Patents by Inventor Naoki Suzuki

Naoki Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040085625
    Abstract: Light signals of first to n-th bands amplified en bloc undergo proper attenuation through an adjustable optical attenuator in conformance with attenuation in an optical fiber connected to input of an optical amplifying repeater apparatus, whereon the light signals are demultiplexed or separated into individual bands and amplified by first to n-th fixed-gain optical amplifiers (#1, . . . , #n) each having a high fixed gain in the respective bands to be subsequently multiplexed by an optical multiplexer and then sent out onto a transmission line. A monitoring light branching device extracts a part of light power of a specific monitoring wavelength, which is then fed to an adjustable attenuator control circuit which controls the attenuation factor of the adjustable optical attenuator so that the light power of the specific wavelength remains constant. The gain of the optical amplifying repeater apparatus at the specific wavelength can thus be determined.
    Type: Application
    Filed: November 17, 2003
    Publication date: May 6, 2004
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kuniaki Motoshima, Katsuhiro Shimizu, Junichi Nakagawa, Naoki Suzuki
  • Publication number: 20040084148
    Abstract: There are provided a low pressure plasma processing apparatus and method by which a throughput can be improved, film contamination can be effectively prevented, and a film can be readily managed. A film substrate is carried in from the outside of a plasma processing apparatus main body to a substrate carrying position in the plasma processing apparatus main body, the film substrate positioned at the substrate carrying position is carried into a chamber, a reaction gas is introduced while the chamber is being evacuated, high frequency power is applied under low pressure to generate plasma so that plasma processing is performed to remove organic matter from the film substrate, and the film substrate subjected to plasma processing is taken out from the chamber and positioned at a substrate carrying-out position in the plasma processing apparatus main body and carried out of the plasma processing apparatus main body.
    Type: Application
    Filed: October 16, 2002
    Publication date: May 6, 2004
    Inventors: Tatsuo Sasaoka, Naoki Suzuki, Ken Kobayashi
  • Publication number: 20040056413
    Abstract: A sheet supply apparatus includes a sheet supply tray for stacking a sheet, and an auxiliary tray movable between a support position where the auxiliary tray supports a portion of the sheet stacked on the sheet supply tray and a storage position where the auxiliary tray overlaps the sheet supply tray. A sheet supply device supplies the sheet stacked on the sheet supply tray. A sheet detection device is mounted on the auxiliary tray for detecting the sheet stacked on the sheet supply tray, and a tray position detection device detects a position of the auxiliary tray between the support position and the storage position. An identifying device identifies a length of the sheet in a sheet supply direction based on detection results of the sheet detection device and the tray detection device.
    Type: Application
    Filed: July 3, 2003
    Publication date: March 25, 2004
    Inventors: Mizuho Shirakura, Naoki Suzuki
  • Patent number: 6676778
    Abstract: A slider and suspension of a hard disk drive are joined with a low modulus epoxy adhesive. The slider and suspension are set in a bonding jig while they are moving from process to process or subjected to a thermosetting treatment in a controlled temperature chamber. The slider and suspension must be kept bound together with the bonding jig until the adhesive is cured through a thermal treatment. The low modulus epoxy adhesive is cured with heat from a laser beam. In addition, a resistance value of the head disposed at the slider is measured so as to monitor the temperature of the head, thereby deciding both output and irradiation time of the laser beam for obtaining a desired strength of the bond within a predetermined temperature range.
    Type: Grant
    Filed: June 19, 2000
    Date of Patent: January 13, 2004
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tatsumi Tuchiya, Tatsushi Yoshida, Naoki Fujii, Surya Pattanaik, William A. Childers, Diane Sprandel O'Regan, Naoki Suzuki, Yuhsuke Matsumoto
  • Patent number: 6667250
    Abstract: To provide a film substrate treatment apparatus that appropriately mounts film substrates on an electrostatic adsorption stage. In the film substrate treatment apparatus, adsorption pads are disposed on the first adsorption units that mount film substrates on an electrostatic stage, and a pressing member that presses the edge portion areas of the film substrates against the stage is provided. The film substrates can thereby be reliably attached to the stage, and the film substrates can be appropriately treated in a decompressed atmosphere.
    Type: Grant
    Filed: April 1, 2003
    Date of Patent: December 23, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tatsuo Sasaoka, Naoki Suzuki, Takahiro Yonezawa, Satoshi Horie
  • Patent number: 6657778
    Abstract: Light signals of first to n-th bands amplified en bloc undergo proper attenuation through an adjustable optical attenuator in conformance with attenuation in an optical fiber connected to input of an optical amplifying repeater apparatus, whereon the light signals are demultiplexed or separated into individual bands and amplified by first to n-th fixed-gain optical amplifiers (#1, . . . , #n) each having a high fixed gain in the respective bands to be subsequently multiplexed by an optical multiplexer and then sent out onto a transmission line. A monitoring light branching device extracts a part of light power of a specific monitoring wavelength, which is then fed to an adjustable attenuator control circuit which controls the attenuation factor of the adjustable optical attenuator so that the light power of the specific wavelength remains constant. The gain of the optical amplifying repeater apparatus at the specific wavelength can thus be determined.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: December 2, 2003
    Assignee: Mitsubishi DenkiKabushiki Kaisha
    Inventors: Kuniaki Motoshima, Katsuhiro Shimizu, Junichi Nakagawa, Naoki Suzuki
  • Publication number: 20030183339
    Abstract: To provide a film substrate treatment apparatus that appropriately mounts film substrates on an electrostatic adsorption stage. In the film substrate treatment apparatus, adsorption pads are disposed on the first adsorption units that mount film substrates on an electrostatic stage, and a pressing member that presses the edge portion areas of the film substrates against the stage is provided. The film substrates can thereby be reliably attached to the stage, and the film substrates can be appropriately treated in a decompressed atmosphere.
    Type: Application
    Filed: April 1, 2003
    Publication date: October 2, 2003
    Applicant: MATSUSHITA ELEC IND CO LTD
    Inventors: Tatsuo Sasaoka, Naoki Suzuki, Takahiro Yonezawa, Satoshi Horie
  • Publication number: 20030158837
    Abstract: An information processing apparatus capable of storing in an address book a photograph of the face of a person listed in the address book, together with data such as the name and address of that listed person. A real time image of the listed person being captured by a camera is displayed in an area provided to display the photograph of the face of the listed person. The real time image is stored as a still image, which is entered as the photograph of the face of the listed person into the address book together with the data concerning the listed person.
    Type: Application
    Filed: October 11, 2002
    Publication date: August 21, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Naoki Suzuki, Manabu Nanba, Hirotaka Abe, Makoto Suzuki, Kazuhiro Yoshihara
  • Patent number: 6588232
    Abstract: A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing the substrate is arranged near the stage section and the treatment section and deviated from a space between the stage section and the treatment section in a second direction crossing a first direction passing through the stage section and the treatment section. A transfer robot is arranged between the stage section and the treatment section. The transfer robot transfers the substrate between the stage section, treatment section, and washing section and loads the substrate, washed in the washing section, directly into the treatment section.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: July 8, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naoki Suzuki, Noriyuki Hirata, Masatoshi Shimizu, Takuo Higashijima, Hiroaki Takahashi, Yoshiaki Komatsubara
  • Publication number: 20030049937
    Abstract: The present invention provides an apparatus and a method for surface treatment to substrates whereby the quality of substrates can be maintained by preventing an excessive plasma treatment to substrates. In carrying out the plasma treatment to a surface of the substrate in a reaction chamber, there are provided an emission spectroscopic analysis device or a mass analyzer, and a controller, so that an energy of ions in plasma is controlled to decrease when, e.g., bromine included in the substrate is detected, and the surface treatment to the substrate is controlled to stop when removing impurities of the substrate is detected to end. The bromine once separated from the substrate is prevented from adhering again to the substrate to corrode the substrate. Moreover, ions are prevented from being excessively irradiated to the substrate when the removal of impurities ends, thereby reducing damages to the substrate. The substrate quality is maintained accordingly.
