Abstract: Provided are a silicon nitride film etching composition, a method of etching a silicon nitride film using the same, and a manufacturing method of a semiconductor device. Specifically, a silicon nitride film may be stably etched with a high selection ratio relative to a silicon oxide film, and when the composition is applied to an etching process at a high temperature and a semiconductor manufacturing process, not only no precipitate occurs but also anomalous growth in which the thickness of the silicon oxide film is rather increased does not occur, thereby minimizing defects and reliability reduction.

Abstract: The present disclosure provides a mobile communications system line number sheet management device and method. Provided, according to one aspect of the present disclosure, is a line number sheet management device and method, for automating access network-related line number sheet management by automatically collecting and updating line number information, the line number information being collected from a mobile communications base station management server (mobile communications system management server) and a fronthaul management server. Provided, according to another aspect of the present disclosure, is a fronthaul device for: acquiring unique information of a base station by receiving an optical signal from any one of a radio unit (RU) and a digital unit (DU); and transmitting the unique information of the base station to a fronthaul management server.

Abstract: A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.

Abstract: The present invention provides a hearing device and a method for adjusting a hearing device with which adjustments are performed in real-time in accordance with sound (in particular, sound in the surrounding environment) input into the hearing device, thereby enabling the input sound to be finely adjusted and output to a user. The hearing system includes a hearing device, and a rechargeable battery device which is connected to the hearing device by way of a network and which accommodates the hearing device, wherein the hearing device is provided with: an input unit which acquires sound data from the outside and sound data from another device; a communication unit which transmits the sound data from the outside and the sound data from the other device to the battery device, and receives a parameter set generated by the battery device on the basis of a result obtained by adjusting the sound data; and an output unit which outputs the adjusted sound data to the user as sound, on the basis of the parameter set.

Abstract: Disclosed is a digital hearing device with a microphone in an ear band, the digital hearing device including a body; an ear band configured to extend from one side of the body and to surround at least a portion of auricle of a user; a plurality of microphones provided to the ear band at predetermined intervals; an ear head configured to protrude inward from the body and to fit into an ear of the user; and a speaker provided to the ear head and configured to amplify sound received from the plurality of microphones and to deliver the amplified sound to the user.

Abstract: Disclosed is a digital hearing device with a microphone in an ear band, the digital hearing device including a body; an ear band configured to extend from one side of the body and to surround at least a portion of auricle of a user; a plurality of microphones provided to the ear band at predetermined intervals; an ear head configured to protrude inward from the body and to fit into an ear of the user; and a speaker provided to the ear head and configured to amplify sound received from the plurality of microphones and to deliver the amplified sound to the user.

Abstract: To provide wireless earphones that are capable of reducing tinnitus by noninvasively applying electrical stimulation to brain cells regardless of the condition of auditory cells.

Abstract: The inventive concept relates to a smart hearing device for providing a control parameter and feedback for a natural language or a non-natural language determined by analyzing sound data, which includes a receiving unit that receives sound data of a voice signal and a noise signal from a first microphone and a second microphone being formed at one side, a determination unit that compares digital flow of the sound data with a previously stored graph pattern to determine a natural language or a non-natural language for the sound data, a processing unit that matches similar data for the determined natural language or non-natural language, based on a database including a natural language area and a non-natural language area, and a providing unit that provides a user with a one-sided sound converted by setting a control parameter in a natural language or a non-natural language specified according to the matched similar data.

Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.

Abstract: A user is allowed to three-dimensionally recognize environment change and noise change corresponding to the sound directionality of the left and right sides through a control parameter that is set by analyzing an audio signal received from a first smart hearing device formed on one side and a second smart hearing device formed on an opposite side.

Abstract: The present invention relates to a composition for treating a semiconductor substrate, and particularly to a composition for treating an edge portion of a wafer coated with polysilazane. According to the composition for treating a semiconductor substrate according to the present invention, it is possible to uniformly maintain the quality of the composition in terms of management and to uniformly treat the boundary of the wafer in terms of processing. In addition, by improving the straightness of the boundary portion where polysilazane is removed, it is possible to significantly reduce the defect rate of the product and to stably improve the productivity yield.

Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.

Abstract: The present invention relates to a composition for selectively etching silicon on a surface on which a metal film and silicon (Si) are exposed. According to the present invention, it is possible to improve etch selectivity of silicon on the semiconductor surface on which the metal film and silicon are exposed.

Abstract: A hearing device directly or indirectly connected to a server through a network, the hearing device being provided with: an input unit that acquires sound data from the outside; a communication unit that transmits the sound data to the server, and receives a parameter set generated on the basis of the analysis result obtained by analyzing the sound data in the server; a storage unit that stores the parameter set; and an adjustment unit that, on the basis of the parameter set, adjusts gains of a plurality of prescribed frequencies.

Abstract: The present invention relates to a silicon etching composition, and to a composition for selectively etching silicon with respect to a silicon insulating film. The etching composition according to the present invention can improve the selective etching ratio of silicon from the surface of the semiconductor on which a silicone oxide film and silicon are exposed.

Abstract: The present disclosure provides an etching composition for a metal nitride layer and an etching method of a metal nitride layer using the same, and more particularly, to an etching composition for a metal nitride layer selectively etching the metal nitride layer, an etching method of a metal nitride layer using the etching composition, and a method of manufacturing a microelectronic device, the method including an etching process performed using the etching composition.

Abstract: The present invention relates to a silicon etching composition, and to a composition for selectively etching silicon with respect to a silicon insulating film. The etching composition according to the present invention can improve the selective etching ratio of silicon from the surface of the semiconductor on which a silicone oxide film and silicon are exposed.

Abstract: A composition for treatment of a cancer according to an embodiment of the present disclosure expresses secreted protein acidic and rich in cysteine (SPARC). The composition includes an albumin and at least one cysteine bound thereto.