Patents by Inventor Michio Komatsu

Michio Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210272768
    Abstract: In order to improve a yield of light generated by a collision between secondary electrons and gas molecules, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a sample chamber configured to hold the sample and a gas molecule; a positive electrode configured to form an electric field that accelerates a secondary electron emitted from the sample; a photodetector configured to detect light generated by a collision between the accelerated secondary electron and the gas molecule; and a light condensing unit disposed between the sample and the photodetector, having a light emitting space in which the light is generated, and configured to condense the light generated in the light emitting space on a photodetector side.
    Type: Application
    Filed: July 19, 2018
    Publication date: September 2, 2021
    Inventors: Shuhei YABU, Michio HATANO, Shin IMAMURA, Masaaki KOMATSU
  • Patent number: 11059997
    Abstract: A polishing composition comprising an abrasive grain; a modified microfibril cellulose in which at least a part of the cellulose units has a hydroxyl group at the C6 position oxidized to a carboxyl group; and a dispersion medium, wherein each content of Na and K is 100 ppm or less relative to the solids weight.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: July 13, 2021
    Assignee: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio Komatsu, Yukihiro Iwasaki, Hiroyasu Nishida, Yuji Tawarazako, Kazuhiro Nakayama
  • Publication number: 20210094833
    Abstract: Provided is a production method of a silica particle dispersion liquid which includes, preparing a linked silica particle by adding a liquid A containing alkoxysilane and a liquid B containing an alkali catalyst to a liquid containing water, an organic solvent, and an alkali catalyst in a container. The preparing a linked silica particle includes initially adding an alkali catalyst, the initially adding an alkali catalyst includes decreasing a molar ratio of an alkali catalyst to silica in the liquid in the container to 0.15 to 0.60 by adding the liquid A containing alkoxysilane to the liquid in the container, and increasing the molar ratio by 0.2 or more by adding the liquid B to the liquid having the decreased molar ratio in the container.
    Type: Application
    Filed: September 23, 2020
    Publication date: April 1, 2021
    Inventors: Shogo HAYASHI, Miki Egami, Mitsuaki Kumazawa, Ryo Muraguchi, Michio Komatsu
  • Publication number: 20210094832
    Abstract: A silica particle dispersion liquid includes a silica particle that satisfies (i) to (iii) below: (i) an average particle diameter d is 5 to 300 nm; (ii) an occlusion amount of a basic substance per 1 g of the particle is 2 mg or more; and (iii) a Sears number Y exceeds 12.0.
    Type: Application
    Filed: September 23, 2020
    Publication date: April 1, 2021
    Inventors: Miki EGAMI, Mitsuaki KUMAZAWA, Ryo MURAGUCHI, Michio KOMATSU
  • Patent number: 10920120
    Abstract: A ceria composite particle dispersion has ceria composite particles having an average particle size of 50 to 350 nm and having the features described below. Each ceria composite particle has a mother particle, a cerium-containing silica layer on the surface thereof, and child particles dispersed inside the cerium-containing silica layer, the mother particles being amorphous silica-based and the child particles being crystalline ceria-based. The child particles have a coefficient of variation (CV value) in a particle size distribution of 14 to 40%. The ceria composite particles have a mass ratio of silica to ceria of 100:11-316. Only the crystal phase of ceria is detected when the ceria composite particles are subjected to X-ray diffraction. The average crystallite size of the crystalline ceria measured by subjecting the ceria composite particles to X-ray diffraction is 10 to 25 nm.
    Type: Grant
    Filed: October 6, 2017
    Date of Patent: February 16, 2021
    Assignee: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio Komatsu, Yuji Tawarazako, Shinya Usuda, Kazuhiro Nakayama, Shota Kawakami
  • Publication number: 20210002513
    Abstract: A polishing composition that can not only achieve high polishing speed, but also can improve the surface smoothness (surface quality) of a polished substrate and reduce defects is provided. That is, provided is a polishing composition comprising silica particles and a water soluble polymer, wherein the contained silica particles satisfy the following requirements (a) to (c): (a) the primary particle diameter based on the specific surface area is 5 to 300 nm; (b) the coefficient of variation in the particle diameter is 10% or less; and (c) the Sears number Y is 10.0 to 12.0.
