Abstract: A special mode key match comparison module has N-storage elements and a special mode key match comparator. The N-storage elements accumulate a serial data stream, and then determine whether a digital device should operate in a normal user mode, in a public programming mode, or in a particular private test mode. To reduce the possibility of accidentally decoding a false test or programming mode, the data stream has a sufficiently large number of N-bits to substantially reduce the probability of a false decode. To further reduce the possibility of accidentally decoding a programming or test mode, the special mode key match comparison module may be reset if less or more than N-clocks are detected during the accumulation of the N-bit serial data stream. The special mode key match data patterns may represent a normal user mode, a public programming mode, and particular private manufacturer test modes.

Abstract: A fabrication method of an ultra low-k dielectric layer is provided. A deposition process is performed, under the control of a temperature varying program or a pressure varying program, by reacting a dielectric matrix to form porous low-k dielectric layers with a gradient density on a barrier layer over a substrate.

Abstract: An illumination system including at least one first light source, a prism and a light uniforming device is provided. The first light source is capable of providing a first beam. The prism is disposed on a transmission path of the first beam, and has four first facets. Two of the first facets are opposite to each other, and the other two first facets are opposite to each other. The first beam passes through one of the first facets and is totally internally reflected by another first facet opposite to the one of the first facets. The light uniforming device is disposed on the transmission path of the first beam from the another first facet. The cost of the illumination system is lower, and the illumination system has high flexibility of the light source design and can provide illumination with high brightness.

Abstract: An illumination system including at least one first light source, a prism and a light uniforming device is provided. The first light source is capable of providing a first beam. The prism is disposed on a transmission path of the first beam, and has four first facets. Two of the first facets are opposite to each other, and the other two first facets are opposite to each other. The first beam passes through one of the first facets and is totally internally reflected by another first facet opposite to the one of the first facets. The light uniforming device is disposed on the transmission path of the first beam from the another first facet. The cost of the illumination system is lower, and the illumination system has high flexibility of the light source design and can provide illumination with high brightness.

Abstract: An optical engine including a beam splitting and combining system, which includes a first polarizing beam splitting (PBS) unit, a dichroic unit and a second PBS unit, is provided. A first color beam is reflected by the first PBS unit, is reflected by a first light valve, and passes through the first PBS unit sequentially. A second color beam passes through the first PBS unit, is reflected by a second light valve, and is reflected by the first PBS unit sequentially. The dichroic unit is disposed on an optical path of the first and second color beams. The second PBS unit is capable of allowing a third color beam to travel to a third light valve and allowing the third color beam reflected from the third light valve to travel to the dichroic unit. The dichroic unit is capable of combining the first, second and third color beams.

Abstract: An illumination system for providing an illumination beam to a light valve is provided. The illumination system includes a light source, a light integration rod, a color wheel, a first focusing unit and a second focusing unit. The light source is capable of generating the illumination beam, and the light integration rod is disposed on the transmission path of the illumination beam. The first focusing unit is disposed between the integration rod and the color wheel and is capable of focusing the illumination beam onto the color wheel. The second focusing unit is disposed between the color wheel and the light valve and is capable of focusing the illumination beam onto the light valve.

Abstract: A projection apparatus including an illumination system, a reflective light valve and an imaging system is provided. The illumination system emits an illumination beam. The reflective light valve is disposed on a transmission path of the illumination beam. The imaging system includes a first lens group, a polarization beam splitter and a second lens group. The first lens group is disposed on the transmission path of the illumination beam between the illumination system and the reflective light valve. The polarization beam splitter is disposed on the transmission path of the illumination beam between the illumination system and the first lens group. The polarization beam splitter permits the illumination beam to pass through and travel to the reflective light valve. The reflective light valve modulates the illumination beam to an image beam traveling to the polarization beam splitter. The polarization beam splitter reflects the image beam to the second lens group.

Abstract: A color filtering device including a color filter, a plurality of polarization beam splitting units, a plurality of reflecting units, and a plurality of wave plates is provided. The color filter has a plurality of filtering parts and a plurality of light shielding parts alternately arranged thereon. Each of the polarization beam splitting units is disposed in front of one of the filtering parts and makes an angle with a corresponding filtering part. Each of the reflecting units is disposed in front of one of the light shielding parts and makes an angle with a corresponding light shielding part. Each of the wave plates is substantially parallel to one of the filtering parts. Each of the polarization beam splitting units is disposed between a pair of a wave plate and a filtering part. The color filtering device has both color filtering function and polarization conversion function.

Abstract: A lamp driving method for a projection apparatus is provided. The projection apparatus has a light valve and a lamp. The lamp driving method includes adjusting a brightness of the lamp to different values according to multiple states of the light valve. The lamp driving method improves the energy efficiency of the projection apparatus.

Abstract: A method for manufacturing a multi cap layer includes providing a substrate, forming a multi cap layer comprising a first cap layer and a second cap layer formed thereon on the substrate, forming a patterned metal hard mask layer on the multi cap layer, and performing an etching process to etch the multi cap layer through the patterned hard mask layer and to form an opening in the second cap layer.

