Abstract: A method of managing a property of a substrate is provided. The method may include selecting an implant recipe according to a set of criteria for processing the substrate. The method may further include measuring a dose saturation curve for the implant recipe, determining an implant procedure based upon the implant recipe and the dose saturation curve; and implementing the implant procedure in the substrate using a processing system.

Abstract: Systems and methods discussed herein can be used to form gratings at various slant angles across a grating material on a single substrate by determining an ion beam angle and changing the angle of an ion beam among and between ion beam angles to form gratings with varying angles and cross-sectional geometries. The substrate can be rotated around a central axis, and one or more process parameters, such as a duty cycle of the ion beam, can be modulated to form a grating with a depth gradient.

Abstract: A method may include performing an echocardiogram procedure on a patient to generate a plurality of echocardiogram images; during the echocardiogram procedure, intravenously directing bubbles into a patient's venous circulatory system and to a right side of the patient's heart; identifying structures of the patient's heart and further identifying composite boundaries for the structures; after detecting presence of the bubbles on the right side of the patient's heart, comparing opacification of the right atrium to a threshold level of opacification to confirm sufficient opacification of the patient's right atrium; analyzing additional echocardiogram images relative to the composite boundaries to detect presence of the bubbles on a left side of the patient's heart; based on analyzing the additional echocardiogram images, calculating a score based on a nature of detected bubbles on the left side of the patient's heart; and based on the score initiating treatment in the patient.

Abstract: An etching and deposition system including a process chamber containing a platen for supporting a substrate, an reactive-ion etching (RIE) source adapted to produce an ion beam and to direct the ion beam into the process chamber for etching the substrate, a first plasma enhanced chemical vapor deposition (PECVD) source located on a first side of the RIE source, the first PECVD source adapted to produce a first radical beam and to direct the first radical beam into the process chamber for depositing a first material, and a second PECVD source located on a second side of the RIE source opposite the first side, the second PECVD source adapted to produce a second radical beam and to direct the second radical beam into the process chamber for depositing a second material.

Abstract: A method of producing a non-uniform ion implant in a workpiece, including storing a target pattern as a target pattern array, analyzing the target pattern to identify maximal gradients, rotating the target pattern and the workpiece to align with a spot beam profile and a scan direction, and transposing the target pattern to a process array. The method further includes optimizing the process array, calculating a largest possible beam spot size, selecting a corresponding spot beam recipe, performing a test scan to determine a beam sweep angle of the spot beam, and rotating the target pattern, the process array, and the workpiece to account for the beam sweep angle. The method further incudes generating a predicted process dose pattern and comparing it to the target pattern, and calculating at least one measure of error representing a fidelity of the predicted process dose pattern to the target pattern.

Abstract: In some implementations, an intravascular gas exchange catheter includes (a) a catheter wall extending from a proximal end to a distal end; (b) a first internal lumen coupled to a first lumen port at the proximal end and adjacent at least a portion of the catheter wall, and a second internal lumen coupled to a second lumen port at the proximal end; and (c) an interior space enclosed by the catheter wall and disposed at the distal end, wherein the first internal lumen and second interior lumen are fluidly isolated from each other along a length of catheter wall but fluidly coupled to each other at the interior space. The catheter wall may include a porous material that facilitates diffusion of a target gas through the catheter wall, from or to a space exterior to the catheter wall, to or from the first lumen.

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.

Abstract: A method may include providing a stress the substrate having a main surface, and forming a patterned stress compensation layer on the main surface, wherein the patterned stress compensation layer is formed by exposing the main surface to a processing beam while a movement of the ion beam with respect to the main surface takes place.

Abstract: A method may include providing a stress compensation stack on a main surface of the substrate, wherein the stress compensation stack comprises a patterned resist layer and a stress compensation layer, disposed subjacent the patterned resist layer. The patterned resist layer may be determined according to a surface map of the main surface of the substrate. The method may further include directing processing species to the stress compensation stack, wherein the stress compensation layer is selectively altered as a function of position across the substrate.

Abstract: A method may include providing a syringe device having (a) a single needle, (b) a first syringe comprising saline with microbubbles, (c) a second syringe comprising a therapeutic compound, and (d) a connector coupling the single needle to the first syringe and to the second syringe. The method may further include guiding the single needle to an injection site of a patient; injecting, with the first syringe, a quantity of saline with microbubbles; confirming a desired position of the single needle, with ultrasound imaging, by identifying the microbubbles in the quantity of saline relative to a tip of the single needle and further relative to one or more anatomical landmarks visible with the ultrasound imaging; and injecting, with the second syringe, the therapeutic compound at the injection site.

Abstract: A method of performing an ultrasound-guided procedure may include (a) providing a medical device that has (i) a therapeutic distal tip configured to percutaneously alter internal tissue or bone at a treatment site of a patient; (ii) a source of biocompatible fluid; and (iii) a delivery system configured to selectively deliver a quantity of the biocompatible fluid, with echogenic microbubbles therein, to an area external and adjacent to the therapeutic distal tip. The method may further include subcutaneously advancing the therapeutic distal tip toward the treatment site; delivering a quantity of biocompatible fluid with echogenic microbubbles to the area; observing, via ultrasound, an anatomic structure proximate the treatment site and dispersion of the echogenic microbubbles at the area; and based on a nature and location of the dispersion, steering the therapeutic distal tip relative to the anatomic structure, and continuing to advance the therapeutic distal tip toward the treatment site.

Abstract: A method for generating microbubbles may include providing a syringe having a barrel defining an interior volume, a plunger, a tip and a check valve assembly. The check valve assembly may have an inlet port; a check valve that is configured to open when the plunger is drawn back by a user; and a nozzle in fluid communication with the interior volume and, when the check valve is open, in fluid communication with the inlet port. The method may include drawing liquid into the interior volume; removing a seal from the inlet port and drawing gas adjacent the inlet ports into the interior volume to form microbubbles in the liquid already drawn in; coupling the tip to an intravenous line associated with a patient undergoing a bubble study; and depressing the plunger to force the liquid and the formed microbubbles into the intravenous line.

Abstract: An etching and deposition system including a process chamber containing a platen for supporting a substrate, an reactive-ion etching (RIE) source adapted to produce an ion beam and to direct the ion beam into the process chamber for etching the substrate, a first plasma enhanced chemical vapor deposition (PECVD) source located on a first side of the RIE source, the first PECVD source adapted to produce a first radical beam and to direct the first radical beam into the process chamber for depositing a first material, and a second PECVD source located on a second side of the RIE source opposite the first side, the second PECVD source adapted to produce a second radical beam and to direct the second radical beam into the process chamber for depositing a second material.

Abstract: A method may include intravenously directing first bubbles into a patient's venous circulatory system and to a right side of the patient's heart. The first bubbles may have sizes that fall within a first range. The method may further include monitoring the patient's heart, with ultrasound imaging, to detect presence of the first bubbles on a left side of the patient's heart. Upon detecting the first bubbles on the left side of the patient's heart, the method may further include intravenously directing second bubbles into the patient's venous circulatory system and to the right side of the patient's heart. The second bubbles may have sizes that fall within a second range that is different than the first range. Upon detecting the second bubbles on the left side of the patient's heart, the method may further include initiating treatment to minimize risk of stroke in the patient.

Abstract: A method may include providing a syringe device having (a) a single needle, (b) a first syringe comprising saline with microbubbles, (c) a second syringe comprising a therapeutic compound, and (d) a connector coupling the single needle to the first syringe and to the second syringe. The method may further include guiding the single needle to an injection site of a patient; injecting, with the first syringe, a quantity of saline with microbubbles; confirming a desired position of the single needle, with ultrasound imaging, by identifying the microbubbles in the quantity of saline relative to a tip of the single needle and further relative to one or more anatomical landmarks visible with the ultrasound imaging; and injecting, with the second syringe, the therapeutic compound at the injection site.

Abstract: A method of performing an ultrasound-guided procedure may include (a) providing a medical device that has (i) a therapeutic distal tip configured to percutaneously alter internal tissue or bone at a treatment site of a patient; (ii) a source of biocompatible fluid; and (iii) a delivery system configured to selectively deliver a quantity of the biocompatible fluid, with echogenic microbubbles therein, to an area external and adjacent to the therapeutic distal tip. The method may further include subcutaneously advancing the therapeutic distal tip toward the treatment site; delivering a quantity of biocompatible fluid with echogenic microbubbles to the area; observing, via ultrasound, an anatomic structure proximate the treatment site and dispersion of the echogenic microbubbles at the area; and based on a nature and location of the dispersion, steering the therapeutic distal tip relative to the anatomic structure, and continuing to advance the therapeutic distal tip toward the treatment site.

Abstract: An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.

Abstract: A system may include a substrate stage, configured to support a substrate, where a main surface of the substrate defines a substrate plane. The system may include an ion source, including an extraction assembly that is oriented to direct an ion beam to the substrate along a trajectory defining a non-zero angle of incidence with respect to a perpendicular to the substrate plane. The system may include a radical source oriented to direct a radical beam to the substrate along a trajectory defining the non-zero angle of incidence with respect to a perpendicular to the substrate plane. The substrate stage may be further configured to scan the substrate along a first direction, lying with the substrate plane, while the main surface of the substrate is oriented within the substrate plane.

Abstract: Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ? relative to a surface normal of the substrates and form gratings in the grating material.

Abstract: A method for forming a device structure is disclosed. The method of forming a device structure includes forming a variable-depth structure in a device material layer using a laser ablation. A plurality of device structures is formed in the variable-depth structure to define slanted device structures therein. The variable-depth structure and the slanted device structures are formed using an etch process.