Patents by Inventor Mei Chang

Mei Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210283650
    Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.
    Type: Application
    Filed: June 1, 2021
    Publication date: September 16, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou, Biao Liu, Cheng Pan, Paul F. Ma, Mei Chang
  • Patent number: 11096990
    Abstract: Liquid formulations of insulin that contain physically and chemically stable insulin but do not contain preservatives or stabilizers are provided. The formulations also lack surfactants. The formulations are useful for various modes of delivery including pulmonary delivery.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: August 24, 2021
    Assignee: AERAMI THERAPEUTICS, INC.
    Inventors: Blaine Bueche, Mei-Chang Kuo, John Patton, Matthew Sander
  • Publication number: 20210225655
    Abstract: Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WCl5 or WCl6.
    Type: Application
    Filed: April 6, 2021
    Publication date: July 22, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang, David Thompson, Steve G. Ghanayem
  • Publication number: 20210225640
    Abstract: A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft.
    Type: Application
    Filed: April 8, 2021
    Publication date: July 22, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Chien-Teh Kao, Joel M. Huston, Mei Chang, Xiaoxiong Yuan
  • Patent number: 11059061
    Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The inlet port has a showerhead that the end within the container. The showerhead has at least two angled nozzles to direct the flow of gas within the cavity so that the gas flow is not perpendicular to the surface of a liquid within the ampoule.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: July 13, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kenric Choi, Xiaoxiong Yuan, Daping Yao, Mei Chang
  • Patent number: 11033930
    Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: June 15, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou, Biao Liu, Cheng Pan, Paul F. Ma, Mei Chang
  • Publication number: 20210154137
    Abstract: Dry powder vancomycin compositions and methods for administering and preparing such compositions are provided.
    Type: Application
    Filed: January 4, 2021
    Publication date: May 27, 2021
    Inventors: John LORD, Jaakko Taneli JOUHIKAINEN, Herman E. SNYDER, Pravin SONI, Mei-Chang KUO
  • Patent number: 11016249
    Abstract: A fiber optical connector includes a connector housing and an optical-fiber component. The connector housing includes a receiving space. Two ends of the connector housing respectively form a first connector opening and a second connector opening. The first connector opening and the second connector opening communicate with the receiving space. Plural pins are assembled on a side surface of the connector housing, and the optical fiber component is inserted into the receiving space from the first connector opening. The connector housing has an improved structural strength. The assembling between the pins and the circuit board allows the connector to be fixedly positioned with the circuit board.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: May 25, 2021
    Assignee: ACON OPTICS COMMUNICATIONS INC.
    Inventors: Yang-Yang Cui, Yan-Mei Chang
  • Patent number: 11018009
    Abstract: The present disclosure relates to a method for forming a p-metal work function nitride film having a desired p-work function on a substrate, including: adjusting one or more of a temperature of a substrate, a duration of one or more temporally separated vapor phase pulses, a ratio of a tungsten precursor to a titanium precursor, or a pressure of a reaction to tune a work function of a p-metal work function nitride film to a desired p-work function, and contacting the substrate with temporally separated vapor phase pulses of the tungsten precursor, the titanium precursor, and a reactive gas to form a p-metal work function nitride film thereon having the desired p-work function.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: May 25, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Guoqiang Jian, Wei Tang, Chi-Chou Lin, Paul Ma, Yixiong Yang, Mei Chang, Wenyi Liu
  • Publication number: 20210123136
    Abstract: The use of a cyclic 1,4-diene reducing agent with a metal precursor and a reactant to form metal-containing films are described. Methods of forming the metal-containing film comprises exposing a substrate surface to a metal precursor, a reducing agent and a reactant either simultaneously, partially simultaneously or separately and sequentially to form the metal-containing film.
    Type: Application
    Filed: October 29, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Lakmal C. Kalutarage, Liqi Wu, Pratham Jain, Jeffrey W. Anthis, Mark Saly, Mei Chang, David Thompson
  • Patent number: 10985023
    Abstract: Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WCl5 or WCl6.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: April 20, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang, David Thompson, Steve G. Ghanayem
  • Patent number: 10956963
    Abstract: An intellectual shopping system includes a scanning apparatus, a cloud server, and an application program installed in a mobile device. The mobile device is bound to the scanning apparatus through the application program. When shopping physically, the scanning apparatus is used to scan sensing data of a merchandise item for uploading to the cloud server. The cloud server queries a database for corresponding merchandise information based on the sensing data, adds the merchandise information to a virtual shopping cart, and transmits the merchandise information to the mobile device for displaying. Upon receiving an external operation through the application program, the mobile device performs a checkout action for the virtual shopping cart. Further, the merchandise of the virtual shopping cart is delivered directly from a warehouse to a designated address by a logistic system after the checkout action, with no need for a consumer to convey the merchandise by himself/herself.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: March 23, 2021
    Assignee: JESS-LINK PRODUCTS CO., LTD.
