Ming Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: A method, for making a semiconductor device, includes forming a first fin over a substrate. The method includes forming a dummy gate stack on the first fin. The method includes forming a first gate spacer along a side of the dummy gate stack. The first gate spacer includes a first dielectric material. The method includes forming a second gate spacer along a side of the first gate spacer. The second gate spacer includes a semiconductor material. The method includes forming a source/drain region in the first fin adjacent the second gate spacer. The method includes removing at least a portion of the second gate spacer to form a void extending between the first gate spacer and the source/drain region.
Abstract: A brushless DC motor control device for a ceiling fan is electrically connected to a brushless DC motor and includes at least one switch, a processor, and a driving module. The processor includes at least one detection module and a processing module. The switch transmits a switch signal to the detection module for detection. After the detection module detects an operating electric potential and a normal electric potential of the switch signal, the detection module outputs a detection signal to the processing module. The processing module outputs a control signal to the driving module, so that the driving module transmits a driving signal to the brushless DC motor to control the rotational speed, stop and rotational direction of the brushless DC motor.
Abstract: A method of manufacturing a semiconductor device based on a dual-architecture-compatible design includes: forming transistor components of in a transistor (TR) layer; and performing one of fabricating additional components according to (A) a buried power rail (BPR) type of architecture or (B) a non-buried power rail (non-BPR) type of architecture. The step (A) includes, in corresponding sub-TR layers, forming various non-dummy sub-TR structures, and, in corresponding supra-TR layers, forming various dummy supra-TR structures which are corresponding first artifacts. The step (B) includes, in corresponding supra-TR layers, forming various non-dummy supra-TR structures and forming various dummy supra-TR structures which are corresponding second artifacts, the first and second artifacts resulting from the dual-architecture-compatible design being suitable to adaptation into the BPR type of architecture.
Abstract: Disclosed is an open loop fractional frequency divider including an integer divider, a control circuit, and a phase interpolator. The integer divider processes an input clock according to the setting of a target frequency to generate a first frequency-divided clock and a second frequency-divided clock. The control circuit generates a coarse-tune control signal and a fine-tune control signal according to the setting. The phase interpolator generates an output clock according to the first frequency-divided clock, the second frequency-divided clock, and the two control signals. The two control signals are used for determining a first current, and their reversed signals are used for determining a second current. The phase interpolator controls a contribution of the first (second) frequency-divided clock to the generation of the output clock according to the first (second) frequency-divided clock, the reversed signal of the first (second) frequency-divided clock, and the first (second) current.
Abstract: A method includes providing a structure having transistors, an isolation structure over the transistors, metal plugs through the isolation structure and connecting to the transistors, and a trench with the isolation structure and the metal plugs as sidewalls. The method further includes forming a dielectric liner on the sidewalls of the trench and over the isolation structure and the metal plugs. The dielectric liner is thicker at an opening portion of the trench than at another portion of the trench so that an air gap is formed inside the trench and the air gap is surrounded by the dielectric liner. The method further includes depositing a sacrificial layer over the dielectric liner and over the air gap and performing CMP to remove the sacrificial layer and to recess the dielectric liner until the isolation structure and the metal plugs are exposed. The air gap remains inside the trench.
May 29, 2020
December 2, 2021
Chun-Yuan Chen, Huan-Chieh Su, Cheng-Chi Chuang, Yu-Ming Lin, Chih-Hao Wang
Abstract: A method includes providing a structure having a gate stack; first gate spacers; a second gate spacer over one of the first gate spacers and having an upper portion over a lower portion; a dummy spacer; an etch stop layer; and a dummy cap. The method further includes removing the dummy cap, resulting in a first void above the gate stack and between the first gate spacers; removing the dummy spacer, resulting in a second void above the lower portion and between the etch stop layer and the upper portion; depositing a layer of a decomposable material into the first and the second voids; depositing a seal layer over the etch stop layer, the first and the second gate spacers, and the layer of the decomposable material; and removing the layer of the decomposable material, thereby reclaiming at least portions of the first and the second voids.
Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a substrate having a first semiconductor material. A second semiconductor material is disposed on the first semiconductor material. The second semiconductor material is a group IV semiconductor or a group III-V compound semiconductor. A passivation layer is disposed on the second semiconductor material. The passivation layer includes the first semiconductor material. A first doped region and a second doped region extend through the passivation layer and into the second semiconductor material.
Abstract: Various examples of an integrated circuit device and a method for forming the device are disclosed herein. In an example, a method includes receiving a workpiece that includes a substrate, and a device fin extending above the substrate. The device fin includes a channel region. A portion of the device fin adjacent the channel region is etched, and the etching creates a source/drain recess and forms a dielectric barrier within the source/drain recess. The workpiece is cleaned such that a bottommost portion of the dielectric barrier remains within a bottommost portion of the source/drain recess. A source/drain feature is formed within the source/drain recess such that the bottommost portion of the dielectric barrier is disposed between the source/drain feature and a remainder of the device fin.
August 9, 2021
December 2, 2021
Feng-Ching Chu, Wei-Yang Lee, Yen-Ming Chen, Feng-Cheng Yang
Abstract: A display panel including horizontal signal lines, vertical signal lines intersecting the horizontal signal lines, first transmission lines and second transmission lines is provided. The horizontal signal lines are divided into a first horizontal signal line group and an adjacent second horizontal signal line group. Each of the first and second horizontal signal line groups includes N horizontal lines, wherein N is a positive integer. The first transmission lines are positioned at a first side of the vertical signal lines and respectively connected to the N horizontal signal lines in the first horizontal signal line group in a first tendency. The second transmission lines are positioned at a second, opposite side of the vertical signal lines and respectively connected to the N horizontal signal lines in the second horizontal signal line group in a second tendency. The first tendency is opposite to the second tendency.
Abstract: The present disclosure provides a rehabilitation training equipment and a rehabilitation training system. The rehabilitation training equipment includes a driving device, a back placement device, a leg aid device, a cushion device, a first feedback device, and a control device. The driving device is configured to adjust rotation angles between the back placement device, the cushion device, and the leg aid device to achieve a posture training mode selected from a plurality of posture training modes including a standing mode, a sitting-up mode, and a lying mode. The first feedback device is used to obtain core muscle strength parameters of the human body. The control device is electrically connected to the first feedback device and the driving device, and is configured to obtain the core muscle strength parameters and send a control signal to the driving device.
May 28, 2021
December 2, 2021
Junwei Hao, Haijie Liu, Teng Chen, Dongshan Wan, Fei Wang, Fang Xu, Ming Lin
Abstract: An embodiment method includes: forming fins extending from a semiconductor substrate; depositing an inter-layer dielectric (ILD) layer on the fins; forming masking layers on the ILD layer; forming a cut mask on the masking layers, the cut mask including a first dielectric material, the cut mask having first openings exposing the masking layers, each of the first openings surrounded on all sides by the first dielectric material; forming a line mask on the cut mask and in the first openings, the line mask having slot openings, the slot openings exposing portions of the cut mask and portions of the masking layers, the slot openings being strips extending perpendicular to the fins; patterning the masking layers by etching the portions of the masking layers exposed by the first openings and the slot openings; and etching contact openings in the ILD layer using the patterned masking layers as an etching mask.
Abstract: A method includes depositing a first passivation layer over a conductive feature, wherein the first passivation layer has a first dielectric constant, forming a capacitor over the first passivation layer, and depositing a second passivation layer over the capacitor, wherein the second passivation layer has a second dielectric constant greater than the first dielectric constant. The method further includes forming a redistribution line over and electrically connecting to the capacitor, depositing a third passivation layer over the redistribution line, and forming an Under-Bump-Metallurgy (UBM) penetrating through the third passivation layer to electrically connect to the redistribution line.
