Patents by Inventor Naoshi Itabashi

Naoshi Itabashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210316310
    Abstract: Provided is a technique for moving all of a droplet from a microchannel in which the droplet have been introduced to another layer. The droplet transport device of the present disclosure includes a substrate having a through-hole or a recess, a first electrode provided on the substrate along the surface of the substrate and arranged at a position adjacent to the through-hole or the recess, a plurality of second electrodes provided on the substrate along a surface of the substrate and to which a voltage for moving the droplet introduced on the substrate is applied, and a dielectric layer covering the surface of the substrate, the first electrode, and the second electrodes, and a water-repellent film provided on the inner wall surface of the through-hole or the recess, and on the dielectric layer.
    Type: Application
    Filed: April 1, 2021
    Publication date: October 14, 2021
    Inventors: Naoshi Itabashi, Michiru Fujioka, Shuhei Yamamoto, Yoshimitsu Yanagawa, Yusuke Goto
  • Patent number: 11130985
    Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
    Type: Grant
    Filed: October 7, 2015
    Date of Patent: September 28, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Naoshi Itabashi, Sonoko Migitaka, Masatoshi Narahara, Tomohiro Shoji, Yukio Ono
  • Publication number: 20200102587
    Abstract: Provided are a method and apparatus for forming clusters of amplified nucleic acid fragments without amplification bias, in a regular arrangement on a substrate. In the method according to the present invention, droplets enclosing the template nucleic acid are formed on a substrate that has a plurality of first surfaces having hydrophilicity and a second surface surrounding each of the plurality of first surfaces and being less hydrophilic than the first surfaces. Then, after a nucleic acid amplification reaction is performed in the droplets on the substrate, the droplets are removed and a nucleic acid amplification reaction is further performed on the substrate.
    Type: Application
    Filed: April 5, 2017
    Publication date: April 2, 2020
    Inventors: Takahide YOKOI, Chihiro UEMATSU, Naoshi ITABASHI
  • Patent number: 10481125
    Abstract: To a biomolecule measuring apparatus, a semiconductor sensor for detecting ions generated by a reaction between a biomolecular sample and a reagent is set. The semiconductor sensor has a plurality of cells which are arranged on a semiconductor substrate, and each of which detects ions, and a plurality of readout wires. Each of the plurality of cells has an ISFET which has a floating gate and which detects ions, a first MOSFET M2 for amplifying an output from the ISFET, and a second MOSFET M3 which selectively transmits an output from the first MOSFET to a corresponding readout wire R1. Each of the plurality of cells is provided with a third MOSFET M1 which generates hot electrons in the ISFET and which injects a charge to the floating gate of the ISFET. Here, the second MOSFET and the third MOSFET are separately controlled.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: November 19, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takayuki Kawahara, Yoshimitsu Yanagawa, Naoshi Itabashi, Riichiro Takemura
  • Patent number: 10451584
    Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimitsu Yanagawa, Takahide Yokoi, Naoshi Itabashi, Takayuki Kawahara, Sonoko Migitaka, Makiko Yoshida, Takamichi Muramatsu
  • Patent number: 10031083
    Abstract: The purpose of the present invention is to control, with a simple structure and high accuracy, irradiation of excitation light to a multi-nanopore substrate without interrupting a measurement. Irradiation of excitation light is performed concurrently to at least one nanopore and at least one reference object on a substrate mounted in an observation container 103. A position irradiated with the excitation light in a measurement sample is calculated on the basis of a signal generated from the reference object detected by a detector 109, and the measurement and a fixed position control is performed concurrently by performing measurement of the measurement object while a drive control part 115 controlling the position of the irradiation of the excitation light to the measurement sample on the basis of the calculation result, whereby an analysis of the measurement sample can be performed in a short time.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: July 24, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Michiru Fujioka, Tsuyoshi Sonehara, Naoshi Itabashi
  • Patent number: 9997337
    Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrode placed within a processing chamber of the vacuum reactor and having a wafer to be etched mounted on the upper surface thereof, bias supplying units and for supplying high frequency power for forming a bias potential to the lower electrode, a gas supply means for feeding reactive gas into the processing chamber, an electric field supplying means through for supplying a magnetic field for generating plasma in the processing chamber, and a control unit for controlling the distribution of ion energy in the plasma being incident on the wafer via the high frequency power.
