An apparatus for ion attachment mass spectrometry provided with an ion emitter for emitting positively charged metal ions, an ionization chamber for causing attachment of the metal ions to a gas to be detected, a third component gas introduction mechanism for introducing a third component gas into the ionization chamber, and a mass spectrometer for mass separation and detection of the detected gas with the metal ions attached. The third component gas introduction mechanism is provided with three types of third component gases and selectively introduces one type of third component gas from the three types of third component gases. Due to this, the occurrence of interference peaks due to macromers of third component gases with each other, macromers of third component gases and high concentration ingredients, etc. is prevented and accurate mass analysis made possible.
    Type: Application
    Filed: December 21, 2001
    Publication date: July 4, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20020053636
    Abstract: An ionization apparatus and ionization method, wherein an ion trap type structural unit is used as the ion source and an ion emitter for emitting metal ions is provided inside or outside the ion source, metal ions are attached to ingredients of a sample gas to ionize the sample gas, a separation parameter is changed to separate ions relating to a target substance for analysis and the metal ions, the metal ions are trapped and accumulated inside the ion source, and the ions relating to a target substance are ejected to a mass spectrometry unit. Due to this configuration, in ion mass spectrometry, it is possible to accurately separate the ions desired to be analyzed and the ions desired to be trapped by a simple configuration and relatively low resolution and possible to improve the sensitivity of analysis.
    Type: Application
    Filed: November 5, 2001
    Publication date: May 9, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Yoshiki Hirano, Toshihiro Fujii
  • Publication number: 20020036263
    Abstract: A mass spectrometry apparatus is provided with a mass spectrometry mechanism for analyzing the mass of ionized detected gas. The mass spectrometry apparatus is further provided with two ion sources, that is, a first ion source for attaching positive charge metal ions to cause ionization, and a second ion source for causing electrons to impact to cause ionization. Based on the configuration, it becomes possible to simultaneously or separately measure the molecular weight and analyze the molecular structure of the detected gas with a high sensitivity. The second ion source is positioned between the first ion source and the mass spectrometry mechanism and the detected gas is introduced into the first ion source. According to the above mass spectrometry apparatus, it is possible to measure the accurate molecular weight of the detected gas with a sufficient sensitivity and to simultaneously analyze the molecular structure with a sufficient sensitivity.
    Type: Application
    Filed: March 23, 2001
    Publication date: March 28, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Publication number: 20020020813
    Abstract: Metal ions are attached to a sample gas in an ionization chamber to produce ions of the sample gas. The ions of the sample gas pass through a mass spectrometer formed by an electromagnetic field for separation by mass. The mass separated ions of the sample gas are detected and measured by a detector as an ion current. Further, a metal ion emitter for emitting metal ions is arranged at the upstream side of a region controlled to a reduced pressure atmosphere where the flow of gas becomes viscous, a sample gas inflow part for introducing the sample gas to the downstream side where the metal ions are transported, and the sample gas ionized by attachment of the metal ions passes through the opening of the aperture plate and transported to the mass spectrometer. A second gas inflow part is arranged at the upstream side of the metal ion producing region. A second gas supplied by the second inflow part flows through the metal ion producing region and sample gas ionization region.
    Type: Application
    Filed: August 8, 2001
    Publication date: February 21, 2002
    Applicant: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20010048074
    Abstract: An apparatus for ion attachment mass spectrometry provided with a reaction chamber for causing positively charged metal ions to attach to a gas to be detected; a mass spectrometer for mass separation and detection of the detection gas; an analysis chamber in which the mass spectrometer is placed; differential evacuation chambers for connecting the reaction chamber and analysis chamber; a data processor for receiving and processing the mass signal from the mass spectrometer; and vacuum gauges for measuring the total pressure of the reduced pressure atmosphere of the reduced pressure atmosphere reaction chamber, a differential evacuation chamber, and an analysis chamber. The total pressure signal from the vacuum gauge measured during the measurement is input to one of the data processor, introduction mechanism, and evacuation mechanism.
    Type: Application
    Filed: June 1, 2001
    Publication date: December 6, 2001
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20010023922
    Abstract: An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion.
    Type: Application
    Filed: March 23, 2001
    Publication date: September 27, 2001
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Patent number: D468198
    Type: Grant
    Filed: April 23, 2001
    Date of Patent: January 7, 2003
    Assignee: Toshiba Battery Co., Ltd.
    Inventors: Manami Nakazawa, Miki Suzuki, Megumi Nakamura