Abstract: A method of forming a porous low-k layer is described. A CVD process is conducted to a substrate, wherein a framework precursor and a porogen precursor are supplied. In an end period of the supply of the framework precursor, the value of at least one deposition parameter negatively correlated with the density of the product of the CVD process is decreased.

Abstract: A method of curing a porous low-k layer is described, which is applied to a substrate with a porous low-k layer formed thereon, wherein the porous low-k: layer contains a porogen. A first UV-curing treatment is performed to the porous low-k layer under a relatively milder condition, and then a second UV-curing treatment is performed to the porous low-k layer under a relatively harsher condition to finish the curing of the porous low-k layer.

Abstract: A dual damascene process starts with providing a substrate having thereon a base layer, a lower copper wiring inlaid into the base layer, and a lower cap layer covering the inlaid lower copper wiring. A dielectric layer is deposited on the lower cap layer. A TEOS-based oxide cap layer is deposited on the dielectric layer. The TEOS-based oxide cap layer has a carbon content lower than 1×1019 atoms/cm3. A metal hard mask is deposited on the TEOS-based oxide cap layer. A trench recess is etched into the metal hard mask and the TEOS-based oxide cap layer. A partial via feature is then etched into the TEOS-based oxide cap layer and the dielectric layer through the trench recess. The trench recess and partial via feature are etch transferred into the underlying dielectric layer, thereby forming a dual damascene opening, which exposes a portion of the lower copper wiring.

Abstract: An integrated circuit device comprising a configurable reference clock output to a peripheral function connection of the integrated circuit device provides a system clock or a frequency divided clock from the system clock as a clock source to a peripheral function on a peripheral function connection of the integrated circuit device. The clock function may be used to generate all necessary clocks for a plurality of integrated circuit devices and may be able to supply a system clock or frequency divided clock from the system clock, either from an external clock oscillator source or from an internally generated system clock, with the option of using a crystal for more accuracy and greater frequency stability. The external clock and/or internal clock may be made available for peripheral devices even when internal logic of the integrated circuit device may be in a standby/sleep mode.

Abstract: A copper damascene process includes providing a substrate having a dielectric layer thereon, forming at least a copper damascene structure in the dielectric layer, performing a heat treatment on the substrate, and performing a reduction plasma treatment on a surface of the copper damascene structure. The impurities formed in the copper damascene process are removed by the heat treatment, therefore the copper damascene structure is completely reduced by the reduction plasma treatment and is improved.

Abstract: A method of improving adhesion property of a dielectric layer is provided. A dielectric layer is formed over a substrate. A plasma surface process comprising a plasma gas containing helium or hydrogen is performed to treat the surface of the dielectric layer. A cap layer is formed on the dielectric layer.

Abstract: A method for fabricating a porous low-k dielectric film includes providing a substrate, performing a first CVD process by providing a back-bone precursor to form an interface dielectric layer, performing a second CVD process by providing a porogen precursor to form a back-bone layer, and removing the porogens in the back-bone layer so that the back-bone layer becomes an ultra low-k dielectric layer. The interface dielectric layer and the ultra low-k dielectric layer compose a porous low-k dielectric film.

Abstract: A dual damascene process starts with providing a substrate having thereon a base layer, a lower copper wiring inlaid into the base layer, and a lower cap layer covering the inlaid lower copper wiring. A dielectric layer is deposited on the lower cap layer. A TEOS-based oxide cap layer is deposited on the dielectric layer. The TEOS-based oxide cap layer has a carbon content lower than 1×1019 atoms/cm3. A metal hard mask is deposited on the TEOS-based oxide cap layer. A trench recess is etched into the metal hard mask and the TEOS-based oxide cap layer. A partial via feature is then etched into the TEOS-based oxide cap layer and the dielectric layer through the trench recess. The trench recess and partial via feature are etch transferred into the underlying dielectric layer, thereby forming a dual damascene opening, which exposes a portion of the lower copper wiring.

Abstract: A method of restoring a low-k material is described, applied to a substrate with a low-k material thereon, wherein the substrate has been subject to a previous process that raised the k-value of the low-k material. The method includes performing a plasma treatment to the low-k material to decrease the k-value thereof.

Abstract: A special mode key match comparison module has N-storage elements and a special mode key match comparator. The N-storage elements accumulate a serial data stream, and then determine whether a digital device should operate in a normal user mode, in a public programming mode, or in a particular private test mode. To reduce the possibility of accidentally decoding a false test or programming mode, the data stream has a sufficiently large number of N-bits to substantially reduce the probability of a false decode. To further reduce the possibility of accidentally decoding a programming or test mode, the special mode key match comparison module may be reset if less or more than N-clocks are detected during the accumulation of the N-bit serial data stream. The special mode key match data patterns may represent a normal user mode, a public programming mode, and particular private manufacturer test modes.