Patents by Inventor Naoki Nojiri

Naoki Nojiri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8436165
    Abstract: The present invention relates to a process for producing a decrystallized cellulose having a reduced cellulose I-type crystallinity from a cellulose-containing raw material in an efficient manner with an excellent productivity. In accordance with the present invention, there is provided a process for producing a decrystallized cellulose from a raw material comprising at least 20% by weight, based on the weight of the raw material excluding water contained therein, of a cellulose having a cellulose I-type crystallinity of more than 33% as calculated from the following formula: Cellulose I-type Crystallinity (%)=[(I22.6?I18.5)/I22.6]×100 wherein I22.6 is a diffraction intensity of a lattice plane (002 plane) as measured at a diffraction angle 2? of 22.6° in X-ray diffraction analysis; and I18.5 is a diffraction intensity of an amorphous moiety as measured at a diffraction angle 2? of 18.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: May 7, 2013
    Assignee: Kao Corporation
    Inventors: Naoki Nojiri, Masahiro Umehara, Tomohito Kitsuki, Munehisa Okutsu, Keiichiro Tomioka
  • Publication number: 20120103324
    Abstract: The invention relates to a highly productive process for producing decrystallized cellulose which includes treating a cellulose-containing raw material by means of a mill, wherein the cellulose-containing raw material has a cellulose content of a residue obtained by removing water from the cellulose-containing raw material of 20 mass % or more, has a cellulose I-type crystallinity of cellulose more than 33% as calculated from the following formula (1): Cellulose I-type Crystallinity (%)=[(I22.6?I18.5)/I22.6]×100??(1), wherein I22.6 is a diffraction intensity of a lattice plane (002 plane) as measured at a diffraction angle 2? of 22.6° in X-ray diffraction analysis; and I18.5 is a diffraction intensity of an amorphous moiety as measured at a diffraction angle 2? of 18.5° in X-ray diffraction analysis, and has a water content of 1.8 mass % or less, to thereby reduce the cellulose I-type crystallinity to 33% or less.
    Type: Application
    Filed: May 19, 2010
    Publication date: May 3, 2012
    Applicant: KAO CORPORATION
    Inventors: Kazutomo Osaki, Keiichiro Tomioka, Naoki Nojiri, Masahiro Umehara, Masafumi Miyamoto
  • Publication number: 20110204918
    Abstract: A delay simulation system comprises an input unit configured to input a netlist, a library, and information including load capacitances; and a simulation unit; the library defines a plurality of distortion patterns of input waveforms of the cells and defines delay values in correspondence with the plurality of distortion patterns of the input waveforms, slopes of the input waveforms, and the load capacitances; and the simulating unit is configured to calculate the delay time in such a manner that the simulating unit selects a distortion pattern of an input waveform according to a logic state of the cell, obtains a slope of the input waveform based on a load capacitance, and obtains a delay value corresponding to the distortion pattern of the input waveform, the slope of the input waveform and the load capacitance, from the library.
    Type: Application
    Filed: May 5, 2011
    Publication date: August 25, 2011
    Applicant: PANASONIC CORPORATION
    Inventor: Naoki NOJIRI
  • Publication number: 20110003341
    Abstract: A process for producing saccharide, including saccharifying decrystallized cellulose prepared from a raw material containing cellulose having cellulose I-type crystallinity of more than 33%, the process including: treating the cellulose-containing raw material by means of a mill to reduce the cellulose I-type crystallinity of the cellulose to 33% or less, wherein the cellulose-containing raw material has a cellulose content of a residue obtained by removing water from the cellulose-containing raw material of 20% by weight or more, to thereby prepare decrystallized cellulose, and causing a cellulase and/or a hemicellulase to act on the decrystallized cellulose.
    Type: Application
    Filed: December 16, 2008
    Publication date: January 6, 2011
    Applicant: KAO CORPORATION
    Inventors: Naoki Nojiri, Masahiro Umehara, Keiichiro Tomioka, Takako Kawano, Tomohito Kitsuki, Munehisa Okutsu, Akinori Ogawa
  • Publication number: 20100274001
    Abstract: The present invention relates to a process for producing a cellulose ether derivative in an industrially convenient and efficient manner by reacting a low-crystalline powdery cellulose with an epoxy compound in the presence of a catalyst.