    Inventor: Shu-Mei Chang
  • Publication number: 20210032753
    Abstract: Methods and apparatus for gas distribution in a process chamber leverage dual electrodes to provide RF power and an RF ground return in a single showerhead. In some embodiments, the apparatus includes a showerhead composed of a non-metallic material with a first gas channel and a second gas channel, the first gas channel and the second gas channel being independent of each other, and the first gas channel including a plurality of through holes from a top surface of the showerhead to a bottom surface of the showerhead and the second gas channel including a plurality of holes on the bottom surface of the showerhead connected to one or more gas inlets on a side of the showerhead, a first electrode embedded in the showerhead near a top surface of the showerhead, and a second electrode embedded in the showerhead near a bottom surface of the showerhead.
    Type: Application
    Filed: July 21, 2020
    Publication date: February 4, 2021
    Inventors: Jallepally RAVI, Dien-Yeh WU, Pingyan LEI, Manjunatha P. KOPPA, Vinod Konda PURATHE, Takashi KURATOMI, Mei CHANG, Xiaoxiong YUAN
  • Patent number: 10892186
    Abstract: Methods and apparatus to fill a feature with a seamless gapfill of copper are described. A copper gapfill seed layer is deposited on a substrate surface by atomic layer deposition followed by a copper deposition by physical vapor deposition to fill the gap with copper.
    Type: Grant
    Filed: October 12, 2018
    Date of Patent: January 12, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Ben-Li Sheu, Feng Q. Liu, Tae Hong Ha, Mei Chang, Shirish Pethe
  • Patent number: 10879090
    Abstract: Lid assemblies for processing chamber and processing chambers including the lid assemblies are described. The lid assemblies include a high temperature lid module and a housing. The high temperature lid module being positioned adjacent a process liner of a processing chamber. The flexible housing positioned around the high temperature lid module and joined to the high temperature lid module with an elastomeric ring.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: December 29, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao, Mei Chang
  • Patent number: 10879081
    Abstract: Methods and apparatus for reducing and eliminating defects in tungsten film are disclosed herein. In the present disclosure, reducing or eliminating oxidation of a first surface of a tungsten film having a predetermined first thickness disposed upon a substrate and within a plurality of trenches is disclosed. The plurality of trenches include a predetermined depth, and a width of less than 20 nanometers. The predetermined first thickness of the tungsten film is substantially uniform throughout the plurality of trenches such that the predetermined first thickness of the tungsten film does not substantially change to a second thickness when the first surface is contacted with air or oxygen.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: December 29, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Guoqiang Jian, Wei Tang, Chi-Chou Lin, Paul F. Ma, Kai Wu, Vikash Banthia, Mei Chang, Jia Ye, Wenyu Zhang, Jing Zhou
  • Patent number: 10842951
    Abstract: Liquid formulations of insulin that contain physically and chemically stable insulin but do not contain preservatives or stabilizers are provided. The formulations also lack surfactants. The formulations are useful for various modes of delivery including pulmonary delivery.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: November 24, 2020
    Assignee: Aerami Therapeutics, Inc.
    Inventors: Blaine Bueche, Mei-Chang Kuo, John Patton, Matthew Sander
  • Publication number: 20200357616
    Abstract: Embodiments of the invention generally provide a processing chamber used to perform a physical vapor deposition (PVD) process and methods of depositing multi-compositional films. The processing chamber may include: an improved RF feed configuration to reduce any standing wave effects; an improved magnetron design to enhance RF plasma uniformity, deposited film composition and thickness uniformity; an improved substrate biasing configuration to improve process control; and an improved process kit design to improve RF field uniformity near the critical surfaces of the substrate. The method includes forming a plasma in a processing region of a chamber using an RF supply coupled to a multi-compositional target, translating a magnetron relative to the multi-compositional target, wherein the magnetron is positioned in a first position relative to a center point of the multi-compositional target while the magnetron is translating and the plasma is formed, and depositing a multi-compositional film on a substrate.
    Type: Application
    Filed: July 24, 2020
    Publication date: November 12, 2020
    Inventors: Adolph Miller ALLEN, Lara HAWRYLCHAK, Zhigang XIE, Muhammad M. RASHEED, Rongjun WANG, Xianmin TANG, Zhendong LIU, Tza-Jing GUNG, Srinivas GANDIKOTA, Mei CHANG, Michael S. COX, Donny YOUNG, Kirankumar SAVANDAIAH, Zhenbin GE
  • Publication number: 20200333538
    Abstract: A fiber optical connector includes a connector housing and an optical-fiber component. The connector housing includes a receiving space. Two ends of the connector housing respectively form a first connector opening and a second connector opening. The first connector opening and the second connector opening communicate with the receiving space. Plural pins are assembled on a side surface of the connector housing, and the optical fiber component is inserted into the receiving space from the first connector opening. The connector housing has an improved structural strength. The assembling between the pins and the circuit board allows the connector to be fixedly positioned with the circuit board.
    Type: Application
    Filed: April 10, 2020
    Publication date: October 22, 2020
    Inventors: Yang-Yang Cui, Yan-Mei Chang
  • Patent number: D914424
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: March 30, 2021
    Inventors: Yu-Mei Chang, Cheng-Hui Huang