Abstract: In the polishing particles each having a core-shell structure, the polishing rate can be controlled by adjusting the thickness and/or density of the shell portion. The polishing particles having the core-shell structure with the average diameter (D) in the range from 5 to 300 nm, and the shell portion of the polishing particles comprises silica with the thickness (ST) in the range from 1 to 50 nm, and the density of the shell portion is in the range from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.

Abstract: A transparent film-coated substrate is provided which has a transparent film having a low refractive index, and a less shrinking property; and being excellent in adhesiveness to a substrate or a transparent electroconductive film formed on the substrate, and in the film strength, the water resistance, the chemical resistance, and so forth.

Abstract: There is provided a process for producing an integrated circuit, wherein not only can conductive fine particles be deposited efficiently and densely in minute wiring channels and connecting holes but also a circuit of low wiring resistance and high density can be formed and wherein a high-degree integration can be achieved to thereby bring about an economic advantage. In particular, there is provided a process for producing an integrated circuit, comprising coating a substrate provided with wiring channels with a coating liquid for integrated circuit formation containing conductive fine particles to thereby form an integrated circuit on the substrate, wherein the coating liquid for integrated circuit formation while being exposed to ultrasonic waves is applied to the wiring channels.

Abstract: The first photoelectric cell of the present invention comprises: an insulating base having on its surface an electrode layer (1), the electrode layer (1) having on its surface a metal oxide semiconductor film (2) on which a photosensitizer is adsorbed; an insulating base having on its surface an electrode layer (3), the electrode layer (1) and the electrode layer (3) arranged opposite to each other; and an electrolyte sealed between the metal oxide semiconductor film (2) and the electrode layer (3), wherein at least one of the electrode-having insulating bases is transparent; and the metal oxide semiconductor film (2) comprises anatase titanium oxide particles. This first photoelectric cell includes a semiconductor film comprising anatase titanium oxide particles, having a high proportion of photosensitizer adsorbed, so that the electron mobility in the semiconductor film is high to thereby realize excellent photoelectric transfer efficiency.

Abstract: The present invention provides a method for forming a silica-containing film with a low-dielectric constant of 3 or less on a semiconductor substrate steadily, which comprises steps of (a) applying a coating liquid for forming the silica-containing film with the low-dielectric constant onto the semiconductor substrate, (b) heating the thus coated film at 50 to 350° C., and then (c) curing the thus treated film at 350 to 450° C. in an inert-gas atmosphere containing 500 to 15,000 ppm by volume of oxygen, and also provides a semiconductor substrate having a silica-containing film formed by the above method. The above step (b) for the thermal treatment is preferably conducted at 150 to 350° C. for 1 to 3 minutes in an air atmosphere. Also, the above curing step (c) is preferably conducted by placing the semiconductor substrate on a hot plate kept at 350 to 450° C.

Abstract: A coating liquid for forming a transparent coating comprising fine particles of an inorganic compound and a hydrolyzate of an organosilicon compound represented by the general formula (I): RnSi(OR′)4−n  (I) wherein R and R′ represent organic groups which may be identical to each other or different from each other, and n is an integer of 1 to 3. This coating liquid ensures excellent substrate wettability and compatibility with various organic solvents so that the printability and applicability thereof are desirable, with the result that a transparent coating film of high uniformity, for example, a flattening coating film, can be formed. The present invention comprises a substrate having a transparent coating film formed on the substrate surface from the above coating liquid.

Abstract: A photovoltaic cell including a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second layer are opposite each other with an electrolyte layer disposed therebetween. The electrolyte layer includes an electrolyte and a liquid crystal and at least one of the electrode-layer-having substrates is transparent.

Abstract: Silica particles for polishing to planarize a surface of a substrate without generating scratches, having the average particle diameter in the range from 5 to 300 nm, carbon content in the range from 0.5 to 5 weight %, and 10%-compressive elasticity modulus in the range from 500 to 3000 kgf/mm2. When the carbon content in the silica particles is less than 0.5 weight %, there is no residual alkoxy group and siloxane bonding proceeds, so that the obtained particles are hard. In that case, although the polishing rate is high, scratches remain or are generated anew after polishing, and planarity of the polished surface is insufficient. On the other hand, when the carbon content is over 5 weight %, many residual alkoxy group are contained in the particles, so that the particles are relatively soft and a sufficient polishing rate can not be achieved.

Abstract: The present invention provides amorphous inorganic particles as a dental material comprising silica and inorganic oxide(s) other than silica and having high x-ray impermeability. The inorganic particles as a dental material comprise silica with the content in the range from 70 to 98 weight % and oxide(s) of one or more elements selected from the group consisting of Zr, Ti, La, Ba, Sr, Hf, Y, Zn, AL, and B, wherein 5 to 70 weight % of the silica is originated from an acidic silicic acid solution and 30 to 95 weight % of the silica is originated from a sol of silica. This inorganic particles as a dental material have average particle diameter in the range from 1 to 10 &mgr;m, specific surface area in the range from 50 to 350 m2/g, pore volume in the range from 0.05 to 0.5 ml/g, amorphous crystallinity as observed by x-ray diffraction, and the refractive index in the range from 1.47 to 1.60.

