Abstract: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

Abstract: An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A clean ignition system is used to ignite the combustion flame.

Abstract: An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.

Abstract: An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate.

Abstract: A method and apparatus for dry chemical processing a wafer at atmospheric pressure is disclosed. The edge area of a substrate is placed in isolation from the remainder of the substrate. According to the present teachings, a method for centering a wafer on a rotatable chuck is provided. The method includes the steps of positioning a wafer adjacent to a micrometer. The wafer is then rotated and a plurality of wafer edge locations and rotational increments are measured. A center offset value for the value of the wafer center with respect to a chuck is calculated. The wafer is then moved with respect to a center position of the chuck.

Abstract: The present invention relates to associative complexes of water soluble and/or water dispersible polymers and polymeric fluorosurfactants, compositions and methods for modifying substrates to provide treated articles with surface protective properties including easier cleaning, increased stain and/or soil repellency, and increased resistance to bio-fouling and environmental contamination.

Abstract: The transfer of antimicrobial agent from a cleaning substrate to the skin can be reduced resulting in reduced skin irritancy when the viscosity of the cleaning composition containing the antimicrobial is increased in viscosity. The transfer is measured by the Simulated Hand Transfer Method. The cleaning substrate is used to clean hard surfaces, especially bathroom surfaces such as toilets, and is attached to a cleaning implement. Also provided is a method of promoting a product having reduced skin irritancy.

Abstract: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.

Abstract: A rotor assembly having a rotor hub, a plurality of yokes, and a plurality of swing arms is provided. The yoke depending from the rotor hub. Each swing arm is movably positioned on the rotor hub for rotation between an unlocked position and a locked position. The yokes are freely movable about a pitch axis and a lead/lag axis when the swing arms are in the unlocked position and the yokes are locked in a predetermined pitch position and a predetermined lead/lag position when the swing arms are in the locked position.

Abstract: A swash plate assembly includes a rotationally stationary swash plate and rotational swash plate which rotates relative to the rotationally stationary swash plate through a bearing system. Each servo control rod is attached to the swash plate assembly to communicate control inputs thereto through a respective servo lug. Each servo lug defines a servo pivot point off an in-line plane inboard of the bearing system. As the servo lugs extend below the rotationally stationary swash plate, a relatively uncomplicated attachment arrangement is facilitated which provides for redundant locking features at a highly inspectable location which simplifies maintenance and increased safety. By locating the servo pivot point just inboard of the bearing system, an exceeding compact load path is defined thereby.

Abstract: Treated articles with improved water sheeting and soap scum repellency result from forming hydroscopic films on the surfaces of hydrophobic polymeric substrates treated with compositions, kits and methods that employ water-soluble or water-dispersible copolymers having: (i) a first monomer that is capable of forming a cationic charge on protonation; (ii) a second monomer that is acidic and that is capable of forming an anionic charge in the compositions; (iii) optionally, a third monomer having an uncharged hydrophilic group; and (iv) optionally, a fourth monomer that is hydrophobic. Treated articles exhibit a Water Sheeting Index of greater than 6. Treated articles may further exhibit improved soap scum repellency behavior compared to untreated articles.

Abstract: A substrate processing method and apparatus using a combustion flame of a gaseous mixture of hydrogen and a non-oxygen oxidizer is described. The method uses the hydrogen and non-oxygen oxidizer combustion flame to impinge upon a substrate surface for chemically reacting with a thin film on the surface and thus etching the substrate. The method is performed in a substantially inert and non-ionized environment at a substantially atmospheric pressure. An apparatus for processing a substrate with the method has a processing chamber for containing the inert environment and a nozzle head for directing the combustion flame towards a substrate retained upon a substrate holder. In an embodiment, an edge nozzle assembly is angled towards the edge of the wafer for treating the near-edge and edge of the wafer. In this embodiment, a heater preheats the substrate in the near-edge region to be processed.

