Patents by Inventor Mutsumi Saito
Mutsumi Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7247848Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: GrantFiled: May 28, 2003Date of Patent: July 24, 2007Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Patent number: 7244932Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.Type: GrantFiled: November 2, 2001Date of Patent: July 17, 2007Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Yoshiaki Kohama, Yukiharu Okubo
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Patent number: 7241993Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.Type: GrantFiled: June 27, 2001Date of Patent: July 10, 2007Assignees: Ebara Corporation, Kabushiki Kaisha ToshibaInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
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Patent number: 7223973Abstract: A substrate inspection apparatus 1-1 (FIG.Type: GrantFiled: January 19, 2005Date of Patent: May 29, 2007Assignee: Ebara CorporationInventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
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Publication number: 20070057186Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.Type: ApplicationFiled: September 28, 2006Publication date: March 15, 2007Applicant: EBARA CORPORATIONInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi
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Publication number: 20070045536Abstract: The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate.Type: ApplicationFiled: February 9, 2006Publication date: March 1, 2007Applicant: EBARA CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Masahiro Hatakeyama, Kenji Watanabe, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Publication number: 20070018101Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.Type: ApplicationFiled: September 28, 2006Publication date: January 25, 2007Applicant: EBARA CORPORATIONInventors: Mamoru Nakasuji, Nobuhara Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe, Takao Kato, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Patent number: 7135676Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.Type: GrantFiled: June 27, 2001Date of Patent: November 14, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi
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Patent number: 7130794Abstract: The present invention relates to a received speech signal processing apparatus suitable for use in a mobile communication terminal such as a portable telephone. The received speech signal processing apparatus (5) is arranged to include a frequency band partitioning unit (8) for partitioning a received speech signal into a plurality of frequency bands in the frequency domain and a received speech signal compressing unit (9) for effecting a compression processing on respective speech signal components involved in respective frequency bands at a ratio differing depending on the respective received speech signal which is partitioned into a plurality of frequency bands. Since the compression processing is effected on the received speech signal at the compression ratio suitable for each frequency band, an articulate speech can be reproduced from the received speech signal.Type: GrantFiled: March 12, 2002Date of Patent: October 31, 2006Assignee: Fujitsu LimitedInventor: Mutsumi Saito
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Patent number: 7129485Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.Type: GrantFiled: January 29, 2004Date of Patent: October 31, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe, Takao Kato, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Patent number: 7109483Abstract: The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate.Type: GrantFiled: November 2, 2001Date of Patent: September 19, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Masahiro Hatakeyama, Kenji Watanabe, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Patent number: 7109484Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system.Type: GrantFiled: November 17, 2004Date of Patent: September 19, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Shoji Yoshikawa, Mutsumi Saito
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Patent number: 7098045Abstract: A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.Type: GrantFiled: February 10, 2005Date of Patent: August 29, 2006Assignee: Ebara CorporationInventors: Nobuharu Noji, Hiroshi Sobukawa, Masami Nagayama, Koji Ono, Mutsumi Saito
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Patent number: 7095022Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.Type: GrantFiled: November 2, 2001Date of Patent: August 22, 2006Assignees: Ebara Corporation, Nikon CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe, Takao Kato, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Publication number: 20060138343Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechType: ApplicationFiled: February 24, 2006Publication date: June 29, 2006Applicant: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Shoji Yoshikawa
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Patent number: 7049585Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system.Type: GrantFiled: June 27, 2001Date of Patent: May 23, 2006Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Shoji Yoshikawa, Mutsumi Saito
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Publication number: 20050145171Abstract: A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.Type: ApplicationFiled: February 10, 2005Publication date: July 7, 2005Inventors: Nobuharu Noji, Hiroshi Sobukawa, Masami Nagayama, Koji Ono, Mutsumi Saito
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Publication number: 20050121611Abstract: A substrate inspection apparatus 1-1 (FIG.Type: ApplicationFiled: January 19, 2005Publication date: June 9, 2005Applicant: EBARA CORPORATIONInventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
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Publication number: 20050092921Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system.Type: ApplicationFiled: November 17, 2004Publication date: May 5, 2005Applicant: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Shoji Yoshikawa, Mutsumi Saito
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Patent number: 6869890Abstract: A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.Type: GrantFiled: January 3, 2002Date of Patent: March 22, 2005Assignee: Ebara CorporationInventors: Nobuharu Noji, Hiroshi Sobukawa, Masami Nagayama, Koji Ono, Mutsumi Saito