Patents by Inventor Myung Soo Huh

Myung Soo Huh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9809880
    Abstract: An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: November 7, 2017
    Assignee: SAMSUNG DISPLAY CO. LTD.
    Inventors: Choel Min Jang, In Kyo Kim, Suk Won Jung, Myung Soo Huh
  • Patent number: 9799849
    Abstract: In an aspect, an organic light-emitting display apparatus and a method of manufacturing the same are provided. The organic light-emitting display apparatus may include a substrate; a display unit formed on the substrate; and a thin film encapsulating layer encapsulating the display unit. The thin film encapsulating layer may include a plurality of organic layers and inorganic layers that are laminated alternately. At least one of the plurality of the inorganic films may include a first layer formed of a first material, a second layer formed of a second material other than the first material, and an intermediate layer provided between the first and second layers.
    Type: Grant
    Filed: November 22, 2016
    Date of Patent: October 24, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sung-Chul Kim, Myung-Soo Huh, Chang-Woo Shim
  • Publication number: 20170218508
    Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.
    Type: Application
    Filed: April 20, 2017
    Publication date: August 3, 2017
    Inventors: Myung-Soo HUH, Suk-Won JUNG, Jeong-Ho YI, Sang-Hyuk HONG, Yong-Suk LEE
  • Patent number: 9673265
    Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.
    Type: Grant
    Filed: September 8, 2013
    Date of Patent: June 6, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Myung-Soo Huh, Suk-Won Jung, Jeong-Ho Yi, Sang-Hyuk Hong, Yong-Suk Lee
  • Patent number: 9653701
    Abstract: A flexible display apparatus includes a flexible substrate, a display layer disposed on one surface of the flexible substrate and including a plurality of pixels, graphene disposed on a surface opposing the one surface of the flexible substrate, and an encapsulation layer covering the display layer.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: May 16, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seung-Ho Choi, Hyun-Woo Joo, Myung-Soo Huh
  • Publication number: 20170117473
    Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate includes a supply unit that is supplied with a first raw gas to form the deposition layer and an auxiliary gas, wherein the auxiliary gas does not constitute a raw material to form the deposition layer, a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas, a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form, and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate.
    Type: Application
    Filed: January 5, 2017
    Publication date: April 27, 2017
    Inventors: Jae-Hyun KIM, Myung-Soo HUH
  • Patent number: 9620738
    Abstract: A flat panel display device provides a sealing structure for comprising and sealing a display unit disposed in a first region on a substrate. The display unit includes the first region and a second region, and a barrier is disposed in the first region on the substrate, on an outer side of the display unit, and adjacent to the second region. The sealing structure contacts the barrier, and includes at least one first layer of an inorganic material and at least one second layer of an organic material. A method of manufacturing the flat panel display device is also disclosed.
    Type: Grant
    Filed: October 1, 2015
    Date of Patent: April 11, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sung-Joong Joo, Myung-Soo Huh, Suk-Won Jung
  • Publication number: 20170077454
    Abstract: In an aspect, an organic light-emitting display apparatus and a method of manufacturing the same are provided. The organic light-emitting display apparatus may include a substrate; a display unit formed on the substrate; and a thin film encapsulating layer encapsulating the display unit. The thin film encapsulating layer may include a plurality of organic layers and inorganic layers that are laminated alternately. At least one of the plurality of the inorganic films may include a first layer formed of a first material, a second layer formed of a second material other than the first material, and an intermediate layer provided between the first and second layers.
    Type: Application
    Filed: November 22, 2016
    Publication date: March 16, 2017
    Inventors: Sung-Chul Kim, Myung-Soo Huh, Chang-Woo Shim
  • Patent number: 9590207
    Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: March 7, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Myung-Soo Huh, Sun-Ho Kim, Hyun-Woo Joo, Jae-Hyun Kim
  • Patent number: 9556520
    Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: January 31, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Choel-Min Jang, Sung-Hun Key, In-Kyo Kim, Suk-Won Jung, Myung-Soo Huh
  • Publication number: 20170016109
    Abstract: A thin film depositing apparatus and a thin film deposition method using the apparatus. The thin film depositing apparatus includes a chamber configured to have a substrate mounted therein, an ejection unit configured to move in the chamber and to eject a deposition vapor to the substrate, and a source supply unit configured to supply a source of the deposition vapor to the ejection unit.