    Type: Application
    Filed: March 28, 2019
    Publication date: January 7, 2021
    Applicant: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Miki EGAMI, Mitsuaki KUMAZAWA, Ryo MURAGUCHI, Michio KOMATSU
  • Patent number: 10844259
    Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: November 24, 2020
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
  • Publication number: 20200354225
    Abstract: Provided is a dispersion containing high-purity silica particles and a method for producing the same. A first solution containing a silane alkoxide and a second solution containing fine bubbles having an average bubble diameter of 40 nm to 10 ?m are mixed. Thus, the silane alkoxide is hydrolyzed without using an alkaline catalyst in a liquid phase containing the fine bubbles, so that uniform silica particles having an average particle size of 3 to 10 nm are produced. Further, hydrolysis is carried out by adding a hydrolyzable metal compound to the dispersion containing the silica particles in the presence of the fine bubbles and the alkaline catalyst. Thus, the silica particles are grown, so that a uniform silica-based particle dispersion containing particles having an average particle size of more than 10 nm and 300 nm or less is produced.
    Type: Application
    Filed: July 16, 2020
    Publication date: November 12, 2020
    Applicant: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio KOMATSU, Hiroyasu NISHIDA
  • Patent number: 10759665
    Abstract: Provided is a dispersion containing high-purity silica particles and a method for producing the same. A first solution containing a silane alkoxide and a second solution containing fine bubbles having an average bubble diameter of 40 nm to 10 ?m are mixed. Thus, the silane alkoxide is hydrolyzed without using an alkaline catalyst in a liquid phase containing the fine bubbles, so that uniform silica particles having an average particle size of 3 to 10 nm are produced. Further, hydrolysis is carried out by adding a hydrolyzable metal compound to the dispersion containing the silica particles in the presence of the fine bubbles and the alkaline catalyst. Thus, the silica particles are grown, so that a uniform silica-based particle dispersion containing particles having an average particle size of more than 10 nm and 300 nm or less is produced.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: September 1, 2020
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Michio Komatsu, Hiroyasu Nishida
  • Patent number: 10730755
    Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: August 4, 2020
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
  • Publication number: 20200109312
    Abstract: An object of the present invention is to provide a nanobubble-containing inorganic oxide fine particle dispersion having excellent concentration stability in a process used as an abrasive. The object is achieved by the nanobubble-containing inorganic oxide fine particle dispersion including: inorganic oxide fine particles having an average particle size of 1 to 500 nm and containing fine particles containing Ce; and nanobubbles having an average cell size of 50 to 500 nm and being at least one non-oxidizing gas selected from a group consisting of N2 and H2.
    Type: Application
    Filed: May 21, 2018
    Publication date: April 9, 2020
    Applicant: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio KOMATSU, Hiroyasu NISHIDA, Kazuhiro NAKAYAMA
  • Publication number: 20200087554
    Abstract: Aiming at providing a ceria-based composite particle dispersion capable of polishing silica film, Si wafer or even hard-to-process material at high polishing rate, and can give high surface accuracy, disclosed is a ceria-based composite particle dispersion that contains a ceria-based composite particle that has an average particle size of 50 to 350 nm, to solve the aforementioned problem, featured by that the ceria-based composite particle has a mother particle, a cerium-containing silica layer, a child particle, and an easily soluble silica-containing layer; the mother particle contains amorphous silica as a major ingredient; the child particle contains crystalline ceria as a major ingredient; ratio of the mass of the easily soluble silica-containing layer relative to the mass of the ceria-based composite particle falls in a specific range; mass ratio of silica and ceria in the ceria-based composite particle falls in a specific range; the ceria-based composite particle, when analyzed by X-ray diffractometry,
    Type: Application
    Filed: May 23, 2018
    Publication date: March 19, 2020
    Inventors: Michio Komatsu, Hiroyasu Nishida, Yuji Tawarazako, Shinya Usuda, Kazuhiro Nakayama
  • Publication number: 20190367777
    Abstract: A polishing composition comprising an abrasive grain; a modified microfibril cellulose in which at least a part of the cellulose units has a hydroxyl group at the C6 position oxidized to a carboxyl group; and a dispersion medium, wherein each content of Na and K is 100 ppm or less relative to the solids weight.
    Type: Application
    Filed: December 28, 2017
    Publication date: December 5, 2019
    Applicant: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio KOMATSU, Yukihiro IWASAKI, Hiroyasu NISHIDA, Yuji TAWARAZAKO, Kazuhiro NAKAYAMA
  • Publication number: 20190345036
    Abstract: Provided is a dispersion containing high-purity silica particles and a method for producing the same. A first solution containing a silane alkoxide and a second solution containing fine bubbles having an average bubble diameter of 40 nm to 10 ?m are mixed. Thus, the silane alkoxide is hydrolyzed without using an alkaline catalyst in a liquid phase containing the fine bubbles, so that uniform silica particles having an average particle size of 3 to 10 nm are produced. Further, hydrolysis is carried out by adding a hydrolyzable metal compound to the dispersion containing the silica particles in the presence of the fine bubbles and the alkaline catalyst. Thus, the silica particles are grown, so that a uniform silica-based particle dispersion containing particles having an average particle size of more than 10 nm and 300 nm or less is produced.