Abstract: A coating liquid for forming a silica-based film having a low dielectric constant, as low as 3 or less, comprising (i) silica-based fine particles having phenyl groups and (ii) a polysiloxazane which can be produced by reacting hydrolyzate of an alkoxysilane represented by the formula (XnSi(OR1)4−n)and/or hydrolyzate of a halogenated silane represented by the formula (XnSiX′4−n) with a polysilazane represented by —(SiR2R4—NR3)—m, or a coating-liquid for forming the silica-based film, comprising (i) silica-based fine particles having phenyl groups and (ii′) an oxidatively decomposable resin with the weight ratio of the particles to the resin being in the range of 0.5 to 5.

Abstract: The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.

Abstract: A photoelectric cell that includes a first insulating base, having on its surface a first electrode layer, which has on its surface a metal oxide semiconductor film, which includes anatase titanium oxide particles, on which a photosensitizer is adsorbed and a second insulating base having on its surface a second electrode layer and an electrolyte sealed between the metal oxide semiconductor film and the second electrode layer. The first electrode layer and the second electrode layer are arranged opposite from each other. At least one of the first and second insulating bases with an electrode layer is transparent.

Abstract: The invention provides a recording sheet having an ink-receiving layer, which comprises a substrate sheet and an ink-receiving layer formed thereon, said ink-receiving layer comprising oxide particles, wherein the ink-receiving layer has pores having a diameter in the range of 3.4 to 2,000 nm, the pore volume of pores having a diameter of 3.4 to 30 nm is in the range of 0.2 to 1.8 ml/g, and the pore volume of pores having a diameter of 30 to 2,000 nm is in the range of 0.1 to 1.5 ml/g. It is preferable that the oxide particles have an average particle diameter of 2 to 1,000 nm and are a mixture of hydrophobic oxide particles and hydrophilic oxide particles. This recording sheet shows sufficient strength, has excellent printability such that images of uniform density and high sharpness can be printed thereon without bleeding, and is excellent in water resistance, weathering resistance and fading resistance.

Abstract: The present invention provides a method for forming a silica-containing film with a low-dielectric constant of 3 or less on a semiconductor substrate steadily, which comprises steps of (a) applying a coating liquid for forming the silica-containing film with the low-dielectric constant onto the semiconductor substrate, (b) heating the thus coated film at 50 to 350° C., and then (c) curing the thus treated film at 350 to 450° C. in an inert-gas atmosphere containing 500 to 15,000 ppm by volume of oxygen, and also provides a semiconductor substrate having a silica-containing film formed by the above method.

Abstract: A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula XnSi(OR)4-n or a halogenated silane of the formula XnSiX′4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10.

Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant, which enables the formation of a low-density film having a dielectric constant as low as 3 or less and being excellent not only in resistance of oxygen plasma and in process adaptation but also in adhesion to a substrate and in film strength, is provided. A substrate coated with the silica-containing film having the above characteristics, which is obtained by the use of the above coating liquid, is further provided.

Abstract: The invention provides a recording sheet having an ink-receiving layer, which comprises a substrate sheet and an ink-receiving layer formed thereon, said ink-receiving layer comprising oxide particles, wherein the ink-receiving layer has pores having a diameter in the range of 3.4 to 2,000 nm, the pore volume of pores having a diameter of 3.4 to 30 nm is in the range of 0.2 to 1.8 ml/g, and the pore volume of pores having a diameter of 30 to 2,000 nm is in the range of 0.1 to 1.5 ml/g. It is preferable that the oxide particles have an average particle diameter of 2 to 1,000 nm and are a mixture of hydrophobic oxide particles and hydrophilic oxide particles. This recording sheet shows sufficient strength, has excellent printability such that images of uniform density and high sharpness can be printed thereon without bleeding, and is excellent in water resistance, weathering resistance and fading resistance.

Abstract: An organopolysiloxane fine particle comprising as a principal component a polysiloxane having a hydrocarbon group (a) directly bonded to a silicon atom and having an OH group (b) directly bonded to a silicon atom, wherein: (i) carbons contained in the hydrocarbon group (a) constitute 5 to 35% of the weight of the organopolysiloxane fine particles, and (ii) the OH group (b) is in an amount of 1 to 8 meq per g of the organopolysiloxane fine particles, the organopolysiloxane fine particles having: (iii) a 10% compressive modulus of elasticity of 150 to 900 Kg/mm2, (iv) an average compressive deformation (Cr)m of 20 to 60%, (v) an average elastic recovery (Rr)m of 60 to 90%, and (vi) an average particle diameter of 0.5 to 50 &mgr;m.

Abstract: A coating liquid for forming a transparent coating, comprising fine particles of an inorganic compound, and a hydrolyzate of an organosilicon compound represented by the general formula (I):

Abstract: The present invention relates to spherical laminated particles each comprising a core particle and a laminate part disposed on a surface of the core particle, wherein the laminate part has a compressive modulus which is smaller than that of the core particle. These spherical laminated particles have a large compressive strength and is excellent in the recovery from a deformation by an arbitrary load, when the load is removed afterwward, as compared with conventional elastic particles composed of a single substance. Therefore, the use of these spherical laminated particles as spacers minimizes the difference in extent of displacement of spacer particles attributed to the difference in load on individual spacer particles caused by, for example, the waviness of a substrate for liquid crystal display cell during the manufacturing of the liquid crystal display cell, so that the cell gap uniformity can be ensured.