    Type: Application
    Filed: October 21, 2008
    Publication date: October 28, 2010
    Applicant: Kao Corporation
    Inventors: Munehisa Okutsu, Masanori Takai, Toru Nishioka, Takeshi Ihara, Naoki Nojiri, Masahiro Umehara, Kohei Nakanishi
  • Patent number: 7768308
    Abstract: In a level shift circuit, the threshold voltage of N-type high-voltage transistors, to whose gates the voltage of a low-voltage supply VDD is applied, is set low. An input signal IN powered by the low-voltage supply VDD is input to the gate of an N-type transistor by way of an inverter. Therefore, even if the potentials at nodes W3 and W4 exceed the voltage of the low-voltage supply VDD, reverse current flow from the nodes W3 and W4 via parasitic diodes within the inverters into the low-voltage supply VDD is prevented. A protection circuit, composed of N-type transistor whose respective gates are fixed to the low-voltage supply VDD, is disposed between the two N-type high-voltage transistors N5, N6 and two N-type low-voltage transistors N1, N2 for receiving the complementary signals IN and XIN, thereby preventing the breakdown of those N-type complementary-signal-receiving transistors.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: August 3, 2010
    Assignee: Panasonic Corporation
    Inventors: Masato Maede, Naoki Nojiri, Masahiro Gion, Shinji Kinuyama, Daisuke Matsuoka, Shiro Usami
  • Publication number: 20100105891
    Abstract: The present invention relates to a process for producing a decrystallized cellulose having a reduced cellulose I-type crystallinity from a cellulose-containing raw material in an efficient manner with an excellent productivity. In accordance with the present invention, there is provided a process for producing a decrystallized cellulose from a raw material containing a cellulose having a cellulose I-type crystallinity of more than 33% as calculated from the following formula: Cellulose I-type Crystallinity (%)=[(I22.6?I18.5)/I22.6]×100 wherein I22.6 is a diffraction intensity of a lattice plane (002 plane) as measured at a diffraction angle 2? of 22.6° in X-ray diffraction analysis; and I18.5 is a diffraction intensity of an amorphous moiety as measured at a diffraction angle 2? of 18.
    Type: Application
    Filed: February 15, 2008
    Publication date: April 29, 2010
    Applicant: Kao Corporation
    Inventors: Naoki Nojiri, Masahiro Umehara, Tomohito Kitsuki, Munehisa Okutsu, Keiichiro Tomioka
  • Patent number: 7436213
    Abstract: In a level shifter, OFF leakage currents flow through two N-type transistors for signal input even when they are OFF. However, another N-type transistor serving as an OFF leakage generation circuit and three P-type transistors serving as current mirrors, which constitute a current conversion circuit, supply to the signal-input transistors a current equivalent to or greater than the OFF leakage currents flowing through the signal-input transistors when they are OFF, thereby canceling the OFF leakage currents. Therefore, one of nodes which is at H level is surely fixed to a potential equal to a higher voltage supply. Thus, the level shifter surely operates with a high speed even when large OFF leakage currents flow through the signal-input transistors.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: October 14, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Naoki Nojiri
  • Publication number: 20080238481
    Abstract: In a level shift circuit, the threshold voltage of N-type high-voltage transistors, to whose gates the voltage of a low-voltage supply VDD is applied, is set low. An input signal IN powered by the low-voltage supply VDD is input to the gate of an N-type transistor by way of an inverter. Therefore, even if the potentials at nodes W3 and W4 exceed the voltage of the low-voltage supply VDD, reverse current flow from the nodes W3 and W4 via parasitic diodes within the inverters into the low-voltage supply VDD is prevented. A protection circuit, composed of N-type transistor whose respective gates are fixed to the low-voltage supply VDD, is disposed between the two N-type high-voltage transistors N5, N6 and two N-type low-voltage transistors N1, N2 for receiving the complementary signals IN and XIN, thereby preventing the breakdown of those N-type complementary-signal-receiving transistors.