    Type: Application
    Filed: December 26, 2017
    Publication date: November 14, 2019
    Applicant: JGC Catalysts and Chemicals Ltd.
    Inventors: Michio KOMATSU, Hiroyasu NISHIDA
  • Publication number: 20190248668
    Abstract: A ceria composite particle dispersion has ceria composite particles having an average particle size of 50 to 350 nm and having the features described below. Each ceria composite particle has a mother particle, a cerium-containing silica layer on the surface thereof, and child particles dispersed inside the cerium-containing silica layer, the mother particles being amorphous silica-based and the child particles being crystalline ceria-based. The child particles have a coefficient of variation (CV value) in a particle size distribution of 14 to 40%. The ceria composite particles have a mass ratio of silica to ceria of 100:11-316. Only the crystal phase of ceria is detected when the ceria composite particles are subjected to X-ray diffraction. The average crystallite size of the crystalline ceria measured by subjecting the ceria composite particles to X-ray diffraction is 10 to 25 nm.
    Type: Application
    Filed: October 6, 2017
    Publication date: August 15, 2019
    Applicant: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Michio KOMATSU, Yuji TAWARAZAKO, Shinya USUDA, Kazuhiro NAKAYAMA, Shota KAWAKAMI
  • Patent number: 10358353
    Abstract: Silica particles calcined in a calcination step are supplied in a swirling flow generated by a gas introduced in a disintegration container and disintegrated therein, whereby the silica particles can be easily disintegrated and there can be obtained disintegrated silica particles having both low hygroscopicity and high dispersibility in resin. In addition, the introduction of dehumidified air (gas) during the disintegration reduces hygroscopicity and greatly improves dispersibility in resin. Furthermore, performing heating treatment (calcination) again after the disintegration causes the surface modification of the disintegrated silica particles, greatly improving hygroscopicity and dispersibility in resin. The resin composition obtained in this manner including silica particles provides good injectability and filterability when used for an underfill material for semiconductors and an in-plane spacer or sealing spacer of liquid crystal displays.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: July 23, 2019
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Ryo Muraguchi, Miki Egami, Mitsuaki Kumazawa, Masanobu Taniguchi, Tsuguo Koyanagi, Michio Komatsu, Kazutaka Egami
  • Publication number: 20190153279
    Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.
    Type: Application
    Filed: April 5, 2017
    Publication date: May 23, 2019
    Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
  • Patent number: 10143636
    Abstract: A porous silica particle optimized as the scrubbing agent is used for a cleansing cosmetic. The porous silica particle has an average circularity of 0.1 to 0.5, a pore volume of 1.0 to 2.0 ml/g, a mode diameter of 50 to 600 ?m, and a ratio of the maximum particle diameter to the mode diameter of 3.0 or less. The porous silica particle moreover has a median size of 0.5 to 25 ?m and the maximum particle diameter of 1 to 100 ?m, after rubbing with a load of 1.0 to 1.4 KPa for 30 seconds. With the cleansing cosmetic containing this particle, the skin is rubbed by the frictional force generated by the friction with the skin at the rubbing. Therefore, the mild peeling effect for the stratum corneum is obtained and the damage of the skin and the micro damage on the stratum corneum can be prevented.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: December 4, 2018
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Satoshi Watanabe, Naoyuki Enomoto, Yasutaka Miyoshi, Michio Komatsu
  • Publication number: 20180105428
    Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.
    Type: Application
    Filed: March 30, 2016
    Publication date: April 19, 2018
    Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
  • Publication number: 20170312196
    Abstract: A porous silica particle optimized as the scrubbing agent is used for a cleansing cosmetic. The porous silica particle has an average circularity of 0.1 to 0.5, a pore volume of 1.0 to 2.0 ml/g, a mode diameter of 50 to 600 ?m, and a ratio of the maximum particle diameter to the mode diameter of 3.0 or less. The porous silica particle moreover has a median size of 0.5 to 25 ?m and the maximum particle diameter of 1 to 100 ?m, after rubbing with a load of 1.0 to 1.4 KPa for 30 seconds. With the cleansing cosmetic containing this particle, the skin is rubbed by the frictional force generated by the friction with the skin at the rubbing. Therefore, the mild peeling effect for the stratum corneum is obtained and the damage of the skin and the micro damage on the stratum corneum can be prevented.
    Type: Application
    Filed: November 5, 2015
    Publication date: November 2, 2017
    Applicant: JGC Catalysts and Chemicals Ltd.
    Inventors: Satoshi WATANABE, Naoyuki ENOMOTO, Yasutaka MIYOSHI, Michio KOMATSU