Abstract: An exposure apparatus includes a projection optical system for projecting exposure light, with which a reticle formed with a pattern is irradiated, onto a wafer, a stage for holding and aligning the wafer or reticle, an alignment optical system for outputting alignment light, a reflection mirror provided on the stage, and a plurality of interferometers for measuring the position of the stage by irradiating the reflection mirror with measurement light. The interferometer to be used to measure the position of the stage in a predetermined direction is switched to another in accordance with whether the stage is aligned to the projection optical system or to the alignment optical system.

Abstract: A stage device includes a table having a reference plane parallel to first and second directions; a driving body movable along the first direction; a moving body movable along the second direction with respect to the driving body; a static pressure bearing provided on the moving body; an exhaust groove provided surrounding the static pressure bearing; and a mechanism for delivering a gas of the static pressure bearing recovered by the exhaust groove between the moving body and the driving body. The adverse affects of piping on the moving body can be reduced and it is possible to position the moving body with high precision.

Abstract: An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.

Abstract: A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.

Abstract: The host adaptor packages 4 and the disk adaptor packages 6 which constitute the magnetic disk subsystem 1 are connected to the common bus 3 consisting of a data bus, a control bus, and a power line in the hot replacement ready state. The packages 4 and 6 have the control means 11 and the clock generator 14 and when a failure occurs in respective packages, the package replace controller 13 mounted in the control means 11 executes the blocking processing for the bus driver 15 and the clock generator 14. If this occurs, the clock generator 14 enters the stopped state, so that the circuit in the package enters the reset state and the package function is stopped, that is, the package enters the blocked state. As a result, hot replacement of the closed package can be executed without affecting the operation of the system.

Abstract: A scanning exposure apparatus includes a projection optical system, a reticle stage for scanningly moving a reticle relative to the projection optical system a wafer stage for scanningly moving a wafer relative to the projection optical system, in a timed relation with the reticle scan movement, and a holding mechanism for holding the reticle on the reticle stage during the reticle scan movement. The holding mechanism includes a first mechanism for confining an end edge portion of the reticle in a scan direction and a second mechanism for pressing the reticle in a direction perpendicular to a pattern surface of the reticle.

Abstract: An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via dampers. The plurality of struts of the base frame are joined at their upper ends to increase the rigidity of the base frame, thereby reducing vibration caused by acceleration and deceleration of the reticle stage.

Abstract: The position of an original plate stage for moving an original plate and the position of a substrate stage for moving a substrate are measured by using an original plate laser interferometer and a substrate laser interferometer, respectively. While control is performed on the basis of the measured values, the pattern of the original plate is transferred onto the substrate by scan exposure by moving the original plate stage and the substrate stage in a scan direction. The measurements of the stage positions by the original plate laser interferometer and the substrate laser interferometer are performed by using light from a single laser head.

Abstract: A scanning exposure apparatus wherein a portion of a pattern of an original is projected onto a substrate through a projection optical system and the original and substrate are scanningly moved relative to the projection optical system, whereby the pattern of the original is transferred onto the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting device for supporting the base at three positions, through a damper device and a pillar device. The three positions define an approximately isosceles triangle, and the scan direction is parallel to a straight line that connects a point of intersection of isosceles sides of the triangle and a gravity center thereof.

Abstract: A stage apparatus has a stationary portion, a movable portion and a linear motor for moving the movable portion in a prescribed direction by applying thrust between the stationary and movable portions. A first supporting member supports the stationary portion with a degree of freedom in the direction of movement, and a second supporting member has an axial supporting member for supporting the stationary portion rigidly in the direction of movement and flexibly in other directions. The second supporting member is isolated from the first supporting member in such a manner that vibration will not be transmitted to the first supporting member. The stage is used to scan a master plate in a scanning-type exposure apparatus, and the first supporting member is joined to a lens barrel table on which a projecting optical system is mounted.

Abstract: A multi-terminal surge protection device able to absorb surges of either polarity between lines and between a line and ground, in which the difference in operating time between the device elements connected to lines is reduced. A plurality of unipolar surge protection device elements are used which only operate to absorb surges of a specific polarity, and do not exhibit a reverse withstand characteristic upon application of a reverse-polarity voltage. One element is connected to a first line and another element to a second line, while a different element is connected to ground. A semiconductor substrate and second electrode are used that are common to all elements. To prevent lateral interference between elements, at least the element connected to ground is isolated from the line elements.