Abstract: Methods and systems for training a neural network include generate an image of a mask. A copy of an image is generated from an original set of training data. The copy is altered to add the image of a mask to a face detected within the copy. An augmented set of training data is generated that includes the original set of training data and the altered copy. A neural network model is trained to recognize masked faces using the augmented set of training data.
Abstract: A slurry composition, a polishing method and an integrated circuit are provided. The slurry composition includes a slurry and at least one rheology modifier. The slurry includes at least one liquid carrier, at least one abrasives and at least one oxidizer. The rheology modifier is dispensed in the slurry. The polishing method includes using the slurry composition with the rheology modifier to polish a conductive layer.
Abstract: A system and a method for uniformed surface measurement are provided, in which a sensor is provided to perform measurements on a carrier in a polishing machine, and a measuring trajectory of the sensor on the carrier is adjusted by controlling the pivoting of a sensor carrier carrying the sensor and the rotation of a rotating platform in the polishing machine in order to achieve uniformed surface measurements of the carrier and real-time constructions of the surface topography. This allows the polishing state of the carrier to be monitored in real time, thereby improving the efficiency of the polishing process. A sensing apparatus for uniformed surface measurement is also provided.
Abstract: A touch substrate, a method for manufacturing a touch substrate, and a touch display device are provided. The touch substrate includes: a base substrate having a first surface; a first over coat layer on the first surface; a first touch electrode on the first over coat layer; and a second over coat layer on the first touch electrode, wherein the first touch electrode is located between the first over coat layer and the second over coat layer, and the second over coat layer covers at least the first touch electrode, and wherein an area of at least one of the first over coat layer and the second over coat layer is less than an area of the first surface in the touch area.
Abstract: In a quality control method applied in manufacturing, product information of a product is obtained. Manufacturing parameters corresponding to the product information are queried. The manufacturing parameters are input into a product quality prediction model which is trained to obtain the value of at least one quality inspection of each product. If such quality inspection value is not equal to a standard value or is not within a standard value range, an incorrect manufacturing parameter is identified from all the manufacturing parameters applicable to each product, the incorrect manufacturing parameter being output when identified.
Abstract: A mitral valve prosthesis, a tricuspid valve prosthesis and a stent thereof. The stent is configured to support the heart valves of the mitral valve prosthesis and has a contracted configuration for delivery and an expanded configuration for deployment. The stent comprises, along its axial direction, an inflow section, a transition section and an outflow section, and the transition section is connected to the inflow section at one end and to the outflow section at the other end. When in the expanded configuration, the inflow section is located upstream of the outflow section with respect to the blood flow direction. The inflow section is less radially rigid than the outflow section and/or the transition section. Due to such a small radial rigidity, the inflow section can well adapt itself to the anatomy of the native mitral annulus.
Abstract: A blood pump (20) includes a stator assembly comprising a motor stator (52), a fluid inlet (24), and a fluid outlet (26). A rotor assembly includes a motor rotor (54) and an impeller (40) rotatable about an axis (44) to move fluid from the inlet (24) to the outlet (26). An outflow sheath (300) directs the flow along the outside of the pump (20).
December 17, 2018
Date of Patent:
November 30, 2021
THE CLEVELAND CLINIC FOUNDATION, FOSTER-MILLER, INC.
William A. Smith, Markus Lorenz, David Dudzinski, Hsiang Ming Chen, Peter A. Chapman, Jr., Charles J. Prisco, Nicholas G. Vitale, Stephan Weber
Abstract: The present disclosure provides an imaging optical lens assembly, including, in order from an object side to an image side: a first lens element with negative refractive power having an object-side surface being concave in a paraxial region, a second lens element with positive refractive power, a third lens element with negative refractive power, a fourth lens element with positive refractive power, and a fifth lens element with negative refractive power having an image-side surface being concave in a paraxial region and at least one convex shape in an off-axial region on the image-side surface, wherein the imaging optical lens assembly has a total of five lens elements.