Patents by Inventor Naomi Shida

Naomi Shida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220085221
    Abstract: The present embodiment provide a method for evaluating anion permeability of a graphene-containing membrane and also to provide a photoelectric conversion device employing a graphene-containing membrane having controlled anion permeability.
    Type: Application
    Filed: November 29, 2021
    Publication date: March 17, 2022
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Yutaka SAITA
  • Patent number: 11217714
    Abstract: The present embodiment provide a method for evaluating anion permeability of a graphene-containing membrane and also to provide a photoelectric conversion device employing a graphene-containing membrane having controlled anion permeability.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: January 4, 2022
    Assignees: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki Naito, Naomi Shida, Yutaka Saita
  • Publication number: 20210408378
    Abstract: The embodiment provides a coating process capable of simply and inexpensively producing devices having strip-shaped cells, and a coating apparatus usable for the process. The process comprises: (a) placing a bar coating head almost parallel to the substrate, (b) placing plural coating nozzles for supplying coating solution to meniscus-forming parts, so that the center between each adjacent two of the coating nozzles may correspond to the separation area between each adjacent two of the strip-shaped cell bases, and (c) moving the substrate or the bar coating head while the coating solution is being supplied from the nozzles, to form the coating films.
    Type: Application
    Filed: September 8, 2021
    Publication date: December 30, 2021
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Takashi KUMATA, Yutaka SAITA
  • Publication number: 20210387222
    Abstract: According to one embodiment, a coating head includes a coating bar, nozzles, a first member, second members, third members, elastic members, and a position controller. The coating bar faces a coating member. The nozzles supply a liquid toward the coating bar. The first member includes first recesses. A portion of the nozzles is between the first recesses and the third members. The portion of the nozzles and the third members are fixed to the first member by the second members. The elastic members are located in at least first, second, or third positions. The first position is between the third members and the second members. The second position is between the portion of the first recesses and the nozzles. The third position is between the portion of the nozzles and the third members. The position controller controls a relative position between the coating bar and the nozzles.
    Type: Application
    Filed: August 24, 2021
    Publication date: December 16, 2021
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Kohei NARA, Takahiro KOKUBO, Yutaka SAITA
  • Publication number: 20210184127
    Abstract: The embodiments provide a process for easily producing an electrode having low resistance, easily subjected to post-process and hardly impairing the device; and also provide, as its application, a production process for a photoelectric conversion device. The process comprises the steps of: coating a hydrophobic substrate directly with a dispersion of metal nanomaterial, to form a metal nanomaterial layer, coating the surface of the metal nanomaterial layer with a dispersion of carbon material, to form a carbon material layer and thereby to form an electrode layer comprising a laminate of the metal nanomaterial layer and the carbon material layer, pressing the carbon material layer onto a hydrophilic substrate so that the surface of the carbon material layer may be directly fixed on the hydrophilic substrate, and peeling away the hydrophobic substrate so as to transfer the electrode layer onto the hydrophilic substrate.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Yutaka SAITA
  • Publication number: 20210178420
    Abstract: An embodiment of the present invention provides a coating method, a coating bar head and a coating apparatus which enables coating in which changes in coating film thickness is less likely to occur, even when performing meniscus coating at a high speed. This coating method is a coating method including: supplying a coating liquid between a coating bar head and a substrate to form a meniscus; and moving the substrate, wherein a cross section of the coating surface of the bar head in the direction of coating, is a convex curve, and has bending points at both ends of the curve.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Mitsunaga SAITO, Yutaka SAITA
  • Publication number: 20200395491
    Abstract: The embodiment provides a graphene-containing membrane producible by wet-coating and excellent in electric properties, a process for producing the membrane, a graphene-containing membrane laminate, and a photoelectric conversion device using the graphene-containing membrane. The graphene-containing membrane contains graphene having a graphene skeleton combined with polyalkyleneimine chains. The membrane has a ratio of the photoelectron intensity at the energy peak position of C1s orbital to that at the bonding energy on an X-ray photoelectron spectrum measured on an ITO film of 288 eV in a range of 5.5 to 20. This membrane can be produced by heating a graphene oxide-containing film in the presence of polyalkyleneimine and further heating the film in the presence of a reducing agent. The graphene-containing membrane can be so installed in a photoelectric conversion device that it is placed between the photoelectric conversion layer and the electrode.
    Type: Application
    Filed: September 1, 2020
    Publication date: December 17, 2020
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki Naito, Naomi Shida, Yutaka Saita
  • Publication number: 20200284744
    Abstract: The embodiments provide a method making it possible to safely and inexpensively measure concentrations of combustible gases, such as methanol, at room temperature even in high concentration atmospheres, and also provide a sensor making it possible to carry out the above measurement method.
    Type: Application
    Filed: September 6, 2019
    Publication date: September 10, 2020
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Katsuyuki Naito, Naomi Shida
  • Publication number: 20200212231
    Abstract: The present embodiment provide a method for evaluating anion permeability of a graphene-containing membrane and also to provide a photoelectric conversion device employing a graphene-containing membrane having controlled anion permeability.
