Abstract: A substrate inspection apparatus 1-1 (FIG.

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract: An echo canceler makes it possible to adaptably control a power of speech reception voice and to reduce distortion of a voice output from a speaker. The echo canceler has a basic structure includes a power control section controlling a power for a speech reception voice, a first filtering section removing a particular component from an output of the power control section, an echo canceling section removing echo components of a speech reception voice, which are added to a speech transmission voice, a second filtering section filtering particular components of the speech reception and transmission voices, and a state judgement section judging existences of the speech reception and transmission voices from an output of the second filtering section and controlling a power attenuation amount of the power control section based on the judgement result.

Abstract: A speech processing apparatus able to enhance formants more naturally, wherein a speech analyzing unit analyzes an input speech signal to find LPCs and converts the LPCs to LSPs, a speech decoding unit calculates a distance between adjacent orders of the LSPs by an LSP analytical processing unit and calculates LSP adjusting amounts of larger values for LSPs of adjacent orders closer in distance by an LSP adjusting amount calculating unit, an LSP adjusting unit adjusts the LSPs based on the LSP adjusting amounts such that the LSPs of adjacent orders closer in distance become closer, an LSP-LPC converting unit converts the adjusted LSPs to LPCs, and an LPC combining unit uses the LPCs and sound source parameters to obtain formant-enhanced speech.

Abstract: A received voice processing apparatus is provided, in which the received voice processing apparatus includes: a target spectrum calculation part for calculating, for each frequency band, a target spectrum on the basis of a compression ratio for a voice spectrum; a gain calculation part for calculating a gain value for amplifying the voice spectrum to the target spectrum; a filter coefficient calculation part for calculating a filter coefficient from the gain value; and a filer part for processing a received voice signal by using the filter coefficient.

Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

Abstract: A substrate inspection apparatus 1-1 (FIG.

Abstract: The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible.

Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

Abstract: The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate.

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract: The present invention relates to a received speech signal processing apparatus suitable for use in a mobile communication terminal such as a portable telephone. The received speech signal processing apparatus (5) is arranged to include a frequency band partitioning unit (8) for partitioning a received speech signal into a plurality of frequency bands in the frequency domain and a received speech signal compressing unit (9) for effecting a compression processing on respective speech signal components involved in respective frequency bands at a ratio differing depending on the respective received speech signal which is partitioned into a plurality of frequency bands. Since the compression processing is effected on the received speech signal at the compression ratio suitable for each frequency band, an articulate speech can be reproduced from the received speech signal.

Abstract: A processing apparatus is used for processing a workpiece such as a semiconductor wafer. The processing apparatus comprises a cover for covering a portion of a surface, to be processed, of a workpiece, a process chamber formed by the cover and the surface, to be processed, of the workpiece, and a sealing portion provided between the cover and the surface of the workpiece for sealing the process chamber.

Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system.

Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

Abstract: A method by which irradiation treatment of an exhaust gas with electron beams can be performed in a more space- and energy efficient manner. The method in which an exhaust gas containing nitrogen oxides (NOx) is irradiated with electron beams so as to form by-products, which are then separated whereas the treated exhaust gas is liberated into air atmosphere, characterized in that electron beams are generated in such a way that they have a pulsed temporal and spatial shape within an electron beam generator, with the pulse frequency and duration being in the respective ranges of 10 Hz-100 kHz and 10.sup.-8 -10.sup.-5 second whereas the non-irradiation region lasts for a time interval of 10.sup.-5 -10.sup.-1 second.

Abstract: A beam charge exchanging apparatus causes the charges of charged particles in a fast particle beam to be exchanged with charges of a gas or other fluid. The apparatus includes; a gas/fluid container disposed in a vacuum and having holes which allow the fast particle beam to pass through the container, a source of gas or other fluid, and a nozzle for introducing the gas into the container. The source and the nozzle are designed to introduce a high speed gas/fluid into the container so that the fast particle beam will collide with the high speed gas/fluid in the container and the charges thereof will be exchanged such that the fast particle beam is converted into a neutral particle beam. The apparatus may further include elements for detecting the quantity of neutral particles resulting from the charge exchange by measuring the quantity of generated ionized gas as an electric current.