Patents by Inventor Mutsumi Saito

Mutsumi Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240087616
    Abstract: A semiconductor memory device comprises: memory layers arranged in a first direction; and a first and a second via wirings having different positions in a second direction. The memory layer comprises: a first transistor electrically connected to the first via wiring; a memory portion electrically connected to the first transistor; a wiring electrically connected to the first transistor; a second transistor electrically connected to the second via wiring; and an electrode provided in a current path between the second transistor and the wiring. The second transistor comprises: a semiconductor layer electrically connected to the electrode and the second via wiring; and a gate electrode facing the semiconductor layer. The semiconductor layer faces at least one of surfaces on one side or the other side in the first direction of the gate electrode. The electrode includes a portion arranged with the second via wiring in a third direction.
    Type: Application
    Filed: September 8, 2023
    Publication date: March 14, 2024
    Applicant: Kioxia Corporation
    Inventors: Takafumi MASUDA, Nobuyoshi SAITO, Mutsumi OKAJIMA, Keiji IKEDA
  • Publication number: 20240081042
    Abstract: A semiconductor memory device comprises: a first memory layer; and a first via wiring and a second via wiring extending in a first direction, and having different positions from each other in a second direction. The first memory layer comprises: a first transistor electrically connected to the first via wiring; a memory portion electrically connected to the first transistor; a first wiring electrically connected to the first transistor; a second transistor electrically connected to the second via wiring and the first wiring; a first electrode electrically connected to the second transistor; and a second electrode electrically connected to the first wiring and first electrode. A length of the second electrode in the first direction is larger than one or both of a length of the first wiring in the first direction and a length of the first conductive layer in the first direction.
    Type: Application
    Filed: September 1, 2023
    Publication date: March 7, 2024
    Applicant: Kioxia Corporation
    Inventors: Takafumi MASUDA, Mutsumi OKAJIMA, Nobuyoshi SAITO, Keiji IKEDA
  • Patent number: 9368314
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: June 14, 2016
    Assignee: EBARA CORPORATION
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Patent number: 9124962
    Abstract: In a wind noise suppressor, a divider divides the frequency band an input sound into a first frequency band having a possibility that wind noise is included and a second frequency band having a frequency higher than a frequency of the first frequency band, a calculator calculates a probability that the input sound includes wind noise from feature parameters of a sound in the first frequency band, a suppressor suppresses wind noise included in the first frequency band in accordance with an intensity calculated from the probability, and an adder mixes and outputs the sound in the second frequency band divided by the divider and the sound in the first frequency band by which wind noise is suppressed by the suppressor.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: September 1, 2015
    Assignee: FUJITSU LIMITED
    Inventor: Mutsumi Saito
  • Publication number: 20140367570
    Abstract: There is provided a substrate inspection method. The method includes: maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; positioning the substrate on a stage in the inspection chamber; selecting an evaluation parameter according to a kind of said processing apparatus; and determining inspection regions of the substrate so that an inspection time required per a lot of the substrate is equal to a processing time spent for said processing step required per a lot of the substrate. The method also includes radiating a primary electron beam from an electron gun; deflecting the primary electron beam with an E*B unit; irradiating said inspection regions of the substrate with the deflected primary electron beam; and projecting secondary electrons emitted from said substrate through the E*B unit onto a detector with a secondary optical system.
    Type: Application
    Filed: July 8, 2014
    Publication date: December 18, 2014
    Applicant: EBARA CORPORATION
    Inventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
  • Publication number: 20140319346
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Application
    Filed: June 30, 2014
    Publication date: October 30, 2014
    Applicant: EBARA CORPORATION
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Patent number: 8822919
    Abstract: A substrate inspection apparatus 1-1 (FIG.
    Type: Grant
    Filed: January 6, 2011
    Date of Patent: September 2, 2014
    Assignee: Ebara Corporation
    Inventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
  • Patent number: 8803103
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Grant
    Filed: January 2, 2013
    Date of Patent: August 12, 2014
    Assignees: Ebara Corporation, Kabushiki Kaisha Toshiba
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Patent number: 8443253
    Abstract: A turbo decoding device includes a memory unit that stores data in an interleaving process performed in a process of decoding a coded signal encoded with a turbo code and an access unit that accesses the memory unit to read and write the data. The memory unit includes memory circuits and is formed as one memory space by coupling the memory circuits. Furthermore, the memory circuit functions as a first bank configuration by which a first capacity is assigned to each bank or a second bank configuration by which a second capacity is assigned to each bank in accordance with a combination of the memory circuits. Moreover, the access unit selects by which of the first bank configuration and the second bank configuration the memory unit functions in accordance with a communication method of a coded signal and accesses the memory unit in accordance with the selected bank configuration.