Abstract: An isolative substrate edge area processing method and apparatus is described. The apparatus has an isolator for isolating and processing by dry chemical technique a portion of a substrate including a substrate edge region. The isolator has nozzles for directing a flow of reactive species towards the edge area of the substrate and a purge plenum for biasing flow of reactive species towards an exhaust plenum while the substrate rotates on a chuck. Tuned flow control prevents migration of reactive species and reaction byproducts out of the processing area. A method for processing a substrate with the isolator involves directing a flow of reactive species at an angle towards an edge area of the substrate while forming a boundary around the processing area with flow control provided by the purge plenum, and exhaust plenum.

Abstract: A tool includes a hammered shaping device having a first working surface and a thickness measured in a direction perpendicular to said first working surface. The first working surface has a length and a width. The length is about equal to a length of a hinge leaf. The width is about equal to a width of the hinge leaf. The thickness is at least two times a thickness of the hinge leaf. The hammered shaping device is fabricated of a material that can be hammered without substantial permanent deformation. The hammered shaping device can have a gauge. The hammered shaping device can have countersunk holes to facilitate connection to a door or door frame hinge reinforcement plate.

Abstract: The present invention relates to associative complexes of water soluble and/or water dispersible polymers and polymeric fluorosurfactants, compositions and methods for modifying substrates to provide treated articles with surface protective properties including easier cleaning, increased stain and/or soil repellency, and increased resistance to bio-fouling and environmental contamination.

Abstract: A control interface is disclosed that includes a display screen, a touch screen disposed on the display screen, a processor electrically connected to the display and the touch screen, and a bezel disposed over the touch screen. The bezel preferably includes a plurality of buttons and a plug. The plug preferably projects from the bezel and contacts a socket connected to a processor, thereby communicating information via the socket to the processor regarding the bezel.

Abstract: A control interface is disclosed that includes a display screen, a touch screen disposed on the display screen, a processor and a memory electrically connected to the display and the touch screen, and a bezel disposed over the touch screen. The bezel preferably includes a frame and a button disposed on the frame. The frame is preferably disposed over the touch screen such that at least part of the frame is disposed outside the perimeter of the touch screen. The button includes a touch pad, touch screen contact point and a lateral extension connecting the touch pad and contact point. Preferably, the button is positioned at least partially outside the perimeter of the touch screen such that pressing the button causes the contact point to contact the touch screen.

Abstract: A control interface is disclosed that includes a display screen, a touch screen disposed on the display screen, a processor and memory electrically connected to the display and the touch screen, and a bezel, which is of a particular type, disposed over the touch screen. The processor may be configured according to any one or more different types of bezels.

Abstract: Hydroscopic polymer gels can be formed by applying a polymer to a surface and allowing water to be sequestered from the atmosphere into the polymer. The polymer gels are formed using methods and compositions employing water soluble or water dispersible copolymers having: (i) a first monomer that is acidic and is capable of forming an anionic charge in the composition; (ii) a second monomer that is amphipathic; (iii) optionally, a third monomer that is hydrophobic; and (iv) optionally, a fourth monomer that that has a permanent cationic charge or that is capable of forming a cationic charge on protonation. The polymer gels are particularly substantive and effective at modifying surfaces such as glass and hydrophobic polymeric substrates to provide soap scum and soil resistance, and easier next time cleaning benefits.

Abstract: A method for shaping and/or encapsulating near-edge regions of a substrate wafer is described. A housing provides channels for flowing a reactive gas towards the wafer edge. The reactive gas is directed towards the wafer edge for removing or depositing a thin film on the wafer edge. Gasses are exhausted downstream from the flow of the reactive gas. A second channel in the housing directs a flow of diluent/quenching gas onto the wafer for exhausting of the diluent/quenching gas and the reactive gas away from the wafer. The method may also provide a sequence of process steps, for example, selectively etching of a material on the wafer, etching of second material on the wafer and depositing an encapsulating material layer on the wafer.