    Type: Application
    Filed: June 4, 2008
    Publication date: October 2, 2008
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Masato MAEDE, Naoki Nojiri, Masahiro Gion, Shinji Kinuyama, Daisuke Matsuoka, Shiro Usami
  • Publication number: 20080136489
    Abstract: In a level shifter, OFF leakage currents flow through two N-type transistors for signal input even when they are OFF. However, another N-type transistor serving as an OFF leakage generation circuit and three P-type transistors serving as current mirrors, which constitute a current conversion circuit, supply to the signal-input transistors a current equivalent to or greater than the OFF leakage currents flowing through the signal-input transistors when they are OFF, thereby canceling the OFF leakage currents. Therefore, one of nodes which is at H level is surely fixed to a potential equal to a higher voltage supply. Thus, the level shifter surely operates with a high speed even when large OFF leakage currents flow through the signal-input transistors.
    Type: Application
    Filed: February 4, 2008
    Publication date: June 12, 2008
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventor: Naoki Nojiri
  • Patent number: 7348801
    Abstract: In a level shifter, OFF leakage currents flow through two N-type transistors for signal input even when they are OFF. However, another N-type transistor serving as an OFF leakage generation circuit and three P-type transistors serving as current mirrors, which constitute a current conversion circuit, supply to the signal-input transistors a current equivalent to or greater than the OFF leakage currents flowing through the signal-input transistors when they are OFF, thereby canceling the OFF leakage currents. Therefore, one of nodes which is at H level is surely fixed to a potential equal to a higher voltage supply. Thus, the level shifter surely operates with a high speed even when large OFF leakage currents flow through the signal-input transistors.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: March 25, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Naoki Nojiri
  • Publication number: 20070247210
    Abstract: In a level shift circuit, the threshold voltage of N-type high-voltage transistors, to whose gates the voltage of a low-voltage supply VDD is applied, is set low. An input signal IN powered by the low-voltage supply VDD is input to the gate of an N-type transistor by way of an inverter. Therefore, even if the potentials at nodes W3 and W4 exceed the voltage of the low-voltage supply VDD, reverse current flow from the nodes W3 and W4 via parasitic diodes within the inverters into the low-voltage supply VDD is prevented. A protection circuit, composed of N-type transistor whose respective gates are fixed to the low-voltage supply VDD, is disposed between the two N-type high-voltage transistors N5, N6 and two N-type low-voltage transistors N1, N2 for receiving the complementary signals IN and XIN, thereby preventing the breakdown of those N-type complementary-signal-receiving transistors.
    Type: Application
    Filed: June 13, 2007
    Publication date: October 25, 2007
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Masato Maede, Naoki Nojiri, Masahiro Gion, Shinji Kinuyama, Daisuke Matsuoka, Shiro Usami
  • Patent number: 7244439
    Abstract: A cosmetic composition having excellent application feeling and transparency while maintaining covering power which includes (a) composite particles obtained by allowing at least two kinds of particles having different shapes and particle diameters to contact with at least one polymer compound selected from the group consisting of fluorinated polymer compounds, silicone polymer compounds, and mixture thereof, in the presence of supercritical carbon dioxide, and (b) a cosmetic component.
    Type: Grant
    Filed: April 10, 2003
    Date of Patent: July 17, 2007
    Assignee: Kao Corporation
    Inventors: Yuko Yago, Keisuke Nakao, Ryuji Hasegawa, Noboru Nagatani, Keiichi Fukuda, Naoki Nojiri, Hidetake Nakamura, Hideaki Kubo
  • Publication number: 20060208759
    Abstract: In a level shifter, OFF leakage currents flow through two N-type transistors for signal input even when they are OFF. However, another N-type transistor serving as an OFF leakage generation circuit and three P-type transistors serving as current mirrors, which constitute a current conversion circuit, supply to the signal-input transistors a current equivalent to or greater than the OFF leakage currents flowing through the signal-input transistors when they are OFF, thereby canceling the OFF leakage currents. Therefore, one of nodes which is at H level is surely fixed to a potential equal to a higher voltage supply. Thus, the level shifter surely operates with a high speed even when large OFF leakage currents flow through the signal-input transistors.
