Abstract: The wrist sphygmomanometer includes a wristband, an inflatable bladder, a measuring unit and a pressure sensing unit. The wristband has an inner surface that is adapted to contact a human wrist. The inflatable bladder is mounted inside the wristband, and has a measurement point adapted to correspond in position to a point of radial pulse on the human wrist. The measuring unit is mounted on an outer surface of the wristband and is connected to the inflatable bladder. The pressure sensing unit includes a pressure sensor mounted at the measurement point of the inflatable bladder, and a wire electrically interconnecting the measuring unit and the pressure sensor.

Abstract: A physically unclonable function unit includes and anti-fuse transistor and a control circuit. The anti-fuse transistor has a first terminal, a second terminal, and a gate terminal. The control circuit is coupled to the anti-fuse transistor. During an enroll operation, the control circuit applies an enroll voltage to the gate terminal of the anti-fuse transistor and applies a reference voltage to the first terminal and the second terminal of the anti-fuse transistor. The enroll voltage is higher than the reference voltage, and is high enough to create a rupture path on the gate terminal to the first terminal or to the second terminal.

Abstract: A device includes a semiconductor substrate, a first Metal-Oxide-Semiconductor (MOS) device, and a second MOS device of a same conductivity as the first MOS device. The first MOS device includes a first gate stack over the semiconductor substrate, and a first stressor adjacent to the first gate stack and extending into the semiconductor substrate. The first stressor and the first gate stack have a first distance. The second MOS device includes a second gate stack over the semiconductor substrate, and a second stressor adjacent to the second gate stack and extending into the semiconductor substrate. The second stressor and the second gate stack have a second distance greater than the first distance.

Abstract: This technology relates to optimizing location and orientation information of an image using known locations of places captured within the image. For example, an image and associated pose data including the image's orientation and location may be received. One or more places captured within the image may be determined, with each place having a respective known location. The image may be annotated with the one or more places. A difference between each annotation and its respective known location to obtain updated pose data of the image may be minimized and the associated pose data may be updated to the updated pose data.

Abstract: An antifuse physically unclonable function (PUF) unit includes a first sub-antifuse cell, a second sub-antifuse cell, a connection circuit, a first copying circuit and a first reading circuit. The first sub-antifuse cell includes a first antifuse transistor. The second sub-antifuse cell includes a second antifuse transistor. The connection circuit is connected between a source/drain terminal of the first antifuse transistor and a source/drain terminal of the second antifuse transistor. The first copying circuit is connected with the first sub-antifuse cell, and includes a third antifuse transistor. The first reading circuit is connected with the first copying circuit. Moreover, the first reading circuit generates a random code according to a state of the third antifuse transistor.

Abstract: A semiconductor device includes a semiconductor substrate having a first conductivity type region including a first conductivity type impurity. A first gate structure is on the semiconductor substrate overlying the first conductivity type region. A second conductivity type region including a second conductivity type impurity is formed in the semiconductor substrate. A barrier layer is located between the first conductivity type region and the second conductivity type region. The barrier layer prevents diffusion of the second conductivity type impurity from the second conductivity type region into the first conductivity type region.

Abstract: A semiconductor apparatus with fake functionality includes a logic device and at least one fake device. The logic device is formed on a substrate and turned on by a bias voltage. The fake device is also formed on the substrate. The fake device cannot be turned on by the same bias voltage applied on the logic device.

Abstract: A dressing includes a silk protein layer and a hydrophilic glycoside compound, and the hydrophilic glycoside compound is coated on the silk protein layer. Furthermore, the invention also provides the use of a wound dressing comprising a silk protein layer and an active ingredient comprising a water extract of Gastrodia elata Blume, wherein the water extract containing gastrodin in a range from 0.33% to 0.67%.

Abstract: A self-capacitive touch sensing circuit including an operational amplifier, an internal capacitor, a first switch and a second switch is disclosed. A first input terminal and a second input terminal of operational amplifier are coupled to a capacitor and ground respectively and an output terminal of operational amplifier outputs an output voltage. The internal capacitor is coupled between the output terminal and first input terminal of operational amplifier. One terminal of first switch is coupled to a first external charging voltage and another terminal of first switch is coupled between the capacitor and the first input terminal. The first external charging voltage is higher than the second external charging voltage. The first switch and second switch are switched according to a specific order, so that the first external charging voltage or second external charging voltage will charge the capacitor.

Abstract: A mutual-capacitive touch sensing circuit includes an operational amplifier, an internal capacitor, a first switch˜a third switch. A first input terminal and a second input terminal of operational amplifier are coupled to a capacitor and ground respectively and an output terminal of operational amplifier outputs an output voltage. The internal capacitor is coupled to output terminal and first input terminal. The first switch is coupled to a first external charging voltage, capacitor and first input terminal. The second switch is coupled to a second external charging voltage and the capacitor. The third switch is coupled to a third external charging voltage, the second switch and capacitor. The second external charging voltage and third external charging voltage have same magnitude but opposite polarities. The first switch, second switch and third switch are switched in a specific order to selectively charge the capacitor with different external charging voltages.

Abstract: An antifuse physically unclonable function (PUF) unit includes a first sub-antifuse cell, a second sub-antifuse cell, a connection circuit, a first copying circuit and a first reading circuit. The first sub-antifuse cell includes a first antifuse transistor. The second sub-antifuse cell includes a second antifuse transistor. The connection circuit is connected between a source/drain terminal of the first antifuse transistor and a source/drain terminal of the second antifuse transistor. The first copying circuit is connected with the first sub-antifuse cell, and includes a third antifuse transistor. The first reading circuit is connected with the first copying circuit. Moreover, the first reading circuit generates a random code according to a state of the third antifuse transistor.

Abstract: A non-volatile memory (NVM) includes a fin structure, a first fin field effect transistor (FinFET), a second FinFET, an antifuse structure, a third FinFET, and a fourth FinFET. The antifuse structure is formed on the fin structure and has a sharing gate, a single diffusion break (SDB) isolation structure, a first source/drain region, and a second source/drain region. The SDB isolation structure isolates the first source/drain region and the second source/drain region. The first FinFET, the second FinFET and the first antifuse element compose a first one time programmable (OTP) memory cell, and the third FinFET, the fourth FinFET and the second antifuse element compose a second OTP memory cell. The first OTP memory cell and the second OTP memory cell share the antifuse structure.

Abstract: A non-volatile memory (NVM) includes a fin structure, a first fin field effect transistor (FinFET), a second FinFET, an antifuse structure, a third FinFET, and a fourth FinFET. The antifuse structure is formed on the fin structure and has a sharing gate, a single diffusion break (SDB) isolation structure, a first source/drain region, and a second source/drain region. The SDB isolation structure isolates the first source/drain region and the second source/drain region. The first FinFET, the second FinFET and the first antifuse element compose a first one time programmable (OTP) memory cell, and the third FinFET, the fourth FinFET and the second antifuse element compose a second OTP memory cell. The first OTP memory cell and the second OTP memory cell share the antifuse structure.

Abstract: A semiconductor device includes a semiconductor substrate having a first conductivity type region including a first conductivity type impurity. A first gate structure is on the semiconductor substrate overlying the first conductivity type region. A second conductivity type region including a second conductivity type impurity is formed in the semiconductor substrate. A barrier layer is located between the first conductivity type region and the second conductivity type region. The barrier layer prevents diffusion of the second conductivity type impurity from the second conductivity type region into the first conductivity type region.

Abstract: An antifuse-type OTP memory cell has following structures. A first doped region, a second doped region, a third doped region and a fourth doped region are formed in a well region. A gate oxide layer covers the surface of the well region. A first gate is formed on the gate oxide layer and spanned over the first doped region and the second doped region. The first gate is connected with a word line. A second gate is formed on the gate oxide layer and spanned over the second doped region and the third doped region. The second gate is connected with an antifuse control line. A third gate is formed on the gate oxide layer and spanned over the third doped region and the fourth doped region. The third gate is connected with an isolation control line.

Abstract: A semiconductor apparatus with fake functionality includes a logic device and at least one fake device. The logic device is formed on a substrate and turned on by a bias voltage. The fake device is also formed on the substrate. The fake device cannot be turned on by the same bias voltage applied on the logic device.

Abstract: A semiconductor device includes a semiconductor substrate having a first conductivity type region including a first conductivity type impurity. A first gate structure is on the semiconductor substrate overlying the first conductivity type region. A second conductivity type region including a second conductivity type impurity is formed in the semiconductor substrate. A barrier layer is located between the first conductivity type region and the second conductivity type region. The barrier layer prevents diffusion of the second conductivity type impurity from the second conductivity type region into the first conductivity type region.

Abstract: An antifuse-type one time programming memory cell, comprising: a first select transistor, wherein a first drain/source terminal of the first select transistor is connected with a bit line, and a gate terminal of the first select transistor is connected with a word line; an antifuse transistor, wherein a first drain/source terminal of the antifuse transistor is connected with a second drain/source terminal of the first select transistor, and a gate terminal of the antifuse transistor is connected with an antifuse control line; and a second select transistor, wherein a first drain/source terminal of the second select transistor is connected with a second drain/source terminal of the antifuse transistor, a gate terminal of the second select transistor is connected with the word line, and a second drain/source terminal of the second select transistor is connected with the bit line.

Abstract: A one time programmable (OTP) memory cell includes a select gate transistor, a following gate transistor, and an antifuse varactor. The select gate transistor has a first gate terminal, a first drain terminal and a first source terminal. The following gate transistor has a second gate terminal, a second drain terminal and a second source terminal coupled to the first drain terminal. The antifuse varactor has a third gate terminal, a third drain terminal, and a third source terminal coupled to the second drain terminal. The select gate transistor, the following gate transistor, and the antifuse varactor are formed on a substrate structure.

Abstract: An antifuse-type one time programming memory cell has following structures. A first doped region, a second doped region, a third doped region and a fourth doped region are formed in a well region. A gate oxide layer covers a surface of the well region. A first gate is formed on the gate oxide layer and spanned over the first doped region and the second doped region. The first gate is connected with a word line. A second gate is formed on the gate oxide layer and spanned over the third doped region and the fourth doped region. The second gate is connected with the word line. A third gate is formed on the gate oxide layer and spanned over the second doped region and the third doped region. The third gate is connected with an antifuse control line.