Patents by Inventor Michael Pickering

Michael Pickering has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7438884
    Abstract: A chemical vapor deposited, ? phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: October 21, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Nathaniel E. Brese, Jitendra S. Goela, Michael A. Pickering
  • Publication number: 20080226868
    Abstract: Chemical vapor deposited silicon carbide articles and the methods of making them are disclosed. The chemical vapor deposited silicon carbide articles are composed of multiple parts which are joined together by sintered ceramics joints. The joints strengthen and maintain tolerances at the joints of the articles. The articles may be used in semi-conductor processing.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 18, 2008
    Applicants: Rohm and Haas Electronic Materials LLC, AGC Electronic Materials
    Inventors: Michael A. Pickering, Jamie L. Mayer, Kevin D. Lais
  • Publication number: 20080000851
    Abstract: A wafer holding apparatus including a plurality of rods joined at opposite ends to endplates by joints having flanges with a fillet radius. The joints which join the component parts of the apparatus provide a stable wafer holding apparatus for manual handling as well as for the harsh processing conditions of semiconductor wafer processing chambers.
    Type: Application
    Filed: June 1, 2007
    Publication date: January 3, 2008
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Michael Pickering, Jitendra Goela, Jamie Triba, Thomas Payne
  • Publication number: 20070128837
    Abstract: Methods are disclosed for providing reduced particle generating silicon carbide. The silicon carbide articles may be used as component parts in apparatus used to process semiconductor wafers. The reduced particle generation during semiconductor processing reduces contamination on semiconductor wafers thus increasing their yield.
    Type: Application
    Filed: December 1, 2006
    Publication date: June 7, 2007
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra Goela, Nathaniel Brese, Michael Pickering
  • Publication number: 20070084827
    Abstract: Semiconductor processing and equipment are disclosed. The semiconductor equipment and processing provide semiconductor wafers with reduced defects.
    Type: Application
    Filed: October 6, 2006
    Publication date: April 19, 2007
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra Goela, Michael Pickering, James Fahey, Melinda Strickland
  • Patent number: 7018947
    Abstract: Free standing articles of chemical vapor deposited silicon carbide with electrical resistivities of less than 0.9 ohm-cm are provided without substantially degrading its thermal conductivity or other properties.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: March 28, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Patent number: 6939821
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: September 6, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Publication number: 20050145968
    Abstract: An optical article and method of making the same are provided. The optical article has optical multi-aperture operation. The optical article has one or more electrically conductive and selectively passivated patterns.
    Type: Application
    Filed: November 6, 2004
    Publication date: July 7, 2005
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Jitendra Goela, Michael Pickering, Neil Brown, Angelo Chirafisi, Mark LeFebvre, Jamie Triba
  • Patent number: 6872637
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Grant
    Filed: July 16, 2003
    Date of Patent: March 29, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Michael A. Pickering, Jitendra S. Goela
  • Publication number: 20050000412
    Abstract: A chemical vapor deposited, ? phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.
    Type: Application
    Filed: August 2, 2004
    Publication date: January 6, 2005
    Inventors: Nathaniel Brese, Jitendra Goela, Michael Pickering
  • Publication number: 20040229395
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Application
    Filed: June 21, 2004
    Publication date: November 18, 2004
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Patent number: 6811040
    Abstract: A wafer holding apparatus composed of a plurality of rods joined at opposite ends by endplates. Each rod at each end is secured to the endplates by a mechanical dovetail joint. The dovetail joint secures the rods to the endplates without the need for sealing or coating agents. Also, auxiliary mechanical components such as nuts and bolts to secure the joint components need not be employed to secure the joint. Each rod has multiple grooves or slits for placing multiple semiconductor wafers that are to be processed in processing chambers. The wafer holding apparatus is oxidation resistant, chemical resistant and thermal shock resistant.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: November 2, 2004
    Assignee: Rohm and Haas Company
    Inventors: Thomas Payne, Jitendra S. Goela, Lee E. Burns, Michael A. Pickering
  • Patent number: 6811761
    Abstract: A chemical vapor deposited, &bgr; phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal conductivity of the silicon carbide is sufficiently high such that it can be employed as parts of apparatus and components of electrical devices where a high heat load is generated. Such components may include active thermoelectric coolers, heat sinks and fans.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: November 2, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Nathaniel E. Brese, Jitendra S. Goela, Michael A. Pickering
  • Publication number: 20040012024
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Application
    Filed: July 16, 2003
    Publication date: January 22, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Michael A. Pickering, Jitendra S. Goela
  • Patent number: 6648977
    Abstract: Near net shape free standing articles can be produced by chemical vapor deposition techniques when a suitable substrate is suspended in a chemical vapor deposition zone according to the disclosed technique. By suspending such substrates from linear suspension supports such as ropes, cables and wires, multiple near net shape articles can be produced with substantial manufacturing cost savings over previously employed techniques.
