Patents by Inventor Michio Hatano
Michio Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128049Abstract: An object of the invention is to provide an electron microscope capable of obtaining a sufficient energy resolution without forming a long drift space and capable of attaining high energy discrimination detection performance with approximately the same device size as in the related art. The electron microscope according to the invention includes a pulsed electron emission mechanism configured to emit an electron beam in a pulsed manner, and discriminates energy of signal electrons by discriminating the signal electrons, which are emitted from a sample by irradiating the sample with the electron beam, according to a time of flight (see FIG. 2).Type: ApplicationFiled: August 31, 2021Publication date: April 18, 2024Inventors: Katsura TAKAGUCHI, Takashi OHSHIMA, Hideo MORISHITA, Yoichi OSE, Junichi KATANE, Toshihide AGEMURA, Michio HATANO
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Publication number: 20240085352Abstract: A risk of breakage of a sample holder can be reduced and a biochemical sample or a liquid sample can be observed easily and with a high observation throughput. A sample holder 101 holding a sample includes: a sample chamber including a first insulating thin film 110 and a second insulating thin film 111 that sandwich and hold the sample 200 in a liquid or gel form and face each other, a vacuum partition wall inside which the sample chamber holding the sample is fixed in a state in which the thin film is exposed to a surrounding atmosphere, and whose internal space is kept at a degree of vacuum at least lower than that of the sample room at the time of observation of the sample, a detection electrode 820 disposed to face the second insulating thin film in a state in which the sample chamber is fixed to the vacuum partition wall, and a signal detection unit 50 connected to the detection electrode.Type: ApplicationFiled: October 10, 2019Publication date: March 14, 2024Inventors: Michio HATANO, Mitsuhiro NAKAMURA, Toshihiko OGURA
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Publication number: 20240079201Abstract: A sample holder reliably holds a liquid or gel sample, and the yield of observation with a charged particle beam device is improved.Type: ApplicationFiled: October 10, 2019Publication date: March 7, 2024Inventors: Michio HATANO, Mitsuhiro NAKAMURA, Toshihiko OGURA
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Patent number: 11538659Abstract: Provided are a charged particle beam device and a detector capable of non-invasively observing a biochemical sample without a staining treatment or an immobilization treatment, with a simple and high observation throughput. An electron optics system, a stage 64, a sample chamber 100 holding a sample and including a first insulating layer 110 that is in contact with the sample, and a conductive layer 120 that is formed on the first insulating layer, signal detection circuits 20 and 50 connected to the conductive layer and detecting a current flowing through the conductive layer, and a main control unit 14 for controlling the electron optics system and the stage, wherein the main control unit 14 irradiates the conductive layer of the sample chamber placed on the stage with an electron beam from the electron optics system and is input with a detection signal from the signal detection circuit.Type: GrantFiled: October 25, 2018Date of Patent: December 27, 2022Assignee: Hitachi High-Tech CorporationInventors: Mitsuhiro Nakamura, Michio Hatano
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Patent number: 11348758Abstract: An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).Type: GrantFiled: February 5, 2019Date of Patent: May 31, 2022Assignee: Hitachi High-Tech CorporationInventors: Anoru Suga, Shuhei Yabu, Kazuki Ishizawa, Michio Hatano
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Patent number: 11348757Abstract: In order to improve a yield of light generated by a collision between secondary electrons and gas molecules, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a sample chamber configured to hold the sample and a gas molecule; a positive electrode configured to form an electric field that accelerates a secondary electron emitted from the sample; a photodetector configured to detect light generated by a collision between the accelerated secondary electron and the gas molecule; and a light condensing unit disposed between the sample and the photodetector, having a light emitting space in which the light is generated, and configured to condense the light generated in the light emitting space on a photodetector side.Type: GrantFiled: July 19, 2018Date of Patent: May 31, 2022Assignee: Hitachi High-Tech CorporationInventors: Shuhei Yabu, Michio Hatano, Shin Imamura, Masaaki Komatsu
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Publication number: 20220044906Abstract: Provided are a charged particle beam device and a detector capable of non-invasively observing a biochemical sample without a staining treatment or an immobilization treatment, with a simple and high observation throughput. An electron optics system, a stage 64, a sample chamber 100 holding a sample and including a first insulating layer 110 that is in contact with the sample, and a conductive layer 120 that is formed on the first insulating layer, signal detection circuits 20 and 50 connected to the conductive layer and detecting a current flowing through the conductive layer, and a main control unit 14 for controlling the electron optics system and the stage, wherein the main control unit 14 irradiates the conductive layer of the sample chamber placed on the stage with an electron beam from the electron optics system and is input with a detection signal from the signal detection circuit.Type: ApplicationFiled: October 25, 2018Publication date: February 10, 2022Inventors: Mitsuhiro NAKAMURA, Michio HATANO
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Publication number: 20210391143Abstract: An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).Type: ApplicationFiled: February 5, 2019Publication date: December 16, 2021Inventors: Anoru SUGA, Shuhei YABU, Kazuki ISHIZAWA, Michio HATANO
