Patents by Inventor Mitsuji Ikeda

Mitsuji Ikeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10535129
    Abstract: It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.
    Type: Grant
    Filed: December 7, 2011
    Date of Patent: January 14, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Masahiro Kitazawa, Mitsuji Ikeda, Yuichi Abe, Junichi Taguchi, Wataru Nagatomo
  • Publication number: 20180005363
    Abstract: The purpose of the present invention is to provide a pattern matching device and computer program that carry out highly accurate positioning even if edge positions and numbers change. The present invention proposes a computer program and a pattern matching device wherein a plurality of edges included in first pattern data to be matched and a plurality of edges included in second pattern data to be matched with the first pattern data are associated, a plurality of different association combinations are prepared, the plurality of association combinations are evaluated using index values for the plurality of edges, and matching processing is carried out using the association combinations selected through the evaluation.
    Type: Application
    Filed: January 30, 2015
    Publication date: January 4, 2018
    Inventors: Wataru NAGATOMO, Yuichi ABE, Mitsuji IKEDA
  • Patent number: 9514526
    Abstract: An evaluation value indicative of the extent of lines in each direction is calculated for a pre-processed image in which 0s are filled in and extended in the lateral direction of the inputted image and which has been reduced ?th in the longitudinal direction. To obtain the angle of rotation of an image from the change in the evaluation value obtained while the angle relative to the lateral direction of the pre-processed image is modified in small steps, a parallel line is drawn for each direction, a projection is taken, and the sum of squares serves as the evaluation value of the direction. The direction having the highest evaluation value serves as the obtained direction of rotation from the normal position. The projection of each direction references the point of intersection between the parallel line drawn for each direction and the coordinate line of the horizontal axis.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: December 6, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Jun'ichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Masahiro Kitazawa
  • Patent number: 9514528
    Abstract: Image processing apparatus includes: interpolation process image acquisition means for acquiring an interpolation process image of prescribed size which includes an interpolation point of an inputted image; Fourier transform means for subjecting the interpolation process image which is acquired with the interpolation process image acquisition means to Fourier transform; phase change means for changing, a phase of each value of the transformed interpolation process image which has been subjected to Fourier transform by the Fourier transform means, such that the interpolation point migrates to a desired nearby integer coordinate position; inverse Fourier transform means for subjecting the interpolation process image whose phase has been changed by the phase change means, to inverse Fourier transform; interpolation value determination means for adopting an interpolation point, a value of a pixel at the integer coordinate position, from the transformed interpolation process image subjected to inverse Fourier tran
    Type: Grant
    Filed: October 3, 2012
    Date of Patent: December 6, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Junichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Osamu Inoue, Takahiro Kawasaki
  • Patent number: 9183450
    Abstract: An inspection apparatus and method are provided, wherein even when an image that cannot be processed by a current image processing algorithm is input to an image processing unit while a working line is in operation, the inspection can be continued by newly generating an image processing algorithm optimized in keeping with a particular image. The apparatus includes an erroneous recognition detector, a teacher data generator and a switching unit for switching the current image processing algorithm to a new image processing algorithm generated based on an updated teacher data group. As a result, the inspection can be continued without extremely decreasing the accuracy even when an unexpected image is input to the working line.
    Type: Grant
    Filed: April 27, 2007
    Date of Patent: November 10, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuichi Abe, Mitsuji Ikeda
  • Patent number: 9141879
    Abstract: In order to provide a computer program, an image processing device, and a pattern matching method that perform pattern matching at a high level of accuracy without relying on edge deformation, contrast fluctuations, etc., in one embodiment, the disclosed pattern matching method and device perform pattern matching over an image using a template produced on the basis of the below mentioned design data. The pattern matching method and device determine the characteristic quantities of the image for an inner region and/or an outer region that are divided by a line that defines the contour of a pattern, and determine positions at which said characteristic quantities satisfy predetermined conditions to be matching positions, matching position candidates, or erroneous matching positions.
    Type: Grant
    Filed: May 30, 2011
    Date of Patent: September 22, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Ushiba, Yasutaka Toyoda, Yuichi Abe, Mitsuji Ikeda
  • Patent number: 8971627
    Abstract: The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: March 3, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Jun'ichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Masahiro Kitazawa, Wataru Nagatomo
  • Patent number: 8953894
    Abstract: A pattern matching method for a scanning electron microscope comprises a step of performing pattern matching of only an upper layer pattern between an image (101) in which a pattern consisting of plural layers is represented and a template (104) in which the upper layer pattern of the plural layer pattern is selectively represented, thereby identifying the position of the pattern consisting of the plural layers. Then, information about the upper layer pattern is subtracted from the image (101), thus extracting shape information (108) about the lower layer pattern. Consequently, stable positioning or selective information extraction on a certain layer is enabled regardless of the state of the depths of a pattern formed in three dimensions or of the charge state of a sample.