    Type: Grant
    Filed: June 1, 2015
    Date of Patent: June 12, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Masahito Mori, Naoyuki Kofuji, Naoshi Itabashi
  • Publication number: 20170307532
    Abstract: The purpose of the present invention is to control, with a simple structure and high accuracy, irradiation of excitation light to a multi-nanopore substrate without interrupting a measurement. Irradiation of excitation light is performed concurrently to at least one nanopore and at least one reference object on a substrate mounted in an observation container 103. A position irradiated with the excitation light in a measurement sample is calculated on the basis of a signal generated from the reference object detected by a detector 109, and the measurement and a fixed position control is performed concurrently by performing measurement of the measurement object while a drive control part 115 controlling the position of the irradiation of the excitation light to the measurement sample on the basis of the calculation result, whereby an analysis of the measurement sample can be performed in a short time.
    Type: Application
    Filed: October 16, 2014
    Publication date: October 26, 2017
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Michiru FUJIOKA, Tsuyoshi SONEHARA, Naoshi ITABASHI
  • Publication number: 20170260573
    Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
    Type: Application
    Filed: October 7, 2015
    Publication date: September 14, 2017
    Inventors: Naoshi ITABASHI, Sonoko MIGITAKA, Masatoshi NARAHARA, Tomohiro SHOJI, Yukio ONO
  • Patent number: 9759681
    Abstract: The present invention is intended to provide a method and a device for detecting a biomolecule with high sensitivity and high throughput over a wide dynamic range without requiring concentration adjustments of a sample in advance. The present invention specifically binds charge carriers to a detection target biomolecule, and detects the detection target biomolecule one by one by measuring a current change that occurs as the conjugate of the biomolecule and the charge carriers passes through a micropore. High-throughput detection of a biomolecule sample is possible with an array of detectors.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: September 12, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiro Saito, Kenta Imai, Kyoko Imai, Kazumichi Imai, Itaru Yanagi, Yoshimitsu Yanagawa, Masahiko Ando, Naoshi Itabashi
  • Patent number: 9702695
    Abstract: An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: July 11, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroki Kawada, Osamu Inoue, Miyako Matsui, Takahiro Kawasaki, Naoshi Itabashi, Takashi Takahama, Katsumi Setoguchi, Osamu Komuro
  • Publication number: 20170138899
    Abstract: While an insulating film having a near-field light generating element placed thereon is being irradiated with light in an electrolytic solution, or after the film that has been irradiated with light is disposed in the electrolytic solution, a first voltage is applied between the two electrodes installed in the electrolytic solution across the film, a second voltage is then applied between the two electrodes, and a value of a current that flows between the two electrodes due to the application of the second voltage is detected. This procedure is stopped when the current value reaches or exceeds a pre-set threshold value, whereby a hole is formed at a desired location in the thin-film.
    Type: Application
    Filed: March 26, 2015
    Publication date: May 18, 2017
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Naoshi ITABASHI, Sonoko MIGITAKA, Itaru YANAGI, Rena AKAHORI, Kenichi TAKEDA
  • Publication number: 20160245777
    Abstract: To a biomolecule measuring apparatus, a semiconductor sensor for detecting ions generated by a reaction between a biomolecular sample and a reagent is set. The semiconductor sensor has a plurality of cells which are arranged on a semiconductor substrate, and each of which detects ions, and a plurality of readout wires. Each of the plurality of cells has an ISFET which has a floating gate and which detects ions, a first MOSFET M2 for amplifying an output from the ISFET, and a second MOSFET M3 which selectively transmits an output from the first MOSFET to a corresponding readout wire R1. Each of the plurality of cells is provided with a third MOSFET M1 which generates hot electrons in the ISFET and which injects a charge to the floating gate of the ISFET. Here, the second MOSFET and the third MOSFET are separately controlled.
    Type: Application
    Filed: October 2, 2014
    Publication date: August 25, 2016
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takayuki Kawahara, Yoshimitsu Yanagawa, Naoshi Itabashi, Riichiro Takemura
  • Patent number: 9293300
    Abstract: There is provided a plasma processing apparatus that can generate uniform plasma without increasing costs per unit electric power even though the discharge area is increased to adapt to samples in given sizes by arranging a plurality of plasma discharge units. A plasma processing apparatus includes an RF power supply having an RF signal circuit and an RF power circuit, a case, and a discharge electrode. A plasma module is configured of the discharge electrode and the RF power circuit provided in the case. A frequency signal from the RF signal circuit is inputted to a plurality of the plasma modules connected in parallel with each other.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: March 22, 2016
    Assignee: HITACHI, LTD.