    Type: Grant
    Filed: July 17, 2001
    Date of Patent: November 18, 2003
    Assignee: Shipley Company, L.L.C.
    Inventors: Jitendra Singh Goela, Zlatko Salihbegovic, Michael A. Pickering, Mitch Boudreaux
  • Publication number: 20030178735
    Abstract: A process of producing relatively large, dense, free-standing silicon carbide articles by chemical vapor deposition is enabled by the provision of specially designed isolation devices. These devices segregate silicon carbide deposits on the intended portions of substrates, thereby alleviating the need to fracture heavy silicon carbide deposits in order to remove, or otherwise move, the substrate, with the heavy deposit thereon, from the deposition furnace. The isolation devices enable the use of more efficient vertically extended vacuum furnaces. The isolation devices also enable the commercial production of relatively dense, large, thin-walled, silicon carbide shells.
    Type: Application
    Filed: March 22, 2003
    Publication date: September 25, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Jitendra Singh Goela, Michael A. Pickering
  • Publication number: 20030059568
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Application
    Filed: October 24, 2001
    Publication date: March 27, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Michael A. Pickering, Jitendra S. Goela
  • Publication number: 20030036471
    Abstract: An opaque, low resistivity silicon carbide and a method of making the opaque, low resistivity silicon carbide. The opaque, low resistivity silicon carbide is doped with a sufficient amount of nitrogen to provide the desired properties of the silicon carbide. The opaque, low resistivity silicon carbide is a free-standing bulk material that may be machined to form furniture used for holding semi-conductor wafers during processing of the wafers. The opaque, low resistivity silicon carbide is opaque at wavelengths of light where semi-conductor wafers are processed. Such opaqueness provides for improved semi-conductor wafer manufacturing. Edge rings fashioned from the opaque, low resistivity silicon carbide can be employed in RTP chambers.
    Type: Application
    Filed: June 6, 2002
    Publication date: February 20, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Publication number: 20030024888
    Abstract: A wafer holding apparatus composed of a plurality of rods joined at opposite ends by endplates. Each rod at each end is secured to the endplates by a mechanical dovetail joint. The dovetail joint secures the rods to the endplates without the need for sealing or coating agents. Also , auxiliary mechanical components such as nuts and bolts to secure the joint components need not be employed to secure the joint. Each rod has multiple grooves or slits for placing multiple semiconductor wafers that are to be processed in processing chambers. The wafer holding apparatus is oxidation resistant, chemical resistant and thermal shock resistant.
    Type: Application
    Filed: July 9, 2002
    Publication date: February 6, 2003
    Applicant: Rohm and Haas Company
    Inventors: Thomas Payne, Jitendra S. Goela, Lee E. Burns, Michael A. Pickering
  • Patent number: 6464912
    Abstract: Near net shape free standing articles can be produced by chemical vapor deposition techniques when a suitable substrate is suspended in a chemical vapor deposition zone according to the disclosed technique. By suspending such substrates from linear suspension supports such as ropes, cables and wires, multiple near net shape articles can be produced with substantial manufacturing cost savings over previously employed techniques.
    Type: Grant
    Filed: January 6, 1999
    Date of Patent: October 15, 2002
    Assignee: CVD, Incorporated
    Inventors: Jitendra Singh Goela, Zlatko Salihbegovic, Michael A. Pickering, Mitch Boudreaux