Patents by Inventor Minoru Yamazaki
Minoru Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11894211Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.Type: GrantFiled: July 2, 2019Date of Patent: February 6, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Erina Kawamoto, Soichiro Matsunaga, Souichi Katagiri, Keigo Kasuya, Takashi Doi, Tetsuya Sawahata, Minoru Yamazaki
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Publication number: 20230095456Abstract: Roughness measurement corrects a machine difference utilizing first PSD data indicating power spectral density of a line pattern measured for a line pattern formed on a wafer for machine difference management by a reference machine in roughness index calculation and second PSD data indicating power spectral density of a line pattern measured for the line pattern formed on the wafer for machine difference management by a correction target machine are used to obtain a correction method for correcting the power spectral density of the second PSD data to the power spectral density of the first PSD data, power spectral density of a line pattern is measured as third PSD data from a scanning image of the line pattern, and corrected power spectral density obtained by correcting the power spectral density of the third PSD data by the obtained correction method is calculated.Type: ApplicationFiled: March 30, 2020Publication date: March 30, 2023Applicant: Hitachi High-Tech CorporationInventors: Daisuke BIZEN, Kei SAKAI, Junichi KAKUTA, Masumi SHIRAI, Minoru YAMAZAKI
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Publication number: 20220351934Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.Type: ApplicationFiled: July 2, 2019Publication date: November 3, 2022Applicant: Hitachi High-Tech CorporationInventors: Erina KAWAMOTO, Soichiro MATSUNAGA, Souichi KATAGIRI, Keigo KASUYA, Takashi DOI, Tetsuya SAWAHATA, Minoru YAMAZAKI
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Patent number: 11456150Abstract: A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided.Type: GrantFiled: March 24, 2021Date of Patent: September 27, 2022Assignee: Hitachi High-Tech CorporationInventors: Kaori Bizen, Yuzuru Mizuhara, Minoru Yamazaki, Daisuke Bizen, Noritsugu Takahashi
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Patent number: 11257658Abstract: An object of the invention is to correct an aberration or a defocus of an electron beam for irradiation, and control an influence on a deflector by a fluctuation in an electric field of an electrostatic lens. The invention provides a charged particle beam apparatus including a deflector that deflects a charged particle beam with which a specimen is irradiated, an objective lens that focuses the charged particle beam on the specimen, an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting the aberration or the defocus of the charged particle beam is applied, and an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.Type: GrantFiled: September 17, 2019Date of Patent: February 22, 2022Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Noritsugu Takahashi, Makoto Sakakibara, Makoto Suzuki, Minoru Yamazaki
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Patent number: 11152186Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.Type: GrantFiled: March 15, 2019Date of Patent: October 19, 2021Assignee: Hitachi High-Tech CorporationInventors: Wataru Yamane, Minoru Yamazaki, Yuko Sasaki, Wataru Mori, Takashi Doi
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Publication number: 20210313140Abstract: A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided.Type: ApplicationFiled: March 24, 2021Publication date: October 7, 2021Inventors: Kaori BIZEN, Yuzuru MIZUHARA, Minoru YAMAZAKI, Daisuke BIZEN, Noritsugu TAKAHASHI
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Patent number: 10991542Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.Type: GrantFiled: January 27, 2017Date of Patent: April 27, 2021Assignee: Hitachi High-Tech CorporationInventors: Ryota Watanabe, Yuko Sasaki, Kazunari Asao, Makoto Suzuki, Wataru Mori, Minoru Yamazaki
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Patent number: 10991543Abstract: The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.Type: GrantFiled: July 12, 2019Date of Patent: April 27, 2021Assignee: Hitachi High-Tech CorporationInventors: Shunsuke Mizutani, Yuuji Kasai, Minoru Yamazaki, Makoto Suzuki
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Patent number: 10770266Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.Type: GrantFiled: June 10, 2019Date of Patent: September 8, 2020Assignee: Hitachi High-Tech CorporationInventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