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: May 14, 2013
    Assignee: Fujitsu Limited
    Inventors: Kazuaki Imafuku, Kazuhisa Obuchi, Shunji Miyazaki, Hideaki Yamada, Mutsumi Saito, Masaru Inoue, Shingo Hotta
  • Patent number: 8368031
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: February 5, 2013
    Assignees: Ebara Corporation, Kabushiki Kaisha Toshiba
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Publication number: 20120288116
    Abstract: In a wind noise suppressor, a divider divides the frequency band an input sound into a first frequency band having a possibility that wind noise is included and a second frequency band having a frequency higher than a frequency of the first frequency band, a calculator calculates a probability that the input sound includes wind noise from feature parameters of a sound in the first frequency band, a suppressor suppresses wind noise included in the first frequency band in accordance with an intensity calculated from the probability, and an adder mixes and outputs the sound in the second frequency band divided by the divider and the sound in the first frequency band by which wind noise is suppressed by the suppressor.
    Type: Application
    Filed: April 27, 2012
    Publication date: November 15, 2012
    Applicant: FUJITSU LIMITED
    Inventor: Mutsumi SAITO
  • Publication number: 20120032079
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Application
    Filed: September 23, 2011
    Publication date: February 9, 2012
    Applicants: KABUSHIKI KAISHA TOSHIBA, EBARA CORPORATION
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Patent number: 8053726
    Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: November 8, 2011
    Assignees: Ebara Corporation, Kabushiki Kaisha Toshiba
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
  • Publication number: 20110104830
    Abstract: A substrate inspection apparatus 1-1 (FIG.
    Type: Application
    Filed: January 6, 2011
    Publication date: May 5, 2011
    Applicant: EBARA CORPORATION
    Inventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
  • Patent number: 7928378
    Abstract: A substrate inspection apparatus 1-1 (FIG.
    Type: Grant
    Filed: June 30, 2008
    Date of Patent: April 19, 2011
    Assignee: Ebara Corporation
    Inventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
  • Publication number: 20110078542
    Abstract: A turbo decoding device includes a memory unit that stores data in an interleaving process performed in a process of decoding a coded signal encoded with a turbo code and an access unit that accesses the memory unit to read and write the data. The memory unit includes memory circuits and is formed as one memory space by coupling the memory circuits. Furthermore, the memory circuit functions as a first bank configuration by which a first capacity is assigned to each bank or a second bank configuration by which a second capacity is assigned to each bank in accordance with a combination of the memory circuits. Moreover, the access unit selects by which of the first bank configuration and the second bank configuration the memory unit functions in accordance with a communication method of a coded signal and accesses the memory unit in accordance with the selected bank configuration.
    Type: Application
    Filed: September 7, 2010
    Publication date: March 31, 2011
    Applicant: FUJITSU LIMITED
    Inventors: Kazuaki IMAFUKU, Kazuhisa OBUCHI, Shunji MIYAZAKI, Hideaki YAMADA, Mutsumi SAITO, Masaru INOUE, Shingo HOTTA
  • Patent number: 7888642
    Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: February 15, 2011
    Assignee: Ebara Corporation
    Inventors: Mamoru Nakasuji, Nabuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe, Takao Kato, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima
  • Patent number: 7829871
    Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mech
    Type: Grant
    Filed: July 22, 2008
    Date of Patent: November 9, 2010
    Assignee: Ebara Corporation
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Shoji Yoshikawa, Mutsumi Saito
  • Patent number: 7601972
    Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: October 13, 2009
    Assignee: Ebara Corporation
    Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi
  • Publication number: 20090050822
    Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.
    Type: Application
    Filed: June 25, 2007
    Publication date: February 26, 2009
    Applicant: EBARA CORPORATION
    Inventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura