Abstract: A position detector includes a first planar encoder including a first encoder head unit mounted on a test object that is a movable member, and a first grating unit mounted on a fixed member, the first planar encoder being configured to detect a position of the test object in two directions by measuring a position of the first grating unit using the first encoder head unit, and a second planar encoder including a second encoder head unit mounted on the fixed member, and a second grating unit mounted on the movable member, the second planar encoder being used to generate data for calibrating the position of the first grating unit measured by the first encoder head unit.

Abstract: A planar motor includes a movable body and a stator configured to drive the movable body in a plane. The stator includes a first stator unit and a second stator unit. The movable body is moved in a first direction by a force acting between the movable body and the first stator unit, and is moved in a second direction by a force acting between the movable body and the second stator unit. The first stator unit and the second stator unit are arranged to face each other in such a manner that the movable body is provided therebetween.

Abstract: A position detector includes a first planar encoder including a first encoder head unit mounted on a test object that is a movable member, and a first grating unit mounted on a fixed member, the first planar encoder being configured to detect a position of the test object in two directions by measuring a position of the first grating unit using the first encoder head unit, and a second planar encoder including a second encoder head unit mounted on the fixed member, and a second grating unit mounted on the movable member, the second planar encoder being used to generate data for calibrating the position of the first grating unit measured by the first encoder head unit.

Abstract: A planar pulse motor includes a stator and a mover which is arranged opposite to the stator and which has a plurality of coils. The planar pulse motor can drive the mover in a first direction on a horizontal plane and in a second direction orthogonal to the first direction by controlling current flowing in the plurality of coils. The stator has a plurality of raised portions, including a plurality of first raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the first direction and a plurality of second raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the second direction, and a plurality of recessed portions through which magnetic flux does not pass in either the first or the second direction.

Abstract: A reticle stage, a substrate stage and a measurement device are controlled such that first measurement of the position of a surface of a substrate, positioning of the surface at an image plane of the projection optical system based on the first measurement, and an exposure are performed during a constant-speed scanning with respect to each shot area of a first group including a row of shot areas, second measurement of the position of the surface is performed during a constant-speed scanning with respect to a shot area belonging to a second group which is adjacent to the first group and includes a row of shot areas, and the constant-speed scanning and the exposure are started with respect to a shot area subjected to the second measurement, after positioning of the surface at the image plane is performed during acceleration of the substrate stage based on the second measurement.

Abstract: A pulse motor includes a first element in which a plurality of convex portions are arranged cyclically, and a second element disposed to face the first element. The plurality of convex portions include first and second convex portions. The first convex portion forms a part of a first magnetic circuit including a portion passing a magnetic flux along a first direction. The second convex portion forms a part of a second magnetic circuit including a portion passing a magnetic flux along a second direction. The second element includes first and second coils to apply a magnetic flux to the first and second magnetic circuit. A time duration in which the movable element moves includes a time duration in which a timing at which a current flowing through the first coil is maximum and a timing at which a current flowing through the second coil is maximum appear alternately.

Abstract: A planar motor includes a stator in which a plurality of convex portions each containing a magnetic material are arranged, and a movable element which faces the stator. The movable element has a plurality of coils, and moves in at least the x direction by controlling electric currents flowing through the plurality of coils. Each convex portion of the stator has different dimensions in the y direction at least at two positions on a straight line along the x direction.

Abstract: Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

Abstract: A planar motor includes a movable body and a stator configured to drive the movable body in a plane. The stator includes a first stator unit and a second stator unit. The movable body is moved in a first direction by a force acting between the movable body and the first stator unit, and is moved in a second direction by a force acting between the movable body and the second stator unit. The first stator unit and the second stator unit are arranged to face each other in such a manner that the movable body is provided therebetween.

Abstract: A planar pulse motor includes a stator and a mover which is arranged opposite to the stator and which has a plurality of coils. The planar pulse motor can drive the mover in a first direction on a horizontal plane and in a second direction orthogonal to the first direction by controlling current flowing in the plurality of coils. The stator has a plurality of raised portions, including a plurality of first raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the first direction and a plurality of second raised portions composed by laminating a plurality of layers of members including magnetic materials through which magnetic flux can pass only in the second direction, and a plurality of recessed portions through which magnetic flux does not pass in either the first or the second direction.

Abstract: Two independent fine adjustment stages (62, 72) are arranged on one coarse adjustment stage (73) to simultaneously perform all of focus measurement and part of alignment measurement in parallel with exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer (60) with a chuck (61) is performed before the chuck is mounted on each fine adjustment stage.

Abstract: An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

Abstract: There is provided an information storage output system enhanced in mobility and improved in convenience to use. In the information storage output system for storing predetermined storage data in a storage server on a network, the storage server can be accessed from many and unspecified communication devices. The information storage output system includes a plurality of remote output terminals for outputting supply data supplied via a network in a predetermined output form, a remote output server having a function of supplying at least the supply data to one of the remote output terminals, and an output request communication terminal for transmitting a primary output request of the storage data to the storage server or the remote output server via a network. The storage data is output from the remote output terminal in response to the primary output request transmitted from the output request communication terminal.

Abstract: An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

Abstract: An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

Abstract: An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

Abstract: Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

Abstract: Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

Abstract: Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

Abstract: A scan type exposure apparatus wherein a pattern of an original is lithographically transferred to a substrate sequentially while the original and the substrate are scanningly moved relative to exposure light, the apparatus including a photodetector disposed at a position optically conjugate with the original, and a storing device for storing correction information with respect to an output of the photodetector, in relation to different positions of the original to be illuminated with the exposure light, such that, in the lithographic pattern transfer, the output of the photodetector can be corrected by use of the correction information.