Abstract: A memory device includes a memory circuit and a fuse protection circuit. The memory circuit includes a memory cell and a program line. The memory cell includes a fuse. The program line is configured to receive a program voltage for programming the fuse. The fuse protection circuit is coupled to the memory circuit and is configured to prevent unintentional programming of the fuse.

Abstract: A diode includes a first plurality of combo fins having lengthwise directions parallel to a first direction, wherein the first plurality of combo fins comprises portions of a first conductivity type. The diodes further includes a second plurality of combo fins having lengthwise directions parallel to the first direction, wherein the second plurality of combo fins includes portions of a second conductivity type opposite the first conductivity type. An isolation region is located between the first plurality of combo fins and the second plurality of combo fins. The first and the second plurality of combo fins form a cathode and an anode of the diode. The diode is configured to have a current flowing in a second direction perpendicular to the first direction, with the current flowing between the anode and the cathode.

Abstract: A memory device includes a memory circuit and a fuse protection circuit. The memory circuit includes a memory cell and a program line. The memory cell includes a fuse. The program line is configured to receive a program voltage for programming the fuse. The fuse protection circuit is coupled to the memory circuit and is configured to prevent unintentional programming of the fuse.

Abstract: A memory device includes a memory circuit and a fuse protection circuit. The memory circuit includes a memory cell and a program line. The memory cell includes a fuse. The program line is configured to receive a program voltage for programming the fuse. The fuse protection circuit is coupled to the memory circuit and is configured to prevent unintentional programming of the fuse.

Abstract: A method comprises forming an active region including a first fin and a second fin over a substrate, wherein the first fin and the second fin are separated by an isolation region, depositing an epitaxial growth block layer over the active region, patterning the epitaxial growth block layer to define a first growth area and a second growth area and growing an N+ region in the first growth area and a P+ region in the second growth area.

Abstract: A memory device includes a memory circuit and a fuse protection circuit. The memory circuit includes a memory cell and a program line. The memory cell includes a fuse. The program line is configured to receive a program voltage for programming the fuse. The fuse protection circuit is coupled to the memory circuit and is configured to prevent unintentional programming of the fuse.

Abstract: The present disclosure provides a three dimensional integrated circuit having a plurality of dies. Each die includes a trigger line common to the other dies, and an ESD detection circuit coupled to the common trigger line and to a first power line common to the other dies, wherein when the ESD detection circuit of one of the plural dies detects an ESD event, the ESD detection circuit is configured to generate a control signal to the common trigger line to control a power clamp in each of the plural dies to clamp an ESD event to the common first power line or a second power line.

Abstract: A semiconductor arrangement includes a well region and a first region disposed within the well region. The first region includes a first conductivity type. The semiconductor arrangement includes a first gate disposed above the well region on a first side of the first region. The first gate includes a first top surface facing away from the well region. The first top surface has a first top surface area. The semiconductor arrangement includes a first gate contact disposed above the first gate. The first gate contact includes a first bottom surface facing towards the well region. The first bottom surface has a first bottom surface area. The first bottom surface area covers at least about two thirds of the first top surface area.

Abstract: An electrostatic discharge (ESD) testing structure includes a measurement device in a first die. The ESD testing structure further includes a fuse in a second die. The ESD testing structure further includes a plurality of bonds electrically connecting the first die to the second die, wherein a first bond of the plurality of bonds electrically connects the fuse to the measurement device.

Abstract: An Electro-Static Discharge (ESD) protection circuit includes a plurality of groups of p-type heavily doped semiconductor strips (p+ strips) and a plurality of groups of n-type heavily doped semiconductor strips (n+ strips) forming an array having a plurality of rows and columns. In each of the rows and the columns, the plurality of groups of p+ strips and the plurality of groups of n+ strips are allocated in an alternating layout. The ESD protection circuit further includes a plurality of gate stacks, each including a first edge aligned to an edge of a group in the plurality of groups of p+ strips, and a second edge aligned to an edge of a group in the plurality of groups of n+ strips.

Abstract: Embodiments of the present disclosure are a semiconductor device, a FinFET device, and a method of forming a FinFET device. An embodiment is a semiconductor device comprising a first semiconductor fin extending above a substrate, a first source region on the first semiconductor fin, and a first drain region on the first semiconductor fin. The first source region has a first width and the first drain region has a second width with the second width being different than the first width.