    Type: Application
    Filed: September 4, 2002
    Publication date: March 13, 2003
    Inventors: Naoki Suzuki, Kazuto Nishida, Kazuyuki Tomita
  • Publication number: 20030021010
    Abstract: Light signals of first to n-th bands amplified en bloc undergo proper attenuation through an adjustable optical attenuator in conformance with attenuation in an optical fiber connected to input of an optical amplifying repeater apparatus, whereon the light signals are demultiplexed or separated into individual bands and amplified by first to n-th fixed-gain optical amplifiers (#1, . . . , #n) each having a high fixed gain in the respective bands to be subsequently multiplexed by an optical multiplexer and then sent out onto a transmission line. A monitoring light branching device extracts a part of light power of a specific monitoring wavelength, which is then fed to an adjustable attenuator control circuit which controls the attenuation factor of the adjustable optical attenuator so that the light power of the specific wavelength remains constant. The gain of the optical amplifying repeater apparatus at the specific wavelength can thus be determined.
    Type: Application
    Filed: August 12, 2002
    Publication date: January 30, 2003
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kuniaki Motoshima, Katsuhiro Shimizu, Junichi Nakagawa, Naoki Suzuki
  • Publication number: 20020183592
    Abstract: An endoscope system is provided, including an endoscope having a flexible inserting tube to be inserted into a human body and a plurality of bending sensors distributed over the flexible inserting tube along the longitudinal direction thereof. Each of the bending sensors detects the local bending state of the flexible inserting tube at the location the bending sensor are provided. A computer adapted to receive data on the local bending state from each of the plurality of bending sensors is also provided. The computer generates a graphical image representing the geometrical configuration of the flexible inserting tube from the data on the local bending states. A monitor connected to the computer to display the graphical image generated by the computer.
    Type: Application
    Filed: May 21, 2002
    Publication date: December 5, 2002
    Applicant: ASAHI KOGAKU KOGYO KABUSHIKI KAISHA
    Inventors: Naoki Suzuki, Kazuki Sumiyama, Naoshi Koizumi, Akira Sugiyama, Tetsuya Tarumoto, Toshiyuki Hashiyama, Motoko Kawamura, Takayuki Enomoto, Minoru Matsushita, Tetsuya Nakamura, Kenichi Ohara, Satoshi Takami
  • Publication number: 20020021301
    Abstract: A drawing-information processing apparatus is used for setting drawing information at positions specified through a drawing-information inputting part. An attribute-inputting part is used for setting attribute of the drawing information, and a changing part is used for changing an attribute of the drawing information while the drawing information is input through the drawing-information inputting part.
    Type: Application
    Filed: February 23, 2001
    Publication date: February 21, 2002
    Inventor: Naoki Suzuki
  • Patent number: 6342139
    Abstract: A sputtering system includes a vacuum chamber, a sputtering electrode provided in the vacuum chamber, a target supported on the sputtering electrode with a front surface of the target and a substrate disposed in the vacuum chamber so as to be opposed to each other. A high-frequency or DC power source supplies a high-frequency or DC power to the sputtering electrode to generate plasma on the target, and an antenna is provided for generating an electromagnetic wave and is disposed outside the vacuum chamber and near the target. An electromagnetic-wave inlet window for introducing into the vacuum chamber an electromagnetic wave generated from the antenna is provided in a wall of the vacuum chamber.