    Type: Application
    Filed: September 27, 2016
    Publication date: January 19, 2017
    Inventors: Yong-Suk Lee, Myung-Soo Huh, Cheol-Rae Jo, Sang-Hyuk Hong, Jeong-Ho Yi, Suk-Won Jung, Sun-Ho Kim, Mi-Ra An
  • Patent number: 9543518
    Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate includes a supply unit that is supplied with a first raw gas to form the deposition layer and an auxiliary gas, wherein the auxiliary gas does not constitute a raw material to form the deposition layer, a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas, a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form, and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: January 10, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae-Hyun Kim, Myung-Soo Huh
  • Publication number: 20170002468
    Abstract: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.
    Type: Application
    Filed: February 22, 2016
    Publication date: January 5, 2017
    Inventors: Jai Hyuk CHOI, Won Woong PARK, Sung Hun KEY, Min Soo KIM, Byeong Chun LEE, Suk Won JUNG, Hyun Woo JOO, Myung Soo HUH
  • Publication number: 20160376698
    Abstract: A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.
    Type: Application
    Filed: September 9, 2016
    Publication date: December 29, 2016
    Inventors: Yong-Suk LEE, Myung-Soo HUH, Suk-Won JUNG, Jeong-Ho YI, Mi-Ra AN
  • Publication number: 20160348241
    Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.
    Type: Application
    Filed: August 8, 2016
    Publication date: December 1, 2016
    Inventors: Cheol-Min Jang, Myung-Soo Huh, Suk-Won Jung, Jae-Hyun Kim, Sung-Chul Kim, Jin-Kwang Kim, Chang-Woo Shim, Sung-Hun Key, In-Kyo Kim
  • Patent number: 9508954
    Abstract: In an aspect, an organic light-emitting display apparatus and a method of manufacturing the same are provided. The organic light-emitting display apparatus may include a substrate; a display unit formed on the substrate; and a thin film encapsulating layer encapsulating the display unit. The thin film encapsulating layer may include a plurality of organic layers and inorganic layers that are laminated alternately. At least one of the plurality of the inorganic films may include a first layer formed of a first material, a second layer formed of a second material other than the first material, and an intermediate layer provided between the first and second layers.
    Type: Grant
    Filed: May 4, 2016
    Date of Patent: November 29, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sung-Chul Kim, Myung-Soo Huh, Chang-Woo Shim
  • Publication number: 20160322574
    Abstract: A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
    Type: Application
    Filed: July 8, 2016
    Publication date: November 3, 2016
    Inventors: Jin-Kwang KIM, Seung-Yong SONG, Myung-Soo HUH, Suk-Won JUNG, Choel-Min JANG, Jae-Hyun KIM, Sung-Chul KIM
  • Patent number: 9481929
    Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.
    Type: Grant
    Filed: February 10, 2014
    Date of Patent: November 1, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Choel-Min Jang, Sung-Hun Key, In-Kyo Kim, Suk-Won Jung, Myung-Soo Huh
  • Patent number: 9450206
    Abstract: An organic light-emitting apparatus including: a substrate; an organic light-emitting device disposed on the substrate and including a first electrode, a second electrode, and an intermediate layer disposed between the first electrode and the second electrode; and an encapsulation layer provided to cover the organic light-emitting device. The encapsulation layer includes a first inorganic layer including a first fracture point, and a first fracture control layer provided on the first inorganic layer to seal the first fracture point.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: September 20, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Myung-Soo Huh, Jae-Hyun Kim, Jin-Kwang Kim, Cheol-Lae Roh, Suk-Won Jung, Cheol-Min Jang
  • Patent number: 9450199
    Abstract: A method of forming nanocrystals and a method of manufacturing an organic light-emitting display apparatus that includes a metal compound thin film having the nanocrystals. The method of forming nanocrystals includes forming a metal compound thin film under a first pressure by using a reactive sputtering process, and forming the nanocrystals in the metal compound thin film under a second pressure that is lower than the first pressure by using the reactive sputtering process.
    Type: Grant
    Filed: August 9, 2013
    Date of Patent: September 20, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Myung-Soo Huh, Cheol-Lae Roh, Seung-Ho Choi