Patents by Inventor Naomi Shida

Naomi Shida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Light-emitting device
    Publication number: 20070001568
    Abstract: A light-emitting device is provided, which includes a supporting member, a light-emitting element disposed on the supporting member to emit a light, and a fluorescent layer formed on the light-emitting element and having a thickness ranging from 80 to 240 ?m, the fluorescent layer containing a light-transmitting member and a fluorescent substance having a particle diameter ranging from 20 to 45 ?m at a concentration of 40 to 60 wt %.
    Type: Application
    Filed: February 7, 2006
    Publication date: January 4, 2007
    Inventors: Kei Kaneko, Naomi Shida, Masahiro Yamamoto, Yasushi Hattori
  • Semiconductor light emitting device
    Publication number: 20060291246
    Abstract: A semiconductor light emitting element includes a semiconductor light emitting element emitting light beams in ultraviolet ranges and visible ranges, and a fluorescent element absorbing the light beams from the semiconductor light emitting element and outputting visible light beams in a light taking-out direction different from a light emitting direction. The light beams emitted from the light emitting element is absorbed within the semiconductor light emitting device.
    Type: Application
    Filed: November 28, 2005
    Publication date: December 28, 2006
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yasushi Hattori, Shinji Saito, Shinya Nunoue, Masahiro Yamamoto, Naomi Shida, Kei Kaneko, Genichi Hatakoshi
  • Fluorescent substance, method of manufacturing fluorescent substance, and light emitting device using the fluorescent substance
    Publication number: 20060231796
    Abstract: Disclosed is a fluorescent substance comprising an alkaline earth metal silicate having a composition represented by the following general formula (1): (Sr1-x-y-zBaxCayEuz)2SiwO2+2w??(1) where x, y, z and w fall within the ranges of: 0?x?0.97; 0?y?0.97; 0.03?z?0.20; 1.00<w 1.10.
    Type: Application
    Filed: March 27, 2006
    Publication date: October 19, 2006
    Applicants: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Naomi Shida, Masaaki Tamatani, Kazuaki Otsuka, Yoshihito Tsutsui, Ryosuke Hiramatsu
  • Resist resin
    Patent number: 7119156
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: October 10, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Pattern forming process
    Patent number: 7070905
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: July 4, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Resist resin
    Patent number: 7063932
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: June 20, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Fluorescent substance and light-emitting device using the same
    Publication number: 20060081814
    Abstract: Disclosed is a fluorescent substance comprising an alkaline earth ortho-silicate, the fluorescent substance being activated by Eu2+, and further comprising at least one selected from the group consisting of La, Gd, Cs and K.
    Type: Application
    Filed: October 13, 2005
    Publication date: April 20, 2006
    Applicants: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd.
    Inventors: Naomi Shida, Masaaki Tamatani, Yoshihito Tsutsui, Kazuaki Ootsuka, Ryosuke Hiramatsu
  • Resist composition
    Patent number: 7029823
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: April 18, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Fluorescent substance containing nitrogen, method for manufacturing the same, and light-emitting device
    Publication number: 20060011936
    Abstract: Disclosed is a method for manufacturing a nitrogen-containing fluorescent substance comprising accommodating an oxide fluorescent substance containing two or more elements in a receptacle made of a material containing carbon, and sintering the oxide fluorescent substance in a mixed gas atmosphere containing nitrogen gas.
    Type: Application
    Filed: July 13, 2005
    Publication date: January 19, 2006
    Inventors: Ryosuke Hiramatsu, Kazuaki Ootsuka, Naomi Shida, Masaaki Tamatani, Hisayo Uetake, Yoshihito Tsutsui
  • HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS
    Patent number: 6974658
    Abstract: Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):
    Type: Grant
    Filed: April 30, 2003
    Date of Patent: December 13, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Naomi Shida, Toru Ushirogouchi, Takuya Naito
  • Resist resin
    Publication number: 20050048400
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: September 10, 2004
    Publication date: March 3, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Resist composition
    Publication number: 20050037284
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: September 10, 2004
    Publication date: February 17, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Resist resin
    Publication number: 20050037283
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: September 10, 2004
    Publication date: February 17, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Pattern forming process
    Publication number: 20050031990
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: September 10, 2004
    Publication date: February 10, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Process for producing a semiconductor device
    Publication number: 20050031991
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: September 10, 2004
    Publication date: February 10, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Light emitting device formed using rare earth complex and luminescent medium
    Publication number: 20040265631
    Abstract: A light emitting device includes a light emitting element and a luminescent medium.
    Type: Application
    Filed: June 23, 2004
    Publication date: December 30, 2004
    Inventors: Hiroki Iwanaga, Fumihiko Aiga, Naomi Shida, Akio Amano
  • Resin useful for resist, resist composition and pattern forming process using the same
    Patent number: 6824957
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: November 30, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • Resin useful for resist, resist composition and pattern forming process using the same
    Publication number: 20040043324
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Application
    Filed: August 7, 2003
    Publication date: March 4, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito
  • High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components
    Publication number: 20030235781
    Abstract: Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C): 1
    Type: Application
    Filed: April 30, 2003
    Publication date: December 25, 2003
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Naomi Shida, Toru Ushirogouchi, Takuya Naito
  • Resin useful for resist, resist composition and pattern forming process using the same
    Patent number: 6660450
    Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: December 9, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Okino, Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Satoshi Saito