    Type: Application
    Filed: March 13, 2020
    Publication date: July 2, 2020
    Applicants: Kabushiki Kaisha Toshiba, Toshiba Energy Systems & Solutions Corporation
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Yutaka SAITA
  • Patent number: 10644172
    Abstract: The present embodiments provide a transparent electrode having a laminate structure of: a first metal oxide layer having an amorphous structure and electroconductivity, a metal layer made of a metallic material containing silver or copper, a second metal oxide layer having an amorphous structure and electroconductivity, and a third metal oxide layer having an amorphous structure and continuity, stacked in this order.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: May 5, 2020
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Katsuyuki Naito, Mitsunaga Saito, Takeshi Niimoto
  • Publication number: 20190393416
    Abstract: The embodiments provide a process and an apparatus for easily producing a transparent electrode of low resistance and of high transparency. The process comprises: coating a hydrophobic polymer film with a dispersion of metal nanowires, press-bonding an electroconductive substrate directly onto the metal nanowires on the polymer film, and peeling and transferring the metal nanowires from the polymer film onto the conductive substrate. The embodiments also relates to an apparatus for the process.
    Type: Application
    Filed: September 9, 2019
    Publication date: December 26, 2019
    Applicants: KABUSHIKI KAISHA TOSHIBA, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION
    Inventors: Katsuyuki Naito, Naomi Shida, Mitsunaga Saito, Takeshi Niimoto
  • Publication number: 20190378940
    Abstract: The present embodiments provide a transparent electrode having a laminate structure of: a first metal oxide layer having an amorphous structure and electroconductivity, a metal layer made of a metallic material containing silver or copper, a second metal oxide layer having an amorphous structure and electroconductivity, and a third metal oxide layer having an amorphous structure and continuity, stacked in this order.
    Type: Application
    Filed: August 22, 2019
    Publication date: December 12, 2019
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi SHIDA, Katsuyuki NAITO, Mitsunaga SAITO, Takeshi NIIMOTO
  • Patent number: 10431702
    Abstract: The present embodiments provide a transparent electrode having a laminate structure of: a first metal oxide layer having an amorphous structure and electroconductivity, a metal layer made of a metallic material containing silver or copper, a second metal oxide layer having an amorphous structure and electroconductivity, and a third metal oxide layer having an amorphous structure and continuity, stacked in this order.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: October 1, 2019
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Katsuyuki Naito, Mitsunaga Saito, Takeshi Niimoto
  • Publication number: 20190081190
    Abstract: The present embodiments provide a transparent electrode having a laminate structure of: a metal oxide layer having an amorphous structure and electroconductivity, and a metal nanowire layer; and further comprising an auxiliary metal wiring. The auxiliary metal wiring covers a part of the metal nanowire layer or of the metal oxide layer, and is connected to the metal nanowire layer.
    Type: Application
    Filed: March 13, 2018
    Publication date: March 14, 2019
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Katsuyuki NAITO, Naomi SHIDA, Mitsunaga SAITO, Takeshi NllMOTO
  • Publication number: 20190027622
    Abstract: The present embodiments provide a transparent electrode having a laminate structure of: a first metal oxide layer having an amorphous structure and electroconductivity, a metal layer made of a metallic material containing silver or copper, a second metal oxide layer having an amorphous structure and electroconductivity, and a third metal oxide layer having an amorphous structure and continuity, stacked in this order.
    Type: Application
    Filed: March 13, 2018
    Publication date: January 24, 2019
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Katsuyuki Naito, Mitsunaga Saito, Takeshi Niimoto
  • Patent number: 10018908
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: July 10, 2018
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Reiko Yoshimura, Hiroyuki Kashiwagi, Ikuo Yoneda, Tsukasa Tada
  • Publication number: 20170131630
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Application
    Filed: January 23, 2017
    Publication date: May 11, 2017
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi SHIDA, Kenji TODORI, Shigehiko MORI, Reiko YOSHIMURA, Hiroyuki KASHIWAGI, lkuo YONEDA, Tsukasa TADA
  • Patent number: 9588418
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: March 7, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Reiko Yoshimura, Hiroyuki Kashiwagi, Ikuo Yoneda, Tsukasa Tada
  • Patent number: 9550322
    Abstract: A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating unit being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: January 24, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Ko Yamada, Masakazu Yamagiwa, Reiko Yoshimura, Yasuyuki Hotta, Tsukasa Tada, Hiroyuki Kashiwagi, Ikuo Yoneda
  • Patent number: 9409119
    Abstract: An acid gas absorbent of which recovery amount of acid gas such as carbon dioxide is high, and an acid gas removal device and an acid gas removal method using the acid gas absorbent are provided. The acid gas absorbent of the embodiment comprising at least one type of tertiary amine compound represented by the following general formula (1). (In the above-stated formula (1), either one of the R1, R2 represents a substituted or non-substituted alkyl group of which carbon number is 2 to 5, and the other one represents a substituted or non-substituted alkyl group of which carbon number is 1 to 5. The R3 represents a methyl group or an ethyl group, and the R4 represents a hydroxyalkyl group. The R1, R2 may either be the same or different, and they may be coupled to form a cyclic structure.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: August 9, 2016
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Shinji Murai, Yukishige Maezawa, Yasuhiro Kato, Takehiko Muramatsu, Satoshi Saito, Hiroko Watando, Naomi Shida, Reiko Yoshimura, Takashi Kuboki