    Type: Grant
    Filed: October 2, 2009
    Date of Patent: February 10, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimichi Sato, Mitsuji Ikeda, Fumihiro Sasajima
  • Publication number: 20140341461
    Abstract: Image processing apparatus includes: interpolation process image acquisition means for acquiring an interpolation process image of prescribed size which includes an interpolation point of an inputted image; Fourier transform means for subjecting the interpolation process image which is acquired with the interpolation process image acquisition means to Fourier transform; phase change means for changing, a phase of each value of the transformed interpolation process image which has been subjected to Fourier transform by the Fourier transform means, such that the interpolation point migrates to a desired nearby integer coordinate position; inverse Fourier transform means for subjecting the interpolation process image whose phase has been changed by the phase change means, to inverse Fourier transform; interpolation value determination means for adopting an interpolation point, a value of a pixel at the integer coordinate position, from the transformed interpolation process image subjected to inverse Fourier tran
    Type: Application
    Filed: October 3, 2012
    Publication date: November 20, 2014
    Applicant: Hitachi, High-Technologies Corporation
    Inventors: Junichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Osamu Inoue, Takahiro Kawasaki
  • Patent number: 8885950
    Abstract: Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: November 11, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Wataru Nagatomo, Yuichi Abe, Mitsuji Ikeda
  • Patent number: 8872106
    Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: October 28, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Nishihama, Tatsuya Maeda, Mitsuji Ikeda, Susumu Koyama
  • Publication number: 20140021350
    Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.
    Type: Application
    Filed: March 7, 2013
    Publication date: January 23, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroshi NISHIHAMA, Tatsuya MAEDA, Mitsuji IKEDA, Susumu KOYAMA
  • Publication number: 20140023265
    Abstract: It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.
    Type: Application
    Filed: December 7, 2011
    Publication date: January 23, 2014
    Inventors: Masahiro Kitazawa, Mitsuji Ikeda, Yuichi Abe, Junichi Taguchi, Wataru Nagatomo
  • Publication number: 20140021349
    Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.
    Type: Application
    Filed: March 7, 2013
    Publication date: January 23, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroshi Nishihama, Tatsuya MAEDA, Mitsuji IKEDA, Susumu KOYAMA
  • Publication number: 20140016824
    Abstract: An evaluation value indicative of the extent of lines in each direction is calculated for a pre-processed image in which 0s are filled in and extended in the lateral direction of the inputted image and which has been reduced ?th in the longitudinal direction. To obtain the angle of rotation of an image from the change in the evaluation value obtained while the angle relative to the lateral direction of the pre-processed image is modified in small steps, a parallel line is drawn for each direction, a projection is taken, and the sum of squares serves as the evaluation value of the direction. The direction having the highest evaluation value serves as the obtained direction of rotation from the normal position. The projection of each direction references the point of intersection between the parallel line drawn for each direction and the coordinate line of the horizontal axis.
    Type: Application
    Filed: November 9, 2011
    Publication date: January 16, 2014
    Applicant: HITACHI HIGH TECHNOLOGIES CORPORATION
    Inventors: Jun'ichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Masahiro Kitazawa
  • Patent number: 8618517
    Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: December 31, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Nishihama, Tatsuya Maeda, Mitsuji Ikeda, Susumu Koyama
  • Publication number: 20130216141
    Abstract: In order to provide a computer program, an image processing device, and a pattern matching method that perform pattern matching at a high level of accuracy without relying on edge deformation, contrast fluctuations, etc., in one embodiment, the disclosed pattern matching method and device perform pattern matching over an image using a template produced on the basis of the below mentioned design data. The pattern matching method and device determine the characteristic quantities of the image for an inner region and/or an outer region that are divided by a line that defines the contour of a pattern, and determine positions at which said characteristic quantities satisfy predetermined conditions to be matching positions, matching position candidates, or erroneous matching positions.
    Type: Application
    Filed: May 30, 2011
    Publication date: August 22, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Ushiba, Yasutaka Toyoda, Yuichi Abe, Mitsuji Ikeda
  • Patent number: 8498489
    Abstract: The present invention provides a unified template matching technique which allows an adequate matching position to be provided even in an image with a distorted pattern shape and a variation in edge intensity. A correlation value contribution rate map is created for the vicinity of each of top candidate positions obtained by applying a centroid distance filter to a normalized correlation map resulting from template matching. A corrected intensity image is created from the correlation value contribution rate maps. Luminance correction is performed based on the corrected intensity image. Local matching is performed again on the vicinity of each candidate position. The candidates are then re-sorted based on candidate positions and correlation values newly obtained. Thus, even in an image with a distorted pattern shape and a variation in edge intensity, an adequate matching position can be provided in a unified manner.
    Type: Grant
    Filed: April 16, 2009
    Date of Patent: July 30, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuichi Abe, Mitsuji Ikeda, Yoshimichi Sato, Yasutaka Toyoda
  • Publication number: 20130170757
    Abstract: Disclosed is a method for creating a template for the purpose of performing pattern matching on the basis of a template image having high contrast. Also disclosed is an image processing apparatus. In the method for creating the template, design data is partially extracted, and on the basis of the extracted partial region, the template for template matching is created. In the image processing apparatus, such method is performed. In the method and the apparatus, a density of edges that belong to a predetermined region in the design data equivalent to the region to be searched for in the template matching is obtained.
    Type: Application
    Filed: May 13, 2011
    Publication date: July 4, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shinichi Shinoda, Yasutaka Toyoda, Yuichi Abe, Mitsuji Ikeda, Hiroyuki Ushiba
  • Publication number: 20130114898
    Abstract: The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
    Type: Application
    Filed: March 17, 2011
    Publication date: May 9, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Jun'ichi Taguchi, Mitsuji Ikeda, Yuichi Abe, Masahiro Kitazawa, Wataru Nagatomo