    Type: Application
    Filed: March 16, 2006
    Publication date: September 21, 2006
    Inventor: Naoki Nojiri
  • Patent number: 6992356
    Abstract: In an I/O circuit unit located in the periphery of a semiconductor chip, a plurality of ESD protection transistors are provided in each I/O cell. An electrode pad cell has a two-layer structure including a lower electrode pad and an upper electrode pad. The electrode pad cell is arranged so as to be present over a connection line of ESD protection transistors of an associated I/O cell. With part of the first pad portion of an adjacent electrode pad located in an end portion of the second pad portion of the electrode pad, the second pad portion can not extend further onward but the third pad portion having a smaller width than that of the second pad portion is arranged onward. Thus, destruction of the ESD protection transistors is not caused, so that an internal circuit is protected from an electrostatic discharge which comes into electrode pads.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: January 31, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Koichi Taniguchi, Naoki Nojiri
  • Publication number: 20050134355
    Abstract: In a level shift circuit, the threshold voltage of N-type high-voltage transistors, to whose gates the voltage of a low-voltage supply VDD is applied, is set low. An input signal IN powered by the low-voltage supply VDD is input to the gate of an N-type transistor by way of an inverter. Therefore, even if the potentials at nodes W3 and W4 exceed the voltage of the low-voltage supply VDD, reverse current flow from the nodes W3 and W4 via parasitic diodes within the inverters into the low-voltage supply VDD is prevented. A protection circuit, composed of N-type transistor whose respective gates are fixed to the low-voltage supply VDD, is disposed between the two N-type high-voltage transistors N5, N6 and two N-type low-voltage transistors N1, N2 for receiving the complementary signals IN and XIN, thereby preventing the breakdown of those N-type complementary-signal-receiving transistors.
    Type: Application
    Filed: December 3, 2004
    Publication date: June 23, 2005
    Inventors: Masato Maede, Naoki Nojiri, Masahiro Gion, Shinji Kinuyama, Daisuke Matsuoka, Shiro Usami
  • Patent number: 6856022
    Abstract: According to the invention, in input/output circuit portions positioned around a semiconductor chip, electrode pads are arranged above each of a plurality of input/output cells arranged in a line. The width of the electrode pads is greater than the width of the input/output cells, and thus the electrode pads cannot be arranged in a single line and are instead arranged staggered in two lines. The electrode pads of one row are arranged shifted so that they do not overlap with the internal terminals of the input/output cells, but are disposed near these internal terminals. The spacing between the electrode pads is set to a distance that is at least a set distance determined by the isolation rules of the design.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: February 15, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Naoki Nojiri, Koji Takemura, Noriyuki Nagai, Atsushi Doi
  • Publication number: 20040188763
    Abstract: In an I/O circuit unit located in the periphery of a semiconductor chip, a plurality of ESD protection transistors are provided in each I/O cell. An electrode pad cell has a two-layer structure including a lower electrode pad and an upper electrode pad. The electrode pad cell is arranged so as to be present over a connection line of ESD protection transistors of an associated I/O cell. With part of the first pad portion of an adjacent electrode pad located in an end portion of the second pad portion of the electrode pad, the second pad portion can not extend further onward but the third pad portion having a smaller width than that of the second pad portion is arranged onward. Thus, destruction of the ESD protection transistors is not caused, so that an internal circuit is protected from an electrostatic discharge which comes into electrode pads.
    Type: Application
    Filed: March 23, 2004
    Publication date: September 30, 2004
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Koichi Taniguchi, Naoki Nojiri
  • Publication number: 20040188848
    Abstract: According to the invention, in input/output circuit portions positioned around a semiconductor chip, electrode pads are arranged above each of a plurality of input/output cells arranged in a line. The width of the electrode pads is greater than the width of the input/output cells, and thus the electrode pads cannot be arranged in a single line and are instead arranged staggered in two lines. The electrode pads of one row are arranged shifted so that they do not overlap with the internal terminals of the input/output cells, but are disposed near these internal terminals. The spacing between the electrode pads is set to a distance that is at least a set distance determined by the isolation rules of the design.
    Type: Application
    Filed: March 31, 2003
    Publication date: September 30, 2004
    Inventors: Naoki Nojiri, Koji Takemura, Noriyuki Nagai, Atsushi Doi
  • Patent number: 6791391
    Abstract: In a CMOS level shifting circuit including N-channel transistors that have sources to which a digital signal is supplied, a bias voltage Vref is supplied to gates of the N-channel transistors, and the bias voltage Vref is set to be higher than a high level voltage of the digital signal and lower than a value obtained by adding a threshold voltage of the N-channel transistors to the high level voltage of the digital signal. Thus, a level shifting circuit is provided that is capable of outputting a signal having subjected to stable level conversion, even when a voltage level of a low voltage signal is lowered.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: September 14, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hidetoshi Nishimura, Masahiro Gion, Heiji Ikoma, Naoki Nojiri