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Patent number: 10692687Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.Type: GrantFiled: January 18, 2019Date of Patent: June 23, 2020Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wen Li, Shinichi Murakami, Hiroyuki Takahashi, Yuko Sasaki, Minoru Yamazaki, Hajime Kawano
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Publication number: 20200105501Abstract: An object of the invention is to correct an aberration or a defocus of an electron beam for irradiation, and control an influence on a deflector by a fluctuation in an electric field of an electrostatic lens. The invention provides a charged particle beam apparatus including a deflector that deflects a charged particle beam with which a specimen is irradiated, an objective lens that focuses the charged particle beam on the specimen, an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting the aberration or the defocus of the charged particle beam is applied, and an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.Type: ApplicationFiled: September 17, 2019Publication date: April 2, 2020Inventors: Noritsugu Takahashi, Makoto Sakakibara, Makoto Suzuki, Minoru Yamazaki
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Patent number: 10566172Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.Type: GrantFiled: November 8, 2018Date of Patent: February 18, 2020Assignee: Hitachi High-Technologies CorporationInventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
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Publication number: 20200035449Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.Type: ApplicationFiled: June 10, 2019Publication date: January 30, 2020Inventors: Tomohito NAKANO, Toshiyuki YOKOSUKA, Yuko SASAKI, Minoru YAMAZAKI, Yuzuru MOCHIZUKI
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Publication number: 20200035450Abstract: The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.Type: ApplicationFiled: July 12, 2019Publication date: January 30, 2020Inventors: Shunsuke MIZUTANI, Yuuji KASAI, Minoru YAMAZAKI, Makoto SUZUKI
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Patent number: 10546715Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction.Type: GrantFiled: September 29, 2015Date of Patent: January 28, 2020Assignee: Hitachi High—Technologies CorporationInventors: Shahedul Hoque, Hajime Kawano, Yoshinori Momonoi, Hideki Itai, Minoru Yamazaki, Hiroshi Nishihama
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Publication number: 20190362931Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.Type: ApplicationFiled: January 27, 2017Publication date: November 28, 2019Inventors: Ryota WATANABE, Yuko SASAKI, Kazunari ASAO, Makoto SUZUKI, Wataru MORI, Minoru YAMAZAKI
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Publication number: 20190318906Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.Type: ApplicationFiled: January 18, 2019Publication date: October 17, 2019Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Wen LI, Shinichi MURAKAMI, Hiroyuki TAKAHASHI, Yuko SASAKI, Minoru YAMAZAKI, Hajime KAWANO
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Publication number: 20190311875Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.Type: ApplicationFiled: March 15, 2019Publication date: October 10, 2019Inventors: Wataru YAMANE, Minoru YAMAZAKI, Yuko SASAKI, Wataru MORI, Takashi DOI
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Patent number: 10384381Abstract: When a plurality of striped molded products are molded at a time, the molded products having a striped pattern and an outstanding design property are obtained by preventing part of molten resins from being unevenly distributed in an inappropriate manner when being fed into a cavity of a metal mold. A hot runner nozzle is provided with a first resin flow path and a plurality of second resin flow paths. The first flow path has a funnel section which continues with a nozzle gate at a centripetal position and which allows a first molten resin to be gathered at the centripetal position of the funnel section so as to feed the resin into the nozzle gate. The second resin flow paths have a plurality of corresponding discharge ports facing and communicating with the funnel section of the first resin flow path, each of the discharge ports being disposed around the centripetal position, so that the second molten resin different from the first molten resin is fed into the funnel section.Type: GrantFiled: September 17, 2014Date of Patent: August 20, 2019Assignee: Nissei Plastic Industrial Co., Ltd.Inventors: Yasuhiko Takeuchi, Minoru Yamazaki, Yoshiharu Yanagimachi, Kouichi Shimizu