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Publication number: 20210272768Abstract: In order to improve a yield of light generated by a collision between secondary electrons and gas molecules, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a sample chamber configured to hold the sample and a gas molecule; a positive electrode configured to form an electric field that accelerates a secondary electron emitted from the sample; a photodetector configured to detect light generated by a collision between the accelerated secondary electron and the gas molecule; and a light condensing unit disposed between the sample and the photodetector, having a light emitting space in which the light is generated, and configured to condense the light generated in the light emitting space on a photodetector side.Type: ApplicationFiled: July 19, 2018Publication date: September 2, 2021Inventors: Shuhei YABU, Michio HATANO, Shin IMAMURA, Masaaki KOMATSU
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Patent number: 10755396Abstract: An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.Type: GrantFiled: February 12, 2018Date of Patent: August 25, 2020Assignee: HITACHI, LTD.Inventors: Momoyo Enyama, Yasuhiro Shirasaki, Michio Hatano, Makoto Sakakibara
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Publication number: 20200225175Abstract: The purpose of the present invention is to provide a multi-coordinated analyzing device that makes it possible to readily observe the same visual field by using a plurality of different kinds of analyzing device and in which observation results for the same visual field are recorded collectively. An analyzing system according to the present invention includes: a first analyzing unit that obtains first observation data by analyzing a sample and that also obtains position information about the analyzed sample; a position setting unit that performs position alignment of the sample on the basis of the position information obtained by the first analyzing unit; and a second analyzing unit that obtains second observation data by analyzing, by using a method different from the method used by the first analyzing unit, the sample placed at the position aligned by the position setting unit (see FIG. 1).Type: ApplicationFiled: March 16, 2018Publication date: July 16, 2020Inventors: Akiko KAGATSUME, Minseok PARK, Momoyo ENYAMA, Yasuhiro SHIRASAKI, Michio HATANO
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Patent number: 10438771Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.Type: GrantFiled: September 22, 2016Date of Patent: October 8, 2019Assignee: Hitachi High-Technologies CorporationInventors: Michio Hatano, Yoshinori Nakayama, Masaru Matsuzaki, Hiroki Kawada, Yoshinori Momonoi, Zhigang Wang
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Patent number: 10262830Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.Type: GrantFiled: November 26, 2014Date of Patent: April 16, 2019Assignee: HITACHI, LTD.Inventors: Daisuke Bizen, Hideo Morishita, Michio Hatano, Hiroya Ohta
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Publication number: 20180232869Abstract: An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.Type: ApplicationFiled: February 12, 2018Publication date: August 16, 2018Inventors: Momoyo ENYAMA, Yasuhiro SHIRASAKI, Michio HATANO, Makoto SAKAKIBARA
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Publication number: 20170263415Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.Type: ApplicationFiled: November 26, 2014Publication date: September 14, 2017Inventors: Daisuke BIZEN, Hideo MORISHITA, Michio HATANO, Hiroya OHTA
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Publication number: 20170092462Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.Type: ApplicationFiled: September 22, 2016Publication date: March 30, 2017Inventors: Michio HATANO, Yoshinori NAKAYAMA, Masaru MATSUZAKI, Hiroki KAWADA, Yoshinori MOMONOI, Zhigang WANG
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Patent number: 9521372Abstract: There is provided a technique to correctly select and measure a pattern to be measured even when contours of the pattern are close to each other in a sample including a plurality of patterns on a substantially same plane. A pattern measuring apparatus that scans a sample with charged particles, forms a detected image by detecting secondary charged particles or backscattered charged particles generated from the sample, and measures a pattern imaged on the detected image includes: an image acquiring section acquiring a plurality of detected images taken at a substantially same location on the sample under different imaging conditions; a contour extracting section extracting a plurality of pattern contours from the plurality of detected images; a contour reconstructing section reconstructing a contour to be measured by combining the plurality of pattern contours; and a contour measuring section making a measurement using the reconstructed contour to be measured.Type: GrantFiled: May 21, 2013Date of Patent: December 13, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yoshinori Momonoi, Koichi Hamada, Yuji Takagi, Michio Hatano, Hideyuki Kazumi
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Patent number: 9472376Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.Type: GrantFiled: February 18, 2013Date of Patent: October 18, 2016Assignee: Hitachi High-Technologies CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hiroshi Makino, Yuzuru Mizuhara, Miki Isawa, Michio Hatano, Yoshinori Momonoi
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Patent number: 9245711Abstract: In observation of a sample having a structure in its depth direction, a charged particle beam apparatus that can form an SEM image reflecting a sample shape at a desired depth by a single image acquisition while avoiding enlargement of the apparatus is provided. The apparatus has: an irradiation optical system for irradiating and scanning a charged particle beam generated from a charged particle source on the sample; a detection optical system having a detector that detects charged particles generated from the sample by the irradiation of the charged particle beam, and converts them into an electric signal at a predetermined sampling period; and an image processing unit for forming an image based on the electric signal from the detector, in which the image processing unit detects a peak of wave height values for each pixel from the electric signal at each sampling time, and forms the image based on the peak of the detected wave height values.Type: GrantFiled: February 4, 2015Date of Patent: January 26, 2016Assignee: Hitachi High-Technologies CorporationInventors: Michio Hatano, Yusuke Abe, Zhigang Wang
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Patent number: 9208994Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.Type: GrantFiled: July 7, 2011Date of Patent: December 8, 2015Assignee: Hitachi High-Technologies CorporationInventors: Takashi Ohshima, Michio Hatano, Hideo Morishita