    Inventors: Hiroyuki Kobayashi, Hideyuki Nagaishi, Takumi Tandou, Naoshi Itabashi
  • Publication number: 20150362458
    Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).
    Type: Application
    Filed: November 18, 2013
    Publication date: December 17, 2015
    Inventors: Yoshimitsu YANAGAWA, Takahide YOKOI, Naoshi ITABASHI, Takayuki KAWAHARA, Sonoko MIGITAKA, Makiko YOSHIDA, Takamichi MURAMATSU
  • Publication number: 20150348763
    Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor, a lower electrode placed within a processing chamber of the vacuum reactor and having a wafer to be etched mounted on the upper surface thereof, bias supplying units and for supplying high frequency power for forming a bias potential to the lower electrode, a gas supply means for feeding reactive gas into the processing chamber, an electric field supplying means through for supplying a magnetic field for generating plasma in the processing chamber, and a control unit for controlling the distribution of ion energy in the plasma being incident on the wafer via the high frequency power.
    Type: Application
    Filed: June 1, 2015
    Publication date: December 3, 2015
    Inventors: Masahito MORI, Naoyuki KOFUJI, Naoshi ITABASHI
  • Publication number: 20150308977
    Abstract: The present invention is intended to provide a method and a device for detecting a biomolecule with high sensitivity and high throughput over a wide dynamic range without requiring concentration adjustments of a sample in advance. The present invention specifically binds charge carriers to a detection target biomolecule, and detects the detection target biomolecule one by one by measuring a current change that occurs as the conjugate of the biomolecule and the charge carriers passes through a micropore. High-throughput detection of a biomolecule sample is possible with an array of detectors.
    Type: Application
    Filed: June 28, 2013
    Publication date: October 29, 2015
    Inventors: Toshiro Saito, Kenta Imai, Kyoko Imai, Kazumichi Imai, Itaru Yanagi, Yoshimitsu Yanagawa, Masahiko Ando, Naoshi Itabashi
  • Patent number: 9076637
    Abstract: The invention provides a plasma processing apparatus and a dry etching method for etching a multilayered film structure having steps with high accuracy. The plasma processing apparatus comprises a vacuum reactor 107, a lower electrode 113 placed within a processing chamber of the vacuum reactor and having a wafer 112 to be etched mounted on the upper surface thereof, bias supplying units 118 and 120 for supplying high frequency power for forming a bias potential to the lower electrode 113, a gas supply means 111 for feeding reactive gas into the processing chamber, an electric field supplying means 101 through 103 for supplying a magnetic field for generating plasma in the processing chamber, and a control unit 127 for controlling the distribution of ion energy in the plasma being incident on the wafer 112 via the high frequency power.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: July 7, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Masahito Mori, Naoyuki Kofuji, Naoshi Itabashi
  • Patent number: 9034270
    Abstract: Sterilization and cleaning of an escalator hand rail are performed. A sterilization and cleaning device including a hand rail; a plasma source for irradiating the hand rails with ions or radicals or UV light; an enclosure for housing the plasma source; a power source for generating plasma; a fan for generating relatively negative pressure in the enclosure; filter units for removing removed bacteria, viruses, and organic matters such as hand marks; and filter plates located backward and forward of a moving direction of the hand rail in the enclosure along the hand rail is provided.
    Type: Grant
    Filed: January 3, 2012
    Date of Patent: May 19, 2015
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Kobayashi, Takumi Tandou, Naoshi Itabashi
  • Publication number: 20150010902
    Abstract: Disclosed is an apparatus for monitoring airborne microorganisms composed of: a chassis, which has a fan for flowing the air therein from the outside at a portion thereof and of which inside is spatially segmented by partition plates for performing a plurality of steps; a perforated plate, which is disposed at a portion of the chassis and has a plurality of nozzles for focusing split air flows passing through a plurality of spaces in a given direction; a capturing plate, which has a plurality of trapping surfaces at the positions opposite to the plurality of nozzles of the perforated plate; a capturing plate control part, which moves the capturing plate relative to the perforated plate; and an optical detection part for fluorescence generated from the microorganisms on the trapping surface of the capturing plate.
    Type: Application
    Filed: February 8, 2012
    Publication date: January 8, 2015
    Applicant: Hitachi, Ltd.
    Inventors: Kei Takenaka, Hideyuki Noda, Naoshi Itabashi, Yoshiaki Yazawa