Abstract: The host adaptor packages 4 and the disk adaptor packages 6 which constitute the magnetic disk subsystem 1 are connected to the common bus 3 consisting of a data bus, a control bus, and a power line in the hot replacement ready state. The packages 4 and 6 have the control means 11 and the clock generator 14 and when a failure occurs in respective packages, the package replace controller 13 mounted in the control means 11 executes the blocking processing for the bus driver 15 and the clock generator 14. If this occurs, the clock generator 14 enters the stopped state, so that the circuit in the package enters the reset state and the package function is stopped, that is, the package enters the blocked state. As a result, hot replacement of the closed package can be executed without affecting the operation of the system.

Abstract: A positioning stage device capable of regulating in a wide range the rotational angle of a Z-stage supporting a suction chuck. The suction chuck is constructed integrally with the Z-stage, which is supported by a bearing so as to be movable along the Z-axis and rotatable about the Z-axis. A rotation stopper plate integral with the Z-stage is supported on both faces by bearing pads of an air bearing supported by a rotary ring, and is rotated about the Z-axis together with the air bearing by means of a motor, whereby the rotational angel of the Z-stage is regulated.

Abstract: Provided is a multilayer insulated wire comprising a conductor and three or more insulating layers covering the conductor, in which each of first and second insulating layers, as counted from the conductor side, is (a) an extrusion-coating layer of an intimate resin mixture compounded so that an ethylene-based copolymer, having a carboxylic acid or a metal salt of the carboxylic acid on the side chain thereof, accounts for 5 to 40 parts by weight compared to 100 parts by weight of a thermoplastic straight-chain polyester resin, (b) an extrusion-coating layer consisting mainly of a thermoplastic straight-chain polyester resin formed by combining an acid constituent and an alcoholic constituent the whole or a part of which is cyclohexanedimethanol, or (c) an extrusion-coating layer of an intimate resin mixture compounded so that the ethylene-based copolymer, having the carboxylic acid or the metal salt of the carboxylic acid on the side chain thereof, accounts for 50 parts or less by weight compared to 100 part

Abstract: The host adaptor packages 4 and the disk adaptor packages 6 which constitute the magnetic disk subsystem 1 are connected to the common bus 3 consisting of a data bus, a control bus, and a power line in the hot replacement ready state. The packages 4 and 6 have the control means 11 and the clock generator 14 and when a failure occurs in respective packages, the package replace controller 13 mounted in the control means 11 executes the blocking processing for the bus driver 15 and the clock generator 14. If this occurs, the clock generator 14 enters the stopped state, so that the circuit in the package enters the reset state and the package function is stopped, that is, the package enters the blocked state. As a result, hot replacement of the closed package can be executed without affecting the operation of the system.

Abstract: A semiconductor manufacturing apparatus having a vibration insulation apparatus with a damper for insulating floor vibrations is so designed that damping characteristics of a damper can be changed. Thus, a semiconductor manufacturing apparatus capable of preventing floor vibrations from being transmitted to the apparatus and efficiently attenuating vibrations generated by the apparatus can be provided.

Abstract: A moving device includes a moving table for mounting an object thereon and for moving the object, a guiding mechanism for regulating the movement of the moving table, a driving mechanism for generating a force to move the moving table, and a transmission mechanism for transmitting the driving force to the moving table. The transmission mechanism includes at least one set of parallel leaf springs having an oscillation-damping material disposed therebetween.

Abstract: In a movement guiding device, two parallel stationary guides are fixed to a surface plate and plural hydrostatic gas or bearing members are provided for the surface plate and the stationary guides. A Y stage is moved in a Y-axis direction under the influence of these bearing members. Additional hydrostatic gas or air bearing members are provided in relation to the surface plate and the Y stage so as to support an X stage for movement in an X-axis direction orthogonal to the Y-axis direction. Guide of the Y stage in the X-axis direction is made by the stationary guides on the surface plate, while guide thereof in a Z-axis direction perpendicular to an X-Y plane is made by the surface plate. Guide of the X stage in the Y-axis direction is made by the Y stage, while the guide thereof in the Z-axis direction is made by the surface plate, similar to the Y stage. With such structure, any vibration, rolling, or otherwise, of the Y stage is not transmitted to the X stage. Thus, high-precision guide is attainable.

Abstract: An assist apparatus for a clutch pedal which includes a pedal arm supported on a machine frame through a supporting shaft so as to be turnable between its inoperative position on one side and its operative position on the other side. A first spring seat and a second spring seat facing the first spring seat are turnably supported on the pedal arm and the machine frame respectively, through a first seat shaft on the pedal arm and a second seat shaft on the machine frame. The seat shafts are parallel with the supporting shaft. A pair of springs are provided between the two spring seats so that the two seats are urged along a direction of a connecting line connecting between an axis of the first seat shaft and an axis of the second seat shaft. The pair of springs are disposed at symmetrical positions on both sides of the connecting line. Each of the seats is provided with inwardly projecting opposite side walls and is turnably mounted and supported on each of the seat shafts which provide side walls thereof.