Abstract: A chip includes a first die, a second die, a first and a second through-silicon vias, a first protection circuit, and a second protection circuit. The first die has a first operational voltage node and a first reference voltage node. The second die has a second operational voltage node and a second reference voltage node. The first and the second through-silicon vias are configured to couple the first die and the second die. The first protection circuit is coupled between the first operational voltage node and the first through-silicon via. The second protection circuit is coupled between the first reference voltage node and the second through-silicon via. The first through-silicon via is further coupled to the second reference voltage node or the second operational voltage node. The second through-silicon via is further coupled to the first reference voltage node or the first operational voltage node.

Abstract: A method includes removing a first portion of a gate layer of a first transistor and leaving a second portion of the gate layer. The first transistor includes a drain region, a source region, and a gate stack, and the gate stack includes a gate dielectric layer, a gate conductive layer over the gate dielectric layer, and the gate layer directly on the gate conductive layer. The method includes removing a gate layer of a second transistor and forming a conductive region at a region previously occupied by the first portion of the gate layer of the first transistor, the unit resistance of the conductive region being less than that of the gate layer of the first transistor.

Abstract: An Electro-Static Discharge (ESD) protection circuit includes a plurality of groups of p-type heavily doped semiconductor strips (p+ strips) and a plurality of groups of n-type heavily doped semiconductor strips (n+ strips) forming an array having a plurality of rows and columns. In each of the rows and the columns, the plurality of groups of p+ strips and the plurality of groups of n+ strips are allocated in an alternating layout. The ESD protection circuit further includes a plurality of gate stacks, each including a first edge aligned to an edge of a group in the plurality of groups of p+ strips, and a second edge aligned to an edge of a group in the plurality of groups of n+ strips.

Abstract: A semiconductor arrangement includes a well region and a first region disposed within the well region. The first region includes a first conductivity type. The semiconductor arrangement includes a first gate disposed above the well region on a first side of the first region. The first gate includes a first top surface facing away from the well region. The first top surface has a first top surface area. The semiconductor arrangement includes a first gate contact disposed above the first gate. The first gate contact includes a first bottom surface facing towards the well region. The first bottom surface has a first bottom surface area. The first bottom surface area covers at least about two thirds of the first top surface area.

Abstract: A semiconductor arrangement includes a well region and a first region disposed within the well region. The first region includes a first conductivity type. The semiconductor arrangement includes a first gate disposed above the well region on a first side of the first region. The first gate includes a first top surface facing away from the well region. The first top surface has a first top surface area. The semiconductor arrangement includes a first gate contact disposed above the first gate. The first gate contact includes a first bottom surface facing towards the well region. The first bottom surface has a first bottom surface area. The first bottom surface area covers at least about two thirds of the first top surface area.

Abstract: In some embodiments, a method includes providing an input voltage to a level-shifting circuit, where the input voltage is in a first power domain, shifting the input voltage to an output voltage using the level-shifting circuit, where the output voltage is in a second power domain different from the first power domain, and where the level-shifting circuit is coupled to power supply voltages in the second power domain. The method further includes in response to an electrostatic discharge (ESD) event, turning off a first transistor coupled between a first node of the level-shifting circuit and a reference low voltage level of the second power domain.

Abstract: Methods and apparatus for increased holding voltage SCRs. A semiconductor device includes a semiconductor substrate of a first conductivity type; a first well of the first conductivity type; a second well of a second conductivity type adjacent to the first well, an intersection of the first well and the second well forming a p-n junction; a first diffused region of the first conductivity type formed at the first well and coupled to a ground terminal; a first diffused region of the second conductivity type formed at the first well; a second diffused region of the first conductivity type formed at the second well and coupled to a pad terminal; a second diffused region of the second conductivity type formed in the second well; and a Schottky junction formed adjacent to the first diffused region of the second conductivity type coupled to a ground terminal. Methods for forming devices are disclosed.

Abstract: A P-type Metal-Oxide-Semiconductor Field Effect Transistor (PMOSFET) includes a gate, a first source/drain region connected to the gate, and a second source/drain region on an opposite side of the gate than the first source/drain region. A first Schottky diode includes a first anode connected to the first source/drain region, and a first cathode connected to a body of the PMOSFET. A second Schottky diode includes a second anode connected to the second source/drain region, and a second cathode connected to the body of the PMOSFET.

Abstract: In some embodiments, a method includes providing an input voltage to a level-shifting circuit, where the input voltage is in a first power domain, shifting the input voltage to an output voltage using the level-shifting circuit, where the output voltage is in a second power domain different from the first power domain, and where the level-shifting circuit is coupled to power supply voltages in the second power domain. The method further includes in response to an electrostatic discharge (ESD) event, turning off a first transistor coupled between a first node of the level-shifting circuit and a reference low voltage level of the second power domain.