    Type: Grant
    Filed: February 1, 2000
    Date of Patent: January 29, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Isamu Aokura, Tomohiro Okumura, Naoki Suzuki
  • Patent number: 6270619
    Abstract: A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing the substrate is arranged near the stage section and the treatment section and deviated from a space between the stage section and the treatment section in a second direction crossing a first direction passing through the stage section and the treatment section. A transfer robot is arranged between the stage section and the treatment section. The transfer robot transfers the substrate between the stage section, treatment section, and washing section and loads the substrate, washed in the washing section, directly into the treatment section.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: August 7, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naoki Suzuki, Noriyuki Hirata, Masatoshi Shimizu, Takuo Higashijima, Hiroaki Takahashi, Yoshiaki Komatsubara
  • Patent number: 6172267
    Abstract: A process for producing aldehydes, which comprises reacting a mono-olefinic compound with carbon monoxide and hydrogen in the presence of a Group VIII transition metal compound of a bisphosphite compound of the following formula (1) or (2)
    Type: Grant
    Filed: October 27, 1998
    Date of Patent: January 9, 2001
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hisao Urata, Yasuhiro Wada, Yoshiyuki Tanaka, Naoki Suzuki, Hiroaki Itagaki
  • Patent number: 5916820
    Abstract: A thin film forming method for forming a thin film on a surface of a substrate having a stepped portion due to a difference in level, includes steps of performing first thin film deposition with plasma generated in a processing chamber by applying high-frequency voltages to electrodes, performing thin film shaping with plasma generated in the processing chamber by applying a high-frequency voltage to a coil, and performing second thin film deposition with plasma generated in the processing chamber by applying high-frequency voltages to the electrodes.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: June 29, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tomohiro Okumura, Ichiro Nakayama, Yuichiro Yamada, Naoki Suzuki
  • Patent number: 5863338
    Abstract: A forming apparatus of a thin film, includes a processing chamber where a predetermined process is carried out on a surface of a supplied substrate, and a feeding device, which is provided in the processing chamber, for feeding material to form an organic molecular layer including silicon or germanium on the surface of the substrate. A forming method of a thin film, includes steps of forming a thin film on a surface of a supplied substrate in a processing chamber, and feeding material for forming an organic molecular layer including silicon or germanium on the formed thin film on the surface of the substrate through a feeding device in the processing chamber, and then forming the organic molecular layer on the surface of the substrate.
    Type: Grant
    Filed: January 5, 1996
    Date of Patent: January 26, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuichiro Yamada, Naoki Suzuki, Ryuzo Houchin, Noboru Nomura, Kousaku Yano, Yuka Terai
  • Patent number: 5761798
    Abstract: A system and a method for mounting electronic components on a printed circuit board are disclosed. The system comprises a component supporting stage, a board bearing stage, mounting heads, vacuum bits, pressure sensors, device for computing thresholds, and device for determining the status of the pick-up operation of the vacuum bits. The method comprises the steps of detecting a first pressure value of a vacuum bit at which the vacuum bit is open and a second pressure value of the vacuum bit at which the vacuum bit is closed, computing a threshold value in response to the detected first and second pressure values, and moving the mounting heads to the board bearing stage in response to a determination that the pressure value of the vacuum bit at which the component is picked up exceeds the threshold values.
    Type: Grant
    Filed: February 20, 1996
    Date of Patent: June 9, 1998
    Assignee: Samsung Aerospace Industries, Ltd.
    Inventor: Naoki Suzuki
  • Patent number: 5501739
    Abstract: A forming apparatus of a thin film includes a processing chamber where a predetermined process is carried out on a surface of a supplied substrate. A feeding device is provided in the processing chamber for feeding material to form an organic molecular layer including silicon or germanium on the surface of the substrate. A forming method of a thin film includes the steps of forming the thin film on the surface of the supplied substrate in the processing chamber, and feeding material for forming the organic molecular layer, including silicon or germanium, on the formed thin film on the surface of the substrate through a feeding device in the processing chamber, and then forming the organic molecular layer on the surface of the substrate.
    Type: Grant
    Filed: November 29, 1993
    Date of Patent: March 26, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yuichiro Yamada, Naoki Suzuki, Ryuzo Houchin, Noboru Nomura, Kousaku Yano, Yuka Terai