Abstract: An ion implantation apparatus and method. The apparatus has a vacuum chamber and an ion beam generator to generate an ion beam in the vacuum chamber. The apparatus also has an implant wheel (10), in the vacuum chamber, having a plurality of circumferentially distributed substrate holding positions. Each of the substrate holding positions comprises a substrate holder (17), which includes an elastomer overlying the substrate holder (17) and a thermal insulating material (71) (e.g., quartz, silicon, ceramics, and other substantially non-compliant materials) overlying the elastomer (72). The present thermal insulating material increases a temperature of a substrate as it is implanted.

Abstract: A novel plasma treatment method (800, 814). The method includes forming an rf plasma discharge in a vacuum chamber. The plasma discharge includes an inductive coupling structure, which has a first cusp region at a first end of the structure and a second cusp region at a second end of the structure. In some embodiments, a third cusp region, which is between the first and second cusp regions, can also be included. The first cusp region is provided by a first electro-magnetic source and the second cusp region is provided by a second-electro magnetic source. The first electro-magnetic source and the second electro-magnetic source confines a substantial portion of the rf plasma discharge to a region away from a wall of the vacuum chamber. Accordingly, a plasma discharge is substantially a single ionic species (e.g., H1+) can be formed.

Abstract: A novel plasma treatment method (800, 814). The method includes forming an rf plasma discharge in a vacuum chamber. The plasma discharge includes an inductive coupling structure, which has a first cusp region at a first end of the structure and a second cusp region at a second end of the structure. In some embodiments, a third cusp region, which is between the first and second cusp regions, can also be included. The first cusp region is provided by a first electro-magnetic source and the second cusp region is provided by a second-electro magnetic source. The first electro-magnetic source and the second electro-magnetic source confines a substantial portion of the rf plasma discharge to a region away from a wall of the vacuum chamber. Accordingly, a plasma discharge is substantially a single ionic species (e.g., H1+) can be formed.

Abstract: A novel plasma treatment system (200). The plasma treatment system has a chamber (14), where a vacuum is maintained. The system also has a susceptor disposed within an interior region in the chamber. The susceptor (i.e., electrostatic chuck) is adapted to secure a work piece thereon. The system has an rf source (40) disposed overlying the susceptor. The rf source provides an inductive discharge to form a plasma from a gas within the chamber. Magnetic sources (207), (209) are selectively applied to the plasma discharge. In a specific embodiment, a first magnetic source (207) is disposed surrounding the susceptor in the chamber. The first magnetic source provides focused magnetic field lines toward the susceptor. A second magnetic source (209) is disposed surrounding the susceptor, where the second magnetic source provides focussed magnetic field lines toward the susceptor.

Abstract: A cleaving tool provides pressurized gas to the edge of a substrate in combination with a sharpened edge to cleave the substrate at a selected interface. The edge of the tool is tapped against the perimeter of a substrate, such as a bonded substrate, and a burst of gas pressure is then applied at approximately the point of contact with the edge of the tool. The combination of mechanical force and gas pressure separates the substrate into two halves at a selected interface, such as a weakened layer in a donor wafer.

Abstract: A novel plasma treatment system (200). The plasma treatment system has a chamber (14), where a vacuum is maintained. The system also has a susceptor disposed within an interior region in the chamber. The susceptor (i.e., electrostatic chuck) is adapted to secure a work piece thereon. The system has an rf source (40) disposed overlying the susceptor. The rf source provides an inductive discharge to form a plasma from a gas within the chamber. Magnetic sources (207), (209) are selectively applied to the plasma discharge. In a specific embodiment, a first magnetic source (207) is disposed surrounding the susceptor in the chamber. The first magnetic source provides focused magnetic field lines toward the susceptor. A second magnetic source (209) is disposed surrounding the susceptor, where the second magnetic source provides focussed magnetic field lines toward the susceptor.

Abstract: A cleaving tool provides pressurized gas to the edge of a substrate to cleave the substrate at a selected interface. A substrate, such as a bonded substrate, is loaded into the cleaving tool, and two halves of the tool are brought together to apply a selected pressure to the substrate. A compliant pad of selected elastic resistance provides support to the substrate while allowing the substrate to expand during the cleaving process. Bringing the two halves of the tool together also compresses an edge seal against the perimeter of the substrate. A thin tube connected to a high-pressure gas source extends through the edge seal and provides a burst of gas to separate the substrate into at least two sheets. In a further embodiment, the perimeter of the substrate is struck with an edge prior to applying the gas pressure.

Abstract: A novel plasma treatment system (200) including one or more novel computer codes. These codes provide a high density plasma for plasma immersion ion implantation applications.

Abstract: An improved method and resulting device 10 for fabricating an electro-optical modulator material. The technique includes providing a substrate 509, which has a top surface. A first layer of electrode material 501 is defined overlying the top surface. The method also includes applying a transfer sheet 400, having an electro-optical material 405, to the first layer of electrode material 501, where the electro-optical material is affixed to the first layer of electrode material. A step of removing (e.g., peeling) 801 the transfer sheet from the electro-optical material is included. The removing step leaves a substantial portion of the electro-optical modulator material intact and affixed to the first layer of electrode material. This method generally uses less steps and provides a higher quality element than pre-existing techniques.

Abstract: A technique for fabricating an electro-optic modulator material 1009 onto a transfer substrate 1001. The technique includes a method, which provides a first transfer substrate 1001. The method includes a step of forming an electro-optic material 1009 onto a surface of the first transfer substrate 1001 to attach the electro-optic material 1009 to the first transfer substrate 1001. A step of applying or forming a second transfer substrate 1008 overlying the electro-optic material 1009 is included. The second transfer substrate 1008 is attached using an adhesive to the electro-optic material at lower strength than the attachment of the first transfer substrate to the electro-optic material. To use the electro-optic material, a step of removing 1017 the second transfer substrate 1008 from the electro-optic modulator material 1009, which leaves the electro-optic material substantially affixed to the first transfer material, is also included.

Abstract: A technique including a method 300, 400 and apparatus 200 for repairing a color filter assembly 1 for a flat panel display using a high intensity light source means. The technique provides a color filter assembly having an anomaly. The technique uses a step of directing a high intensity light source 203 through an aperture opening at the anomaly to selectively ablate a portion of the anomaly. These features remove the portion of the anomaly while preventing a possibility of substantial damage to other portions of the color filter assembly surrounding the anomaly.

Abstract: A technique for monitoring anomalies in a railway system 400. The technique uses a motion sensor 207, 209 operably coupled to a chassis of a rail car 101 to detect a possibility of an event which may correspond to an anomaly in the railway system. A global positioning sensor (GPS) 213 operably coupled to the chassis detects a geographical location of the rail car 101 at a time corresponding to the event, which correlates the anomaly to the geographical location and the time. The technique also uses a processor 301 operably coupled to the motion sensor 207, 209 to direct a signal corresponding to the event and a recorder 215 operably coupled to the processor 301 to log the signal which may correspond to the anomaly and the geographical location of the rail car corresponding to the event. A central station 104 tracks and analyzes the anomaly over time to predict a possible defect in the railway system.

Abstract: A technique for monitoring anomalies in a railway system 400 to predict a future track behavior. The technique uses a motion sensor 207, 209 operably coupled to a chassis of a rail car 101 to detect a possibility of an event which may correspond to an anomaly in the railway system. A global positioning sensor (GPS) 213 operably coupled to the chassis detects a geographical location of the rail car 101 at a time corresponding to the event, which correlates the anomaly to the geographical location and the time. The technique also uses a processor 301 operably coupled to the motion sensor 207, 209 to direct a signal corresponding to the event and a recorder 215 operably coupled to the processor 301 to log the signal which may correspond to the anomaly and the geographical location of the rail car corresponding to the event. A central station 104 tracks and analyzes the anomaly over time to predict a possible defect in the railway system using a record of the events over time.

Abstract: A computer program product for a computer system including a processor, a display, a historical database, and a geographic database, for determining railway defects includes a computer readable memory including code that directs the processor to receive positional data and status data for a portion of a railway, code that directs the processor to retrieve historical status data for the portion of the railway in response to the positional data from the historical database, code that directs the processor to compare the historical status data to the status data to determine a defect for the portion of the railway, code that directs the processor to retrieve an image of a geographic region in response to the positional data from the geographic database, code that directs the processor to determine an icon in response to the defect, and code that directs the display to display the image of the geographic region and the icon for the defect.

Abstract: A method for monitoring defects in a railway with a computer system, the computer system includes the steps of determining positional data and status data for a railway, comparing historical status data to the status data to determine a defect for the railway, the defect having a defect type, displaying an image of a particular geographic area on a display that includes a location corresponding to the positional data, determining an icon associated with the defect type, and displaying the icon associated with the defect type on the display.

Abstract: A method (500) for inspecting anomalies, which are likely defects of several types, namely, particles on the surface, scratches into surface, and defects in bulk material, is provided. This inspection method involves two types of illumination, which can be used separately or together. These two types highlight anomalies sufficiently differently to enable the defect monitoring tool to distinguish between defect type and defect location along an inspection axis. The illumination methods are direct internal side illumination (114) where the plate is used as light pipe, and external front-side illumination (117). In direct internal side illumination, a fiber optic feed (115) with flared end arranged as a line source is abutted to an edge (123) of the plate (102). In external side illumination, the source is light directed at an acute angle, preferably a grazing angle